TW200514828A - Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic part - Google Patents

Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic part

Info

Publication number
TW200514828A
TW200514828A TW093140080A TW93140080A TW200514828A TW 200514828 A TW200514828 A TW 200514828A TW 093140080 A TW093140080 A TW 093140080A TW 93140080 A TW93140080 A TW 93140080A TW 200514828 A TW200514828 A TW 200514828A
Authority
TW
Taiwan
Prior art keywords
based coating
silica based
coating film
composition
component
Prior art date
Application number
TW093140080A
Other languages
English (en)
Other versions
TWI297718B (zh
Inventor
Kazuhiro Enomoto
Shigeru Nobe
Haruaki Sakurai
Kouichi Abe
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Publication of TW200514828A publication Critical patent/TW200514828A/zh
Application granted granted Critical
Publication of TWI297718B publication Critical patent/TWI297718B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/02—Polysilicates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/532—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
    • H01L23/5329—Insulating materials
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30—Technical effects
    • H01L2924/301—Electrical effects
    • H01L2924/3011—Impedance
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31663—As siloxane, silicone or silane

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Formation Of Insulating Films (AREA)
  • Paints Or Removers (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Organic Insulating Materials (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Silicon Compounds (AREA)
TW093140080A 2002-02-27 2003-02-27 Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic part TW200514828A (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2002052025 2002-02-27
JP2002060622 2002-03-06
JP2002060615 2002-03-06
JP2002060620 2002-03-06
JP2002127012 2002-04-26

Publications (2)

Publication Number Publication Date
TW200514828A true TW200514828A (en) 2005-05-01
TWI297718B TWI297718B (zh) 2008-06-11

Family

ID=27767938

Family Applications (3)

Application Number Title Priority Date Filing Date
TW093140080A TW200514828A (en) 2002-02-27 2003-02-27 Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic part
TW094127342A TW200600557A (en) 2002-02-27 2003-02-27 Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts
TW92104285A TW200400237A (en) 2002-02-27 2003-02-27 Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts

Family Applications After (2)

Application Number Title Priority Date Filing Date
TW094127342A TW200600557A (en) 2002-02-27 2003-02-27 Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts
TW92104285A TW200400237A (en) 2002-02-27 2003-02-27 Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts

Country Status (7)

Country Link
US (1) US7358300B2 (zh)
JP (3) JP4151579B2 (zh)
KR (4) KR100820992B1 (zh)
CN (2) CN100491486C (zh)
AU (1) AU2003211343A1 (zh)
TW (3) TW200514828A (zh)
WO (1) WO2003072668A1 (zh)

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US8901268B2 (en) 2004-08-03 2014-12-02 Ahila Krishnamoorthy Compositions, layers and films for optoelectronic devices, methods of production and uses thereof
US20060047034A1 (en) * 2004-09-02 2006-03-02 Haruaki Sakurai Composition for forming silica-based film, method of forming silica-based film, and electronic component provided with silica-based film
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US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
US9273215B2 (en) * 2012-10-30 2016-03-01 Rohm And Haas Electronic Materials Llc Adhesion promoter
US9196849B2 (en) * 2013-01-09 2015-11-24 Research & Business Foundation Sungkyunkwan University Polymer/inorganic multi-layer encapsulation film
KR101506801B1 (ko) * 2013-08-19 2015-03-30 성균관대학교산학협력단 고강도 저유전 플라즈마 중합체 박막 및 그 제조 방법
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US9153357B1 (en) * 2014-03-27 2015-10-06 Rohm And Haas Electronic Materials Llc Adhesion promoter
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Also Published As

Publication number Publication date
CN1639283A (zh) 2005-07-13
JP2008297550A (ja) 2008-12-11
TWI297718B (zh) 2008-06-11
TW200600557A (en) 2006-01-01
KR20070038574A (ko) 2007-04-10
CN1320073C (zh) 2007-06-06
US20050119394A1 (en) 2005-06-02
KR100819226B1 (ko) 2008-04-02
KR20050095788A (ko) 2005-09-30
JPWO2003072668A1 (ja) 2005-06-23
KR100820992B1 (ko) 2008-04-10
JP2008195945A (ja) 2008-08-28
AU2003211343A1 (en) 2003-09-09
JP4169088B2 (ja) 2008-10-22
CN100491486C (zh) 2009-05-27
US7358300B2 (en) 2008-04-15
JP4151579B2 (ja) 2008-09-17
CN1637097A (zh) 2005-07-13
TW200400237A (en) 2004-01-01
TWI304434B (zh) 2008-12-21
KR20050008780A (ko) 2005-01-21
TWI297717B (zh) 2008-06-11
KR20040094732A (ko) 2004-11-10
KR100795251B1 (ko) 2008-01-15
WO2003072668A1 (en) 2003-09-04

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