JP1731672S - - Google Patents

Info

Publication number
JP1731672S
JP1731672S JP2022005266F JP2022005266F JP1731672S JP 1731672 S JP1731672 S JP 1731672S JP 2022005266 F JP2022005266 F JP 2022005266F JP 2022005266 F JP2022005266 F JP 2022005266F JP 1731672 S JP1731672 S JP 1731672S
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2022005266F
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP2022005266F priority Critical patent/JP1731672S/ja
Priority to TW111303581F priority patent/TWD231015S/zh
Priority to US29/849,042 priority patent/USD1053156S1/en
Application granted granted Critical
Publication of JP1731672S publication Critical patent/JP1731672S/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2022005266F 2022-03-15 2022-03-15 Active JP1731672S (enrdf_load_stackoverflow)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2022005266F JP1731672S (enrdf_load_stackoverflow) 2022-03-15 2022-03-15
TW111303581F TWD231015S (zh) 2022-03-15 2022-07-20 基板處理裝置用爐
US29/849,042 USD1053156S1 (en) 2022-03-15 2022-08-08 Furnace for substrate processing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2022005266F JP1731672S (enrdf_load_stackoverflow) 2022-03-15 2022-03-15

Publications (1)

Publication Number Publication Date
JP1731672S true JP1731672S (enrdf_load_stackoverflow) 2022-12-08

Family

ID=84322294

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022005266F Active JP1731672S (enrdf_load_stackoverflow) 2022-03-15 2022-03-15

Country Status (3)

Country Link
US (1) USD1053156S1 (enrdf_load_stackoverflow)
JP (1) JP1731672S (enrdf_load_stackoverflow)
TW (1) TWD231015S (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP1731671S (enrdf_load_stackoverflow) * 2022-03-15 2022-12-08

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD406113S (en) * 1997-01-31 1999-02-23 Tokyo Electron Limited Processing tube for use in a semiconductor wafer heat processing apparatus
NL1005963C2 (nl) * 1997-05-02 1998-11-09 Asm Int Verticale oven voor het behandelen van halfgeleidersubstraten.
TWD127410S1 (zh) * 2007-04-20 2009-02-11 東京威力科創股份有限公司 半導體製造用製程管
TWD143034S1 (zh) * 2008-03-28 2011-10-01 東京威力科創股份有限公司 半導體製造用處理管
USD610559S1 (en) * 2008-05-30 2010-02-23 Hitachi Kokusai Electric, Inc. Reaction tube
USD725053S1 (en) * 2011-11-18 2015-03-24 Tokyo Electron Limited Outer tube for process tube for manufacturing semiconductor wafers
USD720309S1 (en) * 2011-11-18 2014-12-30 Tokyo Electron Limited Inner tube for process tube for manufacturing semiconductor wafers
TWD167986S (zh) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 反應管之部分
TWD167985S (zh) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 反應管之部分
USD739832S1 (en) * 2013-06-28 2015-09-29 Hitachi Kokusai Electric Inc. Reaction tube
TWD168774S (zh) * 2013-06-28 2015-07-01 日立國際電氣股份有限公司 反應管之部分
TWD167987S (zh) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 反應管之部分
JP1535455S (enrdf_load_stackoverflow) * 2015-02-25 2015-10-19
JP1546345S (enrdf_load_stackoverflow) * 2015-09-04 2016-03-22
JP1546512S (enrdf_load_stackoverflow) * 2015-09-04 2016-03-22
JP1548462S (enrdf_load_stackoverflow) * 2015-09-04 2016-04-25
JP1568553S (enrdf_load_stackoverflow) * 2016-02-12 2017-02-06
JP1568552S (enrdf_load_stackoverflow) 2016-02-12 2017-02-06
JP1563524S (enrdf_load_stackoverflow) * 2016-03-30 2016-11-21
JP1582475S (enrdf_load_stackoverflow) * 2016-10-14 2017-07-31
JP1605461S (enrdf_load_stackoverflow) * 2017-08-10 2021-05-31
JP1605462S (enrdf_load_stackoverflow) * 2017-08-10 2021-05-31
JP1605982S (enrdf_load_stackoverflow) * 2017-12-27 2021-05-31
JP1611565S (enrdf_load_stackoverflow) * 2018-02-27 2018-08-20
JP1620676S (enrdf_load_stackoverflow) * 2018-02-27 2018-12-17
JP1644260S (enrdf_load_stackoverflow) * 2019-03-20 2019-10-28
JP1682719S (enrdf_load_stackoverflow) 2020-06-15 2021-04-05
JP7317912B2 (ja) * 2021-09-21 2023-07-31 株式会社Kokusai Electric 炉口部構造、基板処理装置、および半導体装置の製造方法

Also Published As

Publication number Publication date
TWD231015S (zh) 2024-05-01
USD1053156S1 (en) 2024-12-03

Similar Documents

Publication Publication Date Title
JP1731671S (enrdf_load_stackoverflow)
JP1731672S (enrdf_load_stackoverflow)
BR102022025291A2 (enrdf_load_stackoverflow)
BR102023014872A2 (enrdf_load_stackoverflow)
BR102023012440A2 (enrdf_load_stackoverflow)
BR102023010976A2 (enrdf_load_stackoverflow)
BR102023009641A2 (enrdf_load_stackoverflow)
BR102023008688A2 (enrdf_load_stackoverflow)
BR102023005164A2 (enrdf_load_stackoverflow)
BR102023001987A2 (enrdf_load_stackoverflow)
BR102023001877A2 (enrdf_load_stackoverflow)
BR102023000289A2 (enrdf_load_stackoverflow)
BR102022017795A2 (enrdf_load_stackoverflow)
BR202022009269U2 (enrdf_load_stackoverflow)
BR202022005961U2 (enrdf_load_stackoverflow)
BR202022001779U2 (enrdf_load_stackoverflow)
BR202022000931U2 (enrdf_load_stackoverflow)
CN307049298S (enrdf_load_stackoverflow)
BY13169U (enrdf_load_stackoverflow)
CN307047236S (enrdf_load_stackoverflow)
BY13162U (enrdf_load_stackoverflow)
CN307047469S (enrdf_load_stackoverflow)
BY13146U (enrdf_load_stackoverflow)
CN307047823S (enrdf_load_stackoverflow)
CN307046093S (enrdf_load_stackoverflow)