SG43077A1 - Waterborne photoresists having associate thickeners - Google Patents
Waterborne photoresists having associate thickenersInfo
- Publication number
- SG43077A1 SG43077A1 SG1996003334A SG1996003334A SG43077A1 SG 43077 A1 SG43077 A1 SG 43077A1 SG 1996003334 A SG1996003334 A SG 1996003334A SG 1996003334 A SG1996003334 A SG 1996003334A SG 43077 A1 SG43077 A1 SG 43077A1
- Authority
- SG
- Singapore
- Prior art keywords
- neutralised
- compsn
- base
- binder polymer
- carboxylic acid
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/107—Polyamide or polyurethane
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/111—Polymer of unsaturated acid or ester
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Paints Or Removers (AREA)
- Paper (AREA)
- Telephone Function (AREA)
- Diaphragms For Electromechanical Transducers (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Polymerisation Methods In General (AREA)
- Colloid Chemistry (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US18687594A | 1994-01-25 | 1994-01-25 | |
US08/199,037 US5364737A (en) | 1994-01-25 | 1994-02-18 | Waterbone photoresists having associate thickeners |
Publications (1)
Publication Number | Publication Date |
---|---|
SG43077A1 true SG43077A1 (en) | 1997-10-17 |
Family
ID=26882508
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG1996003334A SG43077A1 (en) | 1994-01-25 | 1994-10-27 | Waterborne photoresists having associate thickeners |
Country Status (15)
Country | Link |
---|---|
US (5) | US5364737A (ja) |
EP (1) | EP0664490B1 (ja) |
JP (1) | JP2705907B2 (ja) |
KR (5) | KR0142022B1 (ja) |
CN (1) | CN1078357C (ja) |
AT (1) | ATE164013T1 (ja) |
AU (1) | AU660392B1 (ja) |
BR (1) | BR9404738A (ja) |
CA (1) | CA2131044C (ja) |
DE (1) | DE69408970T2 (ja) |
ES (1) | ES2115165T3 (ja) |
HK (1) | HK1005070A1 (ja) |
IL (1) | IL112006A (ja) |
SG (1) | SG43077A1 (ja) |
TW (4) | TW269018B (ja) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5741621A (en) * | 1994-01-10 | 1998-04-21 | E. I. Du Pont De Nemours And Company | Process for using photoimageable films prepared for aqueous photoimageable liquid emulsions |
TW353158B (en) * | 1994-03-09 | 1999-02-21 | Nat Starch Chem Invest | Aqueous photoresist composition, method for preparing the same and circuit board comprising thereof |
JPH08328251A (ja) * | 1995-03-31 | 1996-12-13 | W R Grace & Co | 水性感光性樹脂組成物 |
JPH08328252A (ja) * | 1995-03-31 | 1996-12-13 | W R Grace & Co | 水性感光性樹脂組成物 |
US5565302A (en) * | 1995-04-21 | 1996-10-15 | W. R. Grace & Co.-Conn. | Process for preparing photosensitive resin composition |
US5512607A (en) * | 1995-06-06 | 1996-04-30 | W. R. Grace & Co.-Conn. | Unsaturated epoxy ester with quaternary ammonium and phosphate groups |
AU709577B2 (en) * | 1995-06-07 | 1999-09-02 | E.I. Du Pont De Nemours And Company | Process for using photoimageable films prepared from aqueous photoimageable liquid emulsions |
WO1996041240A1 (en) * | 1995-06-07 | 1996-12-19 | W.R. Grace & Co.-Conn. | Water photoresist emulsions and methods of preparation thereof |
US5925499A (en) * | 1995-08-01 | 1999-07-20 | Morton International, Inc. | Epoxy-containing waterborne photoimageable composition |
US5846699A (en) * | 1996-09-11 | 1998-12-08 | Eastman Kodak Company | Coating composition including polyurethane for imaging elements |
US6063550A (en) * | 1998-04-29 | 2000-05-16 | Morton International, Inc. | Aqueous developing solutions for reduced developer residue |
