TW577070B - Optical recording medium - Google Patents

Optical recording medium Download PDF

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Publication number
TW577070B
TW577070B TW091112390A TW91112390A TW577070B TW 577070 B TW577070 B TW 577070B TW 091112390 A TW091112390 A TW 091112390A TW 91112390 A TW91112390 A TW 91112390A TW 577070 B TW577070 B TW 577070B
Authority
TW
Taiwan
Prior art keywords
layer
recording medium
optical recording
adhesive
recording
Prior art date
Application number
TW091112390A
Other languages
English (en)
Inventor
Shinji Saito
Takeshi Kakuta
Toshio Ishida
Original Assignee
Fuji Photo Film Co Ltd
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Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Application granted granted Critical
Publication of TW577070B publication Critical patent/TW577070B/zh

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    • G11B7/24Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
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    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/252Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers
    • G11B7/258Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers
    • G11B7/259Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of layers other than recording layers of reflective layers based on silver
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/21Circular sheet or circular blank

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)

Description

577070 五、發明說明(1 ) [發明所屬之技術領域] 本發明爲有關一種記錄媒體,其係具有由有機化合物 所形成的記錄層,而可使用特定波長的雷射光以進行記 錄及再生之補寫型光記錄媒體者。 [從來的技術] 以往,可由雷射光只能記錄一次資訊的補寫型光記錄 媒體是被稱爲可錄式光碟(以下稱CD-R),是爲眾所周知 者。其係有可使用市場鎖售的光碟唱機來再生之優點, 又,在最近隨著個人電腦的普及,其需要量也在增加。 又,在於其可記錄容量是比C D - R爲大的媒體中,對應 於數位高淸晰度電視的錄影等所用的補寫型多樣化數位 光碟(以下稱DVD-R)也已被實用化。 這些補寫型光記錄媒體的構造之中,已知者之一是在 圓盤狀基板上依序層疊由金(Αι〇等所形成的光反射層、 由有機化合物所形成的記錄層、和包含要粘合於該記錄 層所用的粘合層在內的樹脂層(以下有時候會稱之爲覆蓋 層)者。將雷射光從上述樹脂層側照射,就可對其進行記 錄及再生。對補寫型光記錄媒體的資訊之記錄是在記錄 層被照到雷射光的部份會吸收該光而局部性的發熱變形( 例如造成凹點等)以實施記錄者。一方面,資訊的再生是 通常將和記錄用雷射光相同波長的雷射光照射於補寫型 光記錄媒體,而檢測記錄層中有發熱變形部位(記錄部分) 和未變形部位(無記錄部分)之間的反射率之差異以實施 再生者。 577070 五、 發明說明 ( 2) 最 近 網 際 網 路 等 網 路 或 高 淸 晰 度電視頻道已急速的 普 及 〇 又 局 畫 質 電 視(HDTV:^ 丨開始放影也迫在眉睫。 