TW367539B - Cooling method, cooling device and handling apparatus - Google Patents

Cooling method, cooling device and handling apparatus

Info

Publication number
TW367539B
TW367539B TW087102180A TW87102180A TW367539B TW 367539 B TW367539 B TW 367539B TW 087102180 A TW087102180 A TW 087102180A TW 87102180 A TW87102180 A TW 87102180A TW 367539 B TW367539 B TW 367539B
Authority
TW
Taiwan
Prior art keywords
cooling
processed substrate
handling apparatus
substrate
cooling device
Prior art date
Application number
TW087102180A
Other languages
English (en)
Inventor
Kiyohisa Tateyama
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Application granted granted Critical
Publication of TW367539B publication Critical patent/TW367539B/zh

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
    • F25B1/00—Compression machines, plants or systems with non-reversible cycle
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67109—Apparatus for thermal treatment mainly by convection
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
    • F25B21/00—Machines, plants or systems, using electric or magnetic effects
    • F25B21/02—Machines, plants or systems, using electric or magnetic effects using Peltier effect; using Nernst-Ettinghausen effect
TW087102180A 1997-03-13 1998-02-17 Cooling method, cooling device and handling apparatus TW367539B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP07668597A JP3442253B2 (ja) 1997-03-13 1997-03-13 基板処理装置

Publications (1)

Publication Number Publication Date
TW367539B true TW367539B (en) 1999-08-21

Family

ID=13612312

Family Applications (1)

Application Number Title Priority Date Filing Date
TW087102180A TW367539B (en) 1997-03-13 1998-02-17 Cooling method, cooling device and handling apparatus

Country Status (4)

Country Link
US (1) US5970717A (zh)
JP (1) JP3442253B2 (zh)
KR (1) KR100352691B1 (zh)
TW (1) TW367539B (zh)

