TW357265B - Probe card and method of forming the same - Google Patents

Probe card and method of forming the same

Info

Publication number
TW357265B
TW357265B TW086104848A TW86104848A TW357265B TW 357265 B TW357265 B TW 357265B TW 086104848 A TW086104848 A TW 086104848A TW 86104848 A TW86104848 A TW 86104848A TW 357265 B TW357265 B TW 357265B
Authority
TW
Taiwan
Prior art keywords
forming
probe card
same
substrate
insulation film
Prior art date
Application number
TW086104848A
Other languages
English (en)
Inventor
Koji Soejima
Naoji Senba
Original Assignee
Nippon Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co filed Critical Nippon Electric Co
Application granted granted Critical
Publication of TW357265B publication Critical patent/TW357265B/zh

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/06Measuring leads; Measuring probes
    • G01R1/067Measuring probes
    • G01R1/073Multiple probes
    • G01R1/07307Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card
    • G01R1/07342Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card the body of the probe being at an angle other than perpendicular to test object, e.g. probe card
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/06Measuring leads; Measuring probes
    • G01R1/067Measuring probes
    • G01R1/06711Probe needles; Cantilever beams; "Bump" contacts; Replaceable probe pins
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/06Measuring leads; Measuring probes
    • G01R1/067Measuring probes
    • G01R1/06711Probe needles; Cantilever beams; "Bump" contacts; Replaceable probe pins
    • G01R1/06733Geometry aspects
    • G01R1/06744Microprobes, i.e. having dimensions as IC details
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/06Measuring leads; Measuring probes
    • G01R1/067Measuring probes
    • G01R1/073Multiple probes
    • G01R1/07307Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card
    • G01R1/0735Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card arranged on a flexible frame or film
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R3/00Apparatus or processes specially adapted for the manufacture or maintenance of measuring instruments, e.g. of probe tips

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Measuring Leads Or Probes (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)
TW086104848A 1996-04-15 1997-04-15 Probe card and method of forming the same TW357265B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8092079A JP3022312B2 (ja) 1996-04-15 1996-04-15 プローブカードの製造方法

Publications (1)

Publication Number Publication Date
TW357265B true TW357265B (en) 1999-05-01

Family

ID=14044451

Family Applications (1)

Application Number Title Priority Date Filing Date
TW086104848A TW357265B (en) 1996-04-15 1997-04-15 Probe card and method of forming the same

Country Status (6)

Country Link
US (1) US6114864A (zh)
EP (1) EP0802419A3 (zh)
JP (1) JP3022312B2 (zh)
KR (1) KR100266759B1 (zh)
SG (1) SG55303A1 (zh)
TW (1) TW357265B (zh)