在 這 種 狀 況 下 需 要 -- 種 可 將 圖 像 資訊以廉價且簡便的 記 錄 之 大 容 量 光 記 錄 媒 體 〇 上 述 的 DVD-R在現況下是 可 充 分 的 相 當 大 容 量 記 錄 媒 體 應 有 之功能,但,大容量 化 筒 密 度 化 的 要 求 是 越 來 越 局 因而,有必要開發可 對 應 於 這 些 要 求 之 記 錄 媒 體 〇 因 此 ,光記錄媒體的開發 是 在 朝 向 可 用 更 短 波 長 的 光 以 高 密 度的記錄之更大容量 的 記 錄 媒 體 之 方 向 進 行 著 〇 尤 其 是 只能記錄一次資訊的 補 寫 型 光 記 錄 媒 體 在作 爲 大 容 量 資 訊的長期保存或後備 用 上 其 使 用 頻 會 -- 直 升 局 , 因 而 對其開發有迫切的需 求 〇 通 常 > 光 記 錄 媒 體 的 局 密 度 化 是 可由記錄及再生用雷 射 的 短 波 長 化 和 物 鏡 的 局 數 値 孔 徑(以下稱NA)化以縮 小 射 束 光 點 來 達 成 0 最 近 } 從 波 長 6 8 0 n m、6 5 0 n m 及 6 3 5 η m 的 紅 色 半 導 體 雷 射 到 可 記 錄 更超高密度的波長 4 0 0 n m - -5 00] 1111 的 藍 紫 色 半 導 體 雷 射 (以下稱藍紫色雷射) 的 開 發 已 有 急 速 的 進 展 > 同 時 也 著 手於其所對應的光記 錄 媒 體 之 開 發 〇 尤 其 是 藍 紫 色 雷 射 的發售以來,已在進 行 對 於 利 用 藍 紫 色 雷 射 和 局 N A ; 光· 學頭的光記錄系統的 開 發 之 檢 討 y 而 具 會 相 變 的 記 錄 層 之重寫型光記錄媒體 及 光 記 錄 系 統 已 用 DVR(多樣化數位言己錄)系統(「ISOM( 國 際 標 準 化 組 織 手 冊)2000」 210 〜2 1 1頁)的名稱所發表 〇 由 此 對 於 重 寫 型 光 記 錄 媒 4- 體 中 的高密度化之課題, 577070 五、發明說明(3) 已獲得一定的成果。 在於如上述的利用藍紫色雷射和高N A光學頭的光記 錄系統所使用之光記錄媒體中,要將藍紫色雷射照射於 其記錄層之際,爲了要對準高N A的物鏡之焦點,最好 是使雷射光所要入射的覆蓋層薄型化。在此覆蓋層是例 如使用較薄的薄膜,而用粘合劑粘合於記錄層上。覆蓋 層的厚度是包含粘合劑硬化後的粘合層在內,通常爲約 1 0 0 μηι,但,還是要依照所照射的雷射光波長和N A,以 使其最合適化。 [發明欲解決之問題] 然而,在於可由利用藍紫色雷射和高NA光學頭的光 記錄系統做記錄及再生的補寫型光記錄媒體中,其記錄 層如使用有機化合物時,會有不能獲得充分的記錄特性 之問題。其原因雖尙不明確,但可推測是記錄層中的有 機化合物之溶解於粘合層內的粘合劑,以致在上述記錄 層中產生微小的斑點所引起者。 本發明乃有鑑於上述從來技術的問題點,目的是在於 提供一種可高密度記錄且具優異記錄特性之補寫型光記 錄媒體者。 [發明之解決手段] 本發明的目的之更詳細內容是可由以下的手段所達成 〇 <1>一種光記錄媒體,其係在基板上依序設置光反射 層、記錄層、及覆蓋層,而從該覆蓋層側照射波長 577070 五、發明說明(4) 4 5 Onm以下的雷射光以進行記錄及再生之光記錄媒體, 其特徵爲: 該光記錄媒體係在上述記錄層與上述覆蓋層之間,更 設置厚度lnm以上、80nm以下的噴鍍層,而該噴鍍層 與上述覆蓋層之間是用粘合劑所粘合者。 <2>在<1>項的光記錄媒體中,上述噴鍍層是包含Si、 Zn、Ag、Al、Ti、Sn或Ge的單體,或這些化合物之組 合者。 <3>在<1>或<2>項的光記錄媒體中,上述噴鍍層係可 使記錄及再生所使用的上述雷射光透射70%以上者。 <4>一種記錄媒體,其係在基板上依序設置光反射層 、記錄層、及覆蓋層,而從該覆蓋層側照射波長45 Onm 以下的雷射光以進行記錄及再生之光記錄媒體,其特徵 爲. 該光記錄媒體係在上述記錄層與上述覆蓋層之間,更 設置厚度1 nm以上、80nm以下的噴鍍層,該噴鍍層與 上述覆蓋層之間是用粘合劑所粘合,而,上述記錄層係 含有在400nm以下持有最大吸收波長之有機化合物者。 <5>在<4>項的光記錄媒體中,上述噴鍍層是包含si、 Zn、Ag、Ai、Ti、Sll或Ge的單體,或這些的化合物之 組合者。 <6>在<4>或<5>項的光記錄媒體中,上述噴鍍層係可 使記錄及再生所使用的上述雷射光透射7〇 %以上者。 —種光記錄媒體,其係在基板上依序設置光反射 577070 五、發明說明(5 ) 層、記錄層、及覆蓋層,而從該覆蓋層側照射波長 4 5 Onm以下的雷射光以進行記錄及再生之光記錄媒體, 其特徵爲: 該光記錄媒體係在上述記錄層與上述覆蓋層之間,更 設置厚度lnm以上、80nm以下的噴鍍層,而該噴鍍層 與上述覆蓋層之間是用粘合劑所粘合,而由該粘合劑所 形成的粘合層之層厚度是在1〜1()()()μιη範圍者。 < 8 >在<7>項的光記錄媒體中,上述噴鍍層是包含si、 Zn、Ag、Al、Ti、Sn或Ge的單體,或這些化合物之組 合者。 <9>在<7>或<8>項的光記錄媒體中,上述噴鍍層係可 使記錄及再生所使用的上述雷射光透射70%以上者。 <10>—種光記錄媒體,其係在基板上依序設置光反射 層、記錄層、及覆蓋層,而從該覆蓋層側照射波長 4 5 Onm以下的雷射光以進行記錄及再生之光記錄媒體, 其特徵爲: 該光記錄媒體係在上述記錄層與上述覆蓋層之間,更 設置厚度lnm以上、80nm以下的噴鍍層,該噴鍍層與 上述覆蓋層之間是用粘合劑所粘合,而上述記錄層係含 有在40 Onm以下持有最大吸收波長之有機化合物,且, 由上述粘合劑所形成的粘合層之層厚度是在1〜ΙΟΟΟμηι 範圍者。 <1 1>在<10>項的光記錄媒體中,上述噴鍍層是包含Si 、Zn、Ag、Al、Ti、Sn或Ge的單體或這些的化合物之
