TW200622486A - Radiation sensitive resin composition - Google Patents
Radiation sensitive resin compositionInfo
- Publication number
- TW200622486A TW200622486A TW094135105A TW94135105A TW200622486A TW 200622486 A TW200622486 A TW 200622486A TW 094135105 A TW094135105 A TW 094135105A TW 94135105 A TW94135105 A TW 94135105A TW 200622486 A TW200622486 A TW 200622486A
- Authority
- TW
- Taiwan
- Prior art keywords
- resin composition
- silicone
- radiation sensitive
- sensitive resin
- active agent
- Prior art date
Links
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Materials For Photolithography (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
The present invention relates to a radiation sensitive resin composition comprising a curable, alkali-soluble resin (A), a quinonediazide compound (B), a solvent (C) and a silicone-based surface active agent (D), said silicone-based surface active agent (D) containing a silicone-based surface active agent (D1) having an HLB (Hydrophile Lipophile Balance) value between 1 to 9 and a silicone-based surface active agent (D2) having an HLB value more than 9.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004300160 | 2004-10-14 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200622486A true TW200622486A (en) | 2006-07-01 |
Family
ID=36706871
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094135105A TW200622486A (en) | 2004-10-14 | 2005-10-07 | Radiation sensitive resin composition |
Country Status (3)
Country | Link |
---|---|
KR (1) | KR20060052212A (en) |
CN (1) | CN1760757B (en) |
TW (1) | TW200622486A (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102286218A (en) * | 2006-09-04 | 2011-12-21 | Jsr株式会社 | Pigment resin composition, resin composition for ink jet mode color filter, color filter and liquid crystal display device |
CN102352122A (en) * | 2006-09-04 | 2012-02-15 | Jsr株式会社 | Pigment-resin composition, resin composition for ink-jet type color filter, the ink-jet type color filter and liquid crystal display device |
TWI425315B (en) * | 2007-01-18 | 2014-02-01 | Jsr Corp | Sensitive radiation linear resin composition, interlayer insulating film and microlens, and the like |
TWI536094B (en) * | 2007-12-25 | 2016-06-01 | Asahi Kasei Emd Corp | Photosensitive resin laminate |
KR20160095879A (en) * | 2015-02-04 | 2016-08-12 | 동우 화인켐 주식회사 | Photosensitive resin comopsition, photocurable pattern formed from the same and image display comprising the pattern |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU661438B1 (en) * | 1994-01-25 | 1995-07-20 | Morton International, Inc. | Waterborne photoresists having polysiloxanes |
JP2000267270A (en) * | 1999-03-19 | 2000-09-29 | Clariant (Japan) Kk | Photosensitive resin composition for roll coating and roll coating method |
US6984476B2 (en) * | 2002-04-15 | 2006-01-10 | Sharp Kabushiki Kaisha | Radiation-sensitive resin composition, forming process for forming patterned insulation film, active matrix board and flat-panel display device equipped with the same, and process for producing flat-panel display device |
-
2005
- 2005-10-07 TW TW094135105A patent/TW200622486A/en unknown
- 2005-10-12 KR KR1020050095942A patent/KR20060052212A/en active IP Right Grant
- 2005-10-14 CN CN2005101137411A patent/CN1760757B/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR20060052212A (en) | 2006-05-19 |
CN1760757B (en) | 2010-11-10 |
CN1760757A (en) | 2006-04-19 |
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