TW588443B - Semiconductor device, and method of manufacturing the same - Google Patents

Semiconductor device, and method of manufacturing the same Download PDF

Info

Publication number
TW588443B
TW588443B TW092104639A TW92104639A TW588443B TW 588443 B TW588443 B TW 588443B TW 092104639 A TW092104639 A TW 092104639A TW 92104639 A TW92104639 A TW 92104639A TW 588443 B TW588443 B TW 588443B
Authority
TW
Taiwan
Prior art keywords
semiconductor
substrate
semiconductor wafer
semiconductor device
resin
Prior art date
Application number
TW092104639A
Other languages
English (en)
Other versions
TW200401415A (en
Inventor
Kazunari Michii
Naoyuki Shinonaga
Shinji Semba
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Publication of TW200401415A publication Critical patent/TW200401415A/zh
Application granted granted Critical
Publication of TW588443B publication Critical patent/TW588443B/zh

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • H01L21/561Batch processing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49811Additional leads joined to the metallisation on the insulating substrate, e.g. pins, bumps, wires, flat leads
    • H01L23/49816Spherical bumps on the substrate for external connection, e.g. ball grid arrays [BGA]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49838Geometry or layout
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/93Batch processes
    • H01L24/95Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
    • H01L24/97Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/0554External layer
    • H01L2224/05599Material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • H01L2224/8538Bonding interfaces outside the semiconductor or solid-state body
    • H01L2224/85399Material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/93Batch processes
    • H01L2224/95Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
    • H01L2224/97Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L24/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/00014Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01004Beryllium [Be]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01005Boron [B]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01006Carbon [C]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01033Arsenic [As]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01068Erbium [Er]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01082Lead [Pb]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Geometry (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Wire Bonding (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Description

588443 言正替換頁 利範圍第3項之半導體裝置中, 使上述之端子更包含有形成在上述之接端面上之焊接 球。 本發明之申請專利範圍第5項之半導體裝置之製造方法 其特徵是所包含之步驟有: 在基板之表面裝載多個之半導體晶片; 以密封樹脂一起密封上述之多個半導體晶片; 在將多個端子形成在上述基板之背面之步驟,形成端子 使鄰接之半導體晶片之對應之端子之間隔,成爲半導體晶 片之端子之間隔的整數倍; 進行上述之多個半導體晶片之電試驗;和 切斷上述之樹脂和上述之基板,用來使上述之半導體晶 片成爲各個片。 本發明之申請專利範圍第6項之半導體裝置之製造方法 是在申請專利範圍第5項之製造方法中, 使上述之電試驗之進行使用以與上述半導體晶片中之端 子之間隔相同之間隔被配置成爲柵網狀之測試接觸銷進 本發明之申請專利範圍第7項之半導體裝置之製造方法 是在申請專利範圍第5或6項之製造方法中, 使上述之半導體晶片成爲各個片之步驟是對鄰接之半導 體晶片之間進行2次切斷。 本發明之申請專利範圍第.8項之半導體裝置之製造方法 是在申請專利範圍第5或7項之製造方法中’ 32'6\ 總檔\92\92104639\93104639(替換1 588443 y. X ^ Jiy日j 替换頁 是切斷部份,7是切剩部份, Κ 半導體晶片,5是金屬線, 8是封裝(半導體裝置),1 1是測試接觸銷 首先說明本實施形態1之半導體裝置。 如圖1和圖2所示,在基板1之表面形成多個樹脂密封 部2。然後,如圖4和圖5所示,在樹脂密封部2內設置 多個半導體晶片4,利用金屬線5形成與基板1電連接。
然後,如圖3和圖5所示,在基板1之背面,與樹脂密 封部2內之半導體晶片4對應的,形成多個焊接球3作爲 外部電極用之端子。在此處是使鄰接的半導體晶片4(或封 裝8)之對應的焊接球3之間隔A,成爲半導體晶片4(或封 裝8)的焊接球3之間隔B的η倍(η爲1以上之整數),以
此方式配置焊接球3。例如,在封裝大小爲8 m m X 8 m m之 情況時,間隔A爲9.6 m m (= Ο . 8 m m x 1 2),間隔B爲Ο . 8 m m。 另外,焊接球3經由接端面(9)形成與半導體晶片4電連接 (參照圖17)。另外,η之値通常被設定在2〜20之範圍。 換言之,間隔Α被設定成爲間隔Β之2〜20倍。 另外,如圖5所示,利用焊接球3的間隔B相同的間隔 (例如0.8mm),將測試接觸銷11配置成爲栅網狀。使用該 測試接觸銷1 1用來進行半導體裝置之電試驗(將於後面說 明)。 然後,如圖6〜圖8所示,在樹脂密封部2和基板1之 相鄰半導體晶片4之間,分別設置被切割器切斷之2個切 斷部份6。在該2個切斷部份6之間,亦即在半導體晶片 4(或封裝8)之間之部份,成爲切剩部份7。該切剩部份7 13 326\總檔\92\92104639\93104639(替換)-1 93. 9. 1 4 替换頁 經由 小。 588443 I正替換頁 是依照所希望之封裝大小變化其大小之部份。亦即, 變化該切剩部份7之大小,可以獲得所希望之封裝大 例如,在上述之封裝大小之情況時,切斷部份6之幅度爲 0.3 5mm,切剩部份7之幅度爲0.9mm。 下面將說明半導體裝置’之製造方法。 首先,如圖4和圖5所示,在基板1之表面裝載多個半 導體晶片4,使用金屬線5電連接基板1和半導體晶片4。
其次’以樹脂一起封多個半導體晶片4’用來形成樹 脂密封部2。
其次,在基板1之背面,形成與半·導體晶片電連接之多 個焊接球裝載用接端面(參照圖17)。然後,在接端面上形 成焊接球3。在此處具有作爲外部電極用之端子之功能之 接端面和焊接球3,形成使鄰接之半導體晶片4之對應端 子之間隔Α成爲半導體晶片4的端子之間隔Β的η倍(η爲 1以上之整數)。例如,當封裝大小爲8mm X 8 mm之情況時, 間隔A爲9.6mm(0.8mmxl2),間隔B成爲0.8mm,以此方 式形成接端面和焊接球3。 其次,以多個半導體晶片4被裝載在基板1上之狀態, 同時進行多個半導體晶片4之電試驗。此處之電試驗如圖 5所示,使用以與焊接球3之間隔B相同之間隔(例如0.8mm) 被配置成柵網狀之測試接觸銷1 1用來進行該電試驗。 然後,在完成電試驗之後,利用切割器切斷被設在樹脂 密封部2和基板1之切斷部份6。在此處爲著獲得所希望 之封裝大小,所以在鄰接之半導體晶片4(或封裝8)之間, 14 326\總檔\92\92104639\93104639(替換)-1 588443
93. 9. 1 4 替換頁 分別進行2次切斷,例如成爲残留0.9mm幅度之切剩部 利用此種方式使封裝8成爲各個片。 如以上所說明之方式,在本實施形態1中,使端子位置 共同化,用來使鄰接之半導體晶片4之對應端子(接端面+ 9,焊接球3)之間隔A,成爲半導體晶片4的端子之間隔B 的η倍U爲1以上之整數).。因此,假如準備1種以與半導 體晶片4的端子之間隔Β相同的間隔配置成柵網狀的測試 接觸銷1 1時,則即使在.樹脂密封部2內之封裝大小有變化 之情況時,亦可以以相同之測試接觸銷1 1進行電試驗。因 此,測試夾具之成本可以大幅的削減。 另外,因爲不需要更換測試夾具之時間,亦即沒有封裝 替換損失,所以可以有效的進行電試驗。 另外,因爲可以以基板狀態同時測試多個封裝8(或半導 體晶片4),所以可以大幅的提高電試驗之生產效率。另外, 即使在使封裝小型化之情況時,亦可以防止在電試驗時或 搬運時之封裝之脫落。 另外,在本實施形態1中,當使封裝8成爲各個片時, 使切剩部7殘留,以2次切斷樹脂密封部2和基板1。因 此,如上述之方式,即使在謀求使端子位置共同化時,亦 可以獲得所希望之封裝大小之半導體裝置.。 另外,在本實施形態1中,所說明者是使用BGA基板作 爲半導體裝置用基板之情況,亦即BGA型之封裝,但是並 不只限於此種方式,亦可以使用LGA型之封裝。在此種情 況亦可以不形成作爲端子之焊接球3。 15
326\總檔\92\92104639\93104639(替換)-1
588443 肆、中文發明摘要 |正替換頁ii±f
Mm 93. 9. 1 誓换 本發明之目的是使半導體裝置之端子位置共用,和減低 半導體裝置之電試驗所使用之夾具之成本。 本發明之解決手段是在半導體裝置用基板1之表面裝載+ 多個之半導體晶片4。以樹脂一起密封多個半導體晶片4, 用來形成樹脂密封部2。在基板1之背面形成多個焊接球 3,使鄰接之半導體晶片4之對應之焊接球3之間隔A,成 爲半導體晶片4之焊接球3之間隔B之η倍(η爲1以上之 整數)。在進行多個半導體晶片4之電試驗之後,切斷樹脂 密封部2和基板1,用來使半導體晶片4成爲各個片。 伍、英文發明摘要
The present invention is to provide a semiconductor , ' · - device and method of manufacturing the same in order to curtail costs for a test tool used for electrical test of semiconductor devices by establishing commonality in positions of. terminals of semiconductor device. A plurality of semiconductor chips is mounted on a surface of a substrate to be used for manufacturing semiconductor devices. The semiconductor chips are collectively sealed with resin, thereby forming resin-sealed sections. A plurality of solder balls are formed on the back surface of the substrate such that an interval A between the corresponding solder balls of adjacent semiconductor chips becomes “n” times (“n” is an integer greater than 1 )an 3 326\總檔\92\92104639\93104639(替換)-1 fff fη /γ 588443拾·、申:露專利範· 替換頁lM(m 的· 9· 1 4 替换頁 1. 一種半導體裝置,其特徵是具備有: 多個半導體晶片,被裝載在基板之表面; 密封樹脂,用來一起密封該多個半導體晶片;和 端子,成爲形成在該基板之背面之多個端子,使鄰接的 該半導體晶片之對應的該端子的間隔,成爲該半導體晶片 之該端子的間隔的整數倍。 2·如申請專利範圍第丨項之半導體裝置,其中 在鄰接的上述半導體晶片之間的上述樹脂,分別設置2 個切斷部份。 . 3·如申請專利範圍第1或2項之半導體裝置,其中 上述端子包含有與上述半導體晶片電連接之接端面。 4·如申請專利範圍第3項之半導體裝置,其中 上述端子更包含有形成在上述接端面上之焊接球。 5.—種半導體裝置之製造方法,其特徵是所包含的步驟 有: 在基板表面裝載多個之半導體晶片;. 以密封樹脂一起密封上述多個半導體晶片; 在將多個端子形成在上述基板的背面之步驟,形成端子 使鄰接的半導體晶片之對應的端子之間隔,成爲半導體晶 片之端子的間隔之整數倍; 進行上述多個半導體晶片的電試驗;和 切斷上述樹脂和上述基板,用來使上述半導體晶片成爲 各個片。 18
326V總檔\92\92104639\93104639(替換)-1 p ? ^ 588443 9. 1 4 替换頁 2/6 圖4
圖5
圖6
588443 7圖 6 J正替換頁 93· 9· 1 4 替换貝 3/6 6 〇〇〇〇οο:α:σ ;Q::Q;:Q;.:o.: 0QiQ:Q: :σ·:ο::ο:Ό 0!0·::0:.0::Q:ioi:o::Q.: 0:0:0:0: 0:0:0::0: 〇00〇; 3
圖 :0::0:0:0 0:0:0::0: 0;0:0::0::
8 588443 J正替換頁93. 9· 14 矜年Γ月WgJ .替換頁· 5/6 圖72
圖13 5 j c 3
588443 實正替換頁93· 9· 1 4 日替换頁 6/6 6
圖16
B
TW092104639A 2002-07-10 2003-03-05 Semiconductor device, and method of manufacturing the same TW588443B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002200930A JP4002143B2 (ja) 2002-07-10 2002-07-10 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
TW200401415A TW200401415A (en) 2004-01-16
TW588443B true TW588443B (en) 2004-05-21

Family

ID=29997135

Family Applications (1)

Application Number Title Priority Date Filing Date
TW092104639A TW588443B (en) 2002-07-10 2003-03-05 Semiconductor device, and method of manufacturing the same

Country Status (6)

Country Link
US (2) US7166490B2 (zh)
JP (1) JP4002143B2 (zh)
KR (1) KR100536114B1 (zh)
CN (1) CN100378966C (zh)
DE (1) DE10310536B4 (zh)
TW (1) TW588443B (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4002143B2 (ja) * 2002-07-10 2007-10-31 株式会社ルネサステクノロジ 半導体装置の製造方法
TWI231578B (en) * 2003-12-01 2005-04-21 Advanced Semiconductor Eng Anti-warpage package and method for making the same
DE102004020187B4 (de) * 2004-04-22 2006-07-13 Infineon Technologies Ag Umverdrahtungssubstratstreifen mit mehreren Halbleiterbauteilpositionen
KR101010250B1 (ko) * 2009-10-14 2011-01-21 대건종합건축사사무소 주식회사 정원을 갖는 공동주택
KR20200130593A (ko) * 2019-05-10 2020-11-19 에스케이하이닉스 주식회사 플립 칩 패키지 제조방법 및 플립 칩 테스트 장치

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6197941A (ja) 1984-10-19 1986-05-16 Toshiba Corp 半導体ウエハにおけるテスト回路部
JPH0763788A (ja) * 1993-08-21 1995-03-10 Hewlett Packard Co <Hp> プローブおよび電気部品/回路検査装置ならびに電気部品/回路検査方法
US5956601A (en) * 1996-04-25 1999-09-21 Kabushiki Kaisha Toshiba Method of mounting a plurality of semiconductor devices in corresponding supporters
US6284566B1 (en) * 1996-05-17 2001-09-04 National Semiconductor Corporation Chip scale package and method for manufacture thereof
JPH10135258A (ja) 1996-10-30 1998-05-22 Hitachi Ltd 多連配線基板およびそれを用いた半導体装置の製造方法
US6150193A (en) * 1996-10-31 2000-11-21 Amkor Technology, Inc. RF shielded device
JPH10256417A (ja) * 1997-03-07 1998-09-25 Citizen Watch Co Ltd 半導体パッケージの製造方法
JPH10284760A (ja) * 1997-04-11 1998-10-23 Oki Electric Ind Co Ltd 受発光ダイオードアレイチップの製造方法
JPH1197494A (ja) * 1997-09-18 1999-04-09 Hitachi Ltd 半導体装置およびその製造方法
US6246250B1 (en) * 1998-05-11 2001-06-12 Micron Technology, Inc. Probe card having on-board multiplex circuitry for expanding tester resources
JP2000040721A (ja) * 1998-07-22 2000-02-08 Mitsubishi Electric Corp チップスケールパッケージのテスト方法
US6117704A (en) * 1999-03-31 2000-09-12 Irvine Sensors Corporation Stackable layers containing encapsulated chips
US6251695B1 (en) * 1999-09-01 2001-06-26 S3 Graphics Co., Ltd. Multichip module packaging process for known good die burn-in
JP2001135658A (ja) * 1999-11-08 2001-05-18 Towa Corp 電子部品の組立方法及び組立装置
JP2001144197A (ja) * 1999-11-11 2001-05-25 Fujitsu Ltd 半導体装置、半導体装置の製造方法及び試験方法
JP2001203293A (ja) 2000-01-18 2001-07-27 Fujitsu Ltd 半導体装置の製造方法
JP3522177B2 (ja) 2000-02-21 2004-04-26 株式会社三井ハイテック 半導体装置の製造方法
JP2001267492A (ja) * 2000-03-14 2001-09-28 Ibiden Co Ltd 半導体モジュールの製造方法
JP2001298121A (ja) 2000-04-17 2001-10-26 Suzuki Co Ltd 電子部品用フイルム、その製造方法およびこれに用いる金型
JP4475761B2 (ja) * 2000-07-26 2010-06-09 日本テキサス・インスツルメンツ株式会社 半導体パッケージ用絶縁フィルム及びその製造方法
JP4002143B2 (ja) * 2002-07-10 2007-10-31 株式会社ルネサステクノロジ 半導体装置の製造方法

Also Published As

Publication number Publication date
DE10310536B4 (de) 2006-03-02
TW200401415A (en) 2004-01-16
JP4002143B2 (ja) 2007-10-31
DE10310536A1 (de) 2004-01-29
KR100536114B1 (ko) 2005-12-14
JP2004047600A (ja) 2004-02-12
US20040007783A1 (en) 2004-01-15
US7348191B2 (en) 2008-03-25
CN1467830A (zh) 2004-01-14
US20060240596A1 (en) 2006-10-26
CN100378966C (zh) 2008-04-02
KR20040005573A (ko) 2004-01-16
US7166490B2 (en) 2007-01-23

Similar Documents

Publication Publication Date Title
US7339279B2 (en) Chip-size package structure and method of the same
US8383962B2 (en) Exposed die pad package with power ring
TWI233172B (en) Non-leaded semiconductor package and method of fabricating the same
CN103311243B (zh) 用于hemt器件的等离子体保护二极管
US20170005030A1 (en) Flat No-Leads Package With Improved Contact Pins
JP2008211041A (ja) 半導体装置、リードフレームおよび半導体装置の製造方法
US20160148877A1 (en) Qfn package with improved contact pins
US20180254267A1 (en) Method of manufacturing a semiconductor device
US20080012114A1 (en) System for contacting electronic devices and production processes thereof
TW201031021A (en) LED wafer package and its manufacturing method
CN103926430B (zh) 一种硅通孔转接板测试方法
TW588443B (en) Semiconductor device, and method of manufacturing the same
US4736273A (en) Power semiconductor device for surface mounting
JP4157715B2 (ja) 半導体装置の製造方法
US6190947B1 (en) Silicon semiconductor rectifier chips and manufacturing method thereof
US8877555B2 (en) Flip-chip semiconductor chip packing method
CN115863425A (zh) 一种蓝宝石衬底的GaN HEMT器件及共源共栅结构
TW200405537A (en) Lead frame, and method for manufacturing semiconductor device and method for inspecting electrical properties of small device using the lead frame
CN111082306A (zh) 一种半导体激光阵列及其封装方法
JP5609473B2 (ja) 半導体装置とその製造方法
JP2005191258A (ja) 半導体装置の製造方法
US20230154883A1 (en) Semiconductor package with improved connection of the pins to the bond pads of the semiconductor die
CN108364873B (zh) 引线框的制造方法和引线框
TWI237357B (en) Singulation method used in leadless packaging process
US3281922A (en) Method for assembly of semiconductor devices

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees