TW200421587A - Multi-chip module - Google Patents

Multi-chip module Download PDF

Info

Publication number
TW200421587A
TW200421587A TW092133033A TW92133033A TW200421587A TW 200421587 A TW200421587 A TW 200421587A TW 092133033 A TW092133033 A TW 092133033A TW 92133033 A TW92133033 A TW 92133033A TW 200421587 A TW200421587 A TW 200421587A
Authority
TW
Taiwan
Prior art keywords
semiconductor wafer
semiconductor
chip module
mounting board
microcomputer
Prior art date
Application number
TW092133033A
Other languages
English (en)
Inventor
Masanori Owaki
Toshikazu Ishikawa
Takahiro Naito
Makoto Suzuki
Takafumi Kikuchi
Takashi Ozawa
Original Assignee
Renesas Tech Corp
Shinko Electric Ind Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Renesas Tech Corp, Shinko Electric Ind Co filed Critical Renesas Tech Corp
Publication of TW200421587A publication Critical patent/TW200421587A/zh

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/03Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/04Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/065Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00
    • H01L25/0652Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00 the devices being arranged next and on each other, i.e. mixed assemblies
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/0554External layer
    • H01L2224/0556Disposition
    • H01L2224/05571Disposition the external layer being disposed in a recess of the surface
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/0554External layer
    • H01L2224/05573Single external layer
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/11Manufacturing methods
    • H01L2224/113Manufacturing methods by local deposition of the material of the bump connector
    • H01L2224/1133Manufacturing methods by local deposition of the material of the bump connector in solid form
    • H01L2224/1134Stud bumping, i.e. using a wire-bonding apparatus
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/12Structure, shape, material or disposition of the bump connectors prior to the connecting process
    • H01L2224/13Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
    • H01L2224/13001Core members of the bump connector
    • H01L2224/13099Material
    • H01L2224/131Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/12Structure, shape, material or disposition of the bump connectors prior to the connecting process
    • H01L2224/13Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
    • H01L2224/13001Core members of the bump connector
    • H01L2224/13099Material
    • H01L2224/131Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
    • H01L2224/13138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/13144Gold [Au] as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32135Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/32145Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45144Gold (Au) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/4912Layout
    • H01L2224/49171Fan-out arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73253Bump and layer connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2225/00Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
    • H01L2225/03All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
    • H01L2225/04All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers
    • H01L2225/065All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers the devices being of a type provided for in group H01L27/00
    • H01L2225/06503Stacked arrangements of devices
    • H01L2225/06555Geometry of the stack, e.g. form of the devices, geometry to facilitate stacking
    • H01L2225/06558Geometry of the stack, e.g. form of the devices, geometry to facilitate stacking the devices having passive surfaces facing each other, i.e. in a back-to-back arrangement
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/00013Fully indexed content
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/00014Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01021Scandium [Sc]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/30107Inductance
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/3025Electromagnetic shielding

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Semiconductor Memories (AREA)
  • Wire Bonding (AREA)
  • Dram (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Description

