TW200505950A - Organic polymers electronic devices, and methods - Google Patents
Organic polymers electronic devices, and methodsInfo
- Publication number
- TW200505950A TW200505950A TW093111915A TW93111915A TW200505950A TW 200505950 A TW200505950 A TW 200505950A TW 093111915 A TW093111915 A TW 093111915A TW 93111915 A TW93111915 A TW 93111915A TW 200505950 A TW200505950 A TW 200505950A
- Authority
- TW
- Taiwan
- Prior art keywords
- group
- independently
- electronic devices
- organic
- methods
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/468—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics
- H10K10/478—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics the gate dielectric comprising a layer of composite material comprising interpenetrating or embedded materials, e.g. TiO2 particles in a polymer matrix
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/68—Organic materials, e.g. photoresists
- H10P14/683—Organic materials, e.g. photoresists carbon-based polymeric organic materials, e.g. polyimides, poly cyclobutene or PVC
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/018—Dielectrics
- H01G4/06—Solid dielectrics
- H01G4/14—Organic dielectrics
- H01G4/18—Organic dielectrics of synthetic material, e.g. derivatives of cellulose
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/468—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics
- H10K10/471—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics the gate dielectric comprising only organic materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
- H10K10/468—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics
- H10K10/474—Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics the gate dielectric comprising a multilayered structure
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/615—Polycyclic condensed aromatic hydrocarbons, e.g. anthracene
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
- H10P14/6326—Deposition processes
- H10P14/6342—Liquid deposition, e.g. spin-coating, sol-gel techniques or spray coating
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/65—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by treatments performed before or after the formation of the materials
- H10P14/6516—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by treatments performed before or after the formation of the materials of treatments performed after formation of the materials
- H10P14/6536—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by treatments performed before or after the formation of the materials of treatments performed after formation of the materials by exposure to radiation, e.g. visible light
- H10P14/6538—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by treatments performed before or after the formation of the materials of treatments performed after formation of the materials by exposure to radiation, e.g. visible light by exposure to UV light
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/16—Printed circuits incorporating printed electric components, e.g. printed resistors, capacitors or inductors
- H05K1/162—Printed circuits incorporating printed electric components, e.g. printed resistors, capacitors or inductors incorporating printed capacitors
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
- Y10T428/31692—Next to addition polymer from unsaturated monomers
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Materials Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Composite Materials (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Thin Film Transistor (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Formation Of Insulating Films (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/434,377 US7098525B2 (en) | 2003-05-08 | 2003-05-08 | Organic polymers, electronic devices, and methods |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW200505950A true TW200505950A (en) | 2005-02-16 |
Family
ID=33416675
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW093111915A TW200505950A (en) | 2003-05-08 | 2004-04-28 | Organic polymers electronic devices, and methods |
Country Status (9)
| Country | Link |
|---|---|
| US (2) | US7098525B2 (https=) |
| EP (1) | EP1620885B1 (https=) |
| JP (1) | JP4668916B2 (https=) |
| KR (1) | KR20060009320A (https=) |
| CN (2) | CN1813343A (https=) |
| AT (1) | ATE439681T1 (https=) |
| DE (1) | DE602004022534D1 (https=) |
| TW (1) | TW200505950A (https=) |
| WO (1) | WO2004102652A1 (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI462359B (zh) * | 2006-10-20 | 2014-11-21 | Nippon Kayaku Kk | 場效電晶體及其製造方法 |
Families Citing this family (118)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10247817A1 (de) * | 2002-10-14 | 2004-04-22 | Infineon Technologies Ag | Polymertransistor-Anordnung, integrierte Schaltkreis-Anordnung und Verfahren zum Herstellen einer Polymertransistor-Anordnung |
| US7279777B2 (en) * | 2003-05-08 | 2007-10-09 | 3M Innovative Properties Company | Organic polymers, laminates, and capacitors |
| WO2004100281A1 (en) * | 2003-05-12 | 2004-11-18 | Cambridge University Technical Services Limited | Polymer transistor |
| DE10324533A1 (de) * | 2003-05-28 | 2004-12-16 | H.C. Starck Gmbh | Stabile Lösungen von organischen halbleitenden Verbindungen |
| JP4470398B2 (ja) * | 2003-06-23 | 2010-06-02 | Tdk株式会社 | 電界効果トランジスタ |
| JP4228204B2 (ja) * | 2003-07-07 | 2009-02-25 | セイコーエプソン株式会社 | 有機トランジスタの製造方法 |
| TWI221341B (en) * | 2003-09-18 | 2004-09-21 | Ind Tech Res Inst | Method and material for forming active layer of thin film transistor |
| JP2005136383A (ja) * | 2003-10-09 | 2005-05-26 | Canon Inc | 有機半導体素子、その製造方法および有機半導体装置 |
| KR100697511B1 (ko) | 2003-10-21 | 2007-03-20 | 삼성전자주식회사 | 광경화성 반도체 나노결정, 반도체 나노결정 패턴형성용 조성물 및 이들을 이용한 반도체 나노결정의 패턴 형성 방법 |
| CN1784788A (zh) * | 2003-12-08 | 2006-06-07 | 松下电器产业株式会社 | 场效应晶体管、电气元件阵列以及它们的制造方法 |
| US20050137281A1 (en) * | 2003-12-18 | 2005-06-23 | 3M Innovative Properties Company | Printable dielectric materials, devices, and methods |
| JP4544913B2 (ja) * | 2004-03-24 | 2010-09-15 | 富士フイルム株式会社 | 表面グラフト形成方法、導電性膜の形成方法、金属パターン形成方法、多層配線板の形成方法、表面グラフト材料、及び導電性材料 |
| US7256436B2 (en) * | 2004-03-30 | 2007-08-14 | Shin-Etsu Chemical Co., Ltd. | Thin-film field-effect transistors and making method |
| US7479362B2 (en) * | 2004-04-29 | 2009-01-20 | Seiko Epson Corporation | UV decomposable molecules and a photopatternable monomolecular film formed therefrom |
| KR100560796B1 (ko) * | 2004-06-24 | 2006-03-13 | 삼성에스디아이 주식회사 | 유기 박막트랜지스터 및 그의 제조방법 |
| EP1648040B1 (en) * | 2004-08-31 | 2016-06-01 | Osaka University | Thin-layer chemical transistors and their manufacture |
| KR100606655B1 (ko) * | 2004-09-22 | 2006-08-01 | 한국전자통신연구원 | 광반응성 유기고분자 게이트 절연막 조성물 및 이를이용한 유기박막 트랜지스터 |
| US7399668B2 (en) * | 2004-09-30 | 2008-07-15 | 3M Innovative Properties Company | Method for making electronic devices having a dielectric layer surface treatment |
| US7358571B2 (en) * | 2004-10-20 | 2008-04-15 | Taiwan Semiconductor Manufacturing Company | Isolation spacer for thin SOI devices |
| US7265063B2 (en) * | 2004-10-22 | 2007-09-04 | Hewlett-Packard Development Company, L.P. | Method of forming a component having dielectric sub-layers |
