SU1414878A1 - Способ ионно-плазменного напылени и устройство дл его осуществлени - Google Patents

Способ ионно-плазменного напылени и устройство дл его осуществлени Download PDF

Info

Publication number
SU1414878A1
SU1414878A1 SU843821699A SU3821699A SU1414878A1 SU 1414878 A1 SU1414878 A1 SU 1414878A1 SU 843821699 A SU843821699 A SU 843821699A SU 3821699 A SU3821699 A SU 3821699A SU 1414878 A1 SU1414878 A1 SU 1414878A1
Authority
SU
USSR - Soviet Union
Prior art keywords
vacuum chamber
magnetron
vacuum
pump
valve
Prior art date
Application number
SU843821699A
Other languages
English (en)
Russian (ru)
Inventor
Владимир Петрович Петраков
Геннадий Петрович Минькин
Владимир Александрович Шагун
Павел Семенович Балыкин
Давид Исаакович Баркдон
Владимир Александрович Домрачев
Original Assignee
Предприятие П/Я А-1628
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Предприятие П/Я А-1628 filed Critical Предприятие П/Я А-1628
Priority to SU843821699A priority Critical patent/SU1414878A1/ru
Priority to FR8512505A priority patent/FR2575186B1/fr
Priority to DE19853529813 priority patent/DE3529813A1/de
Priority to JP28685185A priority patent/JPS61157677A/ja
Application granted granted Critical
Publication of SU1414878A1 publication Critical patent/SU1414878A1/ru

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/46—Sputtering by ion beam produced by an external ion source

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
SU843821699A 1984-12-20 1984-12-20 Способ ионно-плазменного напылени и устройство дл его осуществлени SU1414878A1 (ru)

Priority Applications (4)

Application Number Priority Date Filing Date Title
SU843821699A SU1414878A1 (ru) 1984-12-20 1984-12-20 Способ ионно-плазменного напылени и устройство дл его осуществлени
FR8512505A FR2575186B1 (fr) 1984-12-20 1985-08-19 Procede d'application de revetements sur des pieces par pulverisation a l'ionoplasma, installation pour sa mise en oeuvre et pieces traitees conformement audit procede
DE19853529813 DE3529813A1 (de) 1984-12-20 1985-08-20 Verfahren zur ionenplasma-aufdampfung und anlage zur durchfuehrung dieses verfahrens
JP28685185A JPS61157677A (ja) 1984-12-20 1985-12-19 イオン化プラズマ式の塗装方法及び装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SU843821699A SU1414878A1 (ru) 1984-12-20 1984-12-20 Способ ионно-плазменного напылени и устройство дл его осуществлени

Publications (1)

Publication Number Publication Date
SU1414878A1 true SU1414878A1 (ru) 1988-08-07

Family

ID=21150242

Family Applications (1)

Application Number Title Priority Date Filing Date
SU843821699A SU1414878A1 (ru) 1984-12-20 1984-12-20 Способ ионно-плазменного напылени и устройство дл его осуществлени

Country Status (4)

Country Link
JP (1) JPS61157677A (fr)
DE (1) DE3529813A1 (fr)
FR (1) FR2575186B1 (fr)
SU (1) SU1414878A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3908316A1 (de) * 1989-03-14 1990-09-20 Vladimir Aleksandrovic Sagun Vorrichtung zum auftragen von duennschichtigen ueberzuegen auf substrate im vakuum

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3793179A (en) * 1971-07-19 1974-02-19 L Sablev Apparatus for metal evaporation coating
US4049533A (en) * 1975-09-10 1977-09-20 Golyanov Vyacheslav Mikhailovi Device for producing coatings by means of ion sputtering
DD145283A1 (de) * 1979-08-06 1980-12-03 Helmut Bollinger Verfahren zur herstellung von verschleissfesten und korrosionsbestaendigen schichten
JPS58221271A (ja) * 1982-06-18 1983-12-22 Citizen Watch Co Ltd イオンプレ−テイング法による被膜形成方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Электронна промьшшенность, 1980, 9 5, с. 52-54. Там же, 1983, 5, с. 50-53. *

Also Published As

Publication number Publication date
FR2575186A1 (fr) 1986-06-27
JPH0258349B2 (fr) 1990-12-07
FR2575186B1 (fr) 1989-12-15
DE3529813A1 (de) 1986-07-03
JPS61157677A (ja) 1986-07-17
DE3529813C2 (fr) 1987-08-27

Similar Documents

Publication Publication Date Title
US3663265A (en) Deposition of polymeric coatings utilizing electrical excitation
US5427671A (en) Ion vapor deposition apparatus and method
JP3122228B2 (ja) プロセス装置
SU1414878A1 (ru) Способ ионно-плазменного напылени и устройство дл его осуществлени
JP3773320B2 (ja) 成膜装置及び成膜方法
JPS6314421A (ja) プラズマｃｖｄ方法
US4606929A (en) Method of ionized-plasma spraying and apparatus for performing same
JP5901571B2 (ja) 成膜方法
JPH0426760A (ja) スパッタリング装置
JPS6134931A (ja) シリコン膜の製造方法
WO1997039160A1 (fr) Appareil et procede de production d'un tube cathodique
JPS6314422A (ja) プラズマｃｖｄ方法
JPH06224097A (ja) 真空排気装置
JPH06172987A (ja) スパッタ装置
JPH0463323A (ja) 液晶配向処理法
JPH04228566A (ja) スパッターイオンめっきによる導電性繊維被覆方法および装置
JP3354591B2 (ja) スパッタリング方法
JP3415212B2 (ja) スパッタ成膜装置
JPH01184267A (ja) 絶縁膜コーティング方法
JPH1136069A (ja) 成膜装置の排気方法
JPH1068065A (ja) 光学基体上に反射防止膜を蒸着する方法
JPS62237720A (ja) 分子線結晶成長装置
JP2579588Y2 (ja) スパッタリング装置
JPS615521A (ja) プラズマ処理装置
JPH0978225A (ja) 薄膜の形成方法