TW202146593A - 導電性高分子組成物、基板,及基板之製造方法 - Google Patents
導電性高分子組成物、基板,及基板之製造方法 Download PDFInfo
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Classifications
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Abstract
本發明為一種導電性高分子組成物,其特徵為將π共軛系聚合物(A)及下述一般式(2)表示之聚合物(B)的複合體分散在H2
O(D)者,且為包含水溶性的有機溶劑(C)者。藉此,提供一種組成物,其係藉由於可形成過濾性良好且成膜性良好,酸性度的緩和可能,且具有高透明性之導電膜的導電性高分子化合物之H2
O分散液,混合有機溶劑,可賦予表面張力、因接觸角的低下導致於基板上之整平性,並可作為藉由液滴之塗佈法使用,藉由於前述有機溶劑使用較H2
O沸點更高之有機溶劑,於從噴嘴周邊之固體成分的析出或從噴嘴先端排出液體材料,至對基板著液為止之間,可迴避因乾燥導致之固體成分析出。
Description
本發明係關於導電性高分子組成物,及有機電致發光元件中,包含由該導電性高分子組成物所形成之塗佈型導電膜的基板。
具有共軛雙鍵之聚合物(π共軛系聚合物)係聚合物本身雖未顯示導電性,但藉由摻雜適當之陰離子分子,表現電子或電洞的移動,並成為導電性高分子材料。作為π共軛系聚合物,已使用聚噻吩、聚硒吩、聚碲吩、聚吡咯、聚苯胺等之(雜)芳香族聚合物及此等之混合物等,作為陰離子分子(摻雜劑),最常使用磺酸系之陰離子。此係因為強酸之磺酸與上述之π共軛系聚合物效率良好地進行相互作用。
作為磺酸系之陰離子摻雜劑,廣泛使用聚乙烯基磺酸或聚苯乙烯磺酸(PSS)等之磺酸聚合物(專利文獻1)。又,磺酸聚合物中亦有註冊商標Nafion所代表之乙烯基全氟烷基醚磺酸,此係使用在燃料電池用途。
磺酸均聚物之聚苯乙烯磺酸(PSS)對於聚合物主鏈,由於磺酸以單體單位連續存在,對於π共軛系聚合物之摻雜為高效率,且亦可提昇摻雜後之π共軛系聚合物對水的分散性。此係因為於PSS較摻雜部位,藉由過剩存在之磺酸基的存在,更保持親水性,大幅提昇對水的分散性。
將PSS作為摻雜劑之聚噻吩,由於為高導電性且可作為液體材料操作,故被期待作為切換成有機EL或太陽能電池等之透明電極使用之ITO(銦-錫氧化物)之塗佈型的透明電極膜材料,或有機EL或太陽能電池等之薄膜裝置轉移至全層塗佈型材料機構,並且在某階段,高導電性雖不需要,但期待作為用作減低從電極至對載體移動層的載體移動負荷之注入層的塗佈型材料的適用。
相對於親水性低之π共軛系聚合物,藉由將親水性極高之PSS作為摻雜劑適用,π共軛系聚合物與摻雜劑的複合體於H2
O中成為粒子,並已分散,作為液體材料,對基板上的塗佈為可能。該複合體對基板上之塗佈後,藉由熱風循環爐、熱板等之加熱成膜或藉由IR、UV照射等之成膜雖可能,但由於前述親水性極為高之PSS保持水分,成膜處理後亦於膜內多量殘留水分,於元件作成・密封後揮發其水分,充滿於元件內等,有顯著降低元件性能的情況。例如於有機EL之構成膜(薄膜)使用該材料時,藉由由在膜內之殘存水分及至密封為止之製造製程的外部環境吸收之水分,於構成層之層合及密封後產生水分之揮發或對相鄰層之浸透,導致於密封元件內或膜內部之因水分凝聚導致之缺陷發生、發光層的機能低下或因膜內水分導致之元件驅動電壓的上昇等元件的機能降低,作為結果,產生縮短元件壽命等之問題。
因此,將PSS作為摻雜劑之π共軛系聚合物的複合體之H2
O分散液作為有機EL或太陽能電池等有機薄膜元件中之透明電極材料或電洞注入層的材料使用時,前述殘存水分引起元件之性能劣化。作為H2
O代替溶劑,雖亦有嘗試於有機溶劑分散該複合體,但由於對有機溶劑之親和性低,得到均一分散液為困難。
又,於研究廣泛適用之PEDOT-PSS,由於光吸收在可見光區域透過率低,故對光透過性發光元件的適用出現問題,又,於液體狀態,亦有容易凝聚前述複合體之分散粒子等之特質,於過濾純化伴隨困難。
將PSS作為摻雜劑之π共軛系聚合物的複合體作為有機EL或太陽能電池等有機薄膜元件中之透明電極材料或電洞注入層的材料使用時,其薄膜形成之方法中有各式各樣的手法。作為成膜之方法,例如有藉由旋塗機等之塗佈、棒塗機、浸漬、缺角輪塗佈、噴塗、輥塗、絲網印刷、柔版印刷、凹版印刷、噴墨印刷等,對基板之塗佈後,藉由熱風循環爐、熱板等之加熱處理,進行IR、UV照射等,可形成導電膜。惟,如前述般,於將組成物內之成分凝聚體的去除作為目的之過濾有問題,故不過濾進行塗佈時,由於因此等凝聚體的影響產生塗佈不良,或例如即使得到均一膜,由於表面粗糙度惡化,亦產生激烈的表面凹凸或針孔,故適用在具有層合構造之有機EL或太陽能電池等時,有容易產生載體之移動障礙或短路等之問題等之問題。
又,將PSS作為摻雜劑之與π共軛系聚合物的複合體的溶劑定為H2
O時,由於表面張力高,無論玻璃基板、塑膠基板,塗佈時之接觸角亦增大,產生塗佈後之液體的凝聚,作為藉由基板上之反彈的液滴,附著在基板上。因此,為了得到均一膜,有必要藉由降低材料的表面張力,降低與基板之接觸角,而賦予整平性。尤其是於藉由液體材料的噴霧或吹附之噴塗或噴墨印刷,前述表面張力的低下及整平性的賦予為必須要素。又,由於有於噴嘴周邊之固體成分的固著或從噴嘴先端排出液體材料後,至對基板成為著液為止之間,產生因乾燥導致之固體成分析出的情況,故若主溶劑之H2
O取代為揮發性低之溶劑或H2
O為主溶劑,則有必要其他方式添加乾燥延遲劑。
為了將PSS作為摻雜劑之與π共軛系聚合物的複合體塗佈在玻璃基板、塑膠基板,從塗佈性及膜質的觀點來看,最期望主溶劑為有機溶劑。於專利文獻2及專利文獻3,記載有於無水溶劑或低水分含量溶劑中之聚噻吩-聚陰離子錯合物之製造。於此等之系統,作為初期溶劑之H2
O與其他水混和性有機溶劑交換。為了此目的,加入有機溶劑,接著,H2
O例如藉由蒸餾去除。惟,此順序的缺點係於該蒸餾有必要使用2階段製程,所添加之有機溶劑有必要與水為混和性,且該有機溶劑的沸點大概為150℃以上時,為通用性高之聚噻吩-聚陰離子粒子性分散液時,產生高導電化等之聚合物變性,於作為孔注入層之用途,有從適性導電率區域脫離等之問題。
又,在專利文獻4,記載有Otani們最初乾燥PEDOT等之導電性聚合物,接著,再分散在有機溶劑之方法。實施例中,雖可列舉異丙基醇及γ-丁內酯,但於此方法,為了再溶解,極性溶劑成為必要。於本文獻,針對聚噻吩-聚陰離子複合體雖未揭示,但於將聚噻吩-聚陰離子複合體尤其是PSS作為摻雜劑之PEDOT-PSS,對化學聚合之溶劑之H2
O去除後之有機溶劑的再分散,高壓分散等之機械性處理為必要,即使進行該處理後,作為有機EL或太陽能電池等有機薄膜元件中之透明電極材料或電洞注入層的材料使用時,有於透過光之形成膜上易產生源自聚合物凝聚體的黑點等之缺陷的缺點。黏度與H2
O主溶劑系比較亦有高黏度化的傾向。此等缺點與成膜性及有機薄膜元件的亮度壽命、耐久性、生產上的產量大幅相關,在使用PEDOT-PSS,由於在使用時即使至少通液0.45μm以下之過濾膜,亦不會引起因固體成分減低導致膜厚減低的分散液為適當,故不期望該再分散處方。
又,將通用性高的PEDOT-PSS等之PSS作為摻雜劑之聚噻吩系導電性聚合物係合成法為公知,由於原料及製造品的市售品於市場上亦為數眾多,故在對有機EL或太陽能電池等有機薄膜元件的適用,雖有合適的材料,但由於於可見光有吸收,故透明性不良,且以H2
O分散液狀態凝聚性高,進而混合有機溶劑時,由於凝聚性加速,產生高黏度化或過濾純化的困難,成膜後亦於膜內大量殘留水分,有膜本身表面粗糙度亦不良,容易產生源自凝聚體之粒子性缺陷的問題。又,為了迴避凝聚,於不添加有機溶劑的狀態,由於表面張力高,於噴霧式印刷機適用時,吹附基板後,由於著液後提高液滴的接觸角,整平性低,故得不到平坦之連續膜,於基板上形成藉由液滴之組成物的海島構造或部分的膜。
於專利文獻5、6、7,提案有對於藉由選自噻吩、吡咯、苯胺、多環式芳香族化合物中之重複單位所形成之π共軛系聚合物,使用納入氟酸單元之摻雜劑聚合物,而形成之導電性聚合物組成物。表示藉由將H2
O、π共軛系聚合物之前驅體單體、氟酸聚合物及氧化劑以任意的順序組合,成為導電性聚合物之H2
O分散體。藉由導入氟酸單元,氟原子之有機溶劑親和性被賦予在摻雜劑聚合物,結果增加對與π共軛系聚合物之複合體全體的有機溶劑或對疏水性基板表面的親和性,改善對該複合體之有機溶劑的分散性或對疏水性基板之塗佈性。又,藉由於摻雜劑內導入氟酸單元,由於緩和於PSS所觀察到之強親水性,而減低成膜後之膜內殘存水分。
在專利文獻6之摻雜劑聚合物,雖由氟酸單元與PSS之構成單體即苯乙烯磺酸等之酸單元所構成,但針對從摻雜在π共軛系聚合物之磺酸末端以外之剩餘的磺酸末端所產生之H+
的量並未控制。亦即,摻雜劑聚合物(B)的重複單位全部具有磺酸末端的單元時,由於相對於構成π共軛系聚合物(A)之重複單位,未以1:1摻雜,故非摻雜狀態之摻雜劑聚合物(B)之重複單位的磺酸末端作為游離之酸存在,成膜前之液體狀態的材料的酸性度成為非常高的狀態。因此高酸性度的影響,有進行在塗佈步驟周邊基材的腐蝕的問題,進而,作為薄膜元件的構成要素,成膜乾燥後亦經由相鄰層或從層合構造的側面,於元件構造內擴散H+
,導致個別的構成層之化學性變質、機能低下,有元件全體的性能劣化,耐久性亦降低等之問題。對於該問題點,於專利文獻7,藉由添加兩性離子化合物,控制對H+
