TW200710048A - Free-formed quartz glass ingots and method for making the same - Google Patents

Free-formed quartz glass ingots and method for making the same

Info

Publication number
TW200710048A
TW200710048A TW095119025A TW95119025A TW200710048A TW 200710048 A TW200710048 A TW 200710048A TW 095119025 A TW095119025 A TW 095119025A TW 95119025 A TW95119025 A TW 95119025A TW 200710048 A TW200710048 A TW 200710048A
Authority
TW
Taiwan
Prior art keywords
quartz glass
free
making
same
glass ingots
Prior art date
Application number
TW095119025A
Other languages
English (en)
Other versions
TWI419849B (zh
Inventor
Michael Peter Winnen
Todd R Springer
Original Assignee
Gen Electric
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gen Electric filed Critical Gen Electric
Publication of TW200710048A publication Critical patent/TW200710048A/zh
Application granted granted Critical
Publication of TWI419849B publication Critical patent/TWI419849B/zh

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B20/00Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B26HAND CUTTING TOOLS; CUTTING; SEVERING
    • B26BHAND-HELD CUTTING TOOLS NOT OTHERWISE PROVIDED FOR
    • B26B29/00Guards or sheaths or guides for hand cutting tools; Arrangements for guiding hand cutting tools
    • B26B29/06Arrangements for guiding hand cutting tools
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00Other methods of shaping glass
    • C03B19/02Other methods of shaping glass by casting molten glass, e.g. injection moulding
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B26HAND CUTTING TOOLS; CUTTING; SEVERING
    • B26BHAND-HELD CUTTING TOOLS NOT OTHERWISE PROVIDED FOR
    • B26B11/00Hand knives combined with other implements, e.g. with corkscrew, with scissors, with writing implement
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B26HAND CUTTING TOOLS; CUTTING; SEVERING
    • B26BHAND-HELD CUTTING TOOLS NOT OTHERWISE PROVIDED FOR
    • B26B3/00Hand knives with fixed blades
    • B26B3/08Hand knives with fixed blades specially adapted for cutting cardboard, or wall, floor, or like covering materials
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C10/00Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
    • C03C10/0009Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing silica as main constituent
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/06Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00Type of glass produced
    • C03B2201/02Pure silica glass, e.g. pure fused quartz
    • C03B2201/03Impurity concentration specified
    • C03B2201/04Hydroxyl ion (OH)
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00Type of glass produced
    • C03B2201/06Doped silica-based glasses
    • C03B2201/07Impurity concentration specified
    • C03B2201/075Hydroxyl ion (OH)
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00Glass compositions
    • C03C2201/06Doped silica-based glasses
    • C03C2201/20Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/23Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00Technologies relating to the processing of minerals
    • Y02P40/50Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57Improving the yield, e-g- reduction of reject rates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Forests & Forestry (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Glass Compositions (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
TW095119025A 2005-06-10 2006-05-29 自由成型的石英玻璃塊及其製法 TWI419849B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US68950705P 2005-06-10 2005-06-10
US11/266,638 US20060281623A1 (en) 2005-06-10 2005-11-03 Free-formed quartz glass ingots and method for making the same

Publications (2)

Publication Number Publication Date
TW200710048A true TW200710048A (en) 2007-03-16
TWI419849B TWI419849B (zh) 2013-12-21

Family

ID=37440122

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095119025A TWI419849B (zh) 2005-06-10 2006-05-29 自由成型的石英玻璃塊及其製法

Country Status (7)

