TW200529300A - Deposition system and deposition method - Google Patents

Deposition system and deposition method Download PDF

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Publication number
TW200529300A
TW200529300A TW093131721A TW93131721A TW200529300A TW 200529300 A TW200529300 A TW 200529300A TW 093131721 A TW093131721 A TW 093131721A TW 93131721 A TW93131721 A TW 93131721A TW 200529300 A TW200529300 A TW 200529300A
Authority
TW
Taiwan
Prior art keywords
film
gas
temperature
silicon
reaction vessel
Prior art date
Application number
TW093131721A
Other languages
English (en)
Chinese (zh)
Other versions
TWI336906B (enExample
Inventor
Masaki Kurokawa
Norifumi Kimura
Takehiko Fujita
Yoshikazu Furusawa
Katsuhiko Komori
Kazuhide Hasebe
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW200529300A publication Critical patent/TW200529300A/zh
Application granted granted Critical
Publication of TWI336906B publication Critical patent/TWI336906B/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/24—Deposition of silicon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/42—Silicides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/56—After-treatment
    • H10D64/01314—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/60—Electrodes characterised by their materials
    • H10D64/66—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes
    • H10D64/667—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes the conductor comprising a layer of alloy material, compound material or organic material contacting the insulator, e.g. TiN workfunction layers
    • H10P14/24—
    • H10P14/2905—
    • H10P14/3411—
    • H10P14/3454—
    • H10P14/38—
    • H10P95/90—

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
TW093131721A 2003-10-20 2004-10-19 Deposition system and deposition method TW200529300A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003359633 2003-10-20

Publications (2)

Publication Number Publication Date
TW200529300A true TW200529300A (en) 2005-09-01
TWI336906B TWI336906B (enExample) 2011-02-01

Family

ID=34805265

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093131721A TW200529300A (en) 2003-10-20 2004-10-19 Deposition system and deposition method

Country Status (4)

Country Link
US (1) US7273818B2 (enExample)
JP (1) JP5240159B2 (enExample)
KR (2) KR100891392B1 (enExample)
TW (1) TW200529300A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8895414B1 (en) 2011-07-22 2014-11-25 Tokyo Electron Limited Method and apparatus for forming amorphous silicon film

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4720058B2 (ja) * 2000-11-28 2011-07-13 株式会社Sumco シリコンウェーハの製造方法
JP4258518B2 (ja) * 2005-03-09 2009-04-30 東京エレクトロン株式会社 成膜方法、成膜装置及び記憶媒体
JP5067381B2 (ja) * 2009-02-19 2012-11-07 東京エレクトロン株式会社 熱処理装置の運転方法
JP5337269B2 (ja) * 2010-04-27 2013-11-06 東京エレクトロン株式会社 アモルファスシリコン膜の成膜方法および成膜装置
JP5544343B2 (ja) * 2010-10-29 2014-07-09 東京エレクトロン株式会社 成膜装置
JP5854112B2 (ja) * 2011-09-30 2016-02-09 東京エレクトロン株式会社 薄膜の形成方法及び成膜装置
JP6258813B2 (ja) 2014-08-12 2018-01-10 東京エレクトロン株式会社 ゲルマニウム膜の成膜方法および成膜装置
US9647090B2 (en) * 2014-12-30 2017-05-09 Taiwan Semiconductor Manufacturing Company, Ltd. Surface passivation for germanium-based semiconductor structure
KR102326316B1 (ko) 2015-04-10 2021-11-16 삼성전자주식회사 반도체 소자의 제조 방법
KR102405665B1 (ko) * 2015-10-27 2022-06-08 에스케이하이닉스 주식회사 에피택시성장 방법 및 그를 이용한 반도체구조물 형성 방법
JP6461030B2 (ja) * 2016-03-15 2019-01-30 株式会社東芝 電子装置及び電子装置の製造方法
JP6498635B2 (ja) * 2016-06-23 2019-04-10 信越半導体株式会社 貼り合わせｓｏｉウェーハの製造方法
JP2018160585A (ja) 2017-03-23 2018-10-11 東京エレクトロン株式会社 加熱方法、成膜方法、半導体装置の製造方法、および成膜装置
JP6777624B2 (ja) * 2017-12-28 2020-10-28 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ 半導体装置の製造方法、基板処理装置、およびプログラム
US11791159B2 (en) 2019-01-17 2023-10-17 Ramesh kumar Harjivan Kakkad Method of fabricating thin, crystalline silicon film and thin film transistors
JP2020117762A (ja) * 2019-01-23 2020-08-06 東京エレクトロン株式会社 半導体製造システムの制御方法及び半導体製造システム

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0652714B2 (ja) * 1981-03-30 1994-07-06 株式会社日立製作所 薄膜材料の製造法
JPS57181117A (en) * 1981-05-01 1982-11-08 Agency Of Ind Science & Technol Manufacture of amorhous semiconductor film
JPH0645257A (ja) * 1992-07-21 1994-02-18 Oki Electric Ind Co Ltd 半導体薄膜形成方法
DE4345229C2 (de) * 1993-09-30 1998-04-09 Reinhard Dr Schwarz Verfahren zum Herstellen von lumineszenten Elementstrukturen und Elementstrukturen
JP2002093735A (ja) * 2000-09-13 2002-03-29 Sony Corp 半導体装置の製造方法
KR100402381B1 (ko) 2001-02-09 2003-10-17 삼성전자주식회사 게르마늄 함유 폴리실리콘 게이트를 가지는 씨모스형반도체 장치 및 그 형성방법
JP2003077845A (ja) 2001-09-05 2003-03-14 Hitachi Kokusai Electric Inc 半導体装置の製造方法および基板処理装置
US6667525B2 (en) * 2002-03-04 2003-12-23 Samsung Electronics Co., Ltd. Semiconductor device having hetero grain stack gate
JP2004079912A (ja) * 2002-08-21 2004-03-11 Sharp Corp 半導体基板改質方法およびこの方法を用いた半導体装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8895414B1 (en) 2011-07-22 2014-11-25 Tokyo Electron Limited Method and apparatus for forming amorphous silicon film
TWI470673B (zh) * 2011-07-22 2015-01-21 東京威力科創股份有限公司 非晶矽膜之形成方法與設備

Also Published As

Publication number Publication date
US20050170617A1 (en) 2005-08-04
KR100891392B1 (ko) 2009-04-02
KR20080089327A (ko) 2008-10-06
JP2010034580A (ja) 2010-02-12
JP5240159B2 (ja) 2013-07-17
KR20050037953A (ko) 2005-04-25
US7273818B2 (en) 2007-09-25
KR100935039B1 (ko) 2009-12-30
TWI336906B (enExample) 2011-02-01

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