之相鄰層的擴散,由此可知,改善對由藉由選自噻吩、吡咯、苯胺、多環式芳香族化合物中之重複單位所形成之π共軛系聚合物、與納入氟酸單元之摻雜劑聚合物所構成之複合體的有機溶劑的分散性或對基板的塗佈性。
專利文獻7所記載之組成物,由於改善對前述有機溶劑的分散性或對基板的塗佈性,於旋塗法,形成平坦性高的連續膜,在藉由同手法之成膜,例如可適用作為電子束抗阻用抗靜電膜或有機EL元件中之透明電極層或電洞注入層。惟,在印刷法為將噴塗機或噴墨印刷之各種液滴吹附在基板之印刷法,適用在具有層合構造之有機EL或太陽能電池等時,與將PSS作為摻雜劑之π共軛系聚合物的複合體比較,雖改善成膜性,塗佈斑或針孔的發生、膜之平坦性不足等之問題完全無法解決,產生元件之高電壓化或發光斑、耐久性劣化等之問題。又,該組成物的溶劑為H2
O100%時,於噴塗機或噴墨印刷,藉由H2
O之揮發,於從噴嘴周邊之固體成分的固著或從噴嘴先端排出液體材料,至對基板進行著液為止之間,產生因乾燥導致之固體成分析出,有於膜附著析出物,產生有機EL元件之缺陷的問題。
[先前技術文獻]
[專利文獻]
[專利文獻1]日本特開2008-146913號公報
[專利文獻2]歐州特許出願公開第1 373 356(A)號說明書
[專利文獻3]國際公開第2003/048228(A)號小冊子
[專利文獻4]日本特開2005-068166號公報
[專利文獻5]日本特表2008-546899號公報
[專利文獻6]日本專利第6483518號公報
[專利文獻7]日本專利第6450666號公報
[發明欲解決之課題]
本發明係鑑於上述事情而完成者,以得到一種可形成過濾性良好且成膜性良好,酸性度的緩和可能,且具有高透明性之導電膜的導電性高分子化合物,賦予於基板上之整平性,並可作為藉由液滴之塗佈法之噴塗或噴墨印刷用途使用的組成物作為目的。
[用以解決課題之手段]
為了解決上述課題,於本發明,係提供一種導電性高分子組成物,其特徵為將π共軛系聚合物(A)及下述一般式(2)表示之聚合物(B)的複合體分散在H2
O(D)者,且包含水溶性的有機溶劑(C)者。
(式中,R1
為氫原子或甲基,Z為伸苯基、伸萘基、酯基、醚基、胺基或醯胺基之任一者,若Z為伸苯基、伸萘基,R2
為單鍵、酯基或醚基之任一者,或可具有此等之兩者的碳數1〜12之直鏈狀、分枝狀、環狀之烴基之任一者,若Z為酯基、醚基、胺基或醯胺基,R2
為可具有醚基之碳數1〜14之直鏈狀、分枝狀、環狀之烴基或單鍵之任一者。m為1〜3。R3
、R5
及R7
分別獨立為氫原子或甲基,R4
、R6
分別獨立為單鍵、醚基或酯基之任一者,或可具有此等之兩者的碳數1〜12之直鏈狀、分枝狀、環狀之烴基之任一者。R8
為單鍵、亞甲基、亞乙基、異亞丙基、醚基、酯基、胺基或醯胺基之任一者,或為醚基、酯基、胺基、醯胺基或可包含雜原子之碳數1〜12之直鏈狀、分枝狀、環狀之烴基之任一者,進而,胺基及醯胺基為可包含氫原子或可包含雜原子之碳數1〜12之直鏈狀、分枝狀、環狀之烴基之任一個者。X1
、X2
分別獨立為單鍵、伸苯基、伸萘基、醚基、酯基、醯胺基之任一者,X3
為單鍵、醚基、酯基之任一者。Rf1
為氟原子或三氟甲基。a、b1、b2及b3為0<a<1.0、0≦b1<1.0、0≦b2<1.0、0≦b3<1.0,為0<b1+b2+b3<1.0。n為1〜4之整數)。
如此,包含前述(A)、(B)、(C)、(D)時,藉由於可形成過濾性良好且成膜性良好,酸性度的緩和可能,且具有高透明性之導電膜的導電性高分子化合物之H2
O分散液,混合水溶性的有機溶劑,可得到賦予因表面張力、接觸角的低下導致之於基板上之整平性,並可作為藉由液滴之塗佈法之噴塗或噴墨印刷用途使用的組成物。
又,本發明之組成物較佳為表面張力為20〜50mN/m的範圍者。
表面張力如此下降時,於噴霧式印刷機適用時,吹附基板後,於著液後不提高液滴之接觸角,於基板上無法形成藉由液滴之組成物的海島構造或部分的膜。
較佳為前述(C)成分為沸點120℃以上之有機溶劑(C1)及/或未滿沸點120℃之有機溶劑(C2),相對於前述(A)成分、(B)成分、(D)成分之合計,為1.0wt%≦(C1)+(C2)≦50.0wt%。
此時,較佳為前述(C1)成分及(C2)成分為選自碳數為1〜7之醇、醚、酯、酮、腈類中之任一種。
於本發明,可使用這般的有機溶劑。
前述(B)成分中之重複單位a較佳為包含選自下述一般式(4-1)〜(4-4)表示之重複單位a1〜a4中之1種以上者。
(式中,R16
、R17
、R18
及R19
分別獨立為氫原子或甲基。R20
為可具有醚基之碳數1〜14之直鏈狀、分枝狀、環狀之烴基或單鍵之任一者,R15
為單鍵、亞甲基、亞乙基、異亞丙基、醚基、酯基、胺基或醯胺基之任一者,或為醚基、酯基、胺基、醯胺基或可包含雜原子之碳數1〜12之直鏈狀、分枝狀、環狀之烴基之任一者,進而,胺基及醯胺基為可包含氫原子或可包含雜原子之碳數1〜12之直鏈狀、分枝狀、環狀之烴基之任一個者。Y表示醚基、酯基、胺基或醯胺基之任一者,胺基及醯胺基可包含氫原子或可包含雜原子之碳數1〜12之直鏈狀、分枝狀、環狀之烴基之任一者。m為1〜3。a1、a2、a3、a4為0≦a1<1.0、0≦a2<1.0、0≦a3<1.0、0≦a4<1.0、0<a1+a2+a3+a4<1.0)。
又此時,較佳為前述(B)成分中之重複單位b1為包含選自下述一般式(5-1)〜(5-4)表示之重複單位b1’〜b4’中之1種以上者。
(式中,R21
、R22
、R23
及R24
分別獨立為氫原子或甲基,b’1、b’2、b’3、b’4為0≦b’1<1.0、0≦b’2<1.0、0≦b’3<1.0、0≦b’4<1.0、0<b’1+b’2+b’3+b’4<1.0)。
如此,作為(B)成分中之重複單位,較佳為如上述般者,提昇導電性高分子組成物之過濾性及成膜性、對有機・無機基板之塗佈性、成膜後之透過率,且對成膜後之膜內的殘存水分之減低產生效果。
藉由包含這般的重複單位c,可將膜的導電率調整成適合在用以表現用途或形成元件構成層時之有效率的機能者。
又,較佳為前述(B)成分之重量平均分子量為1,000〜500,000的範圍。
重量平均分子量為1,000以上時,耐熱性優異,且與(A)成分的複合體溶液之均一性變良好。另一方面,重量平均分子量為500,000以下時,黏度不會極度上昇,作業性變良好,不會降低對水或有機溶劑的分散性。
又此時,較佳為前述(A)成分為聚合選自由吡咯、噻吩、硒吩、碲吩、苯胺、多環式芳香族化合物及此等之衍生物所成之群組中之1種以上的前驅體單體者。
若為這般的單體,由於聚合容易,且於空氣中之安定性良好,可輕易合成(A)成分。
本發明之導電性高分子組成物作為(E)成分,較佳為包含下述一般式(3)表示者。
(式中,R201
及R202
分別獨立表示可具有雜原子之碳數1〜20之直鏈狀、分枝狀或環狀之1價烴基、氫原子、雜原子之任一者。R203
及R204
分別獨立表示可具有雜原子之碳數1〜20之直鏈狀、分枝狀或環狀之1價烴基、氫原子之任一者。R201
與R203
或R201
與R204
可彼此鍵結形成環。L表示可具有雜原子之碳數1〜20之直鏈狀、分枝狀或環狀之4價有機基。L具有雜原子時,該雜原子可為離子)。
包含(E)成分時,使用前述導電性高分子組成物作為有機EL、太陽能電池等之薄膜層合元件的電極或電洞注入層進行膜形成時,抑制對層合構造的相鄰層以及其他構成層之酸的擴散,可緩和因酸導致之影響。且若本發明之導電性高分子組成物為包含(E)成分者,於被加工體上使用前述導電性高分子組成物,作為層合構造元件的構成要素進行成膜時,進一步抑制對前述層合構造薄膜元件的相鄰層以及其他構成層之酸的擴散,可更加緩和因酸導致之影響。
又此時,較佳為前述(E)成分的含量相對於前述(A)成分與前述(B)成分的複合體100質量份,為1質量份至50質量份。
本發明之組成物較佳為進一步包含非離子系界面活性劑者。
若為這般者,可進一步提昇對基材等之被加工體的塗佈性。
又此時,較佳為前述非離子系界面活性劑的含量相對於前述(A)成分與前述(B)成分的複合體100質量份,為1質量份至15質量份。
若為這般者,對基材等之被加工體的塗佈性亦變更加良好,所形成之膜的表面平坦性亦變更加良好。
又,本發明之導電性高分子組成物較佳為使用在有機EL元件之電洞注入層的形成者。
由本發明之導電性高分子組成物所形成之導電膜由於導電性、電洞注入性、透明性優異,故可成為用作有機EL、太陽能電池等之薄膜層合元件的透明電極層或電洞注入層者。
又,於本發明,係提供一種基板,其係具有有機EL元件之基板,係藉由上述之導電性高分子組成物,而形成前述有機EL元件中之電洞注入層者。
如此,本發明之導電性高分子組成物可藉由塗佈・成膜在基板等,而成為導電膜,可提供一種形成有機EL元件中之電洞注入層之基板作為導電膜。
進而,於本發明,係提供一種具有將前述導電性高分子組成物藉由噴塗機或噴墨印刷進行塗佈之步驟的基板之製造方法。
本發明之基板可用這般的方法製造。
[發明效果]
如以上,若為本發明之導電性高分子組成物,則可提供一種低黏性且過濾性良好,對無機、有機基板的塗佈成膜性良好,進而適用在噴塗機或噴墨印刷機時亦低缺陷連續膜。又,藉由存在於摻雜劑聚合物(B)的成分中a及b之個別的重複單位內之氟原子的影響,使得成膜中之膜內殘存水分之去除為有效率的,且形成所形成之膜為透明性、平坦性、導電性或電洞注入效率良好的導電膜變可能。且(B)成分中,藉由共聚合含有磺酸基之重複單位b與不具有磺酸末端之非摻雜性氟化單元a,並將該聚合物作為摻雜劑,與(A)成分形成複合體,變成減低非摻雜狀態的剩餘磺酸末端,其結果減低H+
之發生率,於將本發明之導電性高分子組成物作為薄膜層合元件的構成膜適用時,抑制對H+
之其他構成層的影響變可能。又,藉由本發明之導電性高分子組成物所形成之導電膜係導電性、電洞注入效率、透明性等優異,且於作為薄膜層合元件的構成膜適用時,由於可減低來自膜之水分的揮發、凝聚等,故可成為有效果地用作該薄膜層合元件之透明電極層或電洞注入層者。
如上述,已尋求低黏性且過濾性良好,對無機、有機基板的塗佈成膜性良好,進而於噴塗機或噴墨印刷機適用在時亦可形成低缺陷連續膜,可有效率地去除膜內殘存水分,可形成形成膜透明性高且平坦性良好之導電膜的導電膜形成用材料的開發。
本發明者們針對上述課題進行努力研究的結果,發現藉由取代作為導電性高分子材料的摻雜劑被廣泛使用之聚苯乙烯磺酸均聚物(PSS),使用共聚合非摻雜性氟化單元a與重複單位b的摻雜劑聚合物,該重複單位b係具有例如具有α位被氟化之磺酸基的重複單位,進而於導電性高分子材料之H2
O分散液混合水溶性的有機溶劑,可形成過濾性良好且於噴塗機或噴墨印刷機適用時,於無機基板上之低缺陷連續膜形成能良好,所形成之膜中殘存水分少,且形成高透明性、高平坦性之導電膜的導電性高分子組成物,進而,藉由作為有機EL元件之構成層進行實裝,在其性能評估得到良好的結果,而完成本發明。
亦即,本發明係將π共軛系聚合物(A)及下述一般式(2)表示之聚合物(B)的複合體分散在H2
O(D)者,且包含水溶性的有機溶劑(C)者之導電性高分子組成物。
(式中,R1
為氫原子或甲基,Z為伸苯基、伸萘基、酯基、醚基、胺基或醯胺基之任一者,若Z為伸苯基、伸萘基,R2
為單鍵、酯基或醚基之任一者,或可具有此等之兩者的碳數1〜12之直鏈狀、分枝狀、環狀之烴基之任一者,若Z為酯基、醚基、胺基或醯胺基,R2
為可具有醚基之碳數1〜14之直鏈狀、分枝狀、環狀之烴基或單鍵之任一者。m為1〜3。R3
、R5
及R7
分別獨立為氫原子或甲基,R4
、R6
分別獨立為單鍵、醚基或酯基之任一者,或可具有此等之兩者的碳數1〜12之直鏈狀、分枝狀、環狀之烴基之任一者。R8
為單鍵、亞甲基、亞乙基、異亞丙基、醚基、酯基、胺基或醯胺基之任一者,或為醚基、酯基、胺基、醯胺基或可包含雜原子之碳數1〜12之直鏈狀、分枝狀、環狀之烴基之任一者,進而,胺基及醯胺基為可包含氫原子或可包含雜原子之碳數1〜12之直鏈狀、分枝狀、環狀之烴基之任一個者。X1
、X2
分別獨立為單鍵、伸苯基、伸萘基、醚基、酯基、醯胺基之任一者,X3
為單鍵、醚基、酯基之任一者。Rf1
為氟原子或三氟甲基。a、b1、b2及b3為0<a<1.0、0≦b1<1.0、0≦b2<1.0、0≦b3<1.0,為0<b1+b2+b3<1.0。n為1〜4之整數)。
以下,雖針對本發明進行詳細說明,但本發明並非被限定於此等者。
[(A)π共軛系聚合物]
本發明之導電性高分子組成物作為(A)成分,係包含π共軛系聚合物。此(A)成分若為聚合形成π共軛系連鎖(單鍵與雙鍵交互連續之構造)的前驅體單體(有機單體分子)者即可。
作為這般的前驅體單體,例如可列舉吡咯類、噻吩類、噻吩伸乙烯類、硒吩類、碲吩類、伸苯類、伸苯伸乙烯類、苯胺類等之單環式芳香族類;并苯類等之多環式芳香族類;乙炔類等,可將此等之單體的單一聚合物或共聚物作為(A)成分使用。
上述單體當中,從聚合的容易性、於空氣中之安定性的點來看,較佳為吡咯、噻吩、硒吩、碲吩、苯胺、多環式芳香族化合物及此等之衍生物,特佳為吡咯、噻吩、苯胺及此等之衍生物。
又,構成π共軛系聚合物之單體即使直接無取代,雖(A)成分亦可得到充分之導電性,但為了更加提高導電性,可使用以烷基、羧基、磺酸基、烷氧基、羥基、氰基、鹵素原子等取代之單體。
作為吡咯類、噻吩類、苯胺類之單體的具體例,可列舉吡咯、N-甲基吡咯、3-甲基吡咯、3-乙基吡咯、3-n-丙基吡咯、3-丁基吡咯、3-辛基吡咯、3-癸基吡咯、3-十二烷基吡咯、3,4-二甲基吡咯、3,4-二丁基吡咯、3-羧基吡咯、3-甲基-4-羧基吡咯、3-甲基-4-羧基乙基吡咯、3-甲基-4-羧基丁基吡咯、3-羥基吡咯、3-甲氧基吡咯、3-乙氧基吡咯、3-丁氧基吡咯、3-己基氧基吡咯、3-甲基-4-己基氧基吡咯;噻吩、3-甲基噻吩、3-乙基噻吩、3-丙基噻吩、3-丁基噻吩、3-己基噻吩、3-庚基噻吩、3-辛基噻吩、3-癸基噻吩、3-十二烷基噻吩、3-十八烷基噻吩、3-溴噻吩、3-氯噻吩、3-碘噻吩、3-氰基噻吩、3-苯基噻吩、3,4-二甲基噻吩、3,4-二丁基噻吩、3-羥基噻吩、3-甲氧基噻吩、3-乙氧基噻吩、3-丁氧基噻吩、3-己基氧基噻吩、3-庚基氧基噻吩、3-辛基氧基噻吩、3-癸基氧基噻吩、3-十二烷基氧基噻吩、3-十八烷基氧基噻吩、3,4-二羥基噻吩、3,4-二甲氧基噻吩、3,4-二乙氧基噻吩、3,4-二丙氧基噻吩、3,4-二丁氧基噻吩、3,4-二己基氧基噻吩、3,4-二庚基氧基噻吩、3,4-二辛基氧基噻吩、3,4-二癸基氧基噻吩、3,4-二十二烷基氧基噻吩、3,4-乙烯二氧噻吩、3,4-伸丙基二氧基噻吩、3,4-丁烯二氧基噻吩、3-甲基-4-甲氧基噻吩、3-甲基-4-乙氧基噻吩、3-羧基噻吩、3-甲基-4-羧基噻吩、3-甲基-4-羧基乙基噻吩、3-甲基-4-羧基丁基噻吩;苯胺、2-甲基苯胺、3-異丁基苯胺、2-甲氧基苯胺、2-乙氧基苯胺、2-苯胺磺酸、3-苯胺磺酸等。
其中,由選自吡咯、噻吩、N-甲基吡咯、3-甲基噻吩、3-甲氧基噻吩、3,4-乙烯二氧噻吩中之1種或2種所構成之(共)聚合物從電阻值、反應性的點看,適合使用。進而,藉由吡咯、3,4-乙烯二氧噻吩之單一聚合物係導電性高故更佳。
由實用上的理由來看,此等之重複單元較佳為2〜20的範圍,更佳為6〜15的範圍。作為分子量,較佳為130〜5000左右。
[(B)摻雜劑聚合物]
本發明之導電性高分子組成物作為(B)成分,係包含摻雜劑聚合物。此(B)成分之摻雜劑聚合物為下述一般式(2)表示之包含重複單位a與b的強酸性聚陰離子。形成重複單位a之單體係以下述一般式(1)表示。
(式中,R1
為氫原子或甲基,Z為伸苯基、伸萘基、酯基、醚基、胺基或醯胺基之任一者,若Z為伸苯基、伸萘基,R2
為單鍵、酯基或醚基之任一者,或可具有此等之兩者的碳數1〜12之直鏈狀、分枝狀、環狀之烴基之任一者,若Z為酯基、醚基、胺基或醯胺基,R2
為可具有醚基之碳數1〜14之直鏈狀、分枝狀、環狀之烴基或單鍵之任一者。m為1〜3。R3
、R5
及R7
分別獨立為氫原子或甲基,R4
、R6
分別獨立為單鍵、醚基或酯基之任一者,或可具有此等之兩者的碳數1〜12之直鏈狀、分枝狀、環狀之烴基之任一者。R8
為單鍵、亞甲基、亞乙基、異亞丙基、醚基、酯基、胺基或醯胺基之任一者,或為醚基、酯基、胺基、醯胺基或可包含雜原子之碳數1〜12之直鏈狀、分枝狀、環狀之烴基之任一者,進而,胺基及醯胺基為可包含氫原子或可包含雜原子之碳數1〜12之直鏈狀、分枝狀、環狀之烴基之任一個者。X1
、X2
分別獨立為單鍵、伸苯基、伸萘基、醚基、酯基、醯胺基之任一者,X3
為單鍵、醚基、酯基之任一者。Rf1
為氟原子或三氟甲基。a、b1、b2及b3為0<a<1.0、0≦b1<1.0、0≦b2<1.0、0≦b3<1.0,為0<b1+b2+b3<1.0。n為1〜4之整數)。
(B)成分中之重複單位a較佳為包含選自下述一般式(4-1)〜(4-4)表示之重複單位a1〜a4中之1種以上者。
(式中,R16
、R17
、R18
及R19
分別獨立為氫原子或甲基。R20
為可具有醚基之碳數1〜14之直鏈狀、分枝狀、環狀之烴基或單鍵之任一者,R15
為單鍵、亞甲基、亞乙基、異亞丙基、醚基、酯基、胺基或醯胺基之任一者,或為醚基、酯基、胺基、醯胺基或可包含雜原子之碳數1〜12之直鏈狀、分枝狀、環狀之烴基之任一者,進而,胺基及醯胺基亦為可包含氫原子者。Y表示醚基、酯基、胺基或醯胺基之任一者,胺基及醯胺基可包含氫原子或可包含雜原子之碳數1〜12之直鏈狀、分枝狀、環狀之烴基之任一者。m為1〜3。a1、a2、a3、a4為0≦a1<1.0、0≦a2<1.0、0≦a3<1.0、0≦a4<1.0、0<a1+a2+a3+a4<1.0)。
(B)成分中,依照相對於重複單位b,提昇重複單位a的含有率,更明確顯現本發明的效果,若為20≦a≦60,由於充分得到本發明的效果故較佳。進而,從導電性及由(A)與(B)所構成之複合體的安定性的觀點來看,重複單位a較佳為20≦a≦40。亦即,表現作為電極適用時,表現充分之機能的導電率,或作為電洞注入層適用時,表現充分之機能的電洞注入效率之妥當的範圍,較佳為20≦a≦40、60≦b≦80或20≦a≦40、60≦b+c≦80,此時較佳為c≦40。(針對c進行後述)。
作為給予重複單位a之單體,具體而言,可例示下述者。
作為(B)成分中之重複單位b1,較佳為包含選自下述一般式(5-1)〜(5-4)表示之重複單位b’1〜b’4中之1種以上者。
(式中,R21
、R22
、R23
及R24
分別獨立為氫原子或甲基,b’1、b’2、b’3、b’4為0≦b’1<1.0、0≦b’2<1.0、0≦b’3<1.0、0≦b’4<1.0、0<b’1+b’2+b’3+b’4<1.0)。
作為給予重複單位b1之單體,具體而言,可例示下述者。
作為給予重複單位b2之單體,具體而言,可例示下述者。
作為給予重複單位c之單體,具體而言,可例示下述者。
又,(B)成分之摻雜劑聚合物可具有重複單位a〜c以外之重複單位d,作為此重複單位d,例如可列舉苯乙烯系、乙烯基萘系、乙烯基矽烷系、苊烯、茚、乙烯基咔唑等。
作為給予重複單位d之單體,具體而言,可例示下述者。