| DE102004052266A1 (de) * | 2004-10-27 | 2006-06-01 | Infineon Technologies Ag | Integrierte Analogschaltung in Schaltkondesatortechnik sowie Verfahren zu deren Herstellung |
| US20060113569A1 (en) * | 2004-11-03 | 2006-06-01 | Akinwande Akintunde I | Control of threshold voltage in organic field effect transistors |
| US20060105199A1 (en) * | 2004-11-18 | 2006-05-18 | 3M Innovative Properties Company | Electroluminescent devices containing trans-1,2-bis(acenyl)ethylene compounds |
| US7315042B2 (en) * | 2004-11-18 | 2008-01-01 | 3M Innovative Properties Company | Semiconductors containing trans-1,2-bis(acenyl)ethylene compounds |
| US20060128165A1 (en) * | 2004-12-13 | 2006-06-15 | 3M Innovative Properties Company | Method for patterning surface modification |
| KR101086159B1 (ko) * | 2005-01-07 | 2011-11-25 | 삼성전자주식회사 | 불소계 고분자 박막을 포함하는 유기 박막 트랜지스터 |
| US7151276B2 (en) * | 2005-03-09 | 2006-12-19 | 3M Innovative Properties Company | Semiconductors containing perfluoroether acyl oligothiophene compounds |
| US7211679B2 (en) * | 2005-03-09 | 2007-05-01 | 3M Innovative Properties Company | Perfluoroether acyl oligothiophene compounds |
| US20060214154A1 (en) * | 2005-03-24 | 2006-09-28 | Eastman Kodak Company | Polymeric gate dielectrics for organic thin film transistors and methods of making the same |
| US20060231908A1 (en) * | 2005-04-13 | 2006-10-19 | Xerox Corporation | Multilayer gate dielectric |
| US20060231829A1 (en) * | 2005-04-13 | 2006-10-19 | Xerox Corporation | TFT gate dielectric with crosslinked polymer |
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| US20060270066A1 (en) * | 2005-04-25 | 2006-11-30 | Semiconductor Energy Laboratory Co., Ltd. | Organic transistor, manufacturing method of semiconductor device and organic transistor |
| US7705346B2 (en) * | 2005-06-06 | 2010-04-27 | Xerox Corporation | Barrier layer for an organic electronic device |
| US7507618B2 (en) * | 2005-06-27 | 2009-03-24 | 3M Innovative Properties Company | Method for making electronic devices using metal oxide nanoparticles |
| US7319153B2 (en) * | 2005-07-29 | 2008-01-15 | 3M Innovative Properties Company | 6,13-Bis(thienyl)pentacene compounds |
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| US7498662B2 (en) * | 2005-11-18 | 2009-03-03 | 3M Innovative Properties Company | Dielectric media including surface-treated metal oxide particles |
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| KR100670379B1 (ko) * | 2005-12-15 | 2007-01-16 | 삼성에스디아이 주식회사 | 유기 박막 트랜지스터, 그 제조방법 및 이를 구비한 유기발광 디스플레이 장치 |
| WO2007075965A2 (en) | 2005-12-20 | 2007-07-05 | Northwestern University | Inorganic-organic hybrid thin-film transistors using inorganic semiconducting films |
| US7514710B2 (en) * | 2005-12-28 | 2009-04-07 | 3M Innovative Properties Company | Bottom gate thin film transistors |
| US20070146426A1 (en) * | 2005-12-28 | 2007-06-28 | Nelson Brian K | All-inkjet printed thin film transistor |
| WO2007080575A1 (en) * | 2006-01-09 | 2007-07-19 | Technion Research And Development Foundation Ltd. | Transistor structures and methods of fabrication thereof |
| US8138075B1 (en) | 2006-02-06 | 2012-03-20 | Eberlein Dietmar C | Systems and methods for the manufacture of flat panel devices |
| TW200730978A (en) * | 2006-02-08 | 2007-08-16 | Wintek Corp | Active matrix liquid crystal display and pixel structure thereof |
| KR101186725B1 (ko) * | 2006-02-21 | 2012-09-28 | 삼성전자주식회사 | 불소계 고분자 박막을 포함하는 유기 박막 트랜지스터 및 이의 제조방법 |
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| US8124172B2 (en) * | 2006-03-02 | 2012-02-28 | E.I. Du Pont De Nemours And Company | Process for making contained layers and devices made with same |
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| US7666968B2 (en) * | 2006-04-21 | 2010-02-23 | 3M Innovative Properties Company | Acene-thiophene copolymers with silethynly groups |
| US7495251B2 (en) * | 2006-04-21 | 2009-02-24 | 3M Innovative Properties Company | Electronic devices containing acene-thiophene copolymers with silylethynyl groups |
| US20080161464A1 (en) * | 2006-06-28 | 2008-07-03 | Marks Tobin J | Crosslinked polymeric dielectric materials and methods of manufacturing and use thereof |
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| US20090001356A1 (en) * | 2007-06-29 | 2009-01-01 | 3M Innovative Properties Company | Electronic devices having a solution deposited gate dielectric |
| US7879688B2 (en) * | 2007-06-29 | 2011-02-01 | 3M Innovative Properties Company | Methods for making electronic devices with a solution deposited gate dielectric |
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| US8956555B2 (en) * | 2008-05-30 | 2015-02-17 | 3M Innovative Properties Company | Silylethynyl pentacene compounds and compositions and methods of making and using the same |
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| JP5334039B2 (ja) * | 2008-09-01 | 2013-11-06 | 国立大学法人大阪大学 | 有機電界効果トランジスター及びその製造方法 |
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| JP5630036B2 (ja) * | 2009-05-07 | 2014-11-26 | セイコーエプソン株式会社 | 有機トランジスター、有機トランジスターの製造方法、電気光学装置および電子機器 |
| EP2436056B1 (en) * | 2009-05-25 | 2016-08-03 | Basf Se | Electronic device comprising organic crosslinkable dielectrics and method of preparation thereof |
| EP2435446B8 (en) | 2009-05-29 | 2017-02-22 | 3M Innovative Properties Company | Fluorinated silylethynyl pentacene compounds and compositions and methods of making and using the same |
| JP5730872B2 (ja) * | 2009-07-23 | 2015-06-10 | プロテウス デジタル ヘルス, インコーポレイテッド | 固体薄膜コンデンサ |
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- 2003-05-08 US US10/434,377 patent/US7098525B2/en not_active Expired - Fee Related
-
2004
- 2004-04-16 CN CNA2004800183685A patent/CN1813343A/zh active Pending
- 2004-04-16 WO PCT/US2004/011986 patent/WO2004102652A1/en not_active Ceased
- 2004-04-16 KR KR1020057021251A patent/KR20060009320A/ko not_active Withdrawn
- 2004-04-16 EP EP04760816A patent/EP1620885B1/en not_active Expired - Lifetime
- 2004-04-16 DE DE602004022534T patent/DE602004022534D1/de not_active Expired - Lifetime
- 2004-04-16 AT AT04760816T patent/ATE439681T1/de not_active IP Right Cessation
- 2004-04-16 JP JP2006532428A patent/JP4668916B2/ja not_active Expired - Fee Related
- 2004-04-28 TW TW093111915A patent/TW200505950A/zh unknown
- 2004-05-06 CN CNA200480012462XA patent/CN1784772A/zh active Pending
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2006
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI462359B (zh) * | 2006-10-20 | 2014-11-21 | Nippon Kayaku Kk | 場效電晶體及其製造方法 |
Also Published As
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|---|---|
| JP4668916B2 (ja) | 2011-04-13 |
| JP2007538381A (ja) | 2007-12-27 |
| ATE439681T1 (de) | 2009-08-15 |
| EP1620885A1 (en) | 2006-02-01 |
| WO2004102652A1 (en) | 2004-11-25 |
| EP1620885B1 (en) | 2009-08-12 |
| CN1784772A (zh) | 2006-06-07 |
| US7473652B2 (en) | 2009-01-06 |
| US20040222412A1 (en) | 2004-11-11 |
| US20060237717A1 (en) | 2006-10-26 |
| US7098525B2 (en) | 2006-08-29 |
| DE602004022534D1 (de) | 2009-09-24 |
| KR20060009320A (ko) | 2006-01-31 |
| CN1813343A (zh) | 2006-08-02 |
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