Families Citing this family (85)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020053734A1 (en) 1993-11-16 2002-05-09 Formfactor, Inc. Probe card assembly and kit, and methods of making same
US5729150A (en) 1995-12-01 1998-03-17 Cascade Microtech, Inc. Low-current probe card with reduced triboelectric current generating cables
US8033838B2 (en) 1996-02-21 2011-10-11 Formfactor, Inc. Microelectronic contact structure
US6310484B1 (en) * 1996-04-01 2001-10-30 Micron Technology, Inc. Semiconductor test interconnect with variable flexure contacts
US5914613A (en) 1996-08-08 1999-06-22 Cascade Microtech, Inc. Membrane probing system with local contact scrub
US7714235B1 (en) 1997-05-06 2010-05-11 Formfactor, Inc. Lithographically defined microelectronic contact structures
JP4006081B2 (ja) * 1998-03-19 2007-11-14 株式会社ルネサステクノロジ 半導体装置の製造方法
JP3553791B2 (ja) * 1998-04-03 2004-08-11 株式会社ルネサステクノロジ 接続装置およびその製造方法、検査装置並びに半導体素子の製造方法
JPH11326371A (ja) * 1998-05-15 1999-11-26 Toppan Printing Co Ltd 検査治具
JPH11354561A (ja) * 1998-06-09 1999-12-24 Advantest Corp バンプ形成方法及びバンプ
EP1085327B1 (en) * 1999-09-15 2006-06-07 Capres A/S Multi-point probe
US6256882B1 (en) * 1998-07-14 2001-07-10 Cascade Microtech, Inc. Membrane probing system
JP4160665B2 (ja) * 1998-07-22 2008-10-01 Hoya株式会社 コンタクトボード及びその構成部品
JP3958875B2 (ja) * 1998-07-24 2007-08-15 株式会社日本マイクロニクス プローバ及びプローブ針接触方法
USRE41515E1 (en) 1998-08-12 2010-08-17 Tokyo Electron Limited Contactor and production method for contactor
JP2000055936A (ja) * 1998-08-12 2000-02-25 Tokyo Electron Ltd コンタクタ
US6441315B1 (en) 1998-11-10 2002-08-27 Formfactor, Inc. Contact structures with blades having a wiping motion
JP2000227446A (ja) * 1998-11-30 2000-08-15 Japan Electronic Materials Corp プローブカード
US6980017B1 (en) 1999-03-10 2005-12-27 Micron Technology, Inc. Test interconnect for bumped semiconductor components and method of fabrication
JPH11337581A (ja) * 1999-04-27 1999-12-10 Nec Corp プロ―ブカ―ド
US7382142B2 (en) 2000-05-23 2008-06-03 Nanonexus, Inc. High density interconnect system having rapid fabrication cycle
US6812718B1 (en) 1999-05-27 2004-11-02 Nanonexus, Inc. Massively parallel interface for electronic circuits
US6799976B1 (en) 1999-07-28 2004-10-05 Nanonexus, Inc. Construction structures and manufacturing processes for integrated circuit wafer probe card assemblies
US6218203B1 (en) * 1999-06-28 2001-04-17 Advantest Corp. Method of producing a contact structure
EP1200843A1 (en) * 1999-07-28 2002-05-02 Nanonexus, Inc. Construction structures and manufacturing processes for integrated circuit wafer probe card assemblies
KR100733525B1 (ko) * 1999-07-30 2007-06-28 폼팩터, 인크. 상호 접속 조립체 및 방법
US7435108B1 (en) 1999-07-30 2008-10-14 Formfactor, Inc. Variable width resilient conductive contact structures
US6713374B2 (en) 1999-07-30 2004-03-30 Formfactor, Inc. Interconnect assemblies and methods
JP2001094227A (ja) * 1999-09-20 2001-04-06 Shinko Electric Ind Co Ltd 半導体チップ実装用の配線基板と該基板を用いた半導体チップの実装方法
KR100621760B1 (ko) * 1999-10-18 2006-09-07 삼성전자주식회사 반도체 칩 테스트용 프로브 카드
JP2003203954A (ja) * 1999-11-18 2003-07-18 Ibiden Co Ltd 検査装置およびプローブカード
JP3696486B2 (ja) * 1999-11-18 2005-09-21 イビデン株式会社 検査装置
US6657448B2 (en) * 2000-02-21 2003-12-02 Kabushiki Kaisha Nihon Micronics Electrical connection apparatus
US6838890B2 (en) * 2000-02-25 2005-01-04 Cascade Microtech, Inc. Membrane probing system
US7262611B2 (en) 2000-03-17 2007-08-28 Formfactor, Inc. Apparatuses and methods for planarizing a semiconductor contactor
JP3650722B2 (ja) * 2000-05-18 2005-05-25 株式会社アドバンテスト プローブカードおよびその製造方法
US7952373B2 (en) 2000-05-23 2011-05-31 Verigy (Singapore) Pte. Ltd. Construction structures and manufacturing processes for integrated circuit wafer probe card assemblies
WO2002009169A1 (fr) * 2000-07-25 2002-01-31 Ibiden Co., Ltd. Dispositif d'inspection et carte sonde
KR20000064001A (ko) * 2000-08-16 2000-11-06 홍영희 프로브 및 프로브 카드
US6462568B1 (en) * 2000-08-31 2002-10-08 Micron Technology, Inc. Conductive polymer contact system and test method for semiconductor components
JP2002082130A (ja) 2000-09-06 2002-03-22 Hitachi Ltd 半導体素子検査装置及びその製造方法
JP4527267B2 (ja) * 2000-11-13 2010-08-18 東京エレクトロン株式会社 コンタクタの製造方法