作為合成(B)成分之摻雜劑聚合物的方法,例如給予上述之重複單位a〜d的單體當中,將所期望的單體於有機溶劑中加入自由基聚合起始劑,進行加熱聚合,可得到(共)聚合物之摻雜劑聚合物。
作為使用在聚合時之有機溶劑,可例示甲苯、苯、四氫呋喃、二乙基醚、二噁烷、環己烷、環戊烷、甲基乙基酮、γ-丁內酯等。
作為自由基聚合起始劑,可例示2,2’-偶氮雙異丁腈(AIBN)、2,2’-偶氮雙(2,4-二甲基戊腈)、二甲基2,2’-偶氮雙(2-甲基丙酸酯)、過氧化苯甲醯、過氧化月桂醯等。
反應溫度較佳為50〜80℃,反應時間較佳為2〜100小時,更佳為5〜20小時。
在(B)成分之摻雜劑聚合物,給予重複單位a之單體雖可為1種類,亦可為2種類以上,但較佳為組合提高聚合性之甲基丙烯醯基型與苯乙烯型的單體。
又,使用2種類以上給予重複單位a之單體時,個別的單體可進行無規共聚合,亦可以嵌段進行共聚合。作為嵌段共聚合聚合物(嵌段共聚物)時,亦期待藉由凝聚由2種類以上之重複單位a所構成之重複部分彼此,於摻雜劑聚合物周邊發生特異的構造,提昇導電率的優點。
又,給予重複單位a〜c之單體可無規進行共聚合,亦可分別以嵌段進行共聚合。此情況下,亦與上述之重複單位a的情況相同,期待藉由定為嵌段共聚物,提昇導電率的優點。
以自由基聚合進行無規共聚合時,一般為混合進行共聚合之單體或自由基聚合起始劑,並藉由加熱進行聚合之方法。與第1單體開始自由基聚合起始劑存在下聚合,並之後添加第2單體時,成為聚合物分子的單側聚合第1單體的構造,另一側聚合第2單體的構造。然而,此情況下,於中間部分已混在第1單體與第2單體的重複單位,與嵌段共聚物形態不同。以自由基聚合形成嵌段共聚物時,較佳為使用活性自由基聚合。
被稱為RAFT聚合(Reversible Addition Fragmentation chain Transfer polymerization)之活性自由基的聚合方法,由於聚合物末端之自由基經常活躍,
因此藉由以第1單體開始聚合,於消費此之階段添加第2單體,可形成藉由第1單體之重複單位的嵌段與第2單體之重複單位的嵌段之二嵌段共聚物。又,以第1單體開始聚合,於消費此之階段添加第2單體,接著,添加第3單體時,亦可形成三嵌段聚合物。
進行RAFT聚合時,有形成分子量分布(分散度)狹小之狹分散聚合物的特徵,尤其是一度添加單體,進行RAFT聚合時,可形成分子量分布更狹小之聚合物。
尚,在(B)成分之摻雜劑聚合物,較佳為以分子量分布(Mw/Mn)為1.0〜2.0,尤其是1.0〜1.5為狹分散。若為狹分散,可防止降低藉由使用此之導電性高分子組成物所形成之導電膜的透過率。
為了進行RAFT聚合,鏈轉移劑為必要,具體而言,可列舉2-氰基-2-丙基苯并硫醇酯(benzothioate)、4-氰基-4-苯基硫羰基(Carbonothioyl)硫代戊酸、2-氰基-2-丙基十二烷基三硫代碳酸鹽、4-氰基-4-[(十二烷基氫硫基硫代羰基)氫硫基]戊酸、2-(十二烷基硫代硫羰基(Carbonothioyl)硫代)-2-甲基丙酸、氰基甲基十二烷基硫代碳酸鹽、氰基甲基甲基(苯基)硫代胺基甲酸酯(carbamothioate)、雙(硫代苯甲醯)二硫化物、雙(十二烷基氫硫基硫代羰基)二硫化物。此等當中,特佳為2-氰基-2-丙基苯并硫醇酯(benzothioate)。
(B)成分之摻雜劑聚合物較佳為重量平均分子量為1,000〜500,000,更佳為2,000〜200,000的範圍者。重量平均分子量為1,000以上時,成為耐熱性優異者,且與(A)成分的複合體溶液的均一性不惡化。另一方面,重量平均分子量為500,000以下時,黏度不會極度上昇,作業性變良好,對水或有機溶劑的分散性亦成為良好者。
尚,重量平均分子量(Mw)係藉由使用水、二甲基甲醯胺(DMF)、四氫呋喃(THF)作為溶劑之凝膠滲透層析(GPC)的聚氧化乙烯、聚乙二醇或聚苯乙烯換算測定值。
尚,作為構成(B)成分之摻雜劑聚合物的單體,雖可使用具有磺酸基之單體,但將磺酸基之鋰鹽、鈉鹽、鉀鹽、銨鹽、鋶鹽作為單體使用,進行聚合反應,於聚合後可使用離子交換樹脂,變換成磺酸基。
[(A)成分與(B)成分之複合體]
本發明之導電性高分子組成物所包含之複合體,為包含上述之(A)成分之π共軛系聚合物與(B)成分之摻雜劑聚合物者,藉由(B)成分之摻雜劑聚合物配位在(A)成分之π共軛系聚合物,形成複合體。
本發明所使用之複合體較佳為可分散在H2
O,且對有機溶劑具有親和性者,相對於強疏水性的無機或有機基板,可將噴塗機及噴墨印刷機適用時之連續膜形成性或膜的平坦性變良好。
(複合體之製造方法)
由(A)成分與(B)成分所構成之複合體,可藉由例如於(B)成分之水溶液或(B)成分之水・有機溶媒混合溶液中,加入作為(A)成分之原料的單體(較佳為吡咯、噻吩、苯胺或此等之衍生物單體),添加氧化劑及視情況之氧化觸媒,並進行氧化聚合獲得。
作為氧化劑及氧化觸媒,可使用過氧二硫酸銨(過硫酸銨)、過氧二硫酸鈉(過硫酸鈉)、過氧二硫酸鉀(過硫酸鉀)等之過氧二硫酸鹽(過硫酸鹽)、氯化鐵、硫酸鐵、氯化銅等之過渡金屬化合物、氧化銀、氧化銫等之金屬氧化物、過氧化氫、臭氧等之過氧化物、過氧化苯甲醯等之有機過氧化物、氧等。
作為進行氧化聚合時所使用之反應溶媒,可使用水或水與有機溶劑的混合溶媒。於此使用之有機溶劑可與水混和,較佳為可溶解或分散(A)成分及(B)成分之有機溶劑。例如可列舉N-甲基-2-吡咯烷酮、N,N’-二甲基甲醯胺、N,N’-二甲基乙醯胺、二甲基亞碸、六亞甲基磷三醯胺等之極性溶媒、甲醇、乙醇、丙醇、丁醇等之醇類、乙二醇、丙二醇、二丙二醇、1,3-丁二醇、1,4-丁二醇、D-葡萄糖、D-葡萄糖醇、異戊二烯二醇、丁烷二醇、1,5-戊烷二醇、1,6-己烷二醇、1,9-壬烷二醇、新戊二醇等之多價脂肪族醇類、碳酸乙烯酯、碳酸丙烯酯等之碳酸酯化合物、二噁烷、四氫呋喃等之環狀醚化合物、二烷基醚、乙二醇單烷基醚、乙二醇二烷基醚、丙二醇單烷基醚、丙二醇二烷基醚、聚乙二醇二烷基醚、聚丙二醇二烷基醚等之鏈狀醚類、3-甲基-2-噁唑烷酮等之雜環化合物、乙腈、戊二腈、甲氧基乙腈、丙腈、苯甲腈等之腈化合物等。此等之有機溶劑可單獨使用,亦可作為2種類以上的混合物。此等可與水混和之有機溶劑的摻合量較佳為反應溶媒全體的50質量%以下。
又,於(B)成分之摻雜劑聚合物以外,可併用可對(A)成分之π共軛系聚合物摻雜的陰離子。作為這般的陰離子,從調整來自π共軛系聚合物之脫摻雜特性、導電性聚合物複合體的分散性、耐熱性及耐環境特性等之觀點來看,較佳為有機酸。作為有機酸,可列舉有機羧酸、酚類、有機磺酸等。
作為有機羧酸,可使用於脂肪族、芳香族、環狀脂肪族等包含一個或二個以上羧基者。例如可列舉甲酸、乙酸、草酸、苯甲酸、鄰苯二甲酸、馬來酸、富馬酸、丙二酸、酒石酸、檸檬酸、乳酸、琥珀酸、單氯乙酸、二氯乙酸、三氯乙酸、三氟乙酸、硝基乙酸、三苯基乙酸等。
作為酚類,可列舉甲酚、酚、二甲酚等之酚類。
作為有機磺酸,可使用於脂肪族、芳香族、環狀脂肪族等包含一個或二個以上磺酸基者。作為包含一個磺酸基者,例如可例示甲烷磺酸、乙烷磺酸、1-丙烷磺酸、1-丁烷磺酸、1-己烷磺酸、1-庚烷磺酸、1-辛烷磺酸、1-壬烷磺酸、1-癸烷磺酸、1-十二烷磺酸、1-十四烷磺酸、1-十五烷磺酸、2-溴乙烷磺酸、3-氯-2-羥基丙烷磺酸、三氟甲烷磺酸、黏桿菌素甲烷磺酸、2-丙烯醯胺-2-甲基丙烷磺酸、胺基甲烷磺酸、1-胺基-2-萘酚-4-磺酸、2-胺基-5-萘酚-7-磺酸、3-胺基丙烷磺酸、N-環己基-3-胺基丙烷磺酸、苯磺酸、p-甲苯磺酸、二甲苯磺酸、乙基苯磺酸、丙基苯磺酸、丁基苯磺酸、戊基苯磺酸、己基苯磺酸、庚基苯磺酸、辛基苯磺酸、壬基苯磺酸、癸基苯磺酸、十一烷基苯磺酸、十二烷基苯磺酸、十五烷基苯磺酸、十六烷基苯磺酸、2,4-二甲基苯磺酸、二丙基苯磺酸、丁基苯磺酸、4-胺基苯磺酸、o-胺基苯磺酸、m-胺基苯磺酸、4-胺基-2-氯甲苯-5-磺酸、4-胺基-3-甲基苯-1-磺酸、4-胺基-5-甲氧基-2-甲基苯磺酸、2-胺基-5-甲基苯-1-磺酸、4-胺基-2-甲基苯-1-磺酸、5-胺基-2-甲基苯-1-磺酸、4-胺基-3-甲基苯-1-磺酸、4-乙醯胺-3-氯苯磺酸、4-氯-3-硝基苯磺酸、p-氯苯磺酸、萘磺酸、甲基萘磺酸、丙基萘磺酸、丁基萘磺酸、戊基萘磺酸、二甲基萘磺酸、4-胺基-1-萘磺酸、8-氯萘-1-磺酸、萘磺酸福馬林縮聚物、三聚氰胺磺酸福馬林縮聚物等之包含磺酸基之磺酸化合物等。
作為包含二個以上磺酸基者,例如可列舉乙烷二磺酸、丁烷二磺酸、戊烷二磺酸、癸烷二磺酸、m-苯二磺酸、o-苯二磺酸、p-苯二磺酸、甲苯二磺酸、二甲苯二磺酸、氯苯二磺酸、氟苯二磺酸、苯胺-2,4-二磺酸、苯胺-2,5-二磺酸、二甲基苯二磺酸、二乙基苯二磺酸、二丁基苯二磺酸、萘二磺酸、甲基萘二磺酸、乙基萘二磺酸、十二烷基萘二磺酸、十五烷基萘二磺酸、丁基萘二磺酸、2-胺基-1,4-苯二磺酸、1-胺基-3,8-萘二磺酸、3-胺基-1,5-萘二磺酸、8-胺基-1-萘酚-3,6-二磺酸、4-胺基-5-萘酚-2,7-二磺酸、蒽二磺酸、丁基蒽二磺酸、4-乙醯胺-4’-異硫基-氰基二苯乙烯-2,2’-二磺酸、4-乙醯胺-4’-異硫氰基二苯乙烯(isothiocyanostilbene)-2,2’-二磺酸、4-乙醯胺-4’-馬來醯亞胺基二苯乙烯-2,2’-二磺酸、1-乙醯氧基芘-3,6,8-三磺酸、7-胺基-1,3,6-萘三磺酸、8-胺基萘-1,3,6-三磺酸、3-胺基-1,5,7-萘三磺酸等。
此等(B)成分以外之陰離子於(A)成分之聚合前,可添加在包含(A)成分之原料單體、(B)成分、氧化劑及/或氧化聚合觸媒的溶液,且亦可添加在聚合後之含有(A)成分與(B)成分的複合體。
如此進行所得之由(A)成分與(B)成分所構成之複合體,視需要可用均質機或球磨機等進行細粒化來使用。
細粒化中,較佳為使用可賦予高剪斷力的混合分散機。作為混合分散機,例如可列舉均質機、高壓均質機、珠磨機等,其中,較佳為高壓均質機。
作為高壓均質機之具體例,可列舉吉田機械興業公司製之NanoVater、powrex公司製之微流化器(Microfluidizer)、杉野機械公司製之Ultimaizer等。
作為使用高壓均質機之分散處理,例如可列舉將實施分散處理前之複合體溶液以高壓使其對向碰撞之處理、於孔口(Orifice)或狹縫以高壓通過之處理等。
於細粒化之前或後,藉由過濾、超過濾、透析等之手法,去除雜質,可用陽離子交換樹脂、陰離子交換樹脂、螯合樹脂等進行純化。
尚,導電性高分子化合物組成物中之(A)成分與(B)成分的合計含量較佳為0.05〜5.0質量%。若(A)成分與(B)成分之合計含量為0.05質量%以上,得到充分之導電性或電洞注入機能,若為5.0質量%以下,容易得到均一之導電性塗膜。
作為可添加在聚合反應水溶液,或可稀釋單體的有機溶劑,可列舉甲醇、乙酸乙酯、環己酮、甲基戊基酮、丁烷二醇單甲基醚、丙二醇單甲基醚、乙二醇單甲基醚、丁烷二醇單乙基醚、丙二醇單乙基醚、乙二醇單乙基醚、丙二醇二甲基醚、二乙二醇二甲基醚、丙二醇單甲基醚乙酸酯、丙二醇單乙基醚乙酸酯、丙酮酸乙酯、乙酸丁酯、3-甲氧基丙酸甲酯、3-乙氧基丙酸乙酯、乙酸tert-丁酯、丙酸t-丁酯、丙二醇單t-丁基醚乙酸酯、γ-丁內酯及此等之混合物等。
尚,有機溶劑的使用量相對於單體1莫耳,較佳為0〜1,000mL,特佳為0〜500mL。若為有機溶劑之1,000mL以下,由於反應容器不會變過大故為經濟。
[(C)成分:水溶性的有機溶劑]
於本發明,為了對基板等之被加工體提昇印刷適用性,而添加水溶性的有機溶劑。作為這般的有機溶劑,可列舉具有H2
O可溶性且在常壓之沸點為250℃以下之有機溶劑。
例如,可列舉甲醇、乙醇、丙醇、丁醇等之醇類、乙二醇、丙二醇、1,3-丙烷二醇、二乙二醇、二丙二醇、1,3-丁二醇、1,4-丁二醇、異戊二烯二醇、1,2-丁烷二醇、1,3-丁烷二醇、1,4-丁烷二醇、2,3-丁烷二醇、1,2-戊烷二醇、1,5-戊烷二醇、1,2-己烷二醇、1,6-己烷二醇、新戊二醇等之多價脂肪族醇類、二烷基醚、二甲氧基乙烷、乙二醇單烷基醚、乙二醇二烷基醚、丙二醇單烷基醚、丙二醇二烷基醚、丁烷二醇單烷基醚、聚乙二醇二烷基醚、聚丙二醇二烷基醚等之鏈狀醚類、二噁烷、四氫呋喃等之環狀醚化合物、環己酮、甲基戊基酮、乙酸乙酯、二乙二醇二甲基醚、丙二醇單甲基醚乙酸酯、丙二醇單乙基醚乙酸酯、丙酮酸乙酯、乙酸丁酯、3-甲氧基丙酸甲酯、3-乙氧基丙酸乙酯、乙酸tert-丁酯、丙酸t-丁酯、丙二醇單t-丁基醚乙酸酯、γ-丁內酯、N-甲基-2-吡咯烷酮、N,N’-二甲基甲醯胺、N,N’-二甲基乙醯胺、二甲基亞碸、六亞甲基磷三醯胺等之極性溶媒、碳酸乙烯酯、碳酸丙烯酯等之碳酸酯化合物、3-甲基-2-噁唑烷酮等之雜環化合物、乙腈、戊二腈、甲氧基乙腈、丙腈、苯甲腈等之腈化合物及此等之混合物等。
混合在由(A)及(B)所構成之複合體的H2
O分散液之有機溶劑(C)必須為水溶性有機溶劑。有機溶劑(C)將沸點120℃以上者定為(C1),將沸點未滿120℃者定為(C2),例如可將(C1)或(C2)以單獨或混合(C1)與(C2)使用,相對於(A)成分、(B)成分、(D)成分之合計,較佳為1.0wt%≦(C1)+(C2)≦為50.0wt%,進而更佳為5.0wt%≦(C1)+(C2)≦為30.0wt%。
進而,(C1)成分及(C2)成分較佳為選自碳數為1〜7之醇、醚、酯、酮、腈類中之任一種。
又,藉由於水溶性的有機溶劑使用較H2
O沸點更高之有機溶劑,於從噴嘴周邊之固體成分的析出或從噴嘴先端排出液體材料,至對基板著液為止之間,可迴避因乾燥導致之固體成分析出。
[(D)成分:H2
O]
本發明之組成物係將(A)成分與(B)成分之複合體分散在(D)成分之H2
O者,係包含水溶性的有機溶劑(C)者。作為(D)成分,例如可使用超純水。
[(E)成分]
於上述由(A)及(B)所構成之複合體的H2
O分散液混合有機溶劑(C)之組成物,可進一步加入下述一般式(3)表示之化合物(E)。
(式中,R201
及R202
分別獨立表示可具有雜原子之碳數1〜20之直鏈狀、分枝狀或環狀之1價烴基、氫原子、雜原子之任一者。R203
及R204
分別獨立表示可具有雜原子之碳數1〜20之直鏈狀、分枝狀或環狀之1價烴基、氫原子之任一者。R201
與R203
或R201
與R204
可彼此鍵結形成環。L表示可具有雜原子之碳數1〜20之直鏈狀、分枝狀或環狀之4價有機基。L具有雜原子時,該雜原子可為離子)。
包含(E)成分時,使用前述導電性高分子組成物作為有機EL、太陽能電池等之薄膜層合元件之電極或電洞注入層,進行膜形成時,抑制對層合構造的相鄰層以及其他構成層之酸的擴散,可緩和因酸導致之影響。且本發明之導電性高分子組成物若為包含(E)成分者,於被加工體上,使用前述導電性高分子組成物,作為層合構造元件之構成要素進行成膜時,進一步抑制對前述層合構造薄膜元件的相鄰層以及其他構成層之酸的擴散,可更加緩和因酸導致之影響。
在本發明,一般式(3)表示之化合物(E)可僅使用1種類,亦可混合2種類以上使用。又,可使用公知之化合物之任一種。
作為上述一般式(3)表示之化合物的構造,具體而言,可例示下述者。
又,本發明之導電性高分子組成物較佳為含有上述一般式(3)中之L可具有雜原子之碳數2〜10之直鏈狀、分枝狀或環狀之4價有機基的化合物者。
又,在本發明之導電性高分子組成物的上述一般式(3)表示之化合物及上述式(7)表示之化合物的含量,相對於上述由(A)成分與(B)成分所構成之複合體100質量份,較佳為1質量份至50質量份,進而更佳為5質量份至30質量份。若將上述一般式(3)表示之化合物及上述式(7)表示之化合物的含量定為這般者,可控制從藉由本發明之導電性高分子組成物所形成之膜,對相鄰層之H+
的擴散。
[其他成分]
(界面活性劑)
於本發明,為了進一步提昇對基板等之被加工體的濕潤性,可添加界面活性劑。作為這般的界面活性劑,可列舉非離子系、陽離子系、陰離子系之各種界面活性劑。具體而言,例如可列舉聚氧乙烯烷基醚、聚氧乙烯烷基苯基醚、聚氧乙烯羧酸酯、山梨糖醇酯、聚氧乙烯山梨糖醇酯等之非離子系界面活性劑、烷基三甲基氯化銨、烷基苄基氯化銨等之陽離子系界面活性劑、烷基或烷基烯丙基硫酸鹽、烷基或烷基烯丙基磺酸鹽、二烷基磺基琥珀酸鹽等之陰離子系界面活性劑、胺基酸型、甜菜鹼型等之兩性離子型界面活性劑等。
較佳為非離子系界面活性劑的含量相對於上述(A)成分與上述(B)成分的複合體100質量份,為1質量份至15質量份。
若為如以上所說明之本發明之導電性高分子組成物,於成膜時可效率良好地去除膜內殘存水分,可形成過濾性良好,於無機、有機基板上,於噴塗機、噴墨印刷機適用時亦連續膜形成性高且膜平坦性亦良好,透明性高之導電膜。
[基板]
於本發明,係提供一種基板,其係具有有機EL元件之基板,其特徵為藉由前述之導電性高分子組成物,形成前述有機EL元件中之電洞注入層者。
又,本發明之基板可藉由具有將前述導電性高分子組成物藉由噴塗機或噴墨印刷進行塗佈之步驟來製造。
作為基板,可列舉玻璃基板、石英基板、空白光罩基板、矽晶圓、砷化鎵晶圓、銦磷晶圓等之無機系基板、聚醯亞胺、聚對苯二甲酸乙二酯、聚碳酸酯、環烯烴聚合物、三乙醯基纖維素等之樹脂製有機基板等。
如以上,藉由於本發明之由π共軛系聚合物(A)與含有超強酸之磺酸基及非摻雜性氟化單元的(B)所構成之複合體的H2
O分散液,混合水溶性的有機溶劑(C),變成可形成低黏性且過濾性良好,於無機、有機基板上,噴塗機、噴墨印刷機適用時亦連續膜形成性高,且透明性、平坦性、耐久性及導電性合適的導電膜。又,作為源自非摻雜狀態之酸單元之H+
的擴散緩和目的,藉由添加(E)之成分,作為組成物,保持適當之酸性度,並且於成膜後亦可抑制對相鄰層之H+
擴散。若為這般的導電性高分子組成物,可成為用作電洞注入層者。
[實施例]
以下,雖使用實施例具體說明本發明,但本發明並非被限定於此等者。
[合成例1]
氮環境下於64℃攪拌之甲醇10g,將單體a”1之1.20g與單體b”1之3.75g與2,2’-偶氮雙(異丁酸)二甲酯0.12g溶解在甲醇3g之溶液耗費4小時滴下。進而,於64℃攪拌4小時。冷卻至室溫後,一邊對10g之乙酸乙酯激烈攪拌一邊滴下。過濾所產生之固形物並取出,於50℃真空乾燥15小時,而得到白色聚合物。
將所得之白色聚合物溶解在純水100g,使用離子交換樹脂,將銨鹽變換成磺酸基。19
F,1
H-NMR及GPC測定所得之聚合物時,成為以下之分析結果。
重量平均分子量(Mw)=21,000
分子量分布(Mw/Mn)=1.90
將此高分子化合物定為(聚合物1)。
[合成例2]
氮環境下於64℃攪拌之甲醇10g,將單體a”1之0.6g與單體b”1之5.00g與2,2’-偶氮雙(異丁酸)二甲酯0.12g溶解在甲醇3g之溶液耗費4小時滴下。進而,於64℃攪拌4小時。冷卻至室溫後,一邊對10g之乙酸乙酯激烈攪拌一邊滴下。過濾所產生之固形物並取出,於50℃真空乾燥15小時,而得到白色聚合物。
將所得之白色聚合物溶解在純水100g,使用離子交換樹脂,將銨鹽變換成磺酸基。19
F,1
H-NMR及GPC測定所得之聚合物時,成為以下之分析結果。
重量平均分子量(Mw)=20,500
分子量分布(Mw/Mn)=1.94
將此高分子化合物定為(聚合物2)。
[合成例3]
氮環境下於64℃攪拌之甲醇10g,將單體a”2之1.20g與單體b”1之3.75g與2,2’-偶氮雙(異丁酸)二甲酯0.12g溶解在甲醇3g之溶液耗費4小時滴下。進而,於64℃攪拌4小時。冷卻至室溫後,一邊對10g之乙酸乙酯激烈攪拌一邊滴下。過濾所產生之固形物並取出,於50℃真空乾燥15小時,而得到白色聚合物。
將所得之白色聚合物溶解在純水100g,使用離子交換樹脂,將銨鹽變換成磺酸基。19
F,1
H-NMR及GPC測定所得之聚合物時,成為以下之分析結果。
重量平均分子量(Mw)=20,000
分子量分布(Mw/Mn)=1.88
將此高分子化合物定為(聚合物3)。
[合成例4]
氮環境下於64℃攪拌之甲醇10g,將單體a”1之1.51g與單體b”2之2.55g與2,2’-偶氮雙(異丁酸)二甲酯0.12g溶解在甲醇3g之溶液耗費4小時滴下。進而,於64℃攪拌4小時。冷卻至室溫後,一邊對10g之乙酸乙酯激烈攪拌一邊滴下。過濾所產生之固形物並取出,於50℃真空乾燥15小時,而得到白色聚合物。
將所得之白色聚合物溶解在純水100g,使用離子交換樹脂,將銨鹽變換成磺酸基。19
F,1
H-NMR及GPC測定所得之聚合物時,成為以下之分析結果。
重量平均分子量(Mw)=22,000
分子量分布(Mw/Mn)=1.93
將此高分子化合物定為(聚合物4)。
[合成例5]
氮環境下於64℃攪拌之甲醇10g,將單體a”1之0.60g與單體b”2之4.07g與2,2’-偶氮雙(異丁酸)二甲酯0.12g溶解在甲醇3g之溶液耗費4小時滴下。進而,於64℃攪拌4小時。冷卻至室溫後,一邊對10g之乙酸乙酯激烈攪拌一邊滴下。過濾所產生之固形物並取出,於50℃真空乾燥15小時,而得到白色聚合物。
將所得之白色聚合物溶解在純水100g,使用離子交換樹脂,將銨鹽變換成磺酸基。19
F,1
H-NMR及GPC測定所得之聚合物時,成為以下之分析結果。
重量平均分子量(Mw)=19,500
分子量分布(Mw/Mn)=1.99
將此高分子化合物定為(聚合物5)。
[合成例6]
氮環境下於64℃攪拌之甲醇10g,將單體a”6之1.08g與單體b”1之3.75g與2,2’-偶氮雙(異丁酸)二甲酯0.12g溶解在甲醇3g之溶液耗費4小時滴下。進而,於64℃攪拌4小時。冷卻至室溫後,一邊對10g之乙酸乙酯激烈攪拌一邊滴下。過濾所產生之固形物並取出,於50℃真空乾燥15小時,而得到白色聚合物。
將所得之白色聚合物溶解在純水100g,使用離子交換樹脂,將銨鹽變換成磺酸基。19
F,1
H-NMR及GPC測定所得之聚合物時,成為以下之分析結果。
重量平均分子量(Mw)=21,500
分子量分布(Mw/Mn)=2.07
將此高分子化合物定為(聚合物6)。
[合成例7]
氮環境下於64℃攪拌之甲醇10g,將單體a”7之0.87g與單體b”1之5.00g與2,2’-偶氮雙(異丁酸)二甲酯0.12g溶解在甲醇3g之溶液耗費4小時滴下。進而,於64℃攪拌4小時。冷卻至室溫後,一邊對10g之乙酸乙酯激烈攪拌一邊滴下。過濾所產生之固形物並取出,於50℃真空乾燥15小時,而得到白色聚合物。
將所得之白色聚合物溶解在純水100g,使用離子交換樹脂,將銨鹽變換成磺酸基。19
F,1
H-NMR及GPC測定所得之聚合物時,成為以下之分析結果。
重量平均分子量(Mw)=19,500
分子量分布(Mw/Mn)=2.00
將此高分子化合物定為(聚合物7)。
[合成例8]
氮環境下於64℃攪拌之甲醇10g,將單體a”8之1.00g與單體b”1之5.00g與2,2’-偶氮雙(異丁酸)二甲酯0.12g溶解在甲醇3g之溶液耗費4小時滴下。進而,於64℃攪拌4小時。冷卻至室溫後,一邊對10g之乙酸乙酯激烈攪拌一邊滴下。過濾所產生之固形物並取出,於50℃真空乾燥15小時,而得到白色聚合物。
將所得之白色聚合物溶解在純水100g,使用離子交換樹脂,將銨鹽變換成磺酸基。19
F,1
H-NMR及GPC測定所得之聚合物時,成為以下之分析結果。
重量平均分子量(Mw)=20,000
分子量分布(Mw/Mn)=1.85
將此高分子化合物定為(聚合物8)。
[合成例9]
氮環境下於64℃攪拌之甲醇10g,將單體a”1之0.90g與單體b”5之4.60g與2,2’-偶氮雙(異丁酸)二甲酯0.12g溶解在甲醇3g之溶液耗費4小時滴下。進而,於64℃攪拌4小時。冷卻至室溫後,一邊對10g之乙酸乙酯激烈攪拌一邊滴下。過濾所產生之固形物並取出,於50℃真空乾燥15小時,而得到白色聚合物。
將所得之白色聚合物溶解在純水100g,使用離子交換樹脂,將銨鹽變換成磺酸基。19
F,1
H-NMR及GPC測定所得之聚合物時,成為以下之分析結果。
重量平均分子量(Mw)=26,000
分子量分布(Mw/Mn)=2.04
將此高分子化合物定為(聚合物9)。
[合成例10]
氮環境下於64℃攪拌之甲醇10g,將單體a”1之0.90g與單體b”6之2.35g與2,2’-偶氮雙(異丁酸)二甲酯0.12g溶解在甲醇3g之溶液耗費4小時滴下。進而,於64℃攪拌4小時。冷卻至室溫後,一邊對10g之乙酸乙酯激烈攪拌一邊滴下。過濾所產生之固形物並取出,於50℃真空乾燥15小時,而得到白色聚合物。
將所得之白色聚合物溶解在純水100g,使用離子交換樹脂,將鈉鹽變換成磺酸基。19
F,1
H-NMR及GPC測定所得之聚合物時,成為以下之分析結果。
重量平均分子量(Mw)=31,000
分子量分布(Mw/Mn)=2.11
將此高分子化合物定為(聚合物10)。
[包含聚噻吩作為π共軛系聚合物之導電性高分子複合體分散液的調製]
(調製例1)
將2.27g之3,4-乙烯二氧噻吩、與將15.0g之摻雜劑聚合物1溶解在1,000mL之超純水的溶液於30℃混合。
將藉此所得之混合溶液保持在30℃,一邊攪拌一邊緩慢添加溶解在100mL之超純水的4.99g之過硫酸鈉與1.36g之硫酸鐵的氧化觸媒溶液,並進行4小時攪拌使其反應。
於所得之反應液添加1,000mL之超純水,使用超過濾法去除約1,000mL溶液。重複此操作3次。
而且,於進行上述過濾處理之處理液,加入稀釋成200mL之10質量%的硫酸與2,000mL之離子交換水,並使用超過濾法去除約2,000mL之處理液,對此加入2,000mL之離子交換水,使用超過濾法去除約2,000mL之液。重複此操作3次。
進而,於所得之處理液加入2,000mL之離子交換水,使用超過濾法去除約2,000mL之處理液。重複此操作5次,並藉由濃縮,而得到2.5質量%之藍色的導電性高分子複合體分散液1。
超過濾條件係如下述。
超過濾膜之截留分子量:30K
橫流式
供給液流量:3,000mL/分鐘
膜分壓:0.12Pa
尚,於其他調製例亦以同樣的條件進行超過濾。
(調製例2)
除了將15.0g之摻雜劑聚合物1變更為摻雜劑聚合物2,並將3,4-乙烯二氧噻吩的摻合量變更為2.09g,將過硫酸鈉的摻合量變更為4.59g,將硫酸鐵的摻合量變更為1.25 g之外,其他以與調製例1同樣的方法進行調製,而得到導電性高分子複合體分散液2。
(調製例3)
除了將15.0g之摻雜劑聚合物1變更為摻雜劑聚合物3,並將3,4-乙烯二氧噻吩的摻合量變更為2.27g,將過硫酸鈉的摻合量變更為4.99g,將硫酸鐵的摻合量變更為1.36 g之外,其他以與調製例1同樣的方法進行調製,而得到導電性高分子複合體分散液3。
(調製例4)
除了將15.0g之摻雜劑聚合物1變更為摻雜劑聚合物4,並將3,4-乙烯二氧噻吩的摻合量變更為2.79g,將過硫酸鈉的摻合量變更為6.13g,將硫酸鐵的摻合量變更為1.67 g之外,其他以與調製例1同樣的方法進行調製,而得到導電性高分子複合體分散液4。
(調製例5)
除了將15.0g之摻雜劑聚合物1變更為摻雜劑聚合物5,並將3,4-乙烯二氧噻吩的摻合量變更為2.64g,將過硫酸鈉的摻合量變更為5.82g,將硫酸鐵的摻合量變更為1.59 g之外,其他以與調製例1同樣的方法進行調製,而得到導電性高分子複合體分散液5。
(調製例6)
除了將15.0g之摻雜劑聚合物1變更為摻雜劑聚合物6,並將3,4-乙烯二氧噻吩的摻合量變更為2.34g,將過硫酸鈉的摻合量變更為5.14g,將硫酸鐵的摻合量變更為1.40 g之外,其他以與調製例1同樣的方法進行調製,而得到導電性高分子複合體分散液6。
(調製例7)
除了將15.0g之摻雜劑聚合物1變更為摻雜劑聚合物7,並將3,4-乙烯二氧噻吩的摻合量變更為1.97g,將過硫酸鈉的摻合量變更為4.32g,將硫酸鐵的摻合量變更為1.17 g之外,其他以與調製例1同樣的方法進行調製,而得到導電性高分子複合體分散液7。
(調製例8)
除了將15.0g之摻雜劑聚合物1變更為摻雜劑聚合物8,並將3,4-乙烯二氧噻吩的摻合量變更為1.91g,將過硫酸鈉的摻合量變更為4.20g,將硫酸鐵的摻合量變更為1.12 g之外,其他以與調製例1同樣的方法進行調製,而得到導電性高分子複合體分散液8。
(調製例9)
除了將15.0g之摻雜劑聚合物1變更為摻雜劑聚合物9,並將3,4-乙烯二氧噻吩的摻合量變更為2.06g,將過硫酸鈉的摻合量變更為4.54g,將硫酸鐵的摻合量變更為1.24 g之外,其他以與調製例1同樣的方法進行調製,而得到導電性高分子複合體分散液9。
(調製例10)
除了將15.0g之摻雜劑聚合物1變更為摻雜劑聚合物10,並將3,4-乙烯二氧噻吩的摻合量變更為2.97g,將過硫酸鈉的摻合量變更為6.53g,將硫酸鐵的摻合量變更為1.78 g之外,其他以與調製例1同樣的方法進行調製,而得到導電性高分子複合體分散液10。
[包含聚噻吩作為π共軛系聚合物之導電性高分子組成物評估]
(實施例)
分別將於調製例1〜10所得之2.5質量%的導電性高分子複合體分散液,混合作為有機溶劑(C1)之PGMEA(丙二醇單甲基醚乙酸酯)10wt%、作為有機溶劑(C2)之EtOH 5wt%者定為實施例1〜10。
分別將於調製例1〜10所得之2.5質量%的導電性高分子複合體分散液,混合作為有機溶劑(C1)之PGMEA(丙二醇單甲基醚乙酸酯)10wt%、作為有機溶劑(C2)之IPA(2-丙醇)5wt%者定為實施例11〜20。
分別將於調製例1〜10所得之2.5質量%的導電性高分子複合體分散液,混合作為有機溶劑(C1)之PGMEA(丙二醇單甲基醚乙酸酯)10wt%、作為有機溶劑(C2)之t
BuOH(第三丁基醇)5wt%者定為實施例21〜30。
分別將於調製例1〜10所得之2.5質量%的導電性高分子複合體分散液,混合作為有機溶劑(C1)之PGMEA(丙二醇單甲基醚乙酸酯)15wt%、作為有機溶劑(C2)之EtOH 5wt%者定為實施例31〜40。
分別將於調製例1〜10所得之2.5質量%的導電性高分子複合體分散液,混合作為有機溶劑(C1)之PGMEA(丙二醇單甲基醚乙酸酯)15wt%、作為有機溶劑(C2)之IPA(2-丙醇)5wt%者定為實施例41〜50。
分別將於調製例1〜10所得之2.5質量%的導電性高分子複合體分散液,混合作為有機溶劑(C1)之PGMEA(丙二醇單甲基醚乙酸酯)15wt%、作為有機溶劑(C2)之t
BuOH(第三丁基醇)5wt%者定為實施例51〜60。
分別將於調製例1〜10所得之2.5質量%的導電性高分子複合體分散液,混合作為有機溶劑(C1)之PGME(丙二醇單甲基醚)10wt%、作為有機溶劑(C2)之EtOH 5wt%者定為實施例61〜70。
分別將於調製例1〜10所得之2.5質量%的導電性高分子複合體分散液,混合作為有機溶劑(C1)之PGME(丙二醇單甲基醚)10wt%、作為有機溶劑(C2)之IPA(2-丙醇)5wt%者定為實施例71〜80。
分別將於調製例1〜10所得之2.5質量%的導電性高分子複合體分散液,混合作為有機溶劑(C1)之PGME(丙二醇單甲基醚)10wt%、作為有機溶劑(C2)之t
BuOH(第三丁基醇)5wt%者定為實施例81〜90。
分別將於調製例1〜10所得之2.5質量%的導電性高分子複合體分散液,混合作為有機溶劑(C1)之PGME(丙二醇單甲基醚)15wt%、作為有機溶劑(C2)之EtOH 5wt%者定為實施例91〜100。
分別將於調製例1〜10所得之2.5質量%的導電性高分子複合體分散液,混合作為有機溶劑(C1)之PGME(丙二醇單甲基醚)15wt%、作為有機溶劑(C2)之IPA(2-丙醇)5wt%者定為實施例101〜110。
分別將於調製例1〜10所得之2.5質量%的導電性高分子複合體分散液,混合作為有機溶劑(C1)之PGME(丙二醇單甲基醚)15wt%、作為有機溶劑(C2)之t
BuOH(第三丁基醇)5wt%者定為實施例111〜120。
於上述實施例1〜120之組成物,混合一般式(3)表示之化合物(E)所包含之L-(+)-Lysine 0.43質量%及氟烷基非離子系界面活性劑FS-31(DuPont公司製),然後,使用孔徑3.00〜0.45μm之纖維素製過濾器(ADVANTEC公司製)進行過濾,調製導電性高分子組成物,分別定為組成例121〜240。
(比較例)
分別將於調製例1〜10所得之2.5質量%的導電性高分子複合體分散液定為比較例1〜10。
分別將於調製例1〜10所得之2.5質量%的導電性高分子化合物分散液,混合一般式(3)表示之化合物(E)所包含之L-(+)-Lysine 0.43質量%及氟烷基非離子系界面活性劑FS-31(DuPont公司製)者定為比較例11〜20。
將如上述進行所調製之實施例及比較例的導電性高分子組成物如以下般評估。
(過濾性)
在上述之實施例及比較例的導電性高分子複合體的組成物的調製,使用孔徑3.0〜0.20μm之再生纖維素過濾器,進行過濾時,將可過濾通液之過濾器界限孔徑示於表1-1至表1-9。
(表面張力)
使用DU NOUY式表面張力試驗機D型(伊藤製作所製),測定組成物之表面張力。將其結果示於表1-1至表1-9。
(黏度)
以導電性高分子組成物的液溫度成為25℃的方式調節。於音叉型振動式黏度計SV-10(A&D公司製)之附屬專用測定單元稱量35mL,測定剛調製後之黏度。將其結果示於表1-1至表1-9。
(pH測定)
導電性高分子組成物之pH係使用pH計D-52(堀場製作所製)測定。將其結果示於表1-1至表1-9。
(透過率)
由藉由入射角度可變之光譜橢偏儀(spectroscopic ellipsometer)(VASE)所測定之在波長636nm之折射率(n,k),算出相對於在FT=200nm之波長550nm的光線的透過率。將其結果示於表1-1至表1-9。
(導電率)
於直徑4英吋(100mm)之SiO2
晶圓上,滴下導電性聚合物組成物1.0mL後,於10秒後使用微調器,回轉塗佈在全體。回轉塗佈條件以膜厚成為100±5nm的方式調節。藉由在精密高溫機進行120℃、30分鐘烘烤,去除溶媒,而得到導電膜。
所得之導電膜的導電率(S/cm)係從使用Hiresta-UP MCP-HT450、Loresta-GP MCP-T610(皆為三菱化學公司製)所測定之表面電阻率(Ω/□)與膜厚的實測值求出。將其結果示於表1-1至表1-9。
(噴塗機成膜性)
將35mm平方之無鹼玻璃基板以UV/O3
洗淨進行10分鐘表面洗淨,並將前述導電性高分子組成物以噴塗機NVD203(Fujimori Technical Laboratory製)塗佈成膜。塗佈膜係將膜表面以光學顯微鏡及干涉顯微鏡觀察,評估連續膜之形成的有無。將結果示於表1-1至表1-9。
如表1-1至表1-9所示,於π共軛系聚合物(A)及共聚合一般式(1)記載之聚合性單體與具有氟磺酸之單體的一般式(2)記載之聚合物(B)的複合體之H2
O分散液,添加水溶性的有機溶劑(C)之導電性組成物的實施例1〜120,與比較例1〜10比較,顯示降低表面張力與黏度,縮小過界限孔徑,並成為0.20μm。又,針對pH、透過率、導電率,亦無因水溶性的有機溶劑(C)的添加導致之性能的劣化。另一方面,於藉由噴塗機之塗佈試驗,於實施例1〜120,相對於在基板上形成連續膜(平坦膜),於比較例1〜10,僅有藉由液滴之海島構造或無法被覆基板之部分膜的形成。
於實施例1〜120添加下述一般式(3)表示之化合物及非離子系界面活性劑作為(E)成分之組成物的實施例121〜240亦相同,與比較例11〜20比較,降低表面張力與黏度,縮小過界限孔徑,並成為0.20μm。又,針對pH、透過率、導電率,亦無因水溶性的有機溶劑(C)的添加導致之性能的劣化。又,於藉由噴塗機之塗佈試驗,於實施例121〜240,相對於在基板上形成連續膜(平坦膜),於比較例11〜20,僅有無法被覆基板之部分膜或斑混在者的形成。
將實施例1〜240及比較例1〜20之導電性組成物作為有機EL元件中之電洞注入層實裝,並測定各元件的亮度低下率。
於附經洗淨之ITO的玻璃基板,將實施例1之導電性組成物以成為100nm的膜厚的方式進行噴塗塗佈,作為電洞傳輸層,將α-NPD(二苯基萘基二胺)以成為80nm的膜厚的方式藉由蒸鍍進行層合。接著,作為發光層,將Alq3
(參(8-羥基喹啉)鋁錯合物以成為膜厚35nm的方式進行蒸鍍,並於其上層,將8-Liq(8-羥基喹啉根基(quinolinato)-鋰)以成為30nm的膜厚的方式進行蒸鍍。於其上以混合鎂與銀之合金,形成膜厚100nm的電極,而得到有機EL元件。將此元件以固定電流密度20mA/cm2
的高負荷狀態使其連續發光,測定亮度至成為初期亮度的70%為止的經過時間。
將此等結果示於表2-1至表2-9。
如表2-1至表2-9所示,於π共軛系聚合物(A)及共聚合一般式(1)記載之聚合性單體與具有氟磺酸之單體的一般式(2)記載之聚合物(B)的複合體之H2
O分散液,添加水溶性的有機溶劑(C)之導電性組成物的實施例1〜240,對於表1-1至1-9所示之玻璃基板上之藉由噴塗機之連續膜(平坦膜)形成,同樣於附ITO之玻璃基板上形成連續膜(平坦),將此等膜作為電洞注入層實裝之有機EL元件顯示均一發光,而得到亮度低下率(元件壽命)評估的結果。於實施例1〜120,由於未添加化合物(E),由於無法抑制從該膜對相鄰層之H+
的擴散,與實施例120〜240比較時,亮度低下率(元件壽命)雖變短,但有機EL元件進行均一發光。另一方面,於比較例1〜20,對於表1-1至1-9所示之玻璃基板上之藉由噴塗機之塗佈不良,同樣即使於附ITO之玻璃基板上亦無法形成連續膜(平坦),有機EL元件僅顯示部分發光或不均一發光,無法均一發光。由於無法進行來自膜面全體之均一發光,故無法實施亮度低下率的測定。
如以上,非常清楚明白若為本發明之導電性高分子組成物,變成可形成過濾性良好,於無機、有機基板上,於噴塗機、噴墨等之噴霧式印刷機適用時亦連續膜形成性高,所形成之膜為透明性、導電性,作為電洞注入層適當,且注入效率良好之導電膜。且(B)成分中,藉由共聚合含有磺酸基之重複單位b與不具有磺酸末端之非摻雜性氟化單元a,並將該聚合物作為摻雜劑,與(A)形成複合體,提昇成膜後之膜內殘存水分之排除效率,又,變成減低非摻雜狀態的剩餘磺酸末端,其結果減低H+
之發生率,將本發明之導電性高分子組成物作為薄膜層合元件的構成膜適用時,抑制對H+
之其他構成層的影響變可能。進而,非常明白藉由添加化合物(E),可減低對前述H+
之其他構成層的影響。若為這般的導電性高分子組成物,則對疏水性高之有機・無機基板的親和性良好,即使對於任何基板,亦使得藉由噴塗機、噴墨等之噴霧式印刷機的成膜性成為良好者。
又,藉由這般的導電性高分子組成物所形成之導電膜係導電性、電洞注入效率、透明性等優異,且即使於作為薄膜層合元件的構成膜適用時,由於可減低來自膜之水分之揮發、凝聚等,故作為該薄膜層合元件之電洞注入層,可成為有效果地進行機能者。
尚,本發明並非被限定於上述實施形態者。上述實施形態為例示,具有與本發明之申請專利範圍所記載之技術思想為實質上相同的構成,並發揮同樣作用效果者,無論何者皆包含在本發明之技術範圍。
Claims (18)
- 一種導電性高分子組成物,其特徵為將π共軛系聚合物(A)及下述一般式(2)表示之聚合物(B)的複合體分散在H2 O(D)者,且為包含水溶性的有機溶劑(C)者, (式中,R1 為氫原子或甲基,Z為伸苯基、伸萘基、酯基、醚基、胺基或醯胺基之任一者,若Z為伸苯基、伸萘基,R2 為單鍵、酯基或醚基之任一者,或可具有此等之兩者的碳數1〜12之直鏈狀、分枝狀、環狀之烴基之任一者,若Z為酯基、醚基、胺基或醯胺基,R2 為可具有醚基之碳數1〜14之直鏈狀、分枝狀、環狀之烴基或單鍵之任一者;m為1〜3;R3 、R5 及R7 分別獨立為氫原子或甲基,R4 、R6 分別獨立為單鍵、醚基或酯基之任一者,或可具有此等之兩者的碳數1〜12之直鏈狀、分枝狀、環狀之烴基之任一者;R8 為單鍵、亞甲基、亞乙基、異亞丙基、醚基、酯基、胺基或醯胺基之任一者,或為醚基、酯基、胺基、醯胺基或可包含雜原子之碳數1〜12之直鏈狀、分枝狀、環狀之烴基之任一者,進而,胺基及醯胺基為可包含氫原子或可包含雜原子之碳數1〜12之直鏈狀、分枝狀、環狀之烴基之任一個者;X1 、X2 分別獨立為單鍵、伸苯基、伸萘基、醚基、酯基、醯胺基之任一者,X3 為單鍵、醚基、酯基之任一者;Rf1 為氟原子或三氟甲基;a、b1、b2及b3為0<a<1.0、0≦b1<1.0、0≦b2<1.0、0≦b3<1.0,為0<b1+b2+b3<1.0;n為1〜4之整數)。
- 如請求項1之導電性高分子組成物,其係表面張力為20〜50mN/m的範圍者。
- 如請求項1之導電性高分子組成物,其中,前述(C)成分係沸點120℃以上之有機溶劑(C1)及/或未滿沸點120℃之有機溶劑(C2),相對於前述(A)成分、(B)成分、(D)成分之合計,為1.0wt%≦(C1)+(C2)≦50.0wt%。
- 如請求項2之導電性高分子組成物,其中,前述(C)成分係沸點120℃以上之有機溶劑(C1)及/或未滿沸點120℃之有機溶劑(C2),相對於前述(A)成分、(B)成分、(D)成分之合計,為1.0wt%≦(C1)+(C2)≦50.0wt%。
- 如請求項3之導電性高分子組成物,其中,前述(C1)成分及(C2)成分係選自碳數為1〜7之醇、醚、酯、酮、腈類中之任一種。
- 如請求項4之導電性高分子組成物,其中,前述(C1)成分及(C2)成分係選自碳數為1〜7之醇、醚、酯、酮、腈類中之任一種。
- 如請求項1至請求項6中任一項之導電性高分子組成物,其中,前述(B)成分中之重複單位a係包含選自下述一般式(4-1)〜(4-4)表示之重複單位a1〜a4中之1種以上者, (式中,R16 、R17 、R18 及R19 分別獨立為氫原子或甲基;R20 為可具有醚基之碳數1〜14之直鏈狀、分枝狀、環狀之烴基或單鍵之任一者,R15 為單鍵、亞甲基、亞乙基、異亞丙基、醚基、酯基、胺基或醯胺基之任一者,或為醚基、酯基、胺基、醯胺基或可包含雜原子之碳數1〜12之直鏈狀、分枝狀、環狀之烴基之任一者,進而,胺基及醯胺基為可包含氫原子或可包含雜原子之碳數1〜12之直鏈狀、分枝狀、環狀之烴基之任一個者;Y表示醚基、酯基、胺基或醯胺基之任一者,胺基及醯胺基可包含氫原子或可包含雜原子之碳數1〜12之直鏈狀、分枝狀、環狀之烴基之任一者;m為1〜3;a1、a2、a3、a4為0≦a1<1.0、0≦a2<1.0、0≦a3<1.0、0≦a4<1.0、0<a1+a2+a3+a4<1.0)。
- 如請求項1至請求項6中任一項之導電性高分子組成物,其中,前述(B)成分之重量平均分子量為1,000〜500,000的範圍。
- 如請求項1至請求項6之任一項之導電性高分子組成物,其中,前述(A)成分係聚合選自由吡咯、噻吩、硒吩、碲吩、苯胺、多環式芳香族化合物及此等之衍生物所成之群組中之1種以上的前驅體單體者。
- 如請求項12之導電性高分子組成物,其中,前述(E)成分的含量相對於前述(A)成分與(B)成分的複合體100質量份,為1質量份至50質量份。
- 如請求項1至請求項6中任一項之導電性高分子組成物,其係進一步包含非離子系界面活性劑者。
- 如請求項14之導電性高分子組成物,其中,前述非離子系界面活性劑的含量相對於前述(A)成分與前述(B)成分的複合體100質量份,為1質量份至15質量份。
- 如請求項1至請求項6中任一項之導電性高分子組成物,其係使用在有機EL元件之電洞注入層的形成者。
- 一種具有有機EL元件之基板,其特徵為藉由請求項1至請求項16中任一項所記載之導電性高分子組成物,形成前述有機EL元件中之電洞注入層者。
- 一種如請求項17之基板之製造方法,其特徵為具有將前述導電性高分子組成物藉由噴塗機或噴墨印刷塗佈之步驟。
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JP2008146913A (ja) | 2006-12-07 | 2008-06-26 | Shin Etsu Polymer Co Ltd | 導電性高分子溶液及び導電性塗膜 |
JP6483518B2 (ja) | 2014-05-20 | 2019-03-13 | 信越化学工業株式会社 | 導電性ポリマー複合体及び基板 |
JP6382780B2 (ja) * | 2014-09-30 | 2018-08-29 | 信越化学工業株式会社 | 導電性高分子組成物、被覆品、パターン形成方法、及び基板。 |
US9752045B2 (en) * | 2015-08-25 | 2017-09-05 | Shin-Etsu Chemical Co., Ltd. | Conductive polymer composite and substrate |
JP6450666B2 (ja) * | 2015-09-25 | 2019-01-09 | 信越化学工業株式会社 | 導電性高分子組成物、被覆品、及びパターン形成方法 |
JP6937232B2 (ja) * | 2017-12-07 | 2021-09-22 | 信越化学工業株式会社 | 導電性高分子組成物、被覆品、及びパターン形成方法 |
JP7017530B2 (ja) * | 2019-02-08 | 2022-02-08 | 信越化学工業株式会社 | 導電性ポリマー組成物及び基板 |
-
2021
- 2021-03-24 EP EP21783683.2A patent/EP4134388A4/en active Pending
- 2021-03-24 CN CN202180026714.8A patent/CN115397916A/zh active Pending
- 2021-03-24 WO PCT/JP2021/012125 patent/WO2021205873A1/ja unknown
- 2021-03-24 KR KR1020227034441A patent/KR20220164714A/ko unknown
- 2021-03-24 JP JP2022514384A patent/JPWO2021205873A1/ja active Pending
- 2021-03-24 US US17/916,899 patent/US20230159766A1/en active Pending
- 2021-03-30 TW TW110111514A patent/TW202146593A/zh unknown
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2024
- 2024-01-25 JP JP2024009698A patent/JP2024050695A/ja active Pending
Also Published As
Publication number | Publication date |
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EP4134388A4 (en) | 2024-05-01 |
CN115397916A (zh) | 2022-11-25 |
WO2021205873A1 (ja) | 2021-10-14 |
JPWO2021205873A1 (zh) | 2021-10-14 |
EP4134388A1 (en) | 2023-02-15 |
US20230159766A1 (en) | 2023-05-25 |
KR20220164714A (ko) | 2022-12-13 |
JP2024050695A (ja) | 2024-04-10 |
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