577070 五、發明說明(6) 組合者。 <12>在<10>或<11>項的光記錄媒體中,上述噴鍍層係 可使記錄及再生所使用的雷射光透射70%以上者。 <13>—種光記錄媒體,其係在基板上依序設置光反射 層、記錄層、及覆蓋層,而從該覆蓋層側照射波長 4 5 Onm以下的雷射光以進行記錄及再生之光記錄媒體, 其特徵爲: 該光記錄媒體係在上述記錄層與上述覆蓋層之間,更 設置厚度lnm以上、80nm以下之噴鍍層,該噴鍍層與 上述覆蓋層之間是用粘合劑所粘合,而,上述記錄層係 含有在4 0 0 n m以下持有最大吸收波長之有機化合物,且 ,由上述粘合劑所形成的粘合層是由放射線硬化樹脂所 構成者。 <14>在<13>項的光記錄媒體中,上述噴鍍層是包含Si 、Zn、Ag、Al、Ti、Sn或Ge的單體,或這些化合物之 組合者。 <15>在<13>或<14>項的光記錄媒體中,上述噴鍍層係 可使記錄及再生所使用的上述雷射光透射70%以上者。 <16>—種光記錄媒體,其係在基板上依序設置光反射 層、記錄層、及覆蓋層,而從該覆蓋層側照射波長 4 5 Onm以下的雷射光以進行記錄及再生之光記錄媒體, 其特徵爲: 該光記錄媒體係在上述記錄層與上述覆蓋層之間,更 設置厚度lnm以上、80nm以下的噴鍍層,該噴鍍層與 577070 五、發明說明(7) 上述覆蓋層之間是用粘合劑所粘合,而由上述粘合劑所 形成的粘合層之層厚度是在1〜ΙΟΟΟμπι範圍,且,由該 粘合劑所形成的粘合層是由放射線硬化樹脂所構成者。 <17>在<16>項的光記錄媒體中,上述噴鍍層是包含Si 、Zn、Ag、Al、Ti、Sn或Ge的單體,或這些化合物之 組合者。 <18>在<16>或<17>項的光記錄媒體中,上述噴鍍層係 可使記錄及再生所使用的雷射光透射70%以上者。 <19>一種光記錄媒體,其係在基板上依序設置光反射 層、記錄層、及覆蓋層,而從該覆蓋層側照射波長 4 5 Onm以下的雷射光以進行記錄及再生之光記錄媒體, 其特徵爲: 該光記錄媒體係在上述記錄層與上述覆蓋層之間,更 設置厚度lnm以上、80nm以下的噴鍍層,該噴鍍層與 上述覆蓋層之間是用粘合劑所粘合,上述記錄層是含有 在4 OOnm以下持有最大吸收波長之有機化合物,而由上 述粘合劑所形成的粘合層之層厚度是在1〜1 0 0 0 μ m範圍 ’且’上述由粘合劑所形成的粘合層是由放射線硬化樹 脂所構成者。 <20>在<19>項的光記錄媒體中,上述噴鍍層是包含Si 、Zn、Ag、A1、Ti、Sn或Ge的單體,或這些化合物之 組合者。 <21>在<19>或<20>項的光記錄媒體中,上述噴鍍層係 可使記錄及再生所使用的雷射光透射70%以上者。 577070 五、發明說明(8) [發明之實施形態] 以下,參照圖面詳細的說明本發明光記錄媒體的實施 形態。 第1圖是本發明光記錄媒體1 〇〇的一例示形態之槪略 斷面圖。如第1圖所示,光記錄媒體1 〇〇是持有按照基 板10、光反射層20、記錄層30、噴鍍層40、及覆蓋層 5 〇的順序所層疊之構造者。又,本發明的光記錄媒體 1 00也可依其所需而更包含其他的層者。以下,對構成 本發明光記錄媒體1 〇〇的各個要素分別詳加說明。又, 本發明的光記錄媒體100是可由持有45 Onm以下波長的 雷射光以進行記錄及再生者。 <基板> 基板1 〇是由例如玻璃;聚碳酸酯;聚甲基丙烯酸甲 酯等的丙烯樹脂;聚氯乙烯、氯乙烯共聚物等的氯乙烯 系樹脂;環氧樹脂;非晶質聚烯烴及聚酯等的材料所構 成。上述材料中,也可依照所欲而倂用之。其中,從耐 濕性、尺寸安定性及價格等之點上,是以聚碳酸酯爲理 想。基板10的厚度在一般上是在0.4〜1.5mm範圍,而 在1.1〜1.3mm範圍較理想。 基板1 〇的表面是要有形成追蹤用槽或可表示位址信 號等的資訊之凹凸(預置槽)者爲理想。此預置槽是用聚 碳酸酯等的樹脂材料於射出成形或擠壓成形時,直接形 成在基板上者爲理想。 又’也可由設置預置槽層以形成預置槽者。預置槽層 -10- 577070 五、發明說明(9) 的材料是可使用丙烯酸的單酯、二酯、三酯、及四酯之 中的一種單體(或低聚物)和光聚合引發劑的混合物,預 置槽層的形成是例如首先在以精密製成的母模(壓印模) 上塗布上述丙烯酸酯和聚合引發劑的混合液,而將基板 1 〇放置在該塗布液層上後,經介由基板或母模照射紫外 線,使塗布層硬化,以使基板和塗布層粘合,接著,將 基板從母模剝離就可製成。預置槽層的層厚度在一般上 是在0.0 1〜ΙΟΟμΓΠ範圍,而以0.05〜5 0μηι範圍爲理想。 爲了要達成更局記錄密度,基板10是要用其預置槽 的軌距(槽紋間距)是比CD-R或DVD-R的爲窄之基板爲 理想。基板1 〇的預置槽之軌距是1 00〜600nm。 又,預置槽的深度是在20〜150nm範圍爲理想,又, 其半値寬度是在50〜25 0nm爲理想。由於本發明的光記 錄媒體是具有高靈敏度,因而,用低功率雷射也可記錄 ,由此,會有也可使用廉價的雷射,或可延長雷射的使 用壽命等的優點。 