DE20114544U1 (de) 2000-12-04 2002-02-21 Cascade Microtech, Inc., Beaverton, Oreg. Wafersonde
JP3651405B2 (ja) * 2001-03-28 2005-05-25 ヤマハ株式会社 プローブおよびその製造方法
EP1407280B1 (en) 2001-07-11 2005-11-23 Formfactor, Inc. Method of manufacturing a probe card
US6729019B2 (en) 2001-07-11 2004-05-04 Formfactor, Inc. Method of manufacturing a probe card
US7355420B2 (en) 2001-08-21 2008-04-08 Cascade Microtech, Inc. Membrane probing system
JP2005527823A (ja) * 2002-05-23 2005-09-15 カスケード マイクロテック インコーポレイテッド デバイスのテスト用プローブ
TWI236723B (en) * 2002-10-02 2005-07-21 Renesas Tech Corp Probe sheet, probe card, semiconductor inspection device, and manufacturing method for semiconductor device
US6724205B1 (en) 2002-11-13 2004-04-20 Cascade Microtech, Inc. Probe for combined signals
JP2004213923A (ja) * 2002-12-27 2004-07-29 Anritsu Corp 接点部材及び該接点部材を用いたマイクロ接点装置
US6982565B2 (en) * 2003-03-06 2006-01-03 Micron Technology, Inc. Test system and test method with interconnect having semiconductor spring contacts
KR100523745B1 (ko) * 2003-03-24 2005-10-25 주식회사 유니테스트 전자소자 검사용 마이크로 프로브 및 그 제조 방법
KR20040089244A (ko) * 2003-04-11 2004-10-21 주식회사 유림하이테크산업 프로브 카드의 니들 어셈블리
US7057404B2 (en) 2003-05-23 2006-06-06 Sharp Laboratories Of America, Inc. Shielded probe for testing a device under test
JP2005156365A (ja) * 2003-11-26 2005-06-16 Shinko Electric Ind Co Ltd 電気特性測定用プローブ及びその製造方法
WO2005065258A2 (en) 2003-12-24 2005-07-21 Cascade Microtech, Inc. Active wafer probe
TWI286606B (en) 2004-03-16 2007-09-11 Gunsei Kimoto Electric signal connecting device, and probe assembly and prober device using it
US7420381B2 (en) 2004-09-13 2008-09-02 Cascade Microtech, Inc. Double sided probing structures
JP4535494B2 (ja) * 2004-10-20 2010-09-01 ルネサスエレクトロニクス株式会社 薄膜プローブシートの製造方法および半導体チップの検査方法
KR100633456B1 (ko) * 2004-11-24 2006-10-16 주식회사 유니테스트 깊게 파진 트렌치를 구비하는 프로브 카드 및 그 제조방법
US7656172B2 (en) 2005-01-31 2010-02-02 Cascade Microtech, Inc. System for testing semiconductors
US7535247B2 (en) 2005-01-31 2009-05-19 Cascade Microtech, Inc. Interface for testing semiconductors
US7852101B2 (en) 2005-09-07 2010-12-14 Nec Corporation Semiconductor device testing apparatus and power supply unit for semiconductor device testing apparatus
EP1777529B1 (en) * 2005-09-14 2009-09-02 Gunsei Kimoto Electric signal connecting device and probe assembly using the same
JP4884749B2 (ja) * 2005-10-31 2012-02-29 日本発條株式会社 導電性接触子ホルダの製造方法および導電性接触子ユニットの製造方法
JP4820372B2 (ja) * 2005-12-01 2011-11-24 シャープ株式会社 回路部材、電極接続構造及びそれを備えた表示装置
TWI397696B (zh) 2006-02-19 2013-06-01 Gunsei Kimoto Probe assembly
US7528618B2 (en) 2006-05-02 2009-05-05 Formfactor, Inc. Extended probe tips
US7723999B2 (en) 2006-06-12 2010-05-25 Cascade Microtech, Inc. Calibration structures for differential signal probing
US7764072B2 (en) 2006-06-12 2010-07-27 Cascade Microtech, Inc. Differential signal probing system
US7403028B2 (en) 2006-06-12 2008-07-22 Cascade Microtech, Inc. Test structure and probe for differential signals
JP2006258826A (ja) * 2006-06-20 2006-09-28 Advantest Corp バンプ形成方法及びバンプ
US8130005B2 (en) * 2006-12-14 2012-03-06 Formfactor, Inc. Electrical guard structures for protecting a signal trace from electrical interference
JP5030060B2 (ja) * 2007-08-01 2012-09-19 軍生 木本 電気信号接続装置
US7876114B2 (en) 2007-08-08 2011-01-25 Cascade Microtech, Inc. Differential waveguide probe
US7888957B2 (en) 2008-10-06 2011-02-15 Cascade Microtech, Inc. Probing apparatus with impedance optimized interface
US8410806B2 (en) 2008-11-21 2013-04-02 Cascade Microtech, Inc. Replaceable coupon for a probing apparatus
JP2012198194A (ja) * 2011-03-09 2012-10-18 Shinko Electric Ind Co Ltd プローブカード及びその製造方法
TWI439698B (zh) * 2011-09-30 2014-06-01 Hermes Testing Solutions Inc 電路測試探針卡及其探針基板結構
US9768126B2 (en) * 2014-12-24 2017-09-19 Stmicroelectronics, Inc. Stacked semiconductor packages with cantilever pads
US9899236B2 (en) * 2014-12-24 2018-02-20 Stmicroelectronics, Inc. Semiconductor package with cantilever pads
DE102015004150A1 (de) * 2015-03-31 2016-10-06 Feinmetall Gmbh Verfahren zur Herstellung eines Kontaktabstandswandlers sowie Kontaktabstandswandler
CN110335823A (zh) * 2015-05-26 2019-10-15 意法半导体公司 带有悬臂式焊盘的叠层半导体封装体
JP6770798B2 (ja) * 2015-11-20 2020-10-21 日本電子材料株式会社 コンタクトプローブ