US5922522A (en) * | 1998-04-29 | 1999-07-13 | Morton International, Inc. | Aqueous developing solutions for reduced developer residue |
US6248506B1 (en) | 1998-12-04 | 2001-06-19 | Nichigo-Morton | Aqueous developing solutions for reduced developer residue |
JP2000267270A (ja) * | 1999-03-19 | 2000-09-29 | Clariant (Japan) Kk | ロールコート用感光性樹脂組成物およびロールコート方法 |
NL1013300C2 (nl) * | 1999-10-15 | 2001-04-18 | Stahl Int Bv | Werkwijze voor de bereiding van een dispersie van een anionische polymeer in water waarin geen vluchtige tertiaire-amines voorkomen, de verkregen dispersies en coatings welke met de genoemde dispersies verkregen worden. |
TW461988B (en) | 1999-12-17 | 2001-11-01 | Ind Tech Res Inst | Water soluble polymer and photoresist composition containing the same |
US6436540B1 (en) * | 2000-02-18 | 2002-08-20 | Omnova Solutions Inc. | Co-mingled polyurethane-polyvinyl ester polymer compositions and laminates |
US6306557B1 (en) * | 2000-04-20 | 2001-10-23 | Industrial Technology Research Foundation | Process for preparing water dispersible negative-type photosensitive compositions |
US6797146B2 (en) | 2000-11-02 | 2004-09-28 | Shipley Company, L.L.C. | Seed layer repair |
US7063895B2 (en) * | 2001-08-01 | 2006-06-20 | National Starch And Chemical Investment Holding Corporation | Hydrophobically modified solution polymers and their use in surface protecting formulations |
WO2003074198A2 (en) * | 2002-03-06 | 2003-09-12 | Akzo Nobel Coatings International B.V. | Water borne coating composition for film transfer and casting process |
US20040058276A1 (en) * | 2002-09-23 | 2004-03-25 | Dueber Thomas E. | Halo resistent, photoimagable coverlay compositions, having, advantageous application and removal properties, and methods relating thereto |
US7226959B2 (en) * | 2003-11-06 | 2007-06-05 | Sun Chemical Corporation | Water soluble energy curable stereo-crosslinkable ionomer compositions |
JP5955526B2 (ja) * | 2011-10-08 | 2016-07-20 | 株式会社日本触媒 | 塗料用水性樹脂組成物 |
US8703385B2 (en) * | 2012-02-10 | 2014-04-22 | 3M Innovative Properties Company | Photoresist composition |
CN103700432A (zh) * | 2013-12-20 | 2014-04-02 | 南昌大学 | 一种含流平剂涂层的漆包线 |
KR102536039B1 (ko) * | 2016-12-22 | 2023-05-23 | 일루미나, 인코포레이티드 | 임프린팅 장치 |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3929743A (en) * | 1972-10-10 | 1975-12-30 | Johnson & Son Inc S C | Polyampholytes |
US3912516A (en) * | 1973-07-27 | 1975-10-14 | Upjohn Co | Photopolyer composition containing a polyurethane binding agent |
DE2443785A1 (de) * | 1974-09-13 | 1976-04-01 | Basf Ag | Fluessige, photovernetzbare formmasse zur herstellung von reliefdruckplatten |
US4079028A (en) * | 1975-10-03 | 1978-03-14 | Rohm And Haas Company | Polyurethane thickeners in latex compositions |
US4248958A (en) * | 1979-05-23 | 1981-02-03 | Hoechst Aktiengesellschaft | Photopolymerizable mixture containing polyurethanes |
US4426485A (en) * | 1982-06-14 | 1984-01-17 | Union Carbide Corporation | Polymers with hydrophobe bunches |
US4952481A (en) * | 1985-02-12 | 1990-08-28 | Napp Systems (Usa), Inc. | Photosensitive resin composition |
US4767826A (en) * | 1985-07-18 | 1988-08-30 | Polytechnic Institute Of New York | Radiation-sensitive polymers |
US4743698A (en) * | 1985-10-01 | 1988-05-10 | Alco Chemical Corp. | Acrylic emulsion copolymers for thickening aqueous systems and copolymerizable surfactant monomers for use therein |
