ES2117216T3 - Fotoprotectores de base acuosa que contienen polisiloxanos. - Google Patents
Fotoprotectores de base acuosa que contienen polisiloxanos.Info
- Publication number
- ES2117216T3 ES2117216T3 ES94307902T ES94307902T ES2117216T3 ES 2117216 T3 ES2117216 T3 ES 2117216T3 ES 94307902 T ES94307902 T ES 94307902T ES 94307902 T ES94307902 T ES 94307902T ES 2117216 T3 ES2117216 T3 ES 2117216T3
- Authority
- ES
- Spain
- Prior art keywords
- compsn
- photoprotectors
- water based
- containing polysiloxanes
- polysiloxanes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Silicon Polymers (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Adornments (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Materials For Photolithography (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Paints Or Removers (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
Abstract
UNA COMPOSICION FLOTANTE CON LA QUE SE PUEDEN FORMAR IMAGENES POR VIA FOTOMECANICA O SUSTANCIA PROTECTORA FOTOSENSIBLE QUE CONTIENE UN POLIMERO AGLUTINANTE DE LATEX QUE POSEE UNA FUNCIONALIDAD DEL ACIDO CARBOXILICO SUFICIENTE COMO PARA QUE SE PUEDA REVELAR EN UNA SOLUCION ACUOSA ALCALINA, UNA FRACCION MONOMERICA FOTOPOLIMERIZABLE, UN SISTEMA QUIMICO FOTOINICIADOR Y UN POLI(SILOXANO(S)).
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US18687594A | 1994-01-25 | 1994-01-25 | |
US08/199,037 US5364737A (en) | 1994-01-25 | 1994-02-18 | Waterbone photoresists having associate thickeners |
US08/221,313 US5387494A (en) | 1994-01-25 | 1994-03-30 | Waterborne photoresists having polysiloxanes |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2117216T3 true ES2117216T3 (es) | 1998-08-01 |
Family
ID=27392160
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES94307902T Expired - Lifetime ES2117216T3 (es) | 1994-01-25 | 1994-10-27 | Fotoprotectores de base acuosa que contienen polisiloxanos. |
Country Status (12)
Country | Link |
---|---|
EP (1) | EP0664491B1 (es) |
JP (1) | JP2703731B2 (es) |
CN (1) | CN1072812C (es) |
AT (1) | ATE162894T1 (es) |
AU (1) | AU661438B1 (es) |
BR (1) | BR9500255A (es) |
CA (1) | CA2133149C (es) |
DE (1) | DE69408295T2 (es) |
ES (1) | ES2117216T3 (es) |
HK (1) | HK1002939A1 (es) |
IL (1) | IL112009A (es) |
SG (1) | SG43816A1 (es) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4397601B2 (ja) * | 2003-02-06 | 2010-01-13 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | フェノール−ビフェニレン樹脂を含むネガ型感光性樹脂組成物 |
TWI377440B (en) * | 2004-10-14 | 2012-11-21 | Sumitomo Chemical Co | Radiation sensitive resin composition |
TW200622486A (en) * | 2004-10-14 | 2006-07-01 | Sumitomo Chemical Co | Radiation sensitive resin composition |
CN100426015C (zh) * | 2006-02-15 | 2008-10-15 | 虹创科技股份有限公司 | 彩色滤光片分隔墙及其制造方法,彩色滤光片及其制造方法 |
US8703385B2 (en) * | 2012-02-10 | 2014-04-22 | 3M Innovative Properties Company | Photoresist composition |
EP2883109A1 (en) | 2012-08-09 | 2015-06-17 | 3M Innovative Properties Company | Photocurable compositions |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2443785A1 (de) * | 1974-09-13 | 1976-04-01 | Basf Ag | Fluessige, photovernetzbare formmasse zur herstellung von reliefdruckplatten |
US4079028A (en) | 1975-10-03 | 1978-03-14 | Rohm And Haas Company | Polyurethane thickeners in latex compositions |
