TW280908B - - Google Patents

Info

Publication number
TW280908B
TW280908B TW085100888A TW85100888A TW280908B TW 280908 B TW280908 B TW 280908B TW 085100888 A TW085100888 A TW 085100888A TW 85100888 A TW85100888 A TW 85100888A TW 280908 B TW280908 B TW 280908B
Authority
TW
Taiwan
Application number
TW085100888A
Original Assignee
Nippon Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co filed Critical Nippon Electric Co
Application granted granted Critical
Publication of TW280908B publication Critical patent/TW280908B/zh

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/22—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using ferroelectric elements

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Dram (AREA)
TW085100888A 1995-01-27 1996-01-25 TW280908B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7011357A JPH08203266A (ja) 1995-01-27 1995-01-27 強誘電体メモリ装置

Publications (1)

Publication Number Publication Date
TW280908B true TW280908B (zh) 1996-07-11

Family

ID=11775787

Family Applications (1)

Application Number Title Priority Date Filing Date
TW085100888A TW280908B (zh) 1995-01-27 1996-01-25

Country Status (6)

Country Link
US (1) US5600587A (zh)
EP (1) EP0724265B1 (zh)
JP (1) JPH08203266A (zh)
KR (1) KR100201737B1 (zh)
DE (1) DE69612676T2 (zh)
TW (1) TW280908B (zh)

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KR100601928B1 (ko) * 1996-06-10 2006-10-04 삼성전자주식회사 강유전체랜덤액세서메모리의비휘발성유지장치및방법
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US6265738B1 (en) 1997-03-03 2001-07-24 Matsushita Electronics Corporation Thin film ferroelectric capacitors having improved memory retention through the use of essentially smooth bottom electrode structures
USRE38565E1 (en) * 1997-03-03 2004-08-17 Matsushita Electric Industrial Co., Ltd. Thin film ferroelectric capacitors having improved memory retention through the use of essentially smooth bottom electrode structures
US5784310A (en) * 1997-03-03 1998-07-21 Symetrix Corporation Low imprint ferroelectric material for long retention memory and method of making the same
KR100306823B1 (ko) * 1997-06-02 2001-11-30 윤종용 강유전체메모리셀들을구비한불휘발성메모리장치
JP3877336B2 (ja) * 1997-06-27 2007-02-07 松下電器産業株式会社 強誘電体メモリ装置及びその駆動方法
KR100297874B1 (ko) 1997-09-08 2001-10-24 윤종용 강유전체랜덤액세스메모리장치
KR100247934B1 (ko) 1997-10-07 2000-03-15 윤종용 강유전체 램 장치 및 그 제조방법
KR100457346B1 (ko) * 1997-11-27 2005-04-06 삼성전자주식회사 강유전체 랜덤 액세스 메모리 장치
JP3196829B2 (ja) * 1997-12-26 2001-08-06 日本電気株式会社 強誘電体メモリ装置
KR100275107B1 (ko) * 1997-12-30 2000-12-15 김영환 강유전체메모리장치및그구동방법
JPH11273362A (ja) * 1998-03-18 1999-10-08 Sharp Corp 不揮発性半導体記憶装置
US6541375B1 (en) 1998-06-30 2003-04-01 Matsushita Electric Industrial Co., Ltd. DC sputtering process for making smooth electrodes and thin film ferroelectric capacitors having improved memory retention
KR100363102B1 (ko) 1998-07-15 2003-02-19 주식회사 하이닉스반도체 강유전체 메모리
JP3780713B2 (ja) 1998-08-25 2006-05-31 富士通株式会社 強誘電体メモリ、強誘電体メモリの製造方法及び強誘電体メモリの試験方法
KR100303782B1 (ko) * 1998-10-28 2001-09-24 박종섭 두개의 공급전위를 사용하여 메모리소자의 셀 플레이트 라인을구동하기 위한 장치
JP2000187990A (ja) * 1998-12-24 2000-07-04 Nec Corp センスアンプ回路及びそれを用いた記憶装置並びにそれに用いる読出し方法
KR100301930B1 (ko) * 1999-06-10 2001-11-01 윤종용 세그먼트 플레이트 라인 스킴을 갖는 불휘발성 강유전체 랜덤액세스 메모리 장치 및 플레이트 라인 세그먼트 구동 방법
KR100318435B1 (ko) * 1999-06-28 2001-12-24 박종섭 강유전체 메모리 소자의 기준 전압 발생 장치
KR100324594B1 (ko) 1999-06-28 2002-02-16 박종섭 강유전체 메모리 장치
KR100296917B1 (ko) 1999-06-28 2001-07-12 박종섭 강유전체 메모리 소자의 기준 전압 발생 장치
JP4350222B2 (ja) * 1999-08-26 2009-10-21 Ｏｋｉセミコンダクタ株式会社 強誘電体メモリ装置の動作方法
US6141238A (en) * 1999-08-30 2000-10-31 Micron Technology, Inc. Dynamic random access memory (DRAM) cells with repressed ferroelectric memory methods of reading same, and apparatuses including same
DE10008243B4 (de) 2000-02-23 2005-09-22 Infineon Technologies Ag Integrierter Speicher mit Plattenleitungssegmenten
US6953730B2 (en) * 2001-12-20 2005-10-11 Micron Technology, Inc. Low-temperature grown high quality ultra-thin CoTiO3 gate dielectrics
US7154140B2 (en) * 2002-06-21 2006-12-26 Micron Technology, Inc. Write once read only memory with large work function floating gates
US6970370B2 (en) * 2002-06-21 2005-11-29 Micron Technology, Inc. Ferroelectric write once read only memory for archival storage
US6996009B2 (en) 2002-06-21 2006-02-07 Micron Technology, Inc. NOR flash memory cell with high storage density
US7193893B2 (en) * 2002-06-21 2007-03-20 Micron Technology, Inc. Write once read only memory employing floating gates
US6804136B2 (en) * 2002-06-21 2004-10-12 Micron Technology, Inc. Write once read only memory employing charge trapping in insulators
US6888739B2 (en) * 2002-06-21 2005-05-03 Micron Technology Inc. Nanocrystal write once read only memory for archival storage
US7221586B2 (en) * 2002-07-08 2007-05-22 Micron Technology, Inc. Memory utilizing oxide nanolaminates
US7221017B2 (en) * 2002-07-08 2007-05-22 Micron Technology, Inc. Memory utilizing oxide-conductor nanolaminates
US20050055495A1 (en) * 2003-09-05 2005-03-10 Nokia Corporation Memory wear leveling
KR100597629B1 (ko) * 2003-12-22 2006-07-07 삼성전자주식회사 강유전체 메모리 장치 및 그에 따른 구동방법
NO322040B1 (no) 2004-04-15 2006-08-07 Thin Film Electronics Asa Bimodal drift av ferroelektriske og elektrete minneceller og innretninger
JP2006344289A (ja) * 2005-06-08 2006-12-21 Toshiba Corp 強誘電体記憶装置
US9245591B2 (en) * 2005-06-16 2016-01-26 Lexmark International, Inc. Addressing, command protocol, and electrical interface for non-volatile memories utilized in recording usage counts
US7927948B2 (en) 2005-07-20 2011-04-19 Micron Technology, Inc. Devices with nanocrystals and methods of formation
US7709402B2 (en) * 2006-02-16 2010-05-04 Micron Technology, Inc. Conductive layers for hafnium silicon oxynitride films
CN100390901C (zh) * 2006-04-21 2008-05-28 北京大学深圳研究生院 铁电动态随机存储器单管单元阵列的编程方法
JP5162276B2 (ja) 2008-02-28 2013-03-13 ローム株式会社 強誘電体メモリ装置
JP5189887B2 (ja) 2008-04-28 2013-04-24 ローム株式会社 強誘電体メモリ装置およびその動作方法
JP5060403B2 (ja) * 2008-06-19 2012-10-31 株式会社東芝 半導体記憶装置
JP5333311B2 (ja) * 2010-03-26 2013-11-06 ソニー株式会社 不揮発性記憶装置
DE102014205130A1 (de) * 2014-03-19 2015-09-24 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Speicherzelle
US9368182B2 (en) 2013-12-09 2016-06-14 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V. Memory cell
US10153020B1 (en) * 2017-06-09 2018-12-11 Micron Technology, Inc. Dual mode ferroelectric memory cell operation
US11450675B2 (en) * 2018-09-14 2022-09-20 Intel Corporation One transistor and one ferroelectric capacitor memory cells in diagonal arrangements
US11853213B2 (en) 2021-04-28 2023-12-26 Seagate Technology Llc Intelligent management of ferroelectric memory in a data storage device
US11899590B2 (en) 2021-06-18 2024-02-13 Seagate Technology Llc Intelligent cache with read destructive memory cells

Family Cites Families (9)

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JPS5661085A (en) * 1979-10-23 1981-05-26 Toshiba Corp Semiconductor memory device
US4873664A (en) * 1987-02-12 1989-10-10 Ramtron Corporation Self restoring ferroelectric memory
EP0293798B2 (en) * 1987-06-02 1998-12-30 National Semiconductor Corporation Non-volatile memory ciruit using ferroelectric capacitor storage element
JPH088339B2 (ja) * 1988-10-19 1996-01-29 株式会社東芝 半導体メモリ
DE4110407A1 (de) * 1990-03-30 1991-10-02 Toshiba Kawasaki Kk Halbleiter-speicheranordnung
US5086412A (en) * 1990-11-21 1992-02-04 National Semiconductor Corporation Sense amplifier and method for ferroelectric memory
JPH05182458A (ja) * 1991-12-26 1993-07-23 Toshiba Corp 半導体記憶装置
KR970000870B1 (ko) * 1992-12-02 1997-01-20 마쯔시다덴기산교 가부시기가이샤 반도체메모리장치
JPH07114792A (ja) * 1993-10-19 1995-05-02 Mitsubishi Electric Corp 半導体記憶装置

Also Published As

Publication number Publication date
DE69612676T2 (de) 2002-02-07
EP0724265A2 (en) 1996-07-31
EP0724265B1 (en) 2001-05-09
US5600587A (en) 1997-02-04
KR960030240A (ko) 1996-08-17
JPH08203266A (ja) 1996-08-09
DE69612676D1 (de) 2001-06-13
EP0724265A3 (en) 1999-01-07
KR100201737B1 (ko) 1999-06-15

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