TWD230208S - 半導體製造裝置用反應管的內管之部分 - Google Patents

半導體製造裝置用反應管的內管之部分 Download PDF

Info

Publication number
TWD230208S
TWD230208S TW111305741F TW111305741F TWD230208S TW D230208 S TWD230208 S TW D230208S TW 111305741 F TW111305741 F TW 111305741F TW 111305741 F TW111305741 F TW 111305741F TW D230208 S TWD230208 S TW D230208S
Authority
TW
Taiwan
Prior art keywords
semiconductor manufacturing
reaction tube
tube
inner tube
manufacturing equipment
Prior art date
Application number
TW111305741F
Other languages
English (en)
Chinese (zh)
Inventor
平野敦士
Original Assignee
日商國際電氣股份有限公司 (日本)
日商國際電氣股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商國際電氣股份有限公司 (日本), 日商國際電氣股份有限公司 filed Critical 日商國際電氣股份有限公司 (日本)
Publication of TWD230208S publication Critical patent/TWD230208S/zh

Links

TW111305741F 2022-05-30 2022-11-18 半導體製造裝置用反應管的內管之部分 TWD230208S (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022011411F JP1731675S (enrdf_load_stackoverflow) 2022-05-30 2022-05-30
JP2022-011411 2022-05-30

Publications (1)

Publication Number Publication Date
TWD230208S true TWD230208S (zh) 2024-03-01

Family

ID=84322292

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111305741F TWD230208S (zh) 2022-05-30 2022-11-18 半導體製造裝置用反應管的內管之部分

Country Status (3)

Country Link
US (1) USD1019583S1 (enrdf_load_stackoverflow)
JP (1) JP1731675S (enrdf_load_stackoverflow)
TW (1) TWD230208S (enrdf_load_stackoverflow)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD213081S (zh) 2020-06-15 2021-08-01 日商東京威力科創股份有限公司 半導體製造裝置用反應管（一）