又,在於要設置後述的光反射層2 0 —側之基板表面 上’爲了要改善其平面性和提高其粘合力爲目的,而形 成打底塗層爲理想。 該打底塗層的材料是可例舉如聚甲基甲丙烯酸酯、丙 烯酸•甲丙烯酸共聚物、苯乙烯•馬來酸酐共聚物、聚 乙烯醇、N-羥甲基丙烯醯胺、苯乙烯•乙烯基甲苯共聚 物、氯磺醯化聚乙烯、硝基纖維素、聚氯乙烯、氯化聚 烯烴、聚酯、聚醯亞胺、乙酸乙烯酯•氯乙烯共聚物、 -11- 577070 五、發明說明(1〇) 乙烯•乙酸乙烯酯共聚物、聚乙烯、聚丙烯、聚碳酸酯 等的高分子物質;及,有機矽烷交聯劑等的表面改質劑。 打底塗層是將上述材料在適當的溶劑中溶解或分散, 調製成塗布液後,用自旋塗層法、浸漬塗敷法、擠壓塗 層法等的塗布法,塗布在基板表面就可形成之。打底塗 層的層厚度在一般上是在0.005〜20 μηι範圍,較理想的 是在0.01〜ΙΟμηι範圍。 <光反射層> 光反射層2 0的設置目的是爲了要提高資訊再生時的 反射率者。光反射層20的材料之光反射性物質是對雷 射光有70%以上反射率之物質,其係可例舉如Mg、Se 、Y、Ti、Zr、Hf、V、Nb、Ta、Cr、Mo、W、Μη、Re 、Fe、Co、Ni、Ru、Rh、Pd、Ii·、Pt、Cu、Ag、Au、 Zn、C d、A1、G a、I n、S i、G e、T e、P b、P o、Sn、Bi 等的金屬及半金屬或不銹鋼。這些物質是可單獨使用, 也可用兩種以上的組合,或爲合金者。光反射層20是 以含有Au、Ag中之任一種者爲理想,其含有量是越高 越好。光反射層20是例如將上述反射性物質用真空蒸 鍍、濺射法、或離子鍍敷法,就可將其形成在基板1 0 上。光反射層的層厚度在一般上是在1 0〜8 0 0 nm範圍, 較理想的是在20〜5 00nm範圍,更理想的是在50〜3 00nm 範圍。 <記錄層> 記錄層30是以可由45 0nm波長的雷射光記錄及再生 -12- 577070 五、發明說明(11 ) 的、持有在4 0 0 n m以下的最大吸收波長之有機化合物所 構成者爲理想。又也可由在超過40 Onm波長範圍,持有 第二的、另一吸收波段之有機化合物所構成者。 上述有機化合物在具體上是可使用特開平4-74690號 公報、特開平8- 1 27 1 74號公報、特開平1 1 -5 3 75 8號公 報、特開平Π-3 3 4204號公報、特開平1 1 -3 34205號公 報、特開平1 1 -3 3 4206號公報、特開平1 1 -3 34207號公 報、特開2000-43 423號公報、特開2000- 1 08 5 1 3號公報 、特開2 00 0 - 1 5 8 8 1 8號公報的各公報所記載者,或三唑 、三吖畊、花青、部花青、氨基丁二烯、酞菁、肉桂酸 、氧化還原色素、偶氧色素、側氧羥基苯并噁唑、苯并 三唑等爲理想,而是以花青、氨基丁二烯、苯并三唑、 酞菁爲更理想。 記錄層3 0是將上述花青色素等的有機化合物,並依 其所需再加上粘合劑溶解於溶劑,調製成塗布液,接著 ,將該塗布液塗布於光反射層20的表面以形成塗膜後 ,經過乾燥就可形成之。 又,記錄物質等的溶解處理之方法是可應用超音波處 理、均化器處理、分散處理、混砂機處理、攪拌器攪拌 處理等方法。又,在塗布液中’也可依其目的而添加氧 化防止劑、UV吸收劑、增塑劑、及潤滑劑等的各種添 .加劑。 記錄層3 0的塗布液之溶劑是可例舉如乙酸丁酯.、醋 酸酯溶纖劑等的酯;甲乙酮、環己酮、甲基異丁基酮等 -13- 577〇7〇 五、發明說明(12) 的酮;二氯甲烷、1,2-二氯乙烷、三氯甲烷等的氯化烴 ;甲基甲醯胺等的醯胺;環乙酮等的碳氫化合物;四氫 呋喃、乙醚、二噚烷等的醚;乙醇、正丙醇、異丙醇、 正丁醇、雙丙酮醇等的醇;2,2,3,3-四氟合丙醇等的氟系 溶劑;乙二醇一甲醚、乙二醇一乙醚、丙二醇—甲醚等 的乙二醇醚類等。上述溶劑是可考慮所使用的有機化合 物之溶解性,而以單獨的或二種以上適當的倂用。 粘合劑是例舉如明膠、纖維素衍生物、葡聚糖、松脂 、橡膠等的天然有機高分子物質;聚氨基甲酸酯、聚乙 烯、聚丙烯、聚苯乙烯、聚異丁烯等的碳氫化合物系樹 月旨;聚氯乙烯、聚氯亞乙烯、聚氯乙烯·聚醋酸乙烯酯 共聚物等的乙烯酯系樹脂;聚丙烯酸甲酯、聚甲丙烯酸 甲酯等的丙烯酸系樹脂;聚乙烯醇、氯化聚乙烯、環氧 樹脂、丁醛樹脂、橡膠衍生物、苯酚甲醛樹脂等的熱硬 化樹脂之預縮合物等的合成有機高分子物質。在記錄層 3 0的材料中如要倂用粘合劑時,粘合劑的使用量是對有 機化合物1 0 0質量份的〇 . 2〜2 0質量份,理想的是 0.5〜10質量份,更理想的是1〜5質量份。使記錄層3〇 含有粘合劑時,也可改善記錄層的保存安定性。 如此所調製的塗布液中,有機化合物的濃度在一般上 是在0.01〜10質量%範圍,理想的是在〇. 1〜5質量%範圍。 塗布方法是可例舉如濺射法、自旋塗層法、浸漬法、 滾動塗敷法、舌片塗布法、塗布輕塗布法、絲網印刷法 等。記錄層30可爲單層,也可爲多層者。記錄層的層 -14- 577070 五、發明說明(13) 厚度在一般上是在2 0〜5 0 Onm範圍,理想的是在 50〜3 0 0nm範圍。又,記錄層30不僅可設在基板的單面 上,而也可設在其兩面上。 又,塗布溫度如在於23〜50 °C範圍時並無特殊的問題 ,但理想的是在24〜40°C,更理想的是在25〜37°C。 