TW200604097A - Silica sol and manufacturing method therefor - Google Patents

Silica sol and manufacturing method therefor

Info

Publication number
TW200604097A
TW200604097A TW094101169A TW94101169A TW200604097A TW 200604097 A TW200604097 A TW 200604097A TW 094101169 A TW094101169 A TW 094101169A TW 94101169 A TW94101169 A TW 94101169A TW 200604097 A TW200604097 A TW 200604097A
Authority
TW
Taiwan
Prior art keywords
silica sol
silica
sol
manufacturing
concentration
Prior art date
Application number
TW094101169A
Other languages
English (en)
Chinese (zh)
Other versions
TWI320028B (enExample
Inventor
Yasuhiro Yamakawa
Yoshiaki Tomoda
Keiji Toyama
Masatoshi Sakai
Original Assignee
Fuso Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2004217655A external-priority patent/JP4011566B2/ja
Application filed by Fuso Chemical Co Ltd filed Critical Fuso Chemical Co Ltd
Publication of TW200604097A publication Critical patent/TW200604097A/zh
Application granted granted Critical
Publication of TWI320028B publication Critical patent/TWI320028B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/141—Preparation of hydrosols or aqueous dispersions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Catalysts (AREA)
TW094101169A 2004-07-26 2005-01-14 Silica sol and manufacturing method therefor TW200604097A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004217655A JP4011566B2 (ja) 2003-07-25 2004-07-26 シリカゾル及びその製造方法

Publications (2)

Publication Number Publication Date
TW200604097A true TW200604097A (en) 2006-02-01
TWI320028B TWI320028B (enExample) 2010-02-01

Family

ID=35786010

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094101169A TW200604097A (en) 2004-07-26 2005-01-14 Silica sol and manufacturing method therefor

Country Status (3)

Country Link
US (1) US20070237701A1 (enExample)
TW (1) TW200604097A (enExample)
WO (1) WO2006011252A1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107848811A (zh) * 2015-07-31 2018-03-27 福吉米株式会社 二氧化硅溶胶的制造方法
US12371331B2 (en) 2017-03-30 2025-07-29 Fujimi Incorporated Method for producing silica sol

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008123373A1 (ja) * 2007-03-27 2008-10-16 Fuso Chemical Co., Ltd. コロイダルシリカ及びその製造方法
KR100945198B1 (ko) 2007-11-22 2010-03-03 한국전기연구원 유기용제형 실리카 졸 및 그 제조방법
CN102164853B (zh) * 2008-09-26 2014-12-31 扶桑化学工业株式会社 含有具有弯曲结构和/或分支结构的二氧化硅二次颗粒的胶体二氧化硅及其制造方法
EP2440328B1 (en) * 2009-06-12 2016-08-17 Albemarle Europe Sprl. Sapo molecular sieve catalysts and their preparation and uses
JP2011171689A (ja) 2009-07-07 2011-09-01 Kao Corp シリコンウエハ用研磨液組成物
US9249028B2 (en) 2010-02-08 2016-02-02 Momentive Performance Materials Inc. Method for making high purity metal oxide particles and materials made thereof
US8197782B2 (en) 2010-02-08 2012-06-12 Momentive Performance Materials Method for making high purity metal oxide particles and materials made thereof
WO2013085574A1 (en) 2011-07-29 2013-06-13 Momentive Performance Materials, Inc. Method for making high purity metal oxide particles and materials made thereof
WO2013035742A1 (ja) * 2011-09-05 2013-03-14 日産化学工業株式会社 精製された珪酸アルカリ水溶液及びシリカゾルの製造方法
TWI681929B (zh) * 2011-12-28 2020-01-11 日揮觸媒化成股份有限公司 高純度氧化矽溶膠及其製造方法
KR102205327B1 (ko) * 2013-06-10 2021-01-19 닛산 가가쿠 가부시키가이샤 실리카 졸 및 실리카 졸의 제조 방법
WO2019098257A1 (ja) 2017-11-16 2019-05-23 日揮触媒化成株式会社 シリカ粒子の分散液及びその製造方法
WO2019189610A1 (ja) * 2018-03-30 2019-10-03 日揮触媒化成株式会社 シリカ粒子分散液、研磨組成物及びシリカ粒子分散液の製造方法
JP2024530709A (ja) 2021-08-19 2024-08-23 メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング シリカ粒子を製造するための方法、かかる方法によって製造されるシリカ粒子、かかるシリカ粒子の組成物および使用
JP7782174B2 (ja) * 2021-09-15 2025-12-09 三菱ケミカル株式会社 シリカゾルの製造方法、研磨方法、半導体ウェハの製造方法及び半導体デバイスの製造方法
JP7782173B2 (ja) * 2021-09-15 2025-12-09 三菱ケミカル株式会社 シリカゾルの製造方法、研磨方法、半導体ウェハの製造方法及び半導体デバイスの製造方法
CN114195154A (zh) * 2021-12-27 2022-03-18 于向真 一种以水玻璃生产硅溶胶的制备方法
CN114479973B (zh) * 2022-01-14 2023-06-30 安徽理工大学 一种利用新型无机纳米环保材料提高松散厚煤层强度的方法
CN115404008A (zh) * 2022-07-29 2022-11-29 深圳市永霖科技有限公司 一种含碱性基团的硅晶圆边缘抛光液
CN115893428A (zh) * 2022-12-30 2023-04-04 苏州西丽卡电子材料有限公司 一种超高纯二氧化硅溶胶的浓缩方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3673104A (en) * 1969-04-28 1972-06-27 Nalco Chemical Co Method of preparing silica sols containing large particle size silica
US4054536A (en) * 1974-12-23 1977-10-18 Nalco Chemical Company Preparation of aqueous silica sols free of alkali metal oxides
JPS6374911A (ja) * 1986-09-19 1988-04-05 Shin Etsu Chem Co Ltd 微細球状シリカの製造法
US5230833A (en) * 1989-06-09 1993-07-27 Nalco Chemical Company Low sodium, low metals silica polishing slurries
US5102763A (en) * 1990-03-19 1992-04-07 Xerox Corporation Toner compositions containing colored silica particles
JP2001002411A (ja) * 1999-06-15 2001-01-09 Asahi Denka Kogyo Kk 水性シリカゾルの製造方法
US6569908B2 (en) * 2000-01-19 2003-05-27 Oji Paper Co., Ltd. Dispersion of silica particle agglomerates and process for producing the same
US7347986B2 (en) * 2001-09-14 2008-03-25 Showa Denko K.K. Silica-coated mixed crystal oxide particle, production process thereof and cosmetic material using the same
US6652612B2 (en) * 2001-11-15 2003-11-25 Catalysts & Chemicals Industries Co., Ltd. Silica particles for polishing and a polishing agent
KR100487194B1 (ko) * 2002-06-27 2005-05-03 삼성전자주식회사 콜로이드계 실리카 조성물 및 그 제조방법
JP4130614B2 (ja) * 2003-06-18 2008-08-06 株式会社東芝 半導体装置の製造方法
JP4566645B2 (ja) * 2003-07-25 2010-10-20 扶桑化学工業株式会社 シリカゾル及びその製造方法

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107848811A (zh) * 2015-07-31 2018-03-27 福吉米株式会社 二氧化硅溶胶的制造方法
US10604411B2 (en) 2015-07-31 2020-03-31 Fujimi Incorporated Method for producing silica sol
US11001501B2 (en) 2015-07-31 2021-05-11 Fujimi Incorporated Method for producing silica sol
CN107848811B (zh) * 2015-07-31 2021-11-05 福吉米株式会社 二氧化硅溶胶的制造方法
TWI747171B (zh) * 2015-07-31 2021-11-21 日商福吉米股份有限公司 二氧化矽溶膠的製造方法
TWI746453B (zh) * 2015-07-31 2021-11-21 日商福吉米股份有限公司 二氧化矽溶膠的製造方法
US12371331B2 (en) 2017-03-30 2025-07-29 Fujimi Incorporated Method for producing silica sol

Also Published As

Publication number Publication date
TWI320028B (enExample) 2010-02-01
US20070237701A1 (en) 2007-10-11
WO2006011252A1 (ja) 2006-02-02

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