KR950024022A - 폴리실록산을 갖는 수-부유성 감광성 내식막 - Google Patents

폴리실록산을 갖는 수-부유성 감광성 내식막 Download PDF

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Publication number
KR950024022A
KR950024022A KR1019940030569A KR19940030569A KR950024022A KR 950024022 A KR950024022 A KR 950024022A KR 1019940030569 A KR1019940030569 A KR 1019940030569A KR 19940030569 A KR19940030569 A KR 19940030569A KR 950024022 A KR950024022 A KR 950024022A
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KR
South Korea
Prior art keywords
poly
weight percent
photoinitiator
siloxane
weight
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KR1019940030569A
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English (en)
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KR0149903B1 (ko
Inventor
케이. 바 로버트
에이. 데리코 진
Original Assignee
제랄드 케이. 화이트
모르톤 인터내셔날, 인코오포레이티드
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Publication of KR950024022A publication Critical patent/KR950024022A/ko
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Publication of KR0149903B1 publication Critical patent/KR0149903B1/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/107—Polyamide or polyurethane
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Paper (AREA)
  • Paints Or Removers (AREA)
  • Diaphragms For Electromechanical Transducers (AREA)
  • Telephone Function (AREA)
  • Colloid Chemistry (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

본 발명은 알칼리성 수용액에서 현상가능하게 하기에 충분한 카르복실산 작용성을 갖는 라텍스 결합제 중합체, 광중합성 단량체 단편, 광개시제 화학시스템 및 폴리(실록산(들))을 포함하는 수-부유성 광결상성 조성물 또는 감광성 내식막에 관한 것이다.

Description

폴리실록산을 갖는 수-부유성 감광성 내식막
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (5)

  1. A) 약 50 내지 약 250의 산가를 제공하는 카르복실산 작용성을 갖는 라텍스 결합제 중합체 약 30 내지 약 80중량%;B) 알파, 베타-에틸렌계 불포화된 단량체의 단편 약 15 내지 약 50중량%;C) 유리 라디칼을 형성하는 광개시제 또는 광개시제 화학 시스템 약 0.1 내지 약 25중량%;D) 상기 라텍스 결합제 중합체의 유화제를 안정화시키기에 충분한 양의 중화염기 및/또는 폴리에테르 폴리우레탄 연합된 중점제 약 1 내지 약 40중량%;및 E) 폴리(실록산) 또는 (폴리실록산)의 혼합물 약 0.1 내지 약 10중량%(여기에서, 상기한 중량%는 성분 A 내지 E의 총중량을 기준한 것이다)를 포함하며, 수중부유가능한(waterbornable) 광결상성(光結傷性) 조성물.
  2. 제1항에 있어서, 수성 매질내에 분산된 광결상성 조성물.
  3. 중합성 지지체 시트와 그위에 존재하는 제1항의 광결상성 조성물로 이루어진 층을 포함하는 건조필름.
  4. 제1항에 있어서, 폴리(실록산(들))이 폴리(디메틸실록산) 및 시클로폴리(디메틸실록산)으로 구성되는 그룹에서 선택되는 광결상성 조성물.
  5. 제1항에 있어서, 폴리(실록산)이 중량비가 약 1:9 내지 약 9:1인 폴리에테르 개질된 폴리(디메틸실록산)의 혼합물인 광결상성 조성물.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019940030569A 1994-01-25 1994-11-21 폴리실록산을 갖는 수-부유성 감광성 내식막 KR0149903B1 (ko)

Applications Claiming Priority (9)

Application Number Priority Date Filing Date Title
US18687594A 1994-01-25 1994-01-25
US08/186,875 1994-01-25
US8/186,875 1994-01-25
US08/199,037 1994-02-18
US8/199,037 1994-02-18
US08/199,037 US5364737A (en) 1994-01-25 1994-02-18 Waterbone photoresists having associate thickeners
US8/221,313 1994-03-30
US08/221,313 1994-03-30
US08/221,313 US5387494A (en) 1994-01-25 1994-03-30 Waterborne photoresists having polysiloxanes

Publications (2)

Publication Number Publication Date
KR950024022A true KR950024022A (ko) 1995-08-21
KR0149903B1 KR0149903B1 (ko) 1999-03-30