200421587 玖、發明說明: 【發明所屬之技術領域】 本發明係關於一種多晶片模組(multi_chip _dule ; MCM) ’特定言之係關於一種可有效應用於多晶片模組之技 術,其中複數個具有數種不同功能的半導體晶片係整合黏 著於一單一板上,因此使該等複數個半導體晶片成為一實 質上單一的半導體積體電路裝置。 【先前技術】 在所謂的多晶片模組技術中,複數個半導體晶片係黏著 於一具有複數個内部佈線及複數個外部端子的板上,並且 忒等複數個半導體晶片係與該安裝板整合成一電路裝置。 了?-八-2001-320014與】?-八-2000-299431 揭示一二晶片堆疊 結構之範例,其中上面的晶片大於下面的晶片。另一方面, JP-A-1 1-2 19989揭示一二晶片堆疊結構之範例,其中一快閃 記憶體與一 SRAM彼此組合。 半導體技術在下列方向上取得了發展,即組成一電子系 統的諸如微電腦晶片、D R A Μ晶片及快閃記憶體晶片之類 的複數個半導體晶片係配置成單一封襞的半導體裝置。明 確地說,當複數個各自包含一單一半導體晶片而非複數個 半導體晶片的半導體裝置藉㈣常的封裝技術(如方形爲 平封裝(Quad Flat Package ; qFP)、晶片尺寸封裝或晶片尺 寸級封裝(Chip Size Package或Chip Scale Package ; csp)或 球栅格陣列(Ball Gnd Array ; BGA))進行封裝,並黏著於 —安裝板(如印刷板)上時’各半導體晶片之間的距離及佈線
O:\89\89575.DOC -6- 200421587 距離不易減小,由於佈線妨礙裝置操作速度的提高及裝置 尺寸的縮小,從而造成大信號延遲。 相反,根據多晶片模組技術,複數個極小的半導體晶片 以所謂裸晶片的形式被製成單一封裝中之一半導體裝置。 因此,可減小晶片之間的佈線距離,並且可改進該半導體 裝置的特性。此外,由於複數個半導體晶片形成單一封裝, 因此該半導體裝置的大小可隨封裝面積的減小而減小。 選擇用於多晶片模組的半導體晶片最好包含密切相關的 晶片,如微電腦晶片、DRAM或與該微電腦晶片耦合的快 閃記憶體晶片。藉由選擇複數個如上所述密切相關的半導 體晶片之組合可充分展示該多晶片模組之特徵。然而, JP-A-2001-320014、JP-A-2〇00-299431 及抒-八-11-219989既 未考慮改進構成多晶片#組一特徵之所有功㉟,也未考慮 縮小裝置尺寸,而僅僅採用個別晶片的堆疊結構。 【發明内容】 轉明之目的係提供-種尺寸縮小同時性能提高之多晶 片模組。本發明之上述及其他㈣、特徵及優點藉由結合 隨附圖式所作的詳細說明會變得更加清楚。 下面簡略說明本文所揭示發明之—般方面。複數個適用 於彼此父換信號的第一半導體晶片係表面黏著於一安裝板 的表面上;而大部分焊墊沿其一側排列的第二半導體晶片 係㈣背黏著於該等第一半導體晶片中的至少一個丨並且 在安裝板上形成的焊墊與對應電極藉由導線焊接彼此連 接。安裝板上的該等第一、第二半導體晶片以及焊接導線
O:\89\89575.DOC 200421587 係用一禮封材料進行封裝。 【實施方式】 、圖1顯示依據本發明一項具體實施例之多晶片模組之俯 視平面圖。—快閃電子可抹除可程式唯讀記憶體(flash electrically erasable and programmable read only memory ^ 稱為丨夬閃5己思體」)FLASIi及數位信號設備 係黏著於封裝板上。在上述快閃記憶體之下,黏著 U電細SH及一同步動態隨機存取記憶體(spdr〇n〇us dynamic random access memory ; SDRAM) 〇 月確地兒安裝板的表面如圖2所示藉由纟面黏著法黏著 了微電腦SH、同步動態隨機存取記憶體SDRAM及數位信號 裝置ASIC。圖2中以虛線表示的快閃記憶體孔湖係背對 背(晶片的背面彼此相對)黏著於兩個半導體晶片沾及 SDRAMJi 〇 圖2所不的半導體晶片SH、SDRAM及ASIC係黏著於安裝 板的一主要表面上,黏著方式為各半導體晶片的電路形成 表面彼此相對。該多晶片模組的複數個外部端子係排列於 安裝板的另-主要表面±。不考慮言亥等複數料導體晶片 所佔面積及該等複數個外部端子排列所需面積,該組態可 形成一小型的多晶片模組。 半導體晶片SH、SDRAM&ASIC係配置成所謂的裸晶 片、’並且複數個塊電極適於以裝版方式黏著於安裝板上。 各半導體晶片藉由-稱作區域陣列塾的技術進行配置,I 中可使焊墊電極(焊墊)重新排列的佈線穿過—聚酿亞胺樹
O:\89\89575.DOC 200421587 脂或類似物的絕緣薄膜形成於包含裝置及該佈線的半導體 晶片的電路形成表面上,並且焊墊電極(塊連接平台電極) 形成於該佈線上。 藉由上述區域陣列墊技術,將焊墊電極(其係以較小間距