爲了提局記錄層3 0的耐光性,也可使該記錄層含有 各種褪色防止劑。 褪色防止劑在一般上是使用單態氧抑制劑。單態氧抑 制劑是可使用已爲眾所周知的專利詳細說明書等的出版 物中所記載者。 其具體例是可列舉如特開昭5 8- 1 75693號公報、特開 昭5 9-8 1 1 94號公報、特開昭60- 1 83 87號公報、特開昭 60- 1 95 86號公報、特開昭60- 1 95 87號公報、特開昭60-3 5 054號公報、特開昭60-36 1 90號公報、特開昭60-36191號公報、特開昭60-44554號公報、特開昭60-44555號公報、特開昭60-443 89號公報、特開昭60-44390號公報、特開昭60-54892號公報、特開昭60-47069號公報、特開昭63-209995號公報、特開平4_ 25492號公報、特公平1 -3 8680號公報、及特公平6-26028號公報等的各公報、德國專利3 5 0399號詳細說明 書、以及,日本化學會誌1 992年10月號第1141頁等所 記載者。 上述單態氧抑制劑等的褪色防止劑之含有量通常是佔 記錄層3 0的全固體份中之〇 · 1〜5 0質量。/。範圍,理想的是 577070 五、發明說明(14 ) 在〇·5〜45質量。/〇範圍,更理想的是在3〜40質量。/〇範圍, 而最理想的是在5〜25質量%範圍。 <噴鑛層> 噴鍍層40是可使再生及記錄所使用的雷射光透射 70%以上,較理想的是90%以上者。 噴鍍層40的材料並無特別的規定,但是以Si、Zn、 Ag、A1、Ti、Sn、W、Cu、Ge、Μη、Sb、Zr 的單體或 化合物(氧化物、氮化物、硫化物等)爲理想,而較理想 的是Si、Zn、Ag、Al、Ti、Sn、Ge的單體或化合物。 這些材料是可考慮其熔點或剛性等的各種物性,適當的 選擇使用,因而可單獨的使用或用兩種以上的組合。 噴鍍層40是例如可使用尤納克施斯公司製RF噴鍍裝 置等的眾所周知之噴鍍裝置,就可將其形成在記錄層30 上。噴鍍層40的層厚度在一般上是在1〜8 Onm範圍,較 理想的是在2〜5 Onm範圍,更理想的是在3〜20nm範圍。 <粘合層> 在噴鑛層4 0的上面’是設有要粘合後述的覆蓋層5 0 用的,圖未示之粘合層。該粘合層所使用的粘合劑是例 如用放射線硬化樹脂所構成者爲理想,其中,爲了防止 光碟的彎曲,而是用其硬化收_率較小者爲理想。又, 粘合層的厚度是爲了要其持有彈性,是以1〜1 000 μηι範 圍爲理想,而以5〜500μηι範圍較爲理想,1〇〜1〇(^11:1範 圍爲最理想。 又,上述放射線硬化樹脂是以在其分子中具有兩個以 -16- 577070 五、發明說明(15) 上的放射線官能度之雙鍵的樹脂爲理想。 上述放射線硬化樹脂是可例舉如丙烯酸酯類、丙烯醯 胺類、甲基丙烯酸酯類、甲基丙烯酸醯胺類、烯丙基化 合物、乙烯醚類、乙烯酯類等。而是以雙官能以上的丙 烯酸酯化合物、甲基丙烯酸酯化合物爲更理想。 放射線硬化樹脂的具體例是可使用乙二醇二丙烯酸酯 、丙二醇二丙烯酸脂、丁二醇二丙烯酸酯、己二醇二丙 烯酸酯、二甘醇二丙烯酸酯、三甘醇二丙烯酸酯、四甘 醇二丙烯酸酯、新戊二醇二丙烯酸酯、三丙二醇二丙烯 酸酯、乙二醇二甲基丙烯酸酯、丙二醇二甲基丙烯酸酯 、丁二醇二甲基丙烯酸酯、己二醇二甲基丙烯酸酯、二 甘醇二甲基丙烯酸酯、三甘醇二甲基丙烯酸酯、四甘醇 二甲基丙烯酸酯、新戊二醇二甲基丙烯酸酯、三丙二醇 二甲基丙烯酸酯等所代表的、在脂肪族二醇中,附加丙 烯酸或甲基丙烯酸者。 又,也可使用在聚乙二醇、聚丙二醇、聚四亞甲基二 醇等的聚醚型多元醇中,附加丙烯酸或甲基丙烯酸的聚 醚丙烯酸酯、聚醚甲基丙烯酸酯,或從眾所周知的二元 酸、甘醇所取得的聚酯型多元醇中,附加丙烯酸或甲基 丙烯酸的聚酯丙烯酸酯、聚酯甲基丙烯酸酯。 又,也可使用使眾所周知的多元醇、二醇與聚異氰酸 酯所反應的聚氨酯中,附加丙烯酸、甲基丙烯酸的聚氨 酯丙烯酸酯、聚氨酯甲基丙烯酸酯.。 又,也可使用雙酚A、雙酚F、氫化雙酚A、氫化雙 -17- 577070 五、發明說明(16) 酚F、或在這些環氧烷烴附加物中附加丙烯酸、甲基丙 烯酸者,或三聚異氰酸環氧烷烴改性二丙烯酸酯、三聚 異氰酸環氧烷烴改性二甲基丙烯酸酯、三環癸烷二甲醇 二丙烯酸酯、三環癸烷二甲醇甲基丙烯酸酯等的具有環 狀構造者。 以上是對於可構成粘合層的放射線硬化樹脂加以說明 者,但,例如市場所出售的大日本印克公司製「SD-640」 、「SD-347」等的UV硬化性樹脂(UV硬化性粘合劑)也 很適合於作爲粘合層之用。 要使上述放射線硬化樹脂硬化所使用的放射線是以電 子射線及紫外線爲最合適。又,如要使用紫外線時,必 需在以上的化合物中添加光聚合引發劑。 光聚合引發劑是使用例如芳香酮。芳香酮是並無特別 的限定,但要在於作爲紫外線照射光源通常所使用的水 銀燈所會產生的明線光譜之2 5 4、3 1 3、8 6 5 nm波長中, 其吸光係數較大者爲理想。其代表例是苯乙酮、二苯甲 酮、苯偶姻乙醚、苄基甲基縮酮、苄基乙基縮酮、苯偶 姻異丁基甲酮、羥基二甲基苯基酮、1_羥基環乙基苯基 酮、2-2 - 一乙氧基乙本酮、米豈酮(Michler,s ketone)等 ,而可使用各種芳香酮。 芳香酮的混合比率是對於上述紫外線硬化樹脂i 質 量份’以0.5〜20質量份,而以24 5質量份爲較理想, 以3〜1 0質量份爲更理想。