Country Link
US (2) US20060281623A1 (zh)
JP (1) JP5068015B2 (zh)
KR (1) KR101287275B1 (zh)
DE (1) DE102005057194B4 (zh)
FR (1) FR2886934B1 (zh)
NL (1) NL1031227C2 (zh)
TW (1) TWI419849B (zh)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060281623A1 (en) 2005-06-10 2006-12-14 General Electric Company Free-formed quartz glass ingots and method for making the same
US8857214B2 (en) * 2011-11-18 2014-10-14 Sunedison Semiconductor Limited Methods for producing crucibles with a reduced amount of bubbles
US8524319B2 (en) 2011-11-18 2013-09-03 Memc Electronic Materials, Inc. Methods for producing crucibles with a reduced amount of bubbles
CN103224326B (zh) * 2013-04-14 2015-03-11 久智光电子材料科技有限公司 一种用于制备低水峰大直径光纤预制棒套管的制备方法
JP6208576B2 (ja) * 2013-12-24 2017-10-04 信越石英株式会社 成型用型及び石英ガラスインゴットの成型方法
KR101690988B1 (ko) 2014-11-18 2016-12-29 한국세라믹기술원 석영 유리 잉곳의 사이즈-업 방법
KR101806791B1 (ko) 2015-09-03 2017-12-08 한국세라믹기술원 대면적 석영 유리 잉곳의 제조방법
TWI788278B (zh) 2015-12-18 2023-01-01 德商何瑞斯廓格拉斯公司 由均質石英玻璃製得之玻璃纖維及預成型品
US11299417B2 (en) 2015-12-18 2022-04-12 Heraeus Quarzglas Gmbh & Co. Kg Preparation of a quartz glass body in a melting crucible of refractory metal
WO2017103160A1 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Herstellung von quarzglaskörpern aus siliziumdioxidgranulat
TWI733723B (zh) 2015-12-18 2021-07-21 德商何瑞斯廓格拉斯公司 不透明石英玻璃體的製備
JP6881777B2 (ja) 2015-12-18 2021-06-02 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 合成石英ガラス粒の調製
US10730780B2 (en) 2015-12-18 2020-08-04 Heraeus Quarzglas Gmbh & Co. Kg Preparation of a quartz glass body in a multi-chamber oven
CN108698888A (zh) 2015-12-18 2018-10-23 贺利氏石英玻璃有限两合公司 在石英玻璃制备中作为中间物的经碳掺杂的二氧化硅颗粒的制备
WO2017103123A2 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Herstellung von quarzglaskörpern mit taupunktkontrolle im schmelzofen
WO2017103124A2 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Erhöhen des siliziumgehalts bei der herstellung von quarzglas
TWI808933B (zh) 2015-12-18 2023-07-21 德商何瑞斯廓格拉斯公司 石英玻璃體、二氧化矽顆粒、光導、施照體、及成型體及其製備方法
CN107487985B (zh) * 2017-08-30 2023-06-09 嘉善冠得光学玻璃有限公司 光学玻璃材料浇铸车
CN109437551B (zh) * 2018-12-12 2020-12-15 长飞光纤光缆股份有限公司 一种利用尾料制备高纯石英材料的方法
KR102132252B1 (ko) 2019-03-07 2020-07-09 비씨엔씨 주식회사 쿼츠 재가공 방법
KR102566720B1 (ko) 2022-12-23 2023-08-14 비씨엔씨 주식회사 쿼츠 재가공 방법

Family Cites Families (47)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2038627A (en) * 1935-07-18 1936-04-28 Corning Glass Works Method of making glass
US2382187A (en) * 1942-08-25 1945-08-14 Stevenson Jordan & Harrison In Apparatus for treating glass
US3093456A (en) * 1958-09-02 1963-06-11 Texas Instruments Inc Method for recovery and reuse of quartz containers
US3764286A (en) * 1971-04-22 1973-10-09 Gen Electric Manufacture of elongated fused quartz member
US4122293A (en) * 1977-04-19 1978-10-24 Georgy Mikhailovich Grigorenko Feed system for plasma-arc furnace
JPS5746671Y2 (zh) * 1977-08-11 1982-10-14
US4200621A (en) * 1978-07-18 1980-04-29 Motorola, Inc. Sequential purification and crystal growth
JPS6015566B2 (ja) * 1979-11-05 1985-04-20 昭和電工株式会社 溶融シリカの連続製造装置
DE3226451C2 (de) * 1982-07-15 1984-09-27 Heraeus Quarzschmelze Gmbh, 6450 Hanau Verfahren zur Herstellung von schlierenfreien, blasenfreien und homogenen Quarzglasplatten und Vorrichtung zur Durchführung des Verfahrens
JPH0243720B2 (ja) * 1982-09-10 1990-10-01 Toshiba Ceramics Co Handotaishoryosekieigarasuseiroshinkan
JPS59164644A (ja) 1983-03-11 1984-09-17 Denki Kagaku Kogyo Kk 溶融石英インゴツトの製法
JPS6071593A (ja) * 1983-09-26 1985-04-23 Fujitsu Ltd 結晶成長方法
JPS60141630A (ja) 1983-12-27 1985-07-26 Toshiba Ceramics Co Ltd ガラス管製造装置
EP0173961B1 (en) * 1984-08-30 1991-01-23 Japan Oxygen Co., Ltd. Process for the production of glass
JPS61122131A (ja) 1984-11-14 1986-06-10 Toshiba Ceramics Co Ltd 溶融石英の製造方法及び装置
CA1271316A (en) * 1984-12-21 1990-07-10 Koichi Abe Optical waveguide manufacture
JPS643027A (en) * 1987-06-26 1989-01-06 Nkk Corp Production of silicic acid
JP2630613B2 (ja) 1988-02-29 1997-07-16 東芝セラミックス株式会社 円筒状透明石英ガラスインゴットの製造方法
JPH029727A (ja) * 1988-06-28 1990-01-12 Sumitomo Electric Ind Ltd 光フアイバ用母材の製造方法
JPH03153537A (ja) 1989-11-09 1991-07-01 Toshiba Ceramics Co Ltd 石英ガラスインゴットの製造法
US6012304A (en) * 1991-09-30 2000-01-11 Loxley; Ted A. Sintered quartz glass products and methods for making same
JPH05178632A (ja) * 1991-12-26 1993-07-20 Asahi Glass Co Ltd 光学用高耐熱性石英ガラスとその製造方法
DE4204406C2 (de) * 1992-02-14 1995-04-06 Heraeus Quarzglas Verfahren zur Herstellung eines homogenen, schlierenfreien Körpers aus Quarzglas oder aus einem hochkieselsäurehaltigen Glas durch Umformen eines stabförmigen Ausgangskörpers
GB9210327D0 (en) * 1992-05-14 1992-07-01 Tsl Group Plc Heat treatment facility for synthetic vitreous silica bodies
JPH08133753A (ja) * 1994-10-31 1996-05-28 Tosoh Corp 光学用合成石英ガラス及びその製造方法並びにその用途
JPH08290928A (ja) * 1995-04-17 1996-11-05 Tosoh Corp 透明石英ガラス板の製造方法
JP3188624B2 (ja) * 1995-12-27 2001-07-16 信越石英株式会社 遠紫外線用高純度合成シリカガラス及びその製造方法
US5934893A (en) * 1996-01-05 1999-08-10 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Burner and utilization of such burner in glass furnace
DE69739984D1 (de) * 1996-12-09 2010-10-21 Shinetsu Chemical Co Verfahren und Vorrichtung zum Herstellen einer Glasvorform für optische Fasern durch Ziehen einer Vorform
JP2001524920A (ja) * 1997-05-15 2001-12-04 ショット エムエル ゲーエムベーハー 均一でストリークのない石英ガラス板の製造方法および装置
EP0917523B1 (en) * 1997-05-20 2003-07-30 Heraeus Quarzglas GmbH & Co. KG Synthetic silica glass used with uv-rays and method producing the same
JP2001220157A (ja) * 2000-02-01 2001-08-14 Tosoh Corp 非晶質合成シリカ粉体及びこれを用いたガラス成形体
JP2002037637A (ja) 2000-07-26 2002-02-06 Tosoh Quartz Corp 溶融石英ガラスの製造方法
JP4509342B2 (ja) 2000-09-21 2010-07-21 東ソー・クォーツ株式会社 長尺石英ガラスの製造方法及びその装置
US6502422B1 (en) * 2000-10-27 2003-01-07 General Electric Company Method for quartz crucible fabrication
US6422861B1 (en) * 2000-11-20 2002-07-23 General Electric Company Quartz fusion furnace and method for forming quartz articles
US6534966B2 (en) * 2001-05-10 2003-03-18 Linear Technology Corporation Methods and apparatus for power measuring receiver
JP3498182B2 (ja) * 2001-12-05 2004-02-16 東芝セラミックス株式会社 半導体用シリカガラス部材とその製造方法
DE10159962A1 (de) 2001-12-06 2003-07-03 Heraeus Quarzglas Quarzglasrohling für ein optisches Bauteil sowie Verfahren zur Herstellung und Verwendung desselben
JP2003292337A (ja) 2002-04-01 2003-10-15 Tosoh Corp プラズマ耐食性石英ガラス、その製造方法及びこれを用いた装置
US7074033B2 (en) * 2003-03-22 2006-07-11 David Lloyd Neary Partially-open fired heater cycle providing high thermal efficiencies and ultra-low emissions
US7155936B2 (en) * 2003-08-08 2007-01-02 Corning Incorporated Doped silica glass articles and methods of forming doped silica glass boules and articles
DE102004017031B4 (de) * 2004-04-02 2008-10-23 Heraeus Quarzglas Gmbh & Co. Kg Optisches Bauteil aus Quarzglas, Verfahren zur Herstellung des Bauteils und Verwendung desselben
US7365037B2 (en) 2004-09-30 2008-04-29 Shin-Etsu Quartz Products Co., Ltd. Quartz glass having excellent resistance against plasma corrosion and method for producing the same
US7589039B2 (en) * 2004-12-29 2009-09-15 Corning Incorporated Synthetic silica having low polarization-induced birefringence, method of making same and lithographic device comprising same
US20060281623A1 (en) 2005-06-10 2006-12-14 General Electric Company Free-formed quartz glass ingots and method for making the same
WO2012074934A1 (en) * 2010-11-30 2012-06-07 Rec Silicon Inc. Feedstock melting and casting system and process

