TW578305B - Delta doped silicon carbide metal-semiconductor field effect transistors and methods of fabricating delta doped silicon carbide metal-semiconductor field effect transistors having a gate disposed in a double recess structure - Google Patents
Delta doped silicon carbide metal-semiconductor field effect transistors and methods of fabricating delta doped silicon carbide metal-semiconductor field effect transistors having a gate disposed in a double recess structure Download PDFInfo
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- TW578305B TW578305B TW091124508A TW91124508A TW578305B TW 578305 B TW578305 B TW 578305B TW 091124508 A TW091124508 A TW 091124508A TW 91124508 A TW91124508 A TW 91124508A TW 578305 B TW578305 B TW 578305B
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- Prior art keywords
- layer
- doped
- gate
- silicon carbide
- forming
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- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 title claims abstract description 68
- 229910010271 silicon carbide Inorganic materials 0.000 title claims abstract description 67
- 230000005669 field effect Effects 0.000 title claims abstract description 58
- 239000004065 semiconductor Substances 0.000 title claims abstract description 58
- 238000000034 method Methods 0.000 title claims description 47
- 239000000758 substrate Substances 0.000 claims description 52
- 229910052751 metal Inorganic materials 0.000 claims description 41
- 239000002184 metal Substances 0.000 claims description 41
- 239000000463 material Substances 0.000 claims description 16
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 14
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 13
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 13
- 229910052710 silicon Inorganic materials 0.000 claims description 13
- 239000010703 silicon Substances 0.000 claims description 13
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 12
- 229910052799 carbon Inorganic materials 0.000 claims description 12
- 229910052737 gold Inorganic materials 0.000 claims description 12
- 239000010931 gold Substances 0.000 claims description 12
- 238000005530 etching Methods 0.000 claims description 11
- 230000008569 process Effects 0.000 claims description 11
- 239000004575 stone Substances 0.000 claims description 11
- 239000013078 crystal Substances 0.000 claims description 9
- 239000002019 doping agent Substances 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 229910052759 nickel Inorganic materials 0.000 claims description 7
- 238000000151 deposition Methods 0.000 claims description 6
- 229910052697 platinum Inorganic materials 0.000 claims description 6
- 238000000137 annealing Methods 0.000 claims description 5
- 238000002513 implantation Methods 0.000 claims description 4
- 230000003647 oxidation Effects 0.000 claims description 3
- 238000007254 oxidation reaction Methods 0.000 claims description 3
- 239000000969 carrier Substances 0.000 claims description 2
- 239000010410 layer Substances 0.000 claims 117
- 244000025254 Cannabis sativa Species 0.000 claims 1
- 230000003213 activating effect Effects 0.000 claims 1
- 239000003795 chemical substances by application Substances 0.000 claims 1
- 239000011247 coating layer Substances 0.000 claims 1
- 238000013467 fragmentation Methods 0.000 claims 1
- 238000006062 fragmentation reaction Methods 0.000 claims 1
- 230000005684 electric field Effects 0.000 description 11
- 230000015556 catabolic process Effects 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 230000008901 benefit Effects 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 239000012535 impurity Substances 0.000 description 5
- 239000011651 chromium Substances 0.000 description 4
- 229910001385 heavy metal Inorganic materials 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 229920006395 saturated elastomer Polymers 0.000 description 4
- 230000001052 transient effect Effects 0.000 description 4
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 238000001465 metallisation Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 2
- 229910052769 Ytterbium Inorganic materials 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 2
- 150000001247 metal acetylides Chemical class 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 206010021703 Indifference Diseases 0.000 description 1
- 229910052778 Plutonium Inorganic materials 0.000 description 1
- 241001122767 Theaceae Species 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- YTAHJIFKAKIKAV-XNMGPUDCSA-N [(1R)-3-morpholin-4-yl-1-phenylpropyl] N-[(3S)-2-oxo-5-phenyl-1,3-dihydro-1,4-benzodiazepin-3-yl]carbamate Chemical compound O=C1[C@H](N=C(C2=C(N1)C=CC=C2)C1=CC=CC=C1)NC(O[C@H](CCN1CCOCC1)C1=CC=CC=C1)=O YTAHJIFKAKIKAV-XNMGPUDCSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 238000003763 carbonization Methods 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000035558 fertility Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 229910000939 field's metal Inorganic materials 0.000 description 1
- 230000010006 flight Effects 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 238000009616 inductively coupled plasma Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000005121 nitriding Methods 0.000 description 1
- 235000021018 plums Nutrition 0.000 description 1
- OYEHPCDNVJXUIW-UHFFFAOYSA-N plutonium atom Chemical compound [Pu] OYEHPCDNVJXUIW-UHFFFAOYSA-N 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- 239000011435 rock Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/80—FETs having rectifying junction gate electrodes
- H10D30/87—FETs having Schottky gate electrodes, e.g. metal-semiconductor FETs [MESFET]
- H10D30/877—FETs having Schottky gate electrodes, e.g. metal-semiconductor FETs [MESFET] having recessed gate electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/60—Impurity distributions or concentrations
- H10D62/605—Planar doped, e.g. atomic-plane doped or delta-doped
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/871—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group I-VI materials, e.g. Cu2O; being Group I-VII materials, e.g. CuI
Landscapes
- Junction Field-Effect Transistors (AREA)
- Bipolar Transistors (AREA)
- Electrodes Of Semiconductors (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/136,456 US6906350B2 (en) | 2001-10-24 | 2001-10-24 | Delta doped silicon carbide metal-semiconductor field effect transistors having a gate disposed in a double recess structure |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW578305B true TW578305B (en) | 2004-03-01 |
Family
ID=22472931
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW091124508A TW578305B (en) | 2001-10-24 | 2002-10-23 | Delta doped silicon carbide metal-semiconductor field effect transistors and methods of fabricating delta doped silicon carbide metal-semiconductor field effect transistors having a gate disposed in a double recess structure |
Country Status (11)
| Country | Link |
|---|---|
| US (2) | US6906350B2 (https=) |
| EP (1) | EP1459390B1 (https=) |
| JP (1) | JP4921694B2 (https=) |
| KR (1) | KR20040045904A (https=) |
| CN (1) | CN100459171C (https=) |
| AT (1) | ATE431967T1 (https=) |
| AU (1) | AU2002334921A1 (https=) |
| CA (1) | CA2464110A1 (https=) |
| DE (1) | DE60232420D1 (https=) |
| TW (1) | TW578305B (https=) |
| WO (1) | WO2003036729A1 (https=) |
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-
2001
- 2001-10-24 US US10/136,456 patent/US6906350B2/en not_active Expired - Lifetime
-
2002
- 2002-10-08 AU AU2002334921A patent/AU2002334921A1/en not_active Abandoned
- 2002-10-08 AT AT02802124T patent/ATE431967T1/de not_active IP Right Cessation
- 2002-10-08 CA CA002464110A patent/CA2464110A1/en not_active Abandoned
- 2002-10-08 KR KR10-2004-7005955A patent/KR20040045904A/ko not_active Withdrawn
- 2002-10-08 EP EP02802124A patent/EP1459390B1/en not_active Expired - Lifetime
- 2002-10-08 DE DE60232420T patent/DE60232420D1/de not_active Expired - Lifetime
- 2002-10-08 JP JP2003539110A patent/JP4921694B2/ja not_active Expired - Lifetime
- 2002-10-08 WO PCT/US2002/032204 patent/WO2003036729A1/en not_active Ceased
- 2002-10-08 CN CNB028211898A patent/CN100459171C/zh not_active Expired - Lifetime
- 2002-10-23 TW TW091124508A patent/TW578305B/zh not_active IP Right Cessation
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2004
- 2004-07-30 US US10/909,112 patent/US6902964B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| DE60232420D1 (de) | 2009-07-02 |
| JP2005507174A (ja) | 2005-03-10 |
| AU2002334921A1 (en) | 2003-05-06 |
| CN1706048A (zh) | 2005-12-07 |
| CA2464110A1 (en) | 2003-05-01 |
| WO2003036729A8 (en) | 2004-06-24 |
| KR20040045904A (ko) | 2004-06-02 |
| JP4921694B2 (ja) | 2012-04-25 |
| WO2003036729A1 (en) | 2003-05-01 |
| CN100459171C (zh) | 2009-02-04 |
| US20050023535A1 (en) | 2005-02-03 |
| US20030075719A1 (en) | 2003-04-24 |
| EP1459390B1 (en) | 2009-05-20 |
| ATE431967T1 (de) | 2009-06-15 |
| US6906350B2 (en) | 2005-06-14 |
| US6902964B2 (en) | 2005-06-07 |
| EP1459390A1 (en) | 2004-09-22 |
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