DE3022473A1 (de) * | 1980-06-14 | 1981-12-24 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches kopiermaterial und verfahren zu seiner herstellung |
US4767826A (en) * | 1985-07-18 | 1988-08-30 | Polytechnic Institute Of New York | Radiation-sensitive polymers |
US4743698A (en) | 1985-10-01 | 1988-05-10 | Alco Chemical Corp. | Acrylic emulsion copolymers for thickening aqueous systems and copolymerizable surfactant monomers for use therein |
US4762747A (en) * | 1986-07-29 | 1988-08-09 | Industrial Technology Research Institute | Single component aqueous acrylic adhesive compositions for flexible printed circuits and laminates made therefrom |
JPH0246460A (ja) * | 1988-08-08 | 1990-02-15 | Toyobo Co Ltd | 感光性樹脂組成物 |
US5045435A (en) * | 1988-11-25 | 1991-09-03 | Armstrong World Industries, Inc. | Water-borne, alkali-developable, photoresist coating compositions and their preparation |
US5268256A (en) * | 1990-08-02 | 1993-12-07 | Ppg Industries, Inc. | Photoimageable electrodepositable photoresist composition for producing non-tacky films |
JP3040202B2 (ja) * | 1991-07-12 | 2000-05-15 | ダブリュー・アール・グレース・アンド・カンパニー−コーン | 水系感光性樹脂組成物及びそれを用いたプリント回路板の製造方法 |
JP3240769B2 (ja) * | 1992-10-02 | 2001-12-25 | ジェイエスアール株式会社 | 感光性樹脂組成物 |
JPH06258832A (ja) * | 1992-11-17 | 1994-09-16 | W R Grace & Co | 感光性樹脂組成物 |
JPH06230573A (ja) * | 1993-01-29 | 1994-08-19 | Japan Synthetic Rubber Co Ltd | レジスト組成物 |
DE69502741T2 (de) * | 1994-01-10 | 1998-10-01 | Du Pont | Lichtempfindliche wässrige Emulsion, lichtempfindlicher Film und Verfahren zur Herstellung |
-
1994
- 1994-09-27 AU AU74214/94A patent/AU661438B1/en not_active Ceased
- 1994-09-28 CA CA002133149A patent/CA2133149C/en not_active Expired - Fee Related
- 1994-10-27 DE DE69408295T patent/DE69408295T2/de not_active Expired - Fee Related
- 1994-10-27 AT AT94307902T patent/ATE162894T1/de not_active IP Right Cessation
- 1994-10-27 EP EP94307902A patent/EP0664491B1/en not_active Expired - Lifetime
- 1994-10-27 SG SG1996001194A patent/SG43816A1/en unknown
- 1994-10-27 ES ES94307902T patent/ES2117216T3/es not_active Expired - Lifetime
- 1994-11-21 CN CN94118621A patent/CN1072812C/zh not_active Expired - Fee Related
- 1994-12-16 IL IL11200994A patent/IL112009A/en not_active IP Right Cessation
-
1995
- 1995-01-19 BR BR9500255A patent/BR9500255A/pt not_active IP Right Cessation
- 1995-01-23 JP JP7007978A patent/JP2703731B2/ja not_active Expired - Lifetime
-
1998
- 1998-03-11 HK HK98102010A patent/HK1002939A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
ATE162894T1 (de) | 1998-02-15 |
CA2133149C (en) | 1999-05-11 |
JPH07234506A (ja) | 1995-09-05 |
CN1072812C (zh) | 2001-10-10 |
IL112009A (en) | 1999-03-12 |
DE69408295T2 (de) | 1998-05-14 |
CN1106936A (zh) | 1995-08-16 |
EP0664491B1 (en) | 1998-01-28 |
SG43816A1 (en) | 1997-11-14 |
IL112009A0 (en) | 1995-03-15 |
HK1002939A1 (en) | 1998-09-25 |
AU661438B1 (en) | 1995-07-20 |
EP0664491A1 (en) | 1995-07-26 |
JP2703731B2 (ja) | 1998-01-26 |
DE69408295D1 (de) | 1998-03-05 |
CA2133149A1 (en) | 1995-07-26 |
BR9500255A (pt) | 1995-11-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FG2A | Definitive protection |
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