如數十個μηι或1〇〇 μηι排列,因為半導體晶片、SDRAM 及ASIC的外部端子具有01 111111至〇.2 mm之直徑)轉換成塊 電極排列,其具有400 μηι的較大間距。該區域陣 列墊技術係有效用於半導體晶片的裝版,如具有輸入/輸出 電路的SDRAM及其焊墊電極適當配置於該半導體晶片的 中心。 安裝板具有一玻璃環氧樹脂或玻璃的絕緣基板,在該絕 緣基板上形成一配置成多層佈線結構的比較精細的内部佈 線;複數個電性連接至半導體晶片的塊電極之平台(land); 以及複數個外部端子。安裝板在其由半導體晶片形成的主 要表面上形成用於藉由導線來連接排列於快閃記憶體 FLASH上的焊墊之電極,以及上述平台。 依據該項具體實施例的快閃記憶體係所謂的AND型,沒 有獨立的位址端子。藉由分時使用一資料端子連續輸入位 址U °明確地說’在依據該項具體實施例的快閃記憶體 中:如圖5所示,、經由資料端子1/〇(7:〇)可獲取一用於指定 :刼作模式之命令、一位址及資料。經由一輸入/輸出緩衝 裔將Μ號輸入傳送至命令解碼器,然後經由一内部信號 線傳送至位址計數器。為此,各自由一方形表示的焊塾係 沿+導體晶片的-側(在該具體實施例中為長側)排列,並且
O:\89\89575.DOC 200421587 藉由焊接導線連接至安裝板上的對應電極。 圖1及2示意性顯示安裝板及半導體晶片SH、SDRAM、 ASIC及FLASH的尺寸(橫側乘縱側以mm為單位)。安裝板的 尺寸為19乘13 ; SH的尺寸為5.05乘5.05 ; SDRAM的尺寸為 8.70乘5.99 ; ASIC的尺寸為6.25乘6.15 ;以及FLASH的尺寸 為7.32乘10.46。然而,對於垂直方向上較長的快閃記憶體 FLASH而言,其尺寸表示為水平長度乘垂直長度。 為了將這四個半導體晶片有效地黏著於安裝板上,則將 矩形晶片SDRAM的長側橫向放置;而方形晶片SH如圖2所 示垂直放置以配合矩形晶片FLASH長側的長度。以此方 式,晶片FLASH與晶片SDRAM及SH係背對背放置以形成一 堆疊結構。明確地說,從安裝板的方向觀察,晶片FLASH 可完全黏著於由晶片SH及SDRAM所佔據的安裝表面區域 内。因此,包含晶片FLASH在内的四個半導體晶片可黏著 於安裝板上,否則其僅能容納包含晶片ASIC在内的三個半 導體晶片。 圖3A及3B係示意性顯示依據本發明的多晶片模組之斷 面圖。圖3 A係沿圖1中的箭頭A所截取的斷面圖;而圖3B係 沿圖1中的箭頭B所截取的斷面圖。因此,圖3A及3B在橫向 上彼此顛倒。如上所述,半導體晶片SH、SDRAM及ASIC 係表面黏著於安裝板的主要表面上,而快閃記憶體FLASH 係藉由熱固性黏合劑或類似物背對背黏著於半導體晶片SH 及SDRAM。半導體晶片的電極藉由焊接導線(連接線)連接 至安裝板的對應電極。其上黏著有半導體晶片SH、 O:\89\89575.DOC -10- 200421587 SDRAM、ASIaFLASH的安裝板之主要表面,包括痒接導 線在内,用一密封材料進行封裝。 在圖3A及3B中,多晶片模組的外部端子(雖然未顯示)係 配置成適於穿過安裝板上形成的孔電性連接至内部佈線之 塊電極,並且位於該安裝板另一主要表面(反面)。半導體晶 片SH、SDRAM及ASIC的塊電極可稱為微塊,其尺寸及間 距較小,而提供安裝板外部端子的塊電極在尺寸及間距上 較大。 圖4係說明裝配依據本發明的多晶片模組各步驟之示意 圖。圖4顯示裝配步驟及對應的熱滯後現象以及一般的垂= 結構。在裸晶片1的焊墊上形成一。一各向異性導電薄 膜ACF黏著於MCM基板電極上,並且在焊墊上形成Au塊的 裸晶片黏著於該MCM基板上用於熱壓焊接。一裸晶片2藉 由一熱固性黏合劑與裸晶片丨背對背黏合,並且藉由導線焊 接連接至MCM基板的對應電極。以此方式,(雖然未顯示) 該裝配件用樹脂進行封裝。在最後步驟中,MCM係藉由回 流處理(reflow treatment)形成作為外部端子的焊球而完成。 圖5係顯示依據本發明一項具體實施例之多晶片模組之 方塊圖。圖5中示意性顯示圖!中的微電腦SH、記憶體 SDRAM及快閃記憶體FLASH之電性連接以及信號端子名 稱。 為了縮小提同性能的多晶片模組之尺寸,同時使用來源 於圖1所示的微電腦SH、記憶體SDRAM(及數位信號裝置 ASIC)及快閃記憶體FLASH之組合的各項特徵,彼此交換信
