JP1605982S - - Google Patents

Info

Publication number
JP1605982S
JP1605982S JPD2017-29309F JP2017029309F JP1605982S JP 1605982 S JP1605982 S JP 1605982S JP 2017029309 F JP2017029309 F JP 2017029309F JP 1605982 S JP1605982 S JP 1605982S
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JPD2017-29309F
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JPD2017-29309F priority Critical patent/JP1605982S/ja
Priority to TW106307404D01F priority patent/TWD200073S/zh
Priority to US29/649,496 priority patent/USD853979S1/en
Application granted granted Critical
Publication of JP1605982S publication Critical patent/JP1605982S/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JPD2017-29309F 2017-12-27 2017-12-27 Active JP1605982S (enrdf_load_stackoverflow)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JPD2017-29309F JP1605982S (enrdf_load_stackoverflow) 2017-12-27 2017-12-27
TW106307404D01F TWD200073S (zh) 2017-12-27 2018-04-26 反應管
US29/649,496 USD853979S1 (en) 2017-12-27 2018-05-30 Reaction tube

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JPD2017-29309F JP1605982S (enrdf_load_stackoverflow) 2017-12-27 2017-12-27

Publications (1)

Publication Number Publication Date
JP1605982S true JP1605982S (enrdf_load_stackoverflow) 2021-05-31

Family

ID=62239112

Family Applications (1)

Application Number Title Priority Date Filing Date
JPD2017-29309F Active JP1605982S (enrdf_load_stackoverflow) 2017-12-27 2017-12-27

Country Status (3)

Country Link
US (1) USD853979S1 (enrdf_load_stackoverflow)
JP (1) JP1605982S (enrdf_load_stackoverflow)
TW (1) TWD200073S (enrdf_load_stackoverflow)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP1611626S (enrdf_load_stackoverflow) * 2017-01-20 2018-08-20
JP1640260S (enrdf_load_stackoverflow) * 2018-11-19 2019-09-02
JP1644260S (enrdf_load_stackoverflow) * 2019-03-20 2019-10-28
USD931823S1 (en) * 2020-01-29 2021-09-28 Kokusai Electric Corporation Reaction tube
JP1678273S (ja) * 2020-03-10 2021-02-01 反応管
JP1731672S (enrdf_load_stackoverflow) * 2022-03-15 2022-12-08
JP1731671S (enrdf_load_stackoverflow) * 2022-03-15 2022-12-08
JP1731674S (enrdf_load_stackoverflow) * 2022-05-30 2022-12-08
JP1731675S (enrdf_load_stackoverflow) * 2022-05-30 2022-12-08
JP1731673S (enrdf_load_stackoverflow) * 2022-05-30 2022-12-08

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KR890008922A (ko) * 1987-11-21 1989-07-13 후세 노보루 열처리 장치
JP3024449B2 (ja) * 1993-07-24 2000-03-21 ヤマハ株式会社 縦型熱処理炉及び熱処理方法
JPH08264521A (ja) * 1995-03-20 1996-10-11 Kokusai Electric Co Ltd 半導体製造用反応炉
USD406113S (en) * 1997-01-31 1999-02-23 Tokyo Electron Limited Processing tube for use in a semiconductor wafer heat processing apparatus
USD423463S (en) * 1997-01-31 2000-04-25 Tokyo Electron Limited Quartz process tube
USD417438S (en) * 1997-01-31 1999-12-07 Tokyo Electron Limited Quartz outer tube
USD424024S (en) * 1997-01-31 2000-05-02 Tokyo Electron Limited Quartz process tube
USD405429S (en) * 1997-01-31 1999-02-09 Tokyo Electron Limited Processing tube for use in a semiconductor wafer heat processing apparatus
USD405431S (en) * 1997-08-20 1999-02-09 Tokyo Electron Ltd. Tube for use in a semiconductor wafer heat processing apparatus
USD404368S (en) * 1997-08-20 1999-01-19 Tokyo Electron Limited Outer tube for use in a semiconductor wafer heat processing apparatus
USD405062S (en) * 1997-08-20 1999-02-02 Tokyo Electron Ltd. Processing tube for use in a semiconductor wafer heat processing apparatus
US5948300A (en) * 1997-09-12 1999-09-07 Kokusai Bti Corporation Process tube with in-situ gas preheating
JP2000243747A (ja) * 1999-02-18 2000-09-08 Kokusai Electric Co Ltd 基板処理装置
KR100360401B1 (ko) * 2000-03-17 2002-11-13 삼성전자 주식회사 슬릿형 공정가스 인입부와 다공구조의 폐가스 배출부를포함하는 공정튜브 및 반도체 소자 제조장치
JP3497450B2 (ja) * 2000-07-06 2004-02-16 東京エレクトロン株式会社 バッチ式熱処理装置及びその制御方法
JP4523225B2 (ja) * 2002-09-24 2010-08-11 東京エレクトロン株式会社 熱処理装置
TWD105531S1 (zh) * 2003-11-04 2005-07-11 東京威力科創股份有限公司 半導體製造裝置之處理管
TWD104755S1 (zh) * 2003-11-04 2005-05-21 東京威力科創股份有限公司 半導體製造裝置之處理管
TWD118408S1 (zh) * 2006-02-20 2007-08-01 東京威力科創股份有限公司 半導體製造用加工處理管
USD600659S1 (en) * 2006-09-12 2009-09-22 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
TWD125600S1 (zh) * 2006-10-12 2008-10-21 東京威力科創股份有限公司 半導體製造用加工處理管
TWD143034S1 (zh) * 2008-03-28 2011-10-01 東京威力科創股份有限公司 半導體製造用處理管
TWD133943S1 (zh) * 2008-05-09 2010-03-21 日立國際電氣股份有限公司 反應管
USD610559S1 (en) * 2008-05-30 2010-02-23 Hitachi Kokusai Electric, Inc. Reaction tube
JP5721219B2 (ja) * 2010-07-09 2015-05-20 株式会社日立国際電気 基板処理装置、半導体装置の製造方法及び加熱装置
USD724551S1 (en) * 2011-11-18 2015-03-17 Tokyo Electron Limited Inner tube for process tube for manufacturing semiconductor wafers
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TWD168774S (zh) * 2013-06-28 2015-07-01 日立國際電氣股份有限公司 反應管之部分
TWD167987S (zh) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 反應管之部分
USD739832S1 (en) * 2013-06-28 2015-09-29 Hitachi Kokusai Electric Inc. Reaction tube
TWD167986S (zh) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 反應管之部分
JP1534829S (enrdf_load_stackoverflow) * 2015-02-23 2015-10-13
JP1534828S (enrdf_load_stackoverflow) * 2015-02-23 2015-10-13
JP1535455S (enrdf_load_stackoverflow) * 2015-02-25 2015-10-19
JP1546345S (enrdf_load_stackoverflow) * 2015-09-04 2016-03-22
JP1546512S (enrdf_load_stackoverflow) * 2015-09-04 2016-03-22
JP1563524S (enrdf_load_stackoverflow) * 2016-03-30 2016-11-21

Also Published As

Publication number Publication date
TWD200073S (zh) 2019-10-01
USD853979S1 (en) 2019-07-16

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