紫外線硬化型粘合劑中,已 有出售預先添加光聚合引發劑者,而也可使用這種者。 -18- 577070 五、發明說明(17) 紫外線光源是使用水銀燈。水銀燈是用20〜200W/cm 的燈泡’而以0 · 3 m /分鐘〜2 0 m /分鐘的速度下照射。基 板與水銀燈的距離在一般上是以1〜3 0 cm爲理想。 電子射線加速器是可採用掃瞄方式、雙掃描方式或簾 流聚束(curtain beam)方式,但較理想的是較廉價且可獲 得大輸出之簾流聚束方式。電子射線的特性是其加速電 壓爲100〜1 000kV,較理想的是150〜3 00kV,其吸收劑量 爲0·5〜20Mrad(兆拉德),較理想的是1〜lOMrad。加速電 壓在10kV以下時,能量的透過量會不夠,超過l〇〇〇kV 時,聚合所使用的能量效率會降低,而會有不經濟的問 題。 <覆蓋層> 覆蓋層5 0是使用上述粘合劑(經介以粘合劑)而形成在 噴鍍層40上。其對於記錄及再生所使用的雷射光之透 射率爲80。/。以上者爲理想,而90%以上者更爲理想。又 ,覆蓋層50是以其表面粗糙度Ra爲5 nm以下的樹脂薄 片者爲理想,該樹脂薄片是可用聚碳酸酯(帝人公司製皮 由阿葉斯、帝人化成公司製房來特、三乙酸纖維素(富士 軟片公司製富士達克、聚對苯二甲酸乙二醇酯(PET)(東 縲公司製魯米拉),而是以聚碳酸酯和三乙酸纖維素爲較 理想。又覆蓋層5 0的表面粗糙度Ra是由樹脂的種類、 製膜方法、及是否含有塡充物或所含有塡充物的粗細等 所決定。又,覆蓋層5 0的表面粗糙度R a例如是用 WYKO公司製HD2000所測定。 -19- 577070 五、發明說明(18) 覆蓋層5 0的厚度是依照記錄及再生所用的雷射光之 波長或NA做適當的設定,但是以0.005〜1mm範圍爲理 想,0.01〜0.5mm爲更理想。 <其他的層> 本發明的光記錄媒體100也可在上述覆蓋層50上再 加上保護層。保護層是例如用紫外線硬化樹脂所構成。 保護層是例如將紫外線硬化性粘合劑用旋轉塗膠法塗 布於覆蓋層5 0的表面後,用UV照射燈照射紫外線,使 UV硬化粘合劑硬化,就可形成之。 本發明的光記錄媒體1 00的,雷射光所要入射一側的 表面粗糙度是依據所使用覆蓋層50的表面粗糙度、基 板1 0的表面粗糙度、光反射層20的製作條件、記錄層 3 0的種類、製模條件、粘合層的種類、塗布條件、及保 護層的種類與塗布條件等,做適當的決定。 在本發明的光記錄媒體1 〇〇上,例如是用下述方法做 資訊的記錄和再生者。首先,一面使光記錄媒體1 〇〇以 所定線速度(0.5〜10m/秒),或所定角速度旋轉,一面從 覆蓋層5 0側經介以物鏡200照射藍紫色雷射光(例如波 長405nm)等的記錄用光。由此照射光,記錄層30會吸 收此光而產生局部性的溫升,例如會生成凹點以改變其 光學特性,由此,資訊會被記錄在記錄層3 0中。要再 生如上述所記錄的資訊時,是一面使光記錄媒體1 〇〇以 所定線速度旋轉,一面將藍紫色雷射光從覆蓋層5 0側 照射,以檢測其反射光就可將其再生。 -20- 577070 五、發明說明(19) [實施例] 以下,用實施例更詳細的說明本發明,但,本發明並 不受這些實施例的限制。 •實施例1 <光記錄媒體的製作> 將具螺旋狀槽(深度l〇〇nm、寬度0.120μιη、軌距 0·3μηι),厚度1.1mm,直徑120mm的聚碳酸酯(帝人公 司製聚碳酸脂,商品名旁來特AD5 5 03 )基板,以射出成 形之。在所製成基板的具槽之一面上,噴鍍Ag,以形成 100nm厚度的光反射層。 然後,將酞菁系有機化合物A(最大吸收値:3 40nm)2g 混合於148ml的2,2,3,3-四氟合丙醇中,經過兩小時的 超音波處理使其溶解,調製成爲記錄層形成用的塗布液 。將所調製的塗布液用自旋塗層法,在於23°C、50%RH 條件下,一面使轉速從3 Ο 0 rp m變化到4 Ο Ο 0 rp m,一面塗 布於光反射層上。然後,在23°C、50%RH環境中保持 兩小時使其乾燥,以形成記錄層(厚度:lOOnm)。 在記錄層上,將ZnS-Si02噴鍍成爲20nm厚度,以形 成噴鍍層。將U V硬化粘合劑(大日本印克化學公司製 SD-3 47,對上述有機化合物的溶解性爲〇·〇5重量%), 用自旋塗層法以轉速200rpm塗布於噴鍍層上。在所塗 布的UV硬化粘合劑上,疊上聚碳酸酯薄片(帝人公司製 皮由阿葉斯,粗糙度Ra : 1 nm)後,一面使轉速從 3 00ι·ρηι變化到4000rpm,一面使UV硬化粘合劑擴展到
-21 - 577070 五、發明說明(2〇 ) 記錄層的整面上。然後,用UV照射燈照射紫外線,使 UV硬化粘合劑硬化,以形成覆蓋層。 又’在覆蓋層上用自旋塗層法,以/轉速2 OOrpm塗布 UV硬化粘合劑(大日本印克化學公司製SD_ 3 47),然後 一面使轉速從3 0 0 r p m變化到4 0 0 0 r p m,一面使U V硬化 粘合劑擴展到覆蓋層的整面上。然後,用UV照射燈照 射紫外線,使UV硬化粘合劑硬化,以形成保護層。由 此以製成實施例1的光記錄媒體。 <光記錄媒體的記錄特性之評價> (1) C/N(載波一噪音比) 使用裝上405nm雷射、NA ·· 0.85的光學頭之記錄再 生評價機(拍魯斯帝克公司製:DDU 1 000),在時鐘頻率 66MHz/線速度5.6m/s條件下,以單一頻率的信號(2T = 0.1 3 μηι),對所製成的光記錄媒體進行記錄及再生,並用 頻譜分析儀測定其C/N。 (2) 抖動 使用裝上405nm雷射、ΝΑ : 0.85的光學頭之記錄再 生評價機(拍魯斯帝克公司製:DDU 1 000),在時鐘頻率 66MHz/線速度5.6m/s條件下,以1-7PP調變信號進行 記錄及再生,並用時間間隔分析儀測定其抖動。 實施例1的光記錄媒體之評價結果係如表1所示。 •實施例2 除將實施例1中的酞菁系有機化合物A改爲花青系有 機化合物B(吸收波長:3 73 nm)外,其他的是和實施例1 -22- 577070 五、發明說明(21) 同樣的製成實施例2之光記錄媒體。 對所製成的光記錄媒體實施和實施例1同樣的實驗, 以§平價其sB錄特性’其結果係如表1所不。 •實施例3 除將實施例1中的酞菁系有機化合物A改爲氨基丁二 烯系有機化合物C(吸收波長:3 5 9nm)外,其他的是和實 施例1同樣的製成實施例3之光記錄媒體。 對所製成的光記錄媒體實施和實施例1同樣的實驗, 以評價其記錄特性,其結果係如表1所示。 •實施例4 除將實施例1中的酞菁系有機化合物A改爲苯并三唑 有機化合物D(吸收波長:3 73nm)外,其他的是和實施例 1同樣的製成實施例4之光記錄媒體。 對所製成的記錄媒體實施和實施例1同樣的實驗,以 評價其記錄特性,其結果係如表1所示。 •實施例5〜8 除將實施例1中的噴鍍層厚度從20nm分別改爲80nm 、5 0 n m、1 0 η m、2 η m外,其他的是和實施例1同樣的製 成實施例5〜8之光記錄媒體。 對所製成的光記錄媒體實施和實施例1同樣的實驗’ 以評價其記錄特性,其結果係如表1所示。 •實施例9〜13 除將實施例1中的構成噴鍍層之材料從ZnS-Si〇2分別 改爲Ag〇2、ZnS、GeO、Si、Ti外,其他的是和實施例 -23- 577070 五、發明說明(22 ) 1同樣的製成實施例9〜1 3之光記錄媒體。 對所製成的光記錄媒體實施和實施例1同樣的實驗, 以評價其記錄特性,其結果係如表1所示。 •比較例1 除在實施例1中的記錄層與覆蓋層之間不形成噴鍍層 外,其他的是和實施例1同樣的製成比較例1之光記錄 媒體。 對所製成的光記錄媒體實施和實施例1同樣的實驗, 以評價其記錄特性,其結果係如表1所示。 •比較例2 除將實施例1中的噴鍍層之厚度從20nm改爲lOOnm 外,其他的是和實施例1同樣的製成比較例2之光記錄 媒體。 對所製成的光記錄媒體實施和實施例1同樣的實驗, 以評價其記錄特性,其結果係如表1所示。 -24- 577070 五、發明說明(23 ) [表1] ^----------------------- - 有機化合物 噴銨 1層 C/N(dB) 抖動(%) 材料 厚度(nm) 實施例1 酞菁系A ZnS-Si02 20 55 Ύ3 實施例2 花青系B ZnS-S i〇2 20 52 7.6 實施例3 氨基丁二烯系C ZnS-Si02 20 51 8.0 實施例4 苯并三唑系D ZnS-Si02 20 54 7.3 實施例5 酞菁系A ZnS-Si〇2 80 48 8.1 實施例6 酞菁系A ZnS-Si02 50 54 7.7 實施例7 駄菁系A ZnS-Si02 10 57 7.0 實施例8 駄菁系A ZnS-Si02 2 53 8.2 實施例9 酞菁系A Ag02 20 53 7.5 夏施例10 酞菁系A ZnS 20 58 7.0 ㈣拒例11 酞菁系A GeO 20 57 7.1 實施例12 酞菁系A Si 20 57 7.2 實施例13 醜菁系A Ti 20 56 7.6 比較例1 酞菁系A — — 28 12.1 生較例2 酞菁系A ZnS-Si02 100 37 9.9 由表1的結果得知,在記錄層與覆蓋層之間設置噴鍍層 ,就可改善記錄特性的C/Ν及抖動。 又,將噴鍍層設定在80nm以下,最好是在50nm以下 時,記錄層的分解熱會傳導到覆蓋層而可促進該覆蓋層 的變形。覆蓋層的變形是可使入射的雷射光散射,因而 ,可提高調變度,及提升C/Ν。相對的,如比較例2中 ,噴鍍層太厚時,可推測會發生其分解熱會從噴鍍層散 熱掉的問題,和噴鍍層本身的剛性太強致使覆蓋層難於 變形之問題。 [發明之效果] 可對應於藍紫色雷射及高NA光學頭的本發明之光記 錄媒體中,由於是在記錄層與覆蓋層之間設置噴鍍層, -25- 577070 五、發明說明(24 ) 由此,可防止在記錄層中產生會使記錄特性降低的斑點 。因此,依本發明時,可提供一種以高密度記錄的、具 優異記錄特性之補寫型光記錄媒體。 [圖式簡單說明] 第1圖係本發明光記錄媒體的一例示形態之槪略斷面 圖。 [參考符號說明] 10 · · · · •基板 20 .... •光反射層 30 .... •記錄層 40 .... •噴鍍層 50 .... •覆蓋層 1〇〇 · · · · •光記錄媒體 200 · · _ · •物鏡 -26-

Claims (1)

  1. 577070 六、申請專利範圍 1. 一種光記錄媒體,其係在基板上依序設置光反射層、記 錄層、及覆蓋層,而從該覆蓋層側照射波長45 Onm以下 的雷射光以進行記錄及再生之光記錄媒體,其特徵爲: 該光記錄媒體係在上述記錄層與上述覆蓋層之間,更 設置厚度lnm以上80nm以下之噴鍍層,而該噴鍍層與 上述覆蓋層之間是用粘合劑所粘合。 2. 如申請專利範圍第1項之光記錄媒體,其中, 上述噴鑛層是包含Si、Zn、Ag、Al、Ti、Sn或Ge的 單體,或這些化合物之組合。 3. 如申請專利範圍第1或2項之光記錄媒體,其中, 上述噴鍍層係可使記錄及再生所使用的上述雷射光 透射70%以上。 4· 一種光記錄媒體,其係在基板上依序設置光反射層、記 錄層、及覆蓋層,而從該覆蓋層側照射波長45 Onm以下 的雷射光以進行記錄及再生之光記錄媒體,其特徵爲: 該光記錄媒體係在上述記錄層與上述覆蓋層之間,更 設置厚度lnm以上,80nm以下之噴鍍層,該噴鍍層與 上述覆蓋層之間是用粘合劑所粘合,而上述記錄層係含 有在400nm以下持有最大吸收波長之有機化合物。 5. 如申請專利範圍第4項之光記錄媒體,其中, 上述噴鍍層是包含Si、Zn、Ag、Al、Ti、Sn或Ge的 單體,或這些化合物之組合。 6. 如申請專利範圍第4或5項之光記錄媒體,其中, 上述噴鍍層係可使記錄及再生所使用的雷射光透射 -27- 577070 六、申請專利範圍 70%以上者。 7. —種光記錄媒體,其係在基板上依序設置光反射層、胃β 錄層、及覆蓋層,而從該覆蓋層側照射波長45 Onm以·^ 的雷射光以進行記錄及再生之光記錄媒體,其特徵爲:
    該光記錄媒體係在上述記錄層與上述覆蓋層之間,Μ 設置厚度lnm以上80nm以下的噴鍍層,該噴鍍層與上 述覆蓋層之間是用粘合劑所粘合,而由該粘合劑所形成 的粘合層之層厚度是在1〜ΙΟΟΟμιη範圍。 8. 如申請專利範圍第6項之光記錄媒體,其中, 上述噴鍍層是包含Si、Zn、Ag、Al、Ti、Sn或Ge的 單體,或這些化合物之組合。 9. 如申請專利範圍第7或8項之光記錄媒體,其中, 上述噴鍍層係可使記錄及再生所使用的雷射光透射 70%以上。
    10· —種光記錄媒體,其係在基板上依序設置光反射層、記 錄層、及覆蓋層,而從該覆蓋層側照射波長45 Onm以下 的雷射光以進行記錄及再生之光記錄媒體,其特徵爲: 該光記錄媒體係在上述記錄層與上述覆蓋層之間,更 設置厚度lnm以上80nm以下之噴鍍層,該噴鍍層與上 述覆蓋層之間是用粘合劑所粘合,而上述記錄層係含有 在400nm以下持有最大吸收波長之有機化合物,且,由 上述粘合劑所形成的粘合層之層厚度是在1〜ΙΟΟΟμίΉ範 圍。 11 ·如申請專利範圍第i 〇項之光記錄媒體,其中, -28- 577070 六、申請專利範圍 上述噴鍍層是包含Si、Zn、Ag、Al、Ti、Sn或Ge的 單體,或這些化合物之組合。 12·如申請專利範圍第1 〇或Π項之光記錄媒體,其中, 上述噴鍍層係可使記錄及再生所使用的雷射光透射70%以 上。 13· —種光記錄媒體,其係在基板上依序設置光反射層、記 錄層、及覆蓋層,而從該覆蓋層側照射450nm以下的雷 射光以進行記錄及再生之光記錄媒體,其特徵爲: 該光記錄媒體係在上述記錄層與上述覆蓋層之間,更 設置厚度lnm以上80nm以下之噴鍍層,該噴鍍層與上 述覆蓋層之間是用粘合劑所粘合,而,上述記錄層是含 有在400nm以下持有最大吸收波長之有機化合物,且, 由上述粘合劑所形成的粘合層是由放射線硬化樹脂所 構成者。 14. 如申請專利範圍第1 3項之光記錄媒體,其中, 上述噴鍍層是包含Si、Zn、Ag、Al、Ti、Sn或Ge的 單體,或這些化合物之組合。 15. 如申請專利範圍第13或14項之光記錄媒體,其中, 上述噴鍍層係可使記錄及再生所使用的雷射光透射 70%以上。 16. —種光記錄媒體,其係在基板上依序設置光反射層、記 錄層、及覆蓋層,而從該覆蓋層側照射45 〇nm以下的雷 射光以進行記錄及再生之光記錄媒體,其特徵爲: 該光記錄媒體係在上述記錄層與上述覆蓋層之間,更 -29 - 577070 六、申請專利範圍 設置厚度lnm以上80nm以下之噴鍍層,該噴鍍層與上 述覆蓋層之間是用粘合劑所粘合,而,由上述粘合劑所 形成的粘合層之厚度是在1〜ΙΟΟΟμιη範圍,且,由該粘 合劑所形成的粘合層是由放射線硬化樹脂所構成。 17. 如申請專利範圍第16項之光記錄媒體,其中, 上述噴鍍層是包含Si、Zn、Ag、Al、Ti、Sn或Ge的 單體,或這些化合物之組合。 18. 如申請專利範圍第16或17項之光記錄媒體,其中, 上述噴鍍層係可使記錄及再生所使用的雷射光透射 70%以上。 19. 一種光記錄媒體,其係在基板上依序設置光反射層、記 錄層、及覆蓋層,而從該覆蓋層側照射450nm以下的雷 射光以進行記錄及再生之光記錄媒體,其特徵爲: 該光記錄媒體係在上述記錄層與上述覆蓋層之間,更 設置厚度Inm以上80nm以下之噴鍍層,該噴鍍層與上 述覆蓋層之間是用粘合劑所粘合,上述記錄層是含有在 400nm以下持有最大吸收波長之有機化合物,而,由上 述粘合劑所形成的粘合層之層厚度是在1〜ΙΟΟΟμηι範圍 ,且,由上述粘合劑所形成的粘合層是由放射線硬化樹 脂所構成。 20. 如申請專利範圍第19項之光記錄媒體,其中, 上述噴鍍層是包含Si、Zn、Ag、Al、Ti、Sn或Ge的 單體,或這些化合物之組合。 2 1.如申請專利範圍第1 9或20項之光記錄媒體,其中, -30- 577070 六、申請專利範圍 上述噴鍍層係可使記錄及再生所使用的雷射光透射 70%以上。
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