O:\89\89575.DOC -11 - 200421587 號的微電腦SH及記憶體SDRAM(以及數位信號裝置ASIC) 係藉由安裝板上形成的位址匯流排3位元)、資料匯流排 (32位元)及控制匯流排互連。 十三(13)個位址匯流排(例如)對應於SDRAM的位址端子 A0至A12 ;而32個資料匯流排對應於SDRAM的資料端子 DQ0至DQ31。微電腦SH的位址匯流排連接至位址端子A2 至A14,而資料匯流排連接至端子DO至D31。 對應於記憶體SDRAM,微電腦SH的控制輸出端子CKIO、 CKE、CS3B、RASLB、CASLB、RD/WRB、WE3B/DQMUU、 WE2B/DQMUL、WE1B/DQMLU 及 WEOB/DQMLL 連接至 CLK、CKE、CSB、RASB、CASB、WEB及 DQM7、DQM5、 DQM2、DQM0。所附為B的端子名稱對應於藉由一橫杆(over bar)將低活動位準升至圖式中活動位準之邏輯信號。端子 WE3B/DQMUU、WE2B/DQMUL、WE1B/DQMLU、WEOB/ DQMLL係遮罩信號。具有32位元的資料匯流排分成四個8 位元群組,因此 WE3B/DQMUU、WE2B/DQMUL、WE1B/ DQMLU、WEOB/DQMLL係用於有選擇地遮罩寫入/讀取操 作。 此外,數位信號裝置ASIC基本上與位址匯流排及資料匯 流排相連,並且具有一用於傳送所需控制信號的信號線。 該數位信號裝置係用於針對多晶片模組的特定應用進行數 位信號處理,並且與微電腦SH—起負責一專門指定的信號 處理。此等半導體晶片的信號傳送率必須較高。當半導體 晶片藉由表面黏著法黏著於佈線(如在安裝板上形成的匯 O:\89\89575.DOC -12- 200421587 流排)上時,形成最短距離的信號傳送路徑,可進行高速信 號交換。因此,獲得高性能。 在該項具體實施例中,微電腦SH包含一對應於快閃記憶 體FLASH的介面。明確地說,快閃記憶體FLASH包含一資 料端子 1/0(7:0)及控制信號 WEB、SC、OEB、RDY/BusyB 及CEB。與此相一致,微電腦SH亦包含NA_I〇(7:0)及控制 信號 NA_WEB、NA_SC、NA_OEB、NA_RYBY及 NA—CEB ° 微電腦SH與快閃記憶體FLASH之間的寫入/讀取操作速度 低於與SDRAM的操作速度。因此,即時當焊接導線組成一 信號傳送路徑,傳送率亦不會受負面影響。因此,MCM總 體上可縮小尺寸,同時使其性能提高。 圖6係顯示依據本發明一項具體實施例之多晶片模組的 安裝板佈線模式之示意圖。安裝板係配置成(例如)八層的多 層佈線基板。圖6中顯示該安裝板主要表面的一部分,其中 黏著包括微電腦SH及記憶體SDRAM的半導體晶片。 圖6中,直線及多邊形線表示佈線,而黑色矩形表示用於 連接快閃記憶體FLASH的焊墊。符號*表示用於表面黏著包 括微電腦SH及記憶體SDRAM在内的半導體晶片之板電 極。如圖2所示,對應於實質上方形的微電腦SH的板電極係 位於圖6的上面部分;而對應於橫向長記憶體SDRAM的板 電極係位於圖6的下面部分。焊墊係在垂直方向上位於圖6 的左側。 上述快閃記憶體FLASH背對背黏著於微電腦SH及記憶 體SDRAM之組態並非限制於整個快閃記憶體FLASH黏著 O:\89\89575.DOC -13- 200421587 於SH及SDRAM的安裝表面上之情況。#於事實上快閃記憶 體FLASH的焊墊係在一長側上排列,因此安裝板的焊墊亦 如圖6所示排列。因此,可減少在安裝板上形成焊墊所佔據 之面積。
圖9係顯示依據應用本發明之前所研究的一項具體實施 例之多晶片模組佈局示意圖。在該具體實施例中,微處理 裔CPU係、背對背黏著於快閃記憶體FLASH及記憶體sDRAM 上。微處理器CPU具有大量沿著晶片周邊排列之外部端 子。因此,對應於該CPU焊墊的大量焊墊需要分佈位於安 裝板上的快閃記憶體FLASH&記憶體SDRAM之外。因此, 焊墊在女裝板上所佔據的面積會不合需要地增加。 另一方面,考慮電路操作的性能,微處理器CPU高速傳 送信號所需的信號傳送路徑包括較長的焊接導線。其引起 的問題係高頻率時脈及該時脈同步信號的傳送速率會由於 焊接導線較大的電感成分受到影響。相反,在依據本發明 的多晶片模組中,一方面可縮小安裝板的尺寸,另一方面 可較好地提高電路操作的性能。然而,申請者並不打算將 圖9之範例作為本規則中的先前技術。 圖7顯示依據本發明一項具體實施例之快閃記憶體的焊 墊佈局。焊墊PAD 1至焊墊PAD34係配置於矩形板的長側(底 邊)之一。除了圖5所示的信號墊之外,亦包括用於源極電 壓VCC、VSS及操作電壓的焊墊。 圖8係顯示依據本發明一項具體實施例之多晶片模組之 般組悲示思圖。該多晶片模組薄至1 65 mm及(例如)1.70
O:\89\89575.DOC -14- 200421587 mm(取大),並且其具有的桿球在反面構成總共”^固外部端 子(接針)。焊球連接器(平台)的直徑φ各為〇·33 mm,並且以 0-65 mm的間距排列。 下面況明一平台柵格陣列(land grid ; lga)型多晶 片模組之範例,其中半導體晶片與安裝板係藉由使用金 (Au)/焊料(Sn或類似物)而彼此耦纟’在該安裝板的反面沒 有任何的球形突出電極。 S 10所示,依據该項具體實施例的Mcm與上述參考圖 1至8所描述的MCM具有基本相似的組態,不同之處說明如 下。明確地說,AU凸塊丨藉由搞合部件2各自電性及機械地 連接至安裝板3的連接器4。在半導體晶片5與安裝板3之間 填充一側填滿樹脂6,以防止損壞半導體晶片5,否則由於 肩女裝板3與半導體晶片5之間熱膨脹係數的不同會引起熱 應力集中從而造成損壞。此外,安裝板3的反面形成有平台 電極7 作為外部端子用於電性連接(例如)-印刷線路板 (printed wiring board ; PCB)。 示的球形突出電 。雖然未顯示, 極 依據该項具體實施例,未形成圖1至8所 ,因此較好地縮小了模組的尺寸及厚度 但在平台電極7的表面可形成Cr/Cu/Au或類似物的一阻障 層。在麵具體實施例中,作為代表範例係顯示—單一的 半導體晶片5 ’並且各SH、SDR及鑛係藉由覆晶連接法 黏者於安裝板3。 該安裝板3可主要配置有一剛性基板(核心基板;藉由 增層法(build, meth()d)在剛性基板8的兩個相對表面上形
O:\89\89575 D0C -15- 200421587 成的柔軟層9、10,以及以覆蓋柔軟層9、i〇的方式形成的 保護薄膜11、12。雖然未詳細顯示,但該剛性基板8及柔軟 層9、10具有(例如)多層佈線結構。該剛性基板8的各絕緣層 係由浸潰聚醯亞胺樹脂或環氧樹脂的玻璃纖維的高彈性樹 月曰基板‘成,而柔軟層9、1 〇的各絕緣層係由(例如)低彈性 的環氧樹脂製成。 上述配置有剛性基板8及柔軟層9、1〇的多層佈線結構係 由(例如)銅(Cu)的金屬薄膜製成。保護薄膜u、12係由(例 如)聚醯亞胺樹脂製成,其主要目的係保護在柔軟層9最高 佈線層中形成的佈線,並且用於一方面在封裝時保證黏性 樹脂與半導體晶片5的黏接,另一方面在封裝時控制濕焊料 的膨脹。所形成的保護薄膜12主要係用於保護在柔軟層1〇 的最高佈線層中形成的佈線,並且在用焊料封裝平台電極7 時控制濕焊料的膨脹。 半導體晶片5(但未限制)係主要配置有一半導體基板,·複 數個在該半導體基板的一個主要表面上形成的半導體裝 置;包含複數個絕緣層的多個佈線層,並且佈線層在複數 個階段内堆疊於該半導體基板的一個主 覆蓋多個佈線層方式形成的-表面保護薄膜(最後:2 薄膜)。該半導體基板係由(例如)單晶石夕製成;絕緣層係由 (例如)氧切薄膜製成;而佈線層係由(例如说(ai)或链合 金的金屬薄膜製成。表面保護薄膜係由絕緣薄膜(例如氧化 石夕、氮化矽或有機絕緣薄膜)製成。 一個主要表面形成有複數個電極墊13,該主要表面與半
O:\89\89575.DOC -16- 200421587 導體晶片5的另一主盈主二γ 胥表面(反面)彼此相對。該等複數個電 極塾⑽成於半導體晶片5的多個佈線層的最高佈線層 中’亚且曝露於在該半導體晶片$表面保護薄膜内形成的一 焊接開口。複數個電極塾13沿該半導體晶片5的一側排列。 稷數個電極塾13各形成一(例如)7〇㈣乘川_的平面正方 形。此外,該等複數個電極墊係以大約85_的間距排列。 (例如)金(AU)凸塊1作為突出電極係配置於半導體晶片5 '個主要表面上。複數個凸塊1分別配置於該半導體晶片 5-個主要表面上的複數個電極墊"上,因此凸塊}及電極 墊13彼此電性及機械地連接。Au導線的凸塊!係藉由球悍法 心成⑼如)同日禮用熱焊接及超聲波振動。在球焊法中, 在仏導線的前端形成一球,隨後在超聲波振動下將該球 熱焊接至晶片的電極塾’接著將該Au導線從球部分切斷, “ 乂成塊。因此,在電極墊上形成的凸塊牢固連接於 電才虽塾。 現在參考圖u至13說明上述mcm之製造。圖u至⑽顯 示說明MCM製造實質部分之斷面圖。如圖u所示,藉由散 佈法提供糊狀耦合材料2至(例如)位於安裝板3 一個主要表 面上的晶片安裝區内的各連接器4上。一焊膏材料係用作輕 口材料2。亥焊貧材料係藉由混合及捏合至少精細的焊料顆 粒及助焊劑而製成。該項具體實施例使用的焊膏材料係藉 由混合及捏合由98 wt%的Pb(錯)及2 wt%的如(錫)所組成二 焊料顆粒而製成,其溶點為大約則。Ce散佈法係用於對從 一細噴嘴中噴射出的焊膏材料進行塗佈。
O:\89\89575.DOC -17- 200421587 接著,如圖12所示,安裝板3配置於加熱台14上,隨後半 導體晶片5藉由夾頭15傳送至晶片安裝區之上,且凸塊^系 放置於對應連接器4上的適當位置。然後,安裝板3藉由加 熱台14加熱,同時半導體晶片5藉由夾頭15加熱。以此方 式,如圖13所示,耦合材料2熔化,然後使熔化的耦合材料 2聚集。從而,將半導體晶片5封裝入安裝板3 一個主要表面 上的晶片安裝區内。 如圖1 0所示,將一側填滿樹脂6填充於安裝板3 一個主要 表面上的晶片安裝區與半導體晶片5之間。然後,如圖丨至8 所示的MCM,將快閃記憶體FLASH^^對背堆疊於半導體晶 片5上。然後,快閃記憶體FLASH的電極墊係藉由導線焊接 連接至女裝板3的連接器4。在最後步驟中,四個半導體晶 片SH、SDRAM、ASIC及FLASH以及焊接導線藉由樹脂封 裝’從而實質上完成該MCM。 在將LGA型的MCM安裝於印刷電路板(printed circuit ard ’ PCB)上日守’藉由印刷或類似技術在peg側的連接電 極上形成一焊料層;並且在LGA型MCM的反面上形成的平 台電極係與連接電極放置於PCB側上的適當位置。其後, 連接電極藉由焊料層經過焊料回流彼此連接。替代性地, 藉由印刷或類似技術可預先在LGa型MCM的平台電極上形 成一薄焊料層。 雖然圖1及2僅顯示四個包括sh'、SDRAM、ASIC及FLASH 在内的晶片’但亦可額外黏著用於周邊電路的晶片。在此 情況下’用於周邊電路的晶片係藉由突出電極(如Au凸塊υ
O:\89\89575.DOC -18- 200421587 以與S Η、S D RAM或ASIC相同的方式面朝下黏著於安裝板 上’因此周邊電路係連接至由圖5所示的SH及ASIC共用的 位址匯流排及資料匯流排。 明確地說,晶片SH、SDRAM、ASIC及由凸塊面朝下連 接的周邊電路係藉由共同的匯流排彼此連接,從而提高了 模組的操作速度。另一方面,堆疊於至少一個晶片上的快 閃記憶體FLASH藉由焊接導線連接至安裝板的電極墊,並 且藉由一專用匯流排介面連接至SH,該匯流排介面係用於 單獨與SH獨立連接,因此使模組尺寸減小。 由發明者完成的本發明已參考具體實施例明確說明如 上。然而,本發明並不限制於上述具體實施例,並且在不 脫離本發明的精神及範疇下可進行各種修改。例如, ^ 日日 片杈組上可黏著一數位信號處理器(digital Signal Pr〇CeSS〇r ; DSP)或類似的共處理器,其代替入31(::與cpu_ 起操作、。此時,CPU及數位信號處理器藉由控制信號密切 相關地進行操作。藉由板線經過上述裝版使CPU及數位信 號處理器互連,從而實現高性能。本發明已找到針對組^ 一多晶片模組的半導體裝置之廣泛應用。 下面簡略說明藉由本文所揭示的本發明之一般方面所獲 得之效果。複數個用於交換信號的第—半導體晶片係表: :者於安裝板的表面上;並且大部分焊塾沿其一側排列的 -弟-+導體晶片係背對背黏著於該等第—半導體晶片中 因此在安裝板上形成的焊塾與對應電極係藉 由導料接彼此連接;並且用—密封材料對裝安裝板上的
O:\89\89575.DOC -19- 200421587 = '第二半q料導㈣行料,從 夕晶片杈組的高性能及小尺寸。 貝 【圖式簡單說明】 知例之多晶片模組之俯 圖1顯示依據本發明一項具體實 視平面圖。 圖2顯示圖!的多晶片模 果、之女裝板表面的晶片佈局 圖3 A及3B係示意性顯示圖1 月1 的夕日日片杈組之斷面圖 圖4係說明依據本發 奴I夕日日片拉組之各裝配步驟 意圖 圖5係顯示依據本發明一項具體實施例 方塊圖。 之示 之多晶片模組之 圖6係顯示依據本發一 斗w月項具體實施例之多晶片模組之 女裝板圖案示意圖。 圖7顯示依據本發明一 ^項具體實轭例之快閃記憶體的焊 墊佈局。 之 圖8係顯示依據本發明一項具體實施例之多晶片模組 一般組態示意圖。 般佈 圖9係頌不在本發明之前所研究的多晶片模組之一 局範例之示意圖。 =顯示依據本發明之多晶片模組一更改的實質部分 之斷面圖。 之 圖11係顯示製造圖10的多晶片模組之方法的實質部分 斷面圖。 之方法的實質部分之 圖12係顯示製造圖10的多晶片模組
O:\89\89575.DOC -20- 200421587 斷面圖。 圖13係顯示製造圖10的多晶片模組之方法的實質部分之 斷面圖。 【圖式代表符號說明】 1 凸塊 2 耦合部件 3 安裝板 4 連接器 5 半導體晶片 6 側填滿樹脂 7 平台電極 8 剛性基板 9 柔軟層 10 柔軟層 11 保護薄膜 12 保護薄膜 13 電極墊 14 加熱台 15 夾頭 ACF 各向異性導電薄膜 ASIC 數位信號裝置 CPU 微處理器 FLASH 快閃記憶體 SDRAM 同步動態隨機存取記憶體 SH 微電腦 O:\89\89575.DOC -21 -