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3826984A (en) * 1969-02-28 1974-07-30 Licentia Gmbh Measuring device for the dynamic measurement of semiconductor parameters and method of making such a device
JPS612338A (ja) * 1984-06-15 1986-01-08 Hitachi Ltd 検査装置
US4968589A (en) * 1988-10-26 1990-11-06 General Signal Corporation Probe card for integrated circuit chip and method of making probe card
JPH07114227B2 (ja) * 1989-01-07 1995-12-06 三菱電機株式会社 ウエハ試験用探触板
US5134365A (en) * 1989-07-11 1992-07-28 Nihon Denshizairyo Kabushiki Kaisha Probe card in which contact pressure and relative position of each probe end are correctly maintained
JP2928592B2 (ja) * 1990-06-20 1999-08-03 株式会社日立製作所 半導体lsi検査装置用プローブヘッドの製造方法および検査装置
US5172050A (en) * 1991-02-15 1992-12-15 Motorola, Inc. Micromachined semiconductor probe card
JPH04297050A (ja) * 1991-03-12 1992-10-21 Mitsubishi Electric Corp 半導体検査装置およびその平板状基板の製造方法
JP2606554Y2 (ja) * 1992-01-17 2000-11-27 株式会社東京精密 プロービング装置
JPH0618555A (ja) * 1992-06-30 1994-01-25 Meisei Denshi Kogyo Kk マイクロスプリングコンタクト、マイクロスプリングコンタクトの集合体、該マイクロスプリングコンタクトの集合体からなる電気的接続用端子及びマイクロスプリングコンタクトの製造方法
JPH0650990A (ja) * 1992-07-30 1994-02-25 Nec Corp プローブカード
JPH06349907A (ja) * 1993-06-08 1994-12-22 Toshiba Corp プローブカード
JPH06347481A (ja) * 1993-06-11 1994-12-22 Nitto Denko Corp プローブ構造
JPH0721598A (ja) * 1993-07-02 1995-01-24 Canon Inc プローブユニット及びこれを用いた情報処理装置
JPH0774219A (ja) * 1993-08-31 1995-03-17 Kurisutaru Device:Kk プローブ基板およびその製造方法並びにプローブ装置
JPH0783955A (ja) * 1993-09-14 1995-03-31 Fujitsu Ltd プローブカード
JP2710544B2 (ja) * 1993-09-30 1998-02-10 インターナショナル・ビジネス・マシーンズ・コーポレイション プローブ構造、プローブ構造の形成方法
JPH07135240A (ja) * 1993-11-10 1995-05-23 Tokyo Electron Ltd プローブ装置
JPH07142541A (ja) * 1993-11-12 1995-06-02 Toshiba Corp プロ−ブ
JP3502874B2 (ja) * 1994-06-03 2004-03-02 株式会社ルネサステクノロジ 接続装置およびその製造方法
US5613861A (en) * 1995-06-07 1997-03-25 Xerox Corporation Photolithographically patterned spring contact

Also Published As

Publication number Publication date
EP0802419A2 (en) 1997-10-22
KR970072105A (ko) 1997-11-07
JPH09281144A (ja) 1997-10-31
JP3022312B2 (ja) 2000-03-21
KR100266759B1 (ko) 2000-09-15
US6114864A (en) 2000-09-05
EP0802419A3 (en) 1998-08-12
SG55303A1 (en) 1998-12-21

Similar Documents

Publication Publication Date Title
TW357265B (en) Probe card and method of forming the same
CA2156465A1 (en) Clip and Method Therefor
MY123910A (en) Transparent electromagnetic wave shield
TW358992B (en) Semiconductor device and method of fabricating the same
TW351835B (en) Platen coating structure for chemical mechanical polishing method
TW339460B (en) Method of forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus
TR199501238A2 (tr) Iki-eksen yönünde oluklu ince kagidin olusturulmasi icin krepleme yöntemi ve bu yöntemde kullanilmak icin yeni krepleme bicagi.
EP0820878A3 (en) Transfer sheet for provision of pattern on three-dimensional object and transfer method using the same
DE69834791D1 (de) Heizelement
AU3407699A (en) Means for providing electrical contact
NO974881D0 (no) Fremgangsmåte til å inhibere mikrobiell adhesjon til overflaten
AU2001244425A1 (en) Diamond radiation detector
DE59101612D1 (de) Elektrisch isoliertes Wälzlager.
TW329557B (en) ESD sensor and method of use
TW337607B (en) Process for forming a contact hole in an EEPROM with NOR construction
IL129908A0 (en) Method for optimising the detection of the contact point of a tactile capacitance surface
AU2003254588A1 (en) Data support with transponder coil
TW337025B (en) Semiconductor device and its manufacturing method
TW358986B (en) Metal layer patterns of a semiconductor device and a method for forming the same
TW370693B (en) Method for forming a contact to a substrate
TW335594B (en) A printed-wiring board and a production method
TW327237B (en) Semiconductor device and method for forming the same
TW359062B (en) Method of joining an electrical contact element to a substrate
GB2134817A (en) Antiskidding band, particularly carpet band
TW338176B (en) Improved delibeation pattern for epitaxial depositions

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees