TW335547B - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
TW335547B
TW335547B TW086104814A TW86104814A TW335547B TW 335547 B TW335547 B TW 335547B TW 086104814 A TW086104814 A TW 086104814A TW 86104814 A TW86104814 A TW 86104814A TW 335547 B TW335547 B TW 335547B
Authority
TW
Taiwan
Prior art keywords
semiconductor
resistor
region
semiconductor device
voltage
Prior art date
Application number
TW086104814A
Other languages
English (en)
Inventor
Mahito Suwa
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Application granted granted Critical
Publication of TW335547B publication Critical patent/TW335547B/zh

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C5/00—Details of stores covered by group G11C11/00
    • G11C5/14—Power supply arrangements, e.g. power down, chip selection or deselection, layout of wirings or power grids, or multiple supply levels
    • G11C5/147—Voltage reference generators, voltage or current regulators; Internally lowered supply levels; Compensation for voltage drops
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
    • H01L29/8605—Resistors with PN junctions

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Dram (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Semiconductor Memories (AREA)
TW086104814A 1996-11-29 1997-04-15 Semiconductor device TW335547B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8319402A JPH10163429A (ja) 1996-11-29 1996-11-29 半導体装置

Publications (1)

Publication Number Publication Date
TW335547B true TW335547B (en) 1998-07-01

Family

ID=18109791

Family Applications (1)

Application Number Title Priority Date Filing Date
TW086104814A TW335547B (en) 1996-11-29 1997-04-15 Semiconductor device

Country Status (6)

Country Link
US (1) US5903033A (zh)
JP (1) JPH10163429A (zh)
KR (1) KR100286782B1 (zh)
CN (1) CN1087497C (zh)
DE (1) DE19729601A1 (zh)
TW (1) TW335547B (zh)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3547955B2 (ja) * 1997-10-16 2004-07-28 株式会社ルネサステクノロジ 半導体装置
US6121104A (en) * 1997-12-12 2000-09-19 Texas Instruments Incorporated Charge cancellation technique for integrated circuit resistors
US6335899B1 (en) * 2000-04-19 2002-01-01 Lsi Logic Corporation Compensation capacitance for minimizing bit line coupling in multiport memory
JP4024990B2 (ja) * 2000-04-28 2007-12-19 株式会社ルネサステクノロジ 半導体装置
IT1316269B1 (it) 2000-12-28 2003-04-03 Micron Technology Inc Riduzione di rumore di alimentazione nella selezione di colonna indispositivi di memoria.
JP2006202830A (ja) * 2005-01-18 2006-08-03 Kawasaki Microelectronics Kk 半導体装置
DE102006007040A1 (de) * 2006-02-15 2007-08-16 Austriamicrosystems Ag Bauelement mit integriertem Heizelement und Verfahren zum Beheizen eines Halbleiterkörpers
JP5237549B2 (ja) * 2006-12-27 2013-07-17 セミコンダクター・コンポーネンツ・インダストリーズ・リミテッド・ライアビリティ・カンパニー 定電流回路
JP2012109535A (ja) * 2010-10-20 2012-06-07 Asahi Kasei Electronics Co Ltd 抵抗素子及び反転バッファ回路
WO2012060032A1 (ja) * 2010-11-04 2012-05-10 パナソニック株式会社 半導体集積回路
US8786050B2 (en) * 2011-05-04 2014-07-22 Taiwan Semiconductor Manufacturing Company, Ltd. High voltage resistor with biased-well
US10029909B2 (en) 2013-06-07 2018-07-24 Cavendish Kinetics, Inc. Non-symmetric arrays of MEMS digital variable capacitor with uniform operating characteristics
JP6445374B2 (ja) * 2015-04-01 2018-12-26 ローム株式会社 コンデンサ構造
JP7027176B2 (ja) * 2018-01-22 2022-03-01 ラピスセミコンダクタ株式会社 半導体装置
TWI816359B (zh) * 2019-03-15 2023-09-21 日商鎧俠股份有限公司 半導體裝置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS577150A (en) * 1980-06-16 1982-01-14 Fujitsu Ltd Manufacture of semiconductor device
JP2864576B2 (ja) * 1988-11-22 1999-03-03 セイコーエプソン株式会社 半導体装置
JPH03129762A (ja) * 1989-10-16 1991-06-03 Hitachi Ltd 半導体集積回路装置
JP2748070B2 (ja) * 1992-05-20 1998-05-06 三菱電機株式会社 半導体装置およびその製造方法
US5479044A (en) * 1993-06-25 1995-12-26 Nec Corporation Semiconductor circuit device capable of reducing influence of a parasitic capacitor
US5440162A (en) * 1994-07-26 1995-08-08 Rockwell International Corporation ESD protection for submicron CMOS circuits

Also Published As

Publication number Publication date
DE19729601A1 (de) 1998-06-04
CN1184336A (zh) 1998-06-10
US5903033A (en) 1999-05-11
CN1087497C (zh) 2002-07-10
KR19980041747A (ko) 1998-08-17
JPH10163429A (ja) 1998-06-19
KR100286782B1 (ko) 2001-04-16

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