Claims (1)

  1. 200421587 拾、申請專利範圍: 1 · 一種多晶片模組,其包含: 複數個表面黏著於一安裝板的一表面上用於彼此交換 信號的第一半導體晶片; 一與該等複數個第一半導體晶片中的至少—個背對背 黏著的第二半導體晶片,該第二半導體晶片的大部分焊 墊沿其一側排列; 用於連接该第二半導體晶片的該等焊墊與在該安裝板 上形成的對應電極之焊接導線;以及 一用於封裝該安裝板上的該等複數個第一半導體晶片 、該第二半導體晶片及該焊接導線之密封構件。 2·如申請專利範圍第1項之多晶片模組, ,、中該等複數個第一半導體晶片包含一微電腦、一隨 機存取記憶體及一處理分別用於特定應用之信號的信號 處理裝置, 其中該第二半導體晶片係一非揮發性記憶體。 3 ·如申請專利範圍第2項之多晶片模組, 其中該微電腦及該隨機存取記憶體或連接至該微電腦 用於處理特定應用之信號之該信號處理裝置係藉由在該 女裝板上以裝版方式形成的佈線而互連;以及 其中該微電腦包含-對應於該非揮發性記憶體的唯一 介面,該微電腦㈣非揮發性記憶體係經由該焊接導線 互連。 4·如申請專利範圍第3項之多晶片模組, O:\89\89575.DOC ^0421587 其中该非揮發性記憶體係背對背黏著 的该第一半導體晶片。
    於包含該微電腦 如申凊專利範圍第4項之多晶片模組, 其中與該非揮發性記憶體背對背黏著的該等 曰 μ ^ 守 &曰曰月包含該微電腦及該隨機存取記憶體,·以及 其中構成該隨機存取記憶體的半導體晶片之長側與構 成該非揮發性記憶體的半導體晶片之長側彼此垂直。 O:\89\89575.DOC
TW092133033A 2002-11-28 2003-11-25 Multi-chip module TW200421587A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002344782A JP2004179442A (ja) 2002-11-28 2002-11-28 マルチチップモジュール

Publications (1)

Publication Number Publication Date
TW200421587A true TW200421587A (en) 2004-10-16

Family

ID=32677038

Family Applications (1)

Application Number Title Priority Date Filing Date
TW092133033A TW200421587A (en) 2002-11-28 2003-11-25 Multi-chip module

Country Status (5)

Country Link
US (1) US20040130036A1 (zh)
JP (1) JP2004179442A (zh)
KR (1) KR20040047607A (zh)
CN (1) CN1505146A (zh)
TW (1) TW200421587A (zh)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI255491B (en) * 2004-03-31 2006-05-21 Sanyo Electric Co Substrate for mounting elements, manufacturing method therefor and semiconductor device using the same
JP4020891B2 (ja) * 2004-06-14 2007-12-12 三洋電機株式会社 素子搭載基板の製造方法
JP4601365B2 (ja) * 2004-09-21 2010-12-22 ルネサスエレクトロニクス株式会社 半導体装置
US7530044B2 (en) * 2004-11-04 2009-05-05 Tabula, Inc. Method for manufacturing a programmable system in package
US7301242B2 (en) * 2004-11-04 2007-11-27 Tabula, Inc. Programmable system in package
US8201124B1 (en) 2005-03-15 2012-06-12 Tabula, Inc. System in package and method of creating system in package
US7564126B2 (en) * 2005-08-16 2009-07-21 Nokia Corporation Integrated circuit package
JP2009505435A (ja) * 2005-08-31 2009-02-05 インテル コーポレイション マイクロプロセッサとレベル4キャッシュとを有するパッケージ
KR20090043898A (ko) * 2007-10-30 2009-05-07 삼성전자주식회사 스택 패키지 및 그 제조 방법, 및 스택 패키지를 포함하는카드 및 시스템
JP4910117B2 (ja) * 2008-04-04 2012-04-04 スパンション エルエルシー 積層型メモリ装置
KR20100105147A (ko) 2009-03-20 2010-09-29 삼성전자주식회사 멀티 칩 패키지 및 관련된 장치
CN102439718B (zh) * 2010-06-25 2015-07-01 新普力科技有限公司 数据存储装置
WO2011160311A1 (en) * 2010-06-25 2011-12-29 Biwin Technology Limited Memory device
KR101858159B1 (ko) * 2012-05-08 2018-06-28 삼성전자주식회사 멀티-cpu 시스템과 이를 포함하는 컴퓨팅 시스템
CN105428347A (zh) * 2015-12-28 2016-03-23 中南大学 一种微系统三维芯片叠层封装的改进方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6144101A (en) * 1996-12-03 2000-11-07 Micron Technology, Inc. Flip chip down-bond: method and apparatus
AU1040397A (en) * 1996-12-04 1998-06-29 Hitachi Limited Semiconductor device
US8636648B2 (en) * 1999-03-01 2014-01-28 West View Research, Llc Endoscopic smart probe
JP3581086B2 (ja) * 2000-09-07 2004-10-27 松下電器産業株式会社 半導体装置
US6614267B2 (en) * 2000-12-01 2003-09-02 Kabushiki Kaisha Toshiba Electronic circuit device and hybrid integrated circuit with an ASIC and an FPGA
JP3839323B2 (ja) * 2001-04-06 2006-11-01 株式会社ルネサステクノロジ 半導体装置の製造方法
JP3977049B2 (ja) * 2001-10-18 2007-09-19 株式会社ルネサステクノロジ 半導体装置及びその半導体装置を組み込んだ電子装置
JP4149289B2 (ja) * 2003-03-12 2008-09-10 株式会社ルネサステクノロジ 半導体装置
TWI225290B (en) * 2003-03-21 2004-12-11 Advanced Semiconductor Eng Multi-chips stacked package
JP4538830B2 (ja) * 2004-03-30 2010-09-08 ルネサスエレクトロニクス株式会社 半導体装置

Also Published As

Publication number Publication date
KR20040047607A (ko) 2004-06-05
US20040130036A1 (en) 2004-07-08
CN1505146A (zh) 2004-06-16
JP2004179442A (ja) 2004-06-24

Similar Documents

Publication Publication Date Title
JP4381779B2 (ja) マルチチップモジュール
JP5420505B2 (ja) 半導体装置の製造方法
TW558818B (en) Semiconductor device and its manufacturing method
TWI330872B (en) Semiconductor device
US7420814B2 (en) Package stack and manufacturing method thereof
JP4068974B2 (ja) 半導体装置
TW557556B (en) Window-type multi-chip semiconductor package
KR100460062B1 (ko) 멀티 칩 패키지 및 그 제조 방법
TW200421587A (en) Multi-chip module
JP2001223326A (ja) 半導体装置
JP4033968B2 (ja) 複数チップ混載型半導体装置
JP2005286126A (ja) 半導体装置
JP3339881B2 (ja) 半導体集積回路装置およびその製造方法
JP2000349228A (ja) 積層型半導体パッケージ
JP2002026073A (ja) 半導体装置およびその製造方法
JP2007266567A (ja) 高速及び高性能の半導体パッケージ
JP5099714B2 (ja) マルチチップモジュール
JP4130277B2 (ja) 半導体装置および半導体装置の製造方法
JP2004006482A (ja) 半導体装置およびその製造方法
KR100196291B1 (ko) 요철 형상의 범프 구조를 이용한 반도체 칩과 기판 간의 접속 구조
TWI395319B (zh) 避免封裝堆疊接點斷裂之半導體組合構造
TWI224847B (en) Semiconductor chip package and method for manufacturing the same
TWI345293B (en) Semiconductor package-on-package (pop) device avoiding crack at solder joints of micro-contacts during semiconductor stacking
TW432561B (en) Multi-chip module packaging structure
JP5297445B2 (ja) 半導体装置