TW200622487A - Radiation sensitive resin composition - Google Patents
Radiation sensitive resin compositionInfo
- Publication number
- TW200622487A TW200622487A TW094135321A TW94135321A TW200622487A TW 200622487 A TW200622487 A TW 200622487A TW 094135321 A TW094135321 A TW 094135321A TW 94135321 A TW94135321 A TW 94135321A TW 200622487 A TW200622487 A TW 200622487A
- Authority
- TW
- Taiwan
- Prior art keywords
- resin composition
- radiation sensitive
- sensitive resin
- active agent
- surface active
- Prior art date
Links
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Materials For Photolithography (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
Abstract
A radiation sensitive resin composition comprising an alkali soluble resin (A) having curalility, a quinonediazide compound (B), a solvent (C), silicone-based surface active agent (D) and a fluorine-based surface active agent (E), is provided in the present invention.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004300159 | 2004-10-14 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200622487A true TW200622487A (en) | 2006-07-01 |
TWI377440B TWI377440B (en) | 2012-11-21 |
Family
ID=36706872
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094135321A TWI377440B (en) | 2004-10-14 | 2005-10-11 | Radiation sensitive resin composition |
Country Status (3)
Country | Link |
---|---|
KR (1) | KR20060052211A (en) |
CN (1) | CN1760758B (en) |
TW (1) | TWI377440B (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI536094B (en) * | 2007-12-25 | 2016-06-01 | Asahi Kasei Emd Corp | Photosensitive resin laminate |
JP5607346B2 (en) * | 2009-01-06 | 2014-10-15 | 住友化学株式会社 | Photosensitive resin composition, coating film, pattern and display device |
KR101669085B1 (en) * | 2009-01-28 | 2016-10-25 | 제이에스알 가부시끼가이샤 | Radiation sensitive resin composition, and interlayer insulating film and forming method thereof |
KR20160095879A (en) * | 2015-02-04 | 2016-08-12 | 동우 화인켐 주식회사 | Photosensitive resin comopsition, photocurable pattern formed from the same and image display comprising the pattern |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU661438B1 (en) * | 1994-01-25 | 1995-07-20 | Morton International, Inc. | Waterborne photoresists having polysiloxanes |
JP2000267270A (en) * | 1999-03-19 | 2000-09-29 | Clariant (Japan) Kk | Photosensitive resin composition for roll coating and roll coating method |
US6984476B2 (en) * | 2002-04-15 | 2006-01-10 | Sharp Kabushiki Kaisha | Radiation-sensitive resin composition, forming process for forming patterned insulation film, active matrix board and flat-panel display device equipped with the same, and process for producing flat-panel display device |
-
2005
- 2005-10-11 TW TW094135321A patent/TWI377440B/en not_active IP Right Cessation
- 2005-10-12 KR KR1020050095937A patent/KR20060052211A/en active IP Right Grant
- 2005-10-14 CN CN2005101137426A patent/CN1760758B/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CN1760758B (en) | 2010-11-03 |
TWI377440B (en) | 2012-11-21 |
KR20060052211A (en) | 2006-05-19 |
CN1760758A (en) | 2006-04-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |