TW588443B - Semiconductor device, and method of manufacturing the same - Google Patents
Semiconductor device, and method of manufacturing the same Download PDFInfo
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- TW588443B TW588443B TW092104639A TW92104639A TW588443B TW 588443 B TW588443 B TW 588443B TW 092104639 A TW092104639 A TW 092104639A TW 92104639 A TW92104639 A TW 92104639A TW 588443 B TW588443 B TW 588443B
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- 239000004065 semiconductor Substances 0.000 title abstract description 85
- 238000004519 manufacturing process Methods 0.000 title abstract description 15
- 239000000758 substrate Substances 0.000 abstract description 29
- 238000012360 testing method Methods 0.000 abstract description 28
- 229910000679 solder Inorganic materials 0.000 abstract description 23
- 239000011347 resin Substances 0.000 abstract description 20
- 229920005989 resin Polymers 0.000 abstract description 20
- 235000012431 wafers Nutrition 0.000 description 48
- 238000007789 sealing Methods 0.000 description 15
- 239000002184 metal Substances 0.000 description 3
- 125000006850 spacer group Chemical group 0.000 description 3
- 230000013011 mating Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
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- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
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Description
588443 言正替換頁 利範圍第3項之半導體裝置中, 使上述之端子更包含有形成在上述之接端面上之焊接 球。 本發明之申請專利範圍第5項之半導體裝置之製造方法 其特徵是所包含之步驟有: 在基板之表面裝載多個之半導體晶片; 以密封樹脂一起密封上述之多個半導體晶片; 在將多個端子形成在上述基板之背面之步驟,形成端子 使鄰接之半導體晶片之對應之端子之間隔,成爲半導體晶 片之端子之間隔的整數倍; 進行上述之多個半導體晶片之電試驗;和 切斷上述之樹脂和上述之基板,用來使上述之半導體晶 片成爲各個片。 本發明之申請專利範圍第6項之半導體裝置之製造方法 是在申請專利範圍第5項之製造方法中, 使上述之電試驗之進行使用以與上述半導體晶片中之端 子之間隔相同之間隔被配置成爲柵網狀之測試接觸銷進 本發明之申請專利範圍第7項之半導體裝置之製造方法 是在申請專利範圍第5或6項之製造方法中, 使上述之半導體晶片成爲各個片之步驟是對鄰接之半導 體晶片之間進行2次切斷。 本發明之申請專利範圍第.8項之半導體裝置之製造方法 是在申請專利範圍第5或7項之製造方法中’ 32'6\ 總檔\92\92104639\93104639(替換1 588443 y. X ^ Jiy日j 替换頁 是切斷部份,7是切剩部份, Κ 半導體晶片,5是金屬線, 8是封裝(半導體裝置),1 1是測試接觸銷 首先說明本實施形態1之半導體裝置。 如圖1和圖2所示,在基板1之表面形成多個樹脂密封 部2。然後,如圖4和圖5所示,在樹脂密封部2內設置 多個半導體晶片4,利用金屬線5形成與基板1電連接。
然後,如圖3和圖5所示,在基板1之背面,與樹脂密 封部2內之半導體晶片4對應的,形成多個焊接球3作爲 外部電極用之端子。在此處是使鄰接的半導體晶片4(或封 裝8)之對應的焊接球3之間隔A,成爲半導體晶片4(或封 裝8)的焊接球3之間隔B的η倍(η爲1以上之整數),以
此方式配置焊接球3。例如,在封裝大小爲8 m m X 8 m m之 情況時,間隔A爲9.6 m m (= Ο . 8 m m x 1 2),間隔B爲Ο . 8 m m。 另外,焊接球3經由接端面(9)形成與半導體晶片4電連接 (參照圖17)。另外,η之値通常被設定在2〜20之範圍。 換言之,間隔Α被設定成爲間隔Β之2〜20倍。 另外,如圖5所示,利用焊接球3的間隔B相同的間隔 (例如0.8mm),將測試接觸銷11配置成爲栅網狀。使用該 測試接觸銷1 1用來進行半導體裝置之電試驗(將於後面說 明)。 然後,如圖6〜圖8所示,在樹脂密封部2和基板1之 相鄰半導體晶片4之間,分別設置被切割器切斷之2個切 斷部份6。在該2個切斷部份6之間,亦即在半導體晶片 4(或封裝8)之間之部份,成爲切剩部份7。該切剩部份7 13 326\總檔\92\92104639\93104639(替換)-1 93. 9. 1 4 替换頁 經由 小。 588443 I正替換頁 是依照所希望之封裝大小變化其大小之部份。亦即, 變化該切剩部份7之大小,可以獲得所希望之封裝大 例如,在上述之封裝大小之情況時,切斷部份6之幅度爲 0.3 5mm,切剩部份7之幅度爲0.9mm。 下面將說明半導體裝置’之製造方法。 首先,如圖4和圖5所示,在基板1之表面裝載多個半 導體晶片4,使用金屬線5電連接基板1和半導體晶片4。
其次’以樹脂一起封多個半導體晶片4’用來形成樹 脂密封部2。
其次,在基板1之背面,形成與半·導體晶片電連接之多 個焊接球裝載用接端面(參照圖17)。然後,在接端面上形 成焊接球3。在此處具有作爲外部電極用之端子之功能之 接端面和焊接球3,形成使鄰接之半導體晶片4之對應端 子之間隔Α成爲半導體晶片4的端子之間隔Β的η倍(η爲 1以上之整數)。例如,當封裝大小爲8mm X 8 mm之情況時, 間隔A爲9.6mm(0.8mmxl2),間隔B成爲0.8mm,以此方 式形成接端面和焊接球3。 其次,以多個半導體晶片4被裝載在基板1上之狀態, 同時進行多個半導體晶片4之電試驗。此處之電試驗如圖 5所示,使用以與焊接球3之間隔B相同之間隔(例如0.8mm) 被配置成柵網狀之測試接觸銷1 1用來進行該電試驗。 然後,在完成電試驗之後,利用切割器切斷被設在樹脂 密封部2和基板1之切斷部份6。在此處爲著獲得所希望 之封裝大小,所以在鄰接之半導體晶片4(或封裝8)之間, 14 326\總檔\92\92104639\93104639(替換)-1 588443
93. 9. 1 4 替換頁 分別進行2次切斷,例如成爲残留0.9mm幅度之切剩部 利用此種方式使封裝8成爲各個片。 如以上所說明之方式,在本實施形態1中,使端子位置 共同化,用來使鄰接之半導體晶片4之對應端子(接端面+ 9,焊接球3)之間隔A,成爲半導體晶片4的端子之間隔B 的η倍U爲1以上之整數).。因此,假如準備1種以與半導 體晶片4的端子之間隔Β相同的間隔配置成柵網狀的測試 接觸銷1 1時,則即使在.樹脂密封部2內之封裝大小有變化 之情況時,亦可以以相同之測試接觸銷1 1進行電試驗。因 此,測試夾具之成本可以大幅的削減。 另外,因爲不需要更換測試夾具之時間,亦即沒有封裝 替換損失,所以可以有效的進行電試驗。 另外,因爲可以以基板狀態同時測試多個封裝8(或半導 體晶片4),所以可以大幅的提高電試驗之生產效率。另外, 即使在使封裝小型化之情況時,亦可以防止在電試驗時或 搬運時之封裝之脫落。 另外,在本實施形態1中,當使封裝8成爲各個片時, 使切剩部7殘留,以2次切斷樹脂密封部2和基板1。因 此,如上述之方式,即使在謀求使端子位置共同化時,亦 可以獲得所希望之封裝大小之半導體裝置.。 另外,在本實施形態1中,所說明者是使用BGA基板作 爲半導體裝置用基板之情況,亦即BGA型之封裝,但是並 不只限於此種方式,亦可以使用LGA型之封裝。在此種情 況亦可以不形成作爲端子之焊接球3。 15
326\總檔\92\92104639\93104639(替換)-1
588443 肆、中文發明摘要 |正替換頁ii±f
Mm 93. 9. 1 誓换 本發明之目的是使半導體裝置之端子位置共用,和減低 半導體裝置之電試驗所使用之夾具之成本。 本發明之解決手段是在半導體裝置用基板1之表面裝載+ 多個之半導體晶片4。以樹脂一起密封多個半導體晶片4, 用來形成樹脂密封部2。在基板1之背面形成多個焊接球 3,使鄰接之半導體晶片4之對應之焊接球3之間隔A,成 爲半導體晶片4之焊接球3之間隔B之η倍(η爲1以上之 整數)。在進行多個半導體晶片4之電試驗之後,切斷樹脂 密封部2和基板1,用來使半導體晶片4成爲各個片。 伍、英文發明摘要
The present invention is to provide a semiconductor , ' · - device and method of manufacturing the same in order to curtail costs for a test tool used for electrical test of semiconductor devices by establishing commonality in positions of. terminals of semiconductor device. A plurality of semiconductor chips is mounted on a surface of a substrate to be used for manufacturing semiconductor devices. The semiconductor chips are collectively sealed with resin, thereby forming resin-sealed sections. A plurality of solder balls are formed on the back surface of the substrate such that an interval A between the corresponding solder balls of adjacent semiconductor chips becomes “n” times (“n” is an integer greater than 1 )an 3 326\總檔\92\92104639\93104639(替換)-1 fff fη /γ 588443拾·、申:露專利範· 替換頁lM(m 的· 9· 1 4 替换頁 1. 一種半導體裝置,其特徵是具備有: 多個半導體晶片,被裝載在基板之表面; 密封樹脂,用來一起密封該多個半導體晶片;和 端子,成爲形成在該基板之背面之多個端子,使鄰接的 該半導體晶片之對應的該端子的間隔,成爲該半導體晶片 之該端子的間隔的整數倍。 2·如申請專利範圍第丨項之半導體裝置,其中 在鄰接的上述半導體晶片之間的上述樹脂,分別設置2 個切斷部份。 . 3·如申請專利範圍第1或2項之半導體裝置,其中 上述端子包含有與上述半導體晶片電連接之接端面。 4·如申請專利範圍第3項之半導體裝置,其中 上述端子更包含有形成在上述接端面上之焊接球。 5.—種半導體裝置之製造方法,其特徵是所包含的步驟 有: 在基板表面裝載多個之半導體晶片;. 以密封樹脂一起密封上述多個半導體晶片; 在將多個端子形成在上述基板的背面之步驟,形成端子 使鄰接的半導體晶片之對應的端子之間隔,成爲半導體晶 片之端子的間隔之整數倍; 進行上述多個半導體晶片的電試驗;和 切斷上述樹脂和上述基板,用來使上述半導體晶片成爲 各個片。 18
326V總檔\92\92104639\93104639(替換)-1 p ? ^ 588443 9. 1 4 替换頁 2/6 圖4
圖5
圖6
588443 7圖 6 J正替換頁 93· 9· 1 4 替换貝 3/6 6 〇〇〇〇οο:α:σ ;Q::Q;:Q;.:o.: 0QiQ:Q: :σ·:ο::ο:Ό 0!0·::0:.0::Q:ioi:o::Q.: 0:0:0:0: 0:0:0::0: 〇00〇; 3
圖 :0::0:0:0 0:0:0::0: 0;0:0::0::
8 588443 J正替換頁93. 9· 14 矜年Γ月WgJ .替換頁· 5/6 圖72
圖13 5 j c 3
588443 實正替換頁93· 9· 1 4 日替换頁 6/6 6
圖16
B
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TWI231578B (en) * | 2003-12-01 | 2005-04-21 | Advanced Semiconductor Eng | Anti-warpage package and method for making the same |
DE102004020187B4 (de) * | 2004-04-22 | 2006-07-13 | Infineon Technologies Ag | Umverdrahtungssubstratstreifen mit mehreren Halbleiterbauteilpositionen |
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JPS6197941A (ja) | 1984-10-19 | 1986-05-16 | Toshiba Corp | 半導体ウエハにおけるテスト回路部 |
JPH0763788A (ja) * | 1993-08-21 | 1995-03-10 | Hewlett Packard Co <Hp> | プローブおよび電気部品/回路検査装置ならびに電気部品/回路検査方法 |
US5956601A (en) * | 1996-04-25 | 1999-09-21 | Kabushiki Kaisha Toshiba | Method of mounting a plurality of semiconductor devices in corresponding supporters |
US6284566B1 (en) * | 1996-05-17 | 2001-09-04 | National Semiconductor Corporation | Chip scale package and method for manufacture thereof |
JPH10135258A (ja) | 1996-10-30 | 1998-05-22 | Hitachi Ltd | 多連配線基板およびそれを用いた半導体装置の製造方法 |
US6150193A (en) * | 1996-10-31 | 2000-11-21 | Amkor Technology, Inc. | RF shielded device |
JPH10256417A (ja) * | 1997-03-07 | 1998-09-25 | Citizen Watch Co Ltd | 半導体パッケージの製造方法 |
JPH10284760A (ja) * | 1997-04-11 | 1998-10-23 | Oki Electric Ind Co Ltd | 受発光ダイオードアレイチップの製造方法 |
JPH1197494A (ja) * | 1997-09-18 | 1999-04-09 | Hitachi Ltd | 半導体装置およびその製造方法 |
US6246250B1 (en) * | 1998-05-11 | 2001-06-12 | Micron Technology, Inc. | Probe card having on-board multiplex circuitry for expanding tester resources |
JP2000040721A (ja) * | 1998-07-22 | 2000-02-08 | Mitsubishi Electric Corp | チップスケールパッケージのテスト方法 |
US6117704A (en) * | 1999-03-31 | 2000-09-12 | Irvine Sensors Corporation | Stackable layers containing encapsulated chips |
US6251695B1 (en) * | 1999-09-01 | 2001-06-26 | S3 Graphics Co., Ltd. | Multichip module packaging process for known good die burn-in |
JP2001135658A (ja) * | 1999-11-08 | 2001-05-18 | Towa Corp | 電子部品の組立方法及び組立装置 |
JP2001144197A (ja) * | 1999-11-11 | 2001-05-25 | Fujitsu Ltd | 半導体装置、半導体装置の製造方法及び試験方法 |
JP2001203293A (ja) | 2000-01-18 | 2001-07-27 | Fujitsu Ltd | 半導体装置の製造方法 |
JP3522177B2 (ja) | 2000-02-21 | 2004-04-26 | 株式会社三井ハイテック | 半導体装置の製造方法 |
JP2001267492A (ja) * | 2000-03-14 | 2001-09-28 | Ibiden Co Ltd | 半導体モジュールの製造方法 |
JP2001298121A (ja) | 2000-04-17 | 2001-10-26 | Suzuki Co Ltd | 電子部品用フイルム、その製造方法およびこれに用いる金型 |
JP4475761B2 (ja) * | 2000-07-26 | 2010-06-09 | 日本テキサス・インスツルメンツ株式会社 | 半導体パッケージ用絶縁フィルム及びその製造方法 |
JP4002143B2 (ja) * | 2002-07-10 | 2007-10-31 | 株式会社ルネサステクノロジ | 半導体装置の製造方法 |
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KR100536114B1 (ko) | 2005-12-14 |
JP2004047600A (ja) | 2004-02-12 |
US20040007783A1 (en) | 2004-01-15 |
US7348191B2 (en) | 2008-03-25 |
CN1467830A (zh) | 2004-01-14 |
US20060240596A1 (en) | 2006-10-26 |
CN100378966C (zh) | 2008-04-02 |
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US7166490B2 (en) | 2007-01-23 |
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