Also Published As

Publication number Publication date
DE102005057194B4 (de) 2020-11-12
US9290404B2 (en) 2016-03-22
NL1031227C2 (nl) 2007-03-01
DE102005057194A1 (de) 2006-12-14
JP2006342041A (ja) 2006-12-21
JP5068015B2 (ja) 2012-11-07
FR2886934B1 (fr) 2015-04-24
KR20060128619A (ko) 2006-12-14
US20140123705A1 (en) 2014-05-08
KR101287275B1 (ko) 2013-07-17
US20060281623A1 (en) 2006-12-14
NL1031227A1 (nl) 2006-12-12
TWI419849B (zh) 2013-12-21
FR2886934A1 (fr) 2006-12-15

Similar Documents

Publication Publication Date Title
TW200710048A (en) Free-formed quartz glass ingots and method for making the same
EP1956119A4 (en) QUARTZ GLASS LEAD, MANUFACTURING METHOD THEREFOR AND USE
EP2194166A4 (en) QUARTZ GLASS LEVER, PROCESS FOR ITS MANUFACTURE AND PRODUCTION PROCESS
MY185128A (en) Method for manufacturing stone material using molten slag
MX343756B (es) Microorganismo que produce o-fosfoserina y metodo para producir l-cisteina o derivados de la misma a partir de o-fosfoserina usando los mismos.
WO2011043552A3 (en) Quartz crucible and method of manufacturing the same
EA201100569A1 (ru) СПОСОБ ПОЛУЧЕНИЯ SiOВЫСОКОЙ ЧИСТОТЫ ИЗ РАСТВОРОВ СИЛИКАТОВ
EP1893320B8 (en) Materials purification by treatment with hydrogen-based plasma
NZ591238A (en) Method for producing high-purity silicon carbide from hydrocarbons and silicon oxide through calcination
IL210300A0 (en) Method for producing quartz glass doped with nitrogen and quartz glass grains suitable for carrying out the method
EA201100567A1 (ru) СПОСОБ ПОЛУЧЕНИЯ SiOВЫСОКОЙ ЧИСТОТЫ ИЗ РАСТВОРОВ СИЛИКАТОВ
EP2172432A4 (en) METHOD FOR PRODUCING A QUARTZ GLASS TAIL AND DEVICE FOR PRODUCING THE QUARTZ GLASS TIEGEL
EP2647602A4 (en) GLASS FUSION DEVICE, METHOD FOR MODIFYING GLASS DRAFT, METHOD FOR PRODUCING MOLTEN GLASS, METHOD FOR PRODUCING GLASSWARE, AND GLASSWARE PRODUCTION APPARATUS
TW200942655A (en) Method for producing group III nitride wafers and group III nitride wafers
NZ590955A (en) Production of silicon by reacting silicon oxide and silicon carbide, optionally in the presence of a second carbon source
EP2251461A4 (en) QUARTZ GLASS CUP AND METHOD FOR MANUFACTURING THE SAME
MX2007010141A (es) Procesos para la preparacion de intermedios de linezolid.
EP3473602A4 (en) PRESENTATION FOR THE PRODUCTION OF A SILICON GLASS TIEGEL AND METHOD FOR THE PRODUCTION OF A SILICON GLASS TIEGEL
TW200626515A (en) Perform production apparatus and perform production method
WO2014049382A3 (en) Ethylenediamine fermentative production by a recombinant microorganism
WO2010058427A3 (en) Process for production and purification of polymyxin b sulfate
NZ703382A (en) Syngas fermentation process and medium
TW201130156A (en) Sapphire single crystal for producing sapphire single crystal substrate for LED, sapphire single crystal substrate for LED, light-eliciting element, and method for preparing the same
IL210143A (en) Process for the preparation of a car containing n-ethylmethylamine of high purity
TW200732270A (en) Dielectric glass-ceramic composition, dielectric glass-ceramic substrate and manufacturing method thereof