US4762747A (en) * | 1986-07-29 | 1988-08-09 | Industrial Technology Research Institute | Single component aqueous acrylic adhesive compositions for flexible printed circuits and laminates made therefrom |
JPH0246460A (ja) * | 1988-08-08 | 1990-02-15 | Toyobo Co Ltd | 感光性樹脂組成物 |
US4904772A (en) * | 1988-10-03 | 1990-02-27 | Aqualon Company | Mixed hydrophobe polymers |
US5045435A (en) * | 1988-11-25 | 1991-09-03 | Armstrong World Industries, Inc. | Water-borne, alkali-developable, photoresist coating compositions and their preparation |
US5268256A (en) * | 1990-08-02 | 1993-12-07 | Ppg Industries, Inc. | Photoimageable electrodepositable photoresist composition for producing non-tacky films |
JP3040202B2 (ja) * | 1991-07-12 | 2000-05-15 | ダブリュー・アール・グレース・アンド・カンパニー−コーン | 水系感光性樹脂組成物及びそれを用いたプリント回路板の製造方法 |
CA2084369A1 (en) * | 1991-12-11 | 1993-06-12 | Brent T. Speelman | Water-borne photoimageable compositions |
JP3240769B2 (ja) * | 1992-10-02 | 2001-12-25 | ジェイエスアール株式会社 | 感光性樹脂組成物 |
JPH06258832A (ja) * | 1992-11-17 | 1994-09-16 | W R Grace & Co | 感光性樹脂組成物 |
JPH06230573A (ja) * | 1993-01-29 | 1994-08-19 | Japan Synthetic Rubber Co Ltd | レジスト組成物 |
DE69502741T2 (de) * | 1994-01-10 | 1998-10-01 | Du Pont | Lichtempfindliche wässrige Emulsion, lichtempfindlicher Film und Verfahren zur Herstellung |
-
1994
- 1994-02-18 US US08/199,037 patent/US5364737A/en not_active Expired - Lifetime
- 1994-03-30 US US08/221,313 patent/US5387494A/en not_active Expired - Lifetime
- 1994-04-06 US US08/223,615 patent/US5389495A/en not_active Expired - Lifetime
- 1994-05-04 US US08/238,133 patent/US5393643A/en not_active Expired - Lifetime
- 1994-05-12 US US08/241,872 patent/US5411837A/en not_active Expired - Fee Related
- 1994-08-29 CA CA002131044A patent/CA2131044C/en not_active Expired - Fee Related
- 1994-08-29 AU AU71547/94A patent/AU660392B1/en not_active Ceased
- 1994-08-30 TW TW083107966A patent/TW269018B/zh not_active IP Right Cessation
- 1994-09-16 CN CN94116129A patent/CN1078357C/zh not_active Expired - Lifetime
- 1994-09-24 TW TW083108862A patent/TW301720B/zh active
- 1994-09-24 TW TW083108859A patent/TW263569B/zh not_active IP Right Cessation
- 1994-09-24 TW TW083108860A patent/TW300289B/zh not_active IP Right Cessation
- 1994-10-07 KR KR1019940025629A patent/KR0142022B1/ko not_active IP Right Cessation
- 1994-10-27 SG SG1996003334A patent/SG43077A1/en unknown
- 1994-10-27 AT AT94307904T patent/ATE164013T1/de not_active IP Right Cessation
- 1994-10-27 ES ES94307904T patent/ES2115165T3/es not_active Expired - Lifetime
- 1994-10-27 DE DE69408970T patent/DE69408970T2/de not_active Expired - Fee Related
- 1994-10-27 EP EP94307904A patent/EP0664490B1/en not_active Expired - Lifetime
- 1994-11-21 KR KR1019940030567A patent/KR0149902B1/ko not_active IP Right Cessation
- 1994-11-21 KR KR1019940030568A patent/KR950024021A/ko not_active Application Discontinuation
- 1994-11-21 KR KR1019940030569A patent/KR0149903B1/ko not_active IP Right Cessation
- 1994-11-21 KR KR1019940030566A patent/KR0144639B1/ko not_active IP Right Cessation
- 1994-11-24 BR BR9404738A patent/BR9404738A/pt not_active IP Right Cessation
- 1994-12-16 IL IL11200694A patent/IL112006A/xx not_active IP Right Cessation
-
1995
- 1995-01-09 JP JP7001114A patent/JP2705907B2/ja not_active Expired - Lifetime
-
1998
- 1998-05-15 HK HK98104212A patent/HK1005070A1/xx not_active IP Right Cessation
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