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US6073366A (en) 1997-07-11 2000-06-13 Asm America, Inc. Substrate cooling system and method
TW439094B (en) * 1998-02-16 2001-06-07 Komatsu Co Ltd Apparatus for controlling temperature of substrate
JP3260683B2 (ja) * 1998-02-23 2002-02-25 鹿児島日本電気株式会社 基板移載装置
US6108937A (en) * 1998-09-10 2000-08-29 Asm America, Inc. Method of cooling wafers
US6957690B1 (en) 1998-09-10 2005-10-25 Asm America, Inc. Apparatus for thermal treatment of substrates
US6106634A (en) * 1999-02-11 2000-08-22 Applied Materials, Inc. Methods and apparatus for reducing particle contamination during wafer transport
US6499777B1 (en) 1999-05-11 2002-12-31 Matrix Integrated Systems, Inc. End-effector with integrated cooling mechanism
AU5448200A (en) 1999-05-27 2000-12-18 Matrix Integrated Systems, Inc. Rapid heating and cooling of workpiece chucks
JP3684325B2 (ja) * 1999-07-19 2005-08-17 東京エレクトロン株式会社 基板処理装置
TW511169B (en) 2000-02-01 2002-11-21 Tokyo Electron Ltd Substrate processing apparatus and substrate processing method
JP3910791B2 (ja) * 2000-09-19 2007-04-25 東京エレクトロン株式会社 基板の熱処理方法及び基板の熱処理装置
US6609869B2 (en) 2001-01-04 2003-08-26 Asm America Transfer chamber with integral loadlock and staging station
US6899507B2 (en) * 2002-02-08 2005-05-31 Asm Japan K.K. Semiconductor processing apparatus comprising chamber partitioned into reaction and transfer sections
US7341641B2 (en) * 2002-03-20 2008-03-11 Lg.Philips Lcd Co., Ltd. Bonding device for manufacturing liquid crystal display device
JP2005538566A (ja) * 2002-09-10 2005-12-15 アクセリス テクノロジーズ， インコーポレイテッド 温度固定されたチャックを用いた温度可変プロセスにおける基板の加熱方法
US6696367B1 (en) * 2002-09-27 2004-02-24 Asm America, Inc. System for the improved handling of wafers within a process tool
US7651306B2 (en) 2004-12-22 2010-01-26 Applied Materials, Inc. Cartesian robot cluster tool architecture
US7255747B2 (en) 2004-12-22 2007-08-14 Sokudo Co., Ltd. Coat/develop module with independent stations
US7819079B2 (en) 2004-12-22 2010-10-26 Applied Materials, Inc. Cartesian cluster tool configuration for lithography type processes
US7699021B2 (en) 2004-12-22 2010-04-20 Sokudo Co., Ltd. Cluster tool substrate throughput optimization
US7798764B2 (en) 2005-12-22 2010-09-21 Applied Materials, Inc. Substrate processing sequence in a cartesian robot cluster tool
JP4356936B2 (ja) * 2005-01-21 2009-11-04 東京エレクトロン株式会社 塗布、現像装置及びその方法
JP2007073564A (ja) * 2005-09-02 2007-03-22 Fujitsu Ltd アッシング装置
KR100679269B1 (ko) * 2006-01-04 2007-02-06 삼성전자주식회사 멀티 챔버형 반도체 제조 장치
US20070209593A1 (en) * 2006-03-07 2007-09-13 Ravinder Aggarwal Semiconductor wafer cooling device
JP4833005B2 (ja) * 2006-09-11 2011-12-07 大日本スクリーン製造株式会社 基板処理装置および基板処理方法
US20080008837A1 (en) * 2006-07-10 2008-01-10 Yasuhiro Shiba Substrate processing apparatus and substrate processing method for heat-treating substrate
US7694688B2 (en) 2007-01-05 2010-04-13 Applied Materials, Inc. Wet clean system design
US7950407B2 (en) 2007-02-07 2011-05-31 Applied Materials, Inc. Apparatus for rapid filling of a processing volume
KR100955490B1 (ko) * 2008-05-21 2010-04-30 세메스 주식회사 평판 디스플레이 제조에 사용되는 베이크 장치 및 방법
JP5485056B2 (ja) * 2010-07-21 2014-05-07 東京エレクトロン株式会社 イオン供給装置及びこれを備えた被処理体の処理システム
JP5635378B2 (ja) * 2010-11-30 2014-12-03 日東電工株式会社 半導体ウエハ搬送方法および半導体ウエハ搬送装置
JP2013074112A (ja) * 2011-09-28 2013-04-22 Yaskawa Electric Corp ハンドおよび基板搬送装置
JP5522181B2 (ja) * 2012-01-26 2014-06-18 株式会社安川電機 搬送ロボット
JP5959216B2 (ja) * 2012-02-06 2016-08-02 日東電工株式会社 基板搬送方法および基板搬送装置
JP2013168417A (ja) * 2012-02-14 2013-08-29 Nitto Denko Corp 基板搬送方法および基板搬送装置
JP5963242B2 (ja) * 2012-03-07 2016-08-03 日本特殊陶業株式会社 搬送装置およびセラミック部材
JP6808395B2 (ja) * 2016-08-18 2021-01-06 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
TWI687291B (zh) * 2018-10-08 2020-03-11 聚昌科技股份有限公司 三重托叉式之機械手臂結構及其角度監測模組
CN111061132A (zh) * 2018-10-17 2020-04-24 聚昌科技股份有限公司 三重托叉式的机械手臂结构及其角度监测模块
KR102583261B1 (ko) * 2020-10-28 2023-09-27 세메스 주식회사 기판 처리 장치 및 기판 처리 방법
US11725272B2 (en) 2021-11-01 2023-08-15 Canon Kabushiki Kaisha Method, system and apparatus for cooling a substrate

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US4414758A (en) * 1981-03-23 1983-11-15 Fritz Peter Conveyor for cooling and removal of objects from an in-line sectional production machine
US4667478A (en) * 1984-09-18 1987-05-26 Durotech Corporation Apparatus and method for the cryogenic treatment and heating of materials
JPS6378546A (ja) * 1986-09-22 1988-04-08 Hitachi Ltd ウエハハンドリング装置
US4777733A (en) * 1987-01-09 1988-10-18 Iwatani & Co. Ltd. Method of manufacturing shoes
US4934151A (en) * 1989-07-07 1990-06-19 Kyokujitsu Company., Ltd. Continuous multistage thermal processing apparatus, freezing control method for use by the apparatus, and apparatus for preparing a recording medium for the control method
US5315834A (en) * 1992-08-14 1994-05-31 Feliks Garunts Room air environment conditioner
US5551165A (en) * 1995-04-13 1996-09-03 Texas Instruments Incorporated Enhanced cleansing process for wafer handling implements

Also Published As

Publication number Publication date
KR19980080192A (ko) 1998-11-25
JPH10256344A (ja) 1998-09-25
KR100352691B1 (ko) 2003-04-07
JP3442253B2 (ja) 2003-09-02
US5970717A (en) 1999-10-26

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