Family

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Family Applications (5)

Application Number Title Priority Date Filing Date
KR1019940025629A KR0142022B1 (ko) 1994-01-25 1994-10-07 연합된 증점제를 갖는 수-부유성 감광성 내식막
KR1019940030568A KR950024021A (ko) 1994-01-25 1994-11-21 설폰산 작용가를 갖는 결합제를 포함하는 수인성 감광성 내식막
KR1019940030566A KR0144639B1 (ko) 1994-01-25 1994-11-21 아미노 아크릴레이트로 중화된 결합제를 지닌 수-부유성 감광성 내식막
KR1019940030567A KR0149902B1 (ko) 1994-01-25 1994-11-21 비이온성 탄화 플루오르 계면 활성제를 갖는 수부유성 감광성 내식막
KR1019940030569A KR0149903B1 (ko) 1994-01-25 1994-11-21 폴리실록산을 갖는 수-부유성 감광성 내식막

Family Applications Before (4)

Application Number Title Priority Date Filing Date
KR1019940025629A KR0142022B1 (ko) 1994-01-25 1994-10-07 연합된 증점제를 갖는 수-부유성 감광성 내식막
KR1019940030568A KR950024021A (ko) 1994-01-25 1994-11-21 설폰산 작용가를 갖는 결합제를 포함하는 수인성 감광성 내식막
KR1019940030566A KR0144639B1 (ko) 1994-01-25 1994-11-21 아미노 아크릴레이트로 중화된 결합제를 지닌 수-부유성 감광성 내식막
KR1019940030567A KR0149902B1 (ko) 1994-01-25 1994-11-21 비이온성 탄화 플루오르 계면 활성제를 갖는 수부유성 감광성 내식막

Country Status (15)

Country Link
US (5) US5364737A (ko)
EP (1) EP0664490B1 (ko)
JP (1) JP2705907B2 (ko)
KR (5) KR0142022B1 (ko)
CN (1) CN1078357C (ko)
AT (1) ATE164013T1 (ko)
AU (1) AU660392B1 (ko)
BR (1) BR9404738A (ko)
CA (1) CA2131044C (ko)
DE (1) DE69408970T2 (ko)
ES (1) ES2115165T3 (ko)
HK (1) HK1005070A1 (ko)
IL (1) IL112006A (ko)
SG (1) SG43077A1 (ko)
TW (4) TW269018B (ko)

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KR100754232B1 (ko) * 1999-03-19 2007-09-03 에이제토 엘렉토로닉 마티리알즈 가부시키가이샤 롤 피복용 감광성 수지 조성물 및 롤 피복 방법

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HK1005070A1 (en) 1998-12-18
EP0664490A1 (en) 1995-07-26
AU660392B1 (en) 1995-06-22
SG43077A1 (en) 1997-10-17
KR0142022B1 (ko) 1998-06-15
ES2115165T3 (es) 1998-06-16
TW300289B (ko) 1997-03-11
US5387494A (en) 1995-02-07
CA2131044A1 (en) 1995-07-26
US5411837A (en) 1995-05-02
JP2705907B2 (ja) 1998-01-28
CA2131044C (en) 1999-05-11
TW269018B (ko) 1996-01-21
KR950024019A (ko) 1995-08-21
JPH07271033A (ja) 1995-10-20
TW263569B (ko) 1995-11-21
DE69408970D1 (de) 1998-04-16
KR950024018A (ko) 1995-08-21
DE69408970T2 (de) 1998-08-13
EP0664490B1 (en) 1998-03-11
ATE164013T1 (de) 1998-03-15
US5393643A (en) 1995-02-28
BR9404738A (pt) 1995-10-17
KR0144639B1 (ko) 1998-07-01
IL112006A (en) 1999-11-30
KR0149903B1 (ko) 1999-03-30
US5389495A (en) 1995-02-14
IL112006A0 (en) 1995-03-15
KR950024020A (ko) 1995-08-21
KR950024021A (ko) 1995-08-21
CN1118886A (zh) 1996-03-20
TW301720B (ko) 1997-04-01
KR0149902B1 (ko) 1999-03-30
CN1078357C (zh) 2002-01-23
US5364737A (en) 1994-11-15

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