TW201029985A - Photobase generator - Google Patents

Photobase generator Download PDF

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Publication number
TW201029985A
TW201029985A TW98140941A TW98140941A TW201029985A TW 201029985 A TW201029985 A TW 201029985A TW 98140941 A TW98140941 A TW 98140941A TW 98140941 A TW98140941 A TW 98140941A TW 201029985 A TW201029985 A TW 201029985A
Authority
TW
Taiwan
Prior art keywords
compound
group
nitrogen
ring
atom
Prior art date
Application number
TW98140941A
Other languages
English (en)
Chinese (zh)
Inventor
Nobuhiko Sakai
Ayako Kuramoto
Yoji Urano
Original Assignee
Wako Pure Chem Ind Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wako Pure Chem Ind Ltd filed Critical Wako Pure Chem Ind Ltd
Publication of TW201029985A publication Critical patent/TW201029985A/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D335/00—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom
    • C07D335/04—Heterocyclic compounds containing six-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
    • C07D335/10—Dibenzothiopyrans; Hydrogenated dibenzothiopyrans
    • C07D335/12—Thioxanthenes
    • C07D335/14—Thioxanthenes with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached in position 9
    • C07D335/16—Oxygen atoms, e.g. thioxanthones
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D409/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
    • C07D409/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
    • C07D409/12—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a chain containing hetero atoms as chain links

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Hydrogenated Pyridines (AREA)
TW98140941A 2008-12-02 2009-12-01 Photobase generator TW201029985A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008306920 2008-12-02

Publications (1)

Publication Number Publication Date
TW201029985A true TW201029985A (en) 2010-08-16

Family

ID=42233280

Family Applications (1)

Application Number Title Priority Date Filing Date
TW98140941A TW201029985A (en) 2008-12-02 2009-12-01 Photobase generator

Country Status (3)

Country Link
JP (1) JP5516417B2 (ja)
TW (1) TW201029985A (ja)
WO (1) WO2010064632A1 (ja)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201217508A (en) 2010-09-08 2012-05-01 Wako Pure Chem Ind Ltd Composition for surface water-repellent treatment and water-repellent treating method for surface of semiconductor substrate using the same
JP5994235B2 (ja) * 2010-11-10 2016-09-21 大日本印刷株式会社 光塩基発生剤、感光性ポリイミド樹脂組成物、レリーフパターンの製造方法並びに物品
JP5777908B2 (ja) * 2011-03-02 2015-09-09 株式会社トクヤマデンタル 歯科コンポジットレジン用接着材
KR102026722B1 (ko) 2012-03-22 2019-09-30 가부시키가이샤 아데카 신규 화합물 및 감광성 수지조성물
JP5978138B2 (ja) * 2013-01-22 2016-08-24 株式会社Adeka 新規化合物及び感光性樹脂組成物
JP5920232B2 (ja) 2013-02-01 2016-05-18 信越化学工業株式会社 光硬化性樹脂組成物、光硬化性ドライフィルム、パターン形成方法及び電気・電子部品保護用皮膜の製造方法
JP6280919B2 (ja) * 2013-05-13 2018-02-14 和光純薬工業株式会社 チオキサンテン系化合物、塩基増殖剤及び当該塩基増殖剤を含有する塩基反応性樹脂組成物
WO2019117162A1 (ja) 2017-12-13 2019-06-20 株式会社Adeka 化合物、潜在性塩基発生剤、該化合物を含有する感光性樹脂組成物、及び硬化物
WO2020031986A1 (ja) 2018-08-07 2020-02-13 株式会社Adeka カルバモイルオキシム化合物並びに該化合物を含有する重合開始剤及び重合性組成物
JP7384418B2 (ja) 2018-08-28 2023-11-21 学校法人東京理科大学 硬化性組成物、硬化物、及び硬化物の製造方法
WO2021261498A1 (ja) 2020-06-26 2021-12-30 株式会社Adeka 組成物、硬化物及び硬化物の製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH640849A5 (de) * 1979-05-18 1984-01-31 Ciba Geigy Ag Thioxanthoncarbonsaeureester, -thioester und -amide.
US4348530A (en) * 1980-02-05 1982-09-07 Ciba-Geigy Corporation Thioxanthonecarboxylic acids, esters, thioesters and amides with reactive functional groups
JPS58120605A (ja) * 1982-01-14 1983-07-18 Nippon Kayaku Co Ltd チオキサントンスルホオキシド又はチオキサントンスルホジオキシド誘導体を用いる光重合性樹脂組成物の硬化法
JPH11269138A (ja) * 1998-03-20 1999-10-05 Mitsubishi Paper Mills Ltd 有機塩基発生剤
JP2000330270A (ja) * 1999-05-24 2000-11-30 Kunihiro Ichimura 塩基増殖剤、塩基増殖剤組成物、塩基反応性組成物及びパターン形成方法
DE10315772A1 (de) * 2003-04-07 2004-11-04 Ulrich Prof. Dr. Steiner Chemische Verbindung und Verfahren für den intramolekularen Energietransfer zur Abspaltung von labilen funktionellen Gruppen aus chemischen Verbindungen
JP5224016B2 (ja) * 2006-03-10 2013-07-03 晃二 有光 感活性エネルギー線塩基発生剤、感活性エネルギー線塩基発生剤組成物、塩基反応性組成物及びパターン形成方法
JP4997806B2 (ja) * 2006-03-29 2012-08-08 大日本印刷株式会社 感光性樹脂組成物、物品、及びネガ型パターン形成方法
CN101553549B (zh) * 2006-12-14 2013-02-20 旭化成电子材料株式会社 光产碱剂和光固化性树脂组合物
JP5386789B2 (ja) * 2007-03-29 2014-01-15 大日本印刷株式会社 光塩基発生剤、感光性樹脂組成物、及びネガ型パターン形成方法

Also Published As

Publication number Publication date
WO2010064632A1 (ja) 2010-06-10
JP5516417B2 (ja) 2014-06-11
JPWO2010064632A1 (ja) 2012-05-10

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