KR950024021A - 설폰산 작용가를 갖는 결합제를 포함하는 수인성 감광성 내식막 - Google Patents

설폰산 작용가를 갖는 결합제를 포함하는 수인성 감광성 내식막 Download PDF

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Publication number
KR950024021A
KR950024021A KR1019940030568A KR19940030568A KR950024021A KR 950024021 A KR950024021 A KR 950024021A KR 1019940030568 A KR1019940030568 A KR 1019940030568A KR 19940030568 A KR19940030568 A KR 19940030568A KR 950024021 A KR950024021 A KR 950024021A
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KR
South Korea
Prior art keywords
photo
acid functionality
forming composition
weight percent
photoinitiator
Prior art date
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KR1019940030568A
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English (en)
Inventor
이. 바텀리 스티븐
이. 런디 대니얼
다다 벳시
케이. 바 로버트
Original Assignee
제럴드 케이. 화이트
모르톤 인터내셔날, 인코오포레이티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 제럴드 케이. 화이트, 모르톤 인터내셔날, 인코오포레이티드 filed Critical 제럴드 케이. 화이트
Publication of KR950024021A publication Critical patent/KR950024021A/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/107—Polyamide or polyurethane
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Paints Or Removers (AREA)
  • Paper (AREA)
  • Diaphragms For Electromechanical Transducers (AREA)
  • Telephone Function (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Polymerisation Methods In General (AREA)
  • Colloid Chemistry (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

본 발명은 약 50몰% 이상의 설폰산 작용가를 갖고, 알칼리 수용액내에서 현상시킬 수 있는 라텍스 결합제 중합체, 광 중합성 단량체 단편 및 광개시제 화학 시스템을 포함하는 수인성 광 상 형성 조성물 또는 감광성 내식막에 관한 것이다.

Description

설폰산 작용가를 갖는 결합제를 포함하는 수인성 감광성 내식막
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (3)

  1. 하기 성분 A)-D)의 총 중량을 기준하여, A) 약 50몰% 이상의 설폰산 작용가를 갖는 약 30 내지 약 80중량%의 라텍스 결합제 중합체(상기 산 작용가는 총 약 40 내지 약 250의 산가를 제공함);B) 약 15 내지 약 50중량%의 α, β-에틸렌형 불포화 단량체(들);C) 자유 라디칼을 생성하는 약 0.1 내지 약 25중량%의 광개시제 또는 광개시제 화학 시스템;및 D) 수성 유탁액으로 광 상 형성 조성물을 안정화시키기에 충분한 함량의 약 1 내지 약 40중량%의 중화 연기 및/또는 폴리에테르 폴리우레탄 결합증점제를 포함하는 수인성 광 상 형성 조성물.
  2. 제1항에 있어서, 수성 매질내에 분산되어 있는 광 상 형성 조성물.
  3. 중합체 지지 시이트 및 상기 시이트 위의 제1항의 광 상 형성 조성물층을 포함하는 무수 필름.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019940030568A 1994-01-25 1994-11-21 설폰산 작용가를 갖는 결합제를 포함하는 수인성 감광성 내식막 KR950024021A (ko)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US18687594A 1994-01-25 1994-01-25
US08/186,875 1994-01-25
US08/199,037 1994-02-18
US08/199,037 US5364737A (en) 1994-01-25 1994-02-18 Waterbone photoresists having associate thickeners
US08/241,872 1994-05-12
US08/241,872 US5411837A (en) 1994-01-25 1994-05-12 Waterborne photoresists having binders with sulfonic acid functionality

Publications (1)

Publication Number Publication Date
KR950024021A true KR950024021A (ko) 1995-08-21

Family

ID=26882508

Family Applications (5)

Application Number Title Priority Date Filing Date
KR1019940025629A KR0142022B1 (ko) 1994-01-25 1994-10-07 연합된 증점제를 갖는 수-부유성 감광성 내식막
KR1019940030569A KR0149903B1 (ko) 1994-01-25 1994-11-21 폴리실록산을 갖는 수-부유성 감광성 내식막
KR1019940030567A KR0149902B1 (ko) 1994-01-25 1994-11-21 비이온성 탄화 플루오르 계면 활성제를 갖는 수부유성 감광성 내식막
KR1019940030568A KR950024021A (ko) 1994-01-25 1994-11-21 설폰산 작용가를 갖는 결합제를 포함하는 수인성 감광성 내식막
KR1019940030566A KR0144639B1 (ko) 1994-01-25 1994-11-21 아미노 아크릴레이트로 중화된 결합제를 지닌 수-부유성 감광성 내식막

Family Applications Before (3)

Application Number Title Priority Date Filing Date
KR1019940025629A KR0142022B1 (ko) 1994-01-25 1994-10-07 연합된 증점제를 갖는 수-부유성 감광성 내식막
KR1019940030569A KR0149903B1 (ko) 1994-01-25 1994-11-21 폴리실록산을 갖는 수-부유성 감광성 내식막
KR1019940030567A KR0149902B1 (ko) 1994-01-25 1994-11-21 비이온성 탄화 플루오르 계면 활성제를 갖는 수부유성 감광성 내식막

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1019940030566A KR0144639B1 (ko) 1994-01-25 1994-11-21 아미노 아크릴레이트로 중화된 결합제를 지닌 수-부유성 감광성 내식막

Country Status (15)

Country Link
US (5) US5364737A (ko)
EP (1) EP0664490B1 (ko)
JP (1) JP2705907B2 (ko)
KR (5) KR0142022B1 (ko)
CN (1) CN1078357C (ko)
AT (1) ATE164013T1 (ko)
AU (1) AU660392B1 (ko)
BR (1) BR9404738A (ko)
CA (1) CA2131044C (ko)
DE (1) DE69408970T2 (ko)
ES (1) ES2115165T3 (ko)
HK (1) HK1005070A1 (ko)
IL (1) IL112006A (ko)
SG (1) SG43077A1 (ko)
TW (4) TW269018B (ko)

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Also Published As

Publication number Publication date
KR0144639B1 (ko) 1998-07-01
JP2705907B2 (ja) 1998-01-28
TW301720B (ko) 1997-04-01
IL112006A (en) 1999-11-30
IL112006A0 (en) 1995-03-15
SG43077A1 (en) 1997-10-17
JPH07271033A (ja) 1995-10-20
KR950024018A (ko) 1995-08-21
CA2131044A1 (en) 1995-07-26
ATE164013T1 (de) 1998-03-15
KR0142022B1 (ko) 1998-06-15
KR950024019A (ko) 1995-08-21
HK1005070A1 (en) 1998-12-18
AU660392B1 (en) 1995-06-22
CN1078357C (zh) 2002-01-23
TW269018B (ko) 1996-01-21
US5393643A (en) 1995-02-28
BR9404738A (pt) 1995-10-17
EP0664490A1 (en) 1995-07-26
KR950024020A (ko) 1995-08-21
CA2131044C (en) 1999-05-11
ES2115165T3 (es) 1998-06-16
US5387494A (en) 1995-02-07
CN1118886A (zh) 1996-03-20
DE69408970T2 (de) 1998-08-13
KR0149902B1 (ko) 1999-03-30
US5411837A (en) 1995-05-02
EP0664490B1 (en) 1998-03-11
KR950024022A (ko) 1995-08-21
TW300289B (ko) 1997-03-11
TW263569B (ko) 1995-11-21
US5389495A (en) 1995-02-14
DE69408970D1 (de) 1998-04-16
US5364737A (en) 1994-11-15
KR0149903B1 (ko) 1999-03-30

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