Family Cites Families (47)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5637153A (en) * 1993-04-30 1997-06-10 Tokyo Electron Limited Method of cleaning reaction tube and exhaustion piping system in heat processing apparatus
USD424024S (en) * 1997-01-31 2000-05-02 Tokyo Electron Limited Quartz process tube
USD405430S (en) * 1997-01-31 1999-02-09 Tokyo Electron Limited Inner tube for use in a semiconductor wafer heat processing apparatus
USD423463S (en) * 1997-01-31 2000-04-25 Tokyo Electron Limited Quartz process tube
USD552047S1 (en) * 2005-02-28 2007-10-02 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD551634S1 (en) * 2005-02-28 2007-09-25 Tokyo Electron Limited Wafer-boat for heat-processing of semiconductor wafers
USD600659S1 (en) * 2006-09-12 2009-09-22 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
JP4331768B2 (ja) * 2007-02-28 2009-09-16 東京エレクトロン株式会社 熱処理炉及び縦型熱処理装置
US8023806B2 (en) * 2007-03-20 2011-09-20 Tokyo Electron Limited Heat processing furnace and vertical-type heat processing apparatus
TWD127410S1 (zh) * 2007-04-20 2009-02-11 東京威力科創股份有限公司 半導體製造用製程管
TWD125601S (zh) * 2007-05-08 2008-10-21 東京威力科創股份有限公司 半導體製造用加工處理管
TWD143034S1 (zh) * 2008-03-28 2011-10-01 東京威力科創股份有限公司 半導體製造用處理管
USD610559S1 (en) * 2008-05-30 2010-02-23 Hitachi Kokusai Electric, Inc. Reaction tube
US8398773B2 (en) * 2011-01-21 2013-03-19 Asm International N.V. Thermal processing furnace and liner for the same
USD724551S1 (en) * 2011-11-18 2015-03-17 Tokyo Electron Limited Inner tube for process tube for manufacturing semiconductor wafers
USD720308S1 (en) * 2011-11-18 2014-12-30 Tokyo Electron Limited Inner tube for process tube for manufacturing semiconductor wafers
USD720309S1 (en) * 2011-11-18 2014-12-30 Tokyo Electron Limited Inner tube for process tube for manufacturing semiconductor wafers
TWD166332S (zh) * 2013-03-22 2015-03-01 日立國際電氣股份有限公司 基板處理裝置用晶舟之部分
TWD168774S (zh) * 2013-06-28 2015-07-01 日立國際電氣股份有限公司 反應管之部分
TWD167987S (zh) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 反應管之部分
USD739832S1 (en) * 2013-06-28 2015-09-29 Hitachi Kokusai Electric Inc. Reaction tube
TWD167986S (zh) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 反應管之部分
TWD167985S (zh) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 反應管之部分
TWD168827S (zh) * 2013-07-29 2015-07-01 日立國際電氣股份有限公司 半導體製造裝置用晶舟
TWD167988S (zh) * 2013-07-29 2015-05-21 日立國際電氣股份有限公司 半導體製造裝置用晶舟
JP1535455S (enrdf_load_stackoverflow) * 2015-02-25 2015-10-19
JP1546512S (enrdf_load_stackoverflow) * 2015-09-04 2016-03-22
JP1546345S (enrdf_load_stackoverflow) * 2015-09-04 2016-03-22
JP1563649S (enrdf_load_stackoverflow) * 2016-02-12 2016-11-21
JP1563524S (enrdf_load_stackoverflow) 2016-03-30 2016-11-21
JP1605460S (enrdf_load_stackoverflow) * 2017-08-09 2021-05-31
JP1605462S (enrdf_load_stackoverflow) * 2017-08-10 2021-05-31
JP1605461S (enrdf_load_stackoverflow) * 2017-08-10 2021-05-31
JP1605982S (enrdf_load_stackoverflow) * 2017-12-27 2021-05-31
USD846514S1 (en) * 2018-05-03 2019-04-23 Kokusai Electric Corporation Boat of substrate processing apparatus
USD847105S1 (en) * 2018-05-03 2019-04-30 Kokusai Electric Corporation Boat of substrate processing apparatus
JP6856576B2 (ja) * 2018-05-25 2021-04-07 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ 基板処理装置、半導体装置の製造方法及びプログラム
JP1638282S (enrdf_load_stackoverflow) * 2018-09-20 2019-08-05
JP1640260S (enrdf_load_stackoverflow) * 2018-11-19 2019-09-02
JP1644260S (enrdf_load_stackoverflow) 2019-03-20 2019-10-28
JP1658652S (enrdf_load_stackoverflow) * 2019-08-07 2020-04-27
JP1665228S (enrdf_load_stackoverflow) * 2019-11-28 2020-08-03
USD931823S1 (en) * 2020-01-29 2021-09-28 Kokusai Electric Corporation Reaction tube
JP1678273S (ja) * 2020-03-10 2021-02-01 反応管
JP1678278S (ja) * 2020-03-19 2021-02-01 基板処理装置用ボート
JP7461490B2 (ja) * 2020-09-28 2024-04-03 株式会社Kokusai Electric 温度制御方法、半導体装置の製造方法、プログラム及び基板処理装置
JP1700777S (ja) * 2021-03-15 2021-11-29 基板処理装置用ボート

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD213081S (zh) 2020-06-15 2021-08-01 日商東京威力科創股份有限公司 半導體製造裝置用反應管（一）

Also Published As

Publication number Publication date
JP1731675S (enrdf_load_stackoverflow) 2022-12-08
USD1019583S1 (en) 2024-03-26

Similar Documents

Publication Publication Date Title
TWD212079S (zh) 控制器
TWD232581S (zh) 半導體製造裝置用反應管的內管
TWD192693S (zh) 真空吸塵器（五十四）
TWD207217S (zh) 動力工具接口部
TWD211225S (zh) 排氣管
TWD208387S (zh) 半導體製造裝置用反應管之內管
TWD194464S (zh) Chain
TWD203179S (zh) 扳手之部分
TWD210154S (zh) 千斤頂
TWD211239S (zh) 晶圓保持器之部分
TWD192466S (zh) 真空吸塵器（十）
TWD192697S (zh) 真空吸塵器（五十八）
TWD192695S (zh) 真空吸塵器（五十六）
TWD210725S (zh) 動力工具接口部
TWD199827S (zh) 車用輪胎之部分
TWD230208S (zh) 半導體製造裝置用反應管的內管之部分
TWD191274S (zh) Part of the headlight
TWD192696S (zh) 真空吸塵器（五十七）
TWD232582S (zh) 半導體製造裝置用反應管的內管之部分
TWD207502S (zh) 耳機
TWD203223S (zh) 鏈片之部分
TWD207972S (zh) 鞋底
TWD192467S (zh) 真空吸塵器（十一）
TWD218222S (zh) 便盆
TWD223598S (zh) 音頻感知器