TW200919085A - Photosensitive resin composition and laminate thereof - Google Patents
Photosensitive resin composition and laminate thereof Download PDFInfo
- Publication number
- TW200919085A TW200919085A TW097135508A TW97135508A TW200919085A TW 200919085 A TW200919085 A TW 200919085A TW 097135508 A TW097135508 A TW 097135508A TW 97135508 A TW97135508 A TW 97135508A TW 200919085 A TW200919085 A TW 200919085A
- Authority
- TW
- Taiwan
- Prior art keywords
- group
- photosensitive resin
- substrate
- resin composition
- mass
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/06—Hydrocarbons
- C08F212/08—Styrene
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/10—Esters
- C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
- C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/10—Esters
- C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
- C08F222/106—Esters of polycondensation macromers
- C08F222/1063—Esters of polycondensation macromers of alcohol terminated polyethers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
- C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Materials For Photolithography (AREA)
- Polymerisation Methods In General (AREA)
- Laminated Bodies (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Graft Or Block Polymers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007241007 | 2007-09-18 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200919085A true TW200919085A (en) | 2009-05-01 |
TWI376573B TWI376573B (ja) | 2012-11-11 |
Family
ID=40467892
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW097135508A TW200919085A (en) | 2007-09-18 | 2008-09-16 | Photosensitive resin composition and laminate thereof |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5437072B2 (ja) |
KR (1) | KR101167536B1 (ja) |
CN (1) | CN101802710A (ja) |
TW (1) | TW200919085A (ja) |
WO (1) | WO2009038082A1 (ja) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2009116401A1 (ja) * | 2008-03-17 | 2009-09-24 | 日立化成工業株式会社 | 感光性樹脂組成物、並びにこれを用いた感光性エレメント、ソルダーレジスト及びプリント配線板 |
CN102378940A (zh) * | 2009-03-30 | 2012-03-14 | 旭化成电子材料株式会社 | 感光性树脂组合物及其层压体 |
CN102428406B (zh) * | 2009-05-20 | 2014-09-03 | 旭化成电子材料株式会社 | 感光性树脂组合物 |
KR101860155B1 (ko) * | 2010-06-08 | 2018-05-21 | 스미또모 가가꾸 가부시끼가이샤 | 감광성 수지 조성물 |
JP5697965B2 (ja) * | 2010-06-08 | 2015-04-08 | 住友化学株式会社 | 感光性樹脂組成物 |
WO2012131912A1 (ja) * | 2011-03-29 | 2012-10-04 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂組成物及びその積層体 |
JP6432511B2 (ja) * | 2013-07-23 | 2018-12-05 | 日立化成株式会社 | 投影露光用感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法、プリント配線板の製造方法及びリードフレームの製造方法 |
JPWO2022181485A1 (ja) * | 2021-02-26 | 2022-09-01 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2719799B2 (ja) * | 1988-10-14 | 1998-02-25 | 日本合成化学工業株式会社 | 感光性樹脂組成物 |
JP3196269B2 (ja) * | 1991-12-16 | 2001-08-06 | ジェイエスアール株式会社 | 液状硬化性樹脂組成物 |
JP3957364B2 (ja) * | 1997-02-06 | 2007-08-15 | 旭化成エレクトロニクス株式会社 | 光重合性組成物 |
JP2001125264A (ja) | 1999-10-25 | 2001-05-11 | Toagosei Co Ltd | 硬化型組成物 |
JP2004085781A (ja) * | 2002-08-26 | 2004-03-18 | Toagosei Co Ltd | 架橋硬化型樹脂組成物 |
JP4346315B2 (ja) * | 2003-01-14 | 2009-10-21 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂組成物およびその用途 |
JP4300847B2 (ja) * | 2003-04-01 | 2009-07-22 | Jsr株式会社 | 感光性樹脂膜およびこれからなる硬化膜 |
JP4360242B2 (ja) * | 2004-03-24 | 2009-11-11 | Jsr株式会社 | ネガ型感放射線性樹脂組成物 |
JP2006259716A (ja) * | 2005-02-21 | 2006-09-28 | Toray Ind Inc | 感光性着色組成物およびカラーフィルター |
JP4578269B2 (ja) * | 2005-02-23 | 2010-11-10 | 旭化成イーマテリアルズ株式会社 | 光重合性樹脂組成物 |
US7358283B2 (en) | 2005-04-01 | 2008-04-15 | 3D Systems, Inc. | Radiation curable compositions useful in image projection systems |
JP4749305B2 (ja) * | 2005-10-05 | 2011-08-17 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂組成物及び積層体 |
-
2008
- 2008-09-16 TW TW097135508A patent/TW200919085A/zh unknown
- 2008-09-17 JP JP2009533153A patent/JP5437072B2/ja active Active
- 2008-09-17 WO PCT/JP2008/066756 patent/WO2009038082A1/ja active Application Filing
- 2008-09-17 KR KR1020107001284A patent/KR101167536B1/ko active IP Right Grant
- 2008-09-17 CN CN200880107510A patent/CN101802710A/zh active Pending
Also Published As
Publication number | Publication date |
---|---|
WO2009038082A1 (ja) | 2009-03-26 |
JPWO2009038082A1 (ja) | 2011-01-06 |
KR20100027227A (ko) | 2010-03-10 |
CN101802710A (zh) | 2010-08-11 |
KR101167536B1 (ko) | 2012-07-20 |
TWI376573B (ja) | 2012-11-11 |
JP5437072B2 (ja) | 2014-03-12 |
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