CN1072812C - 感光成象组合物和涂覆该组合物的干片 - Google Patents
感光成象组合物和涂覆该组合物的干片 Download PDFInfo
- Publication number
- CN1072812C CN1072812C CN94118621A CN94118621A CN1072812C CN 1072812 C CN1072812 C CN 1072812C CN 94118621 A CN94118621 A CN 94118621A CN 94118621 A CN94118621 A CN 94118621A CN 1072812 C CN1072812 C CN 1072812C
- Authority
- CN
- China
- Prior art keywords
- composition
- weight
- photographic imaging
- polyether
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Silicon Polymers (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Materials For Photolithography (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Adornments (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Paints Or Removers (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Abstract
Description
Claims (5)
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US18687594A | 1994-01-25 | 1994-01-25 | |
US08/186,875 | 1994-01-25 | ||
US08/199,037 | 1994-02-18 | ||
US08/199,037 US5364737A (en) | 1994-01-25 | 1994-02-18 | Waterbone photoresists having associate thickeners |
US08/221,313 US5387494A (en) | 1994-01-25 | 1994-03-30 | Waterborne photoresists having polysiloxanes |
US08/221,313 | 1994-03-30 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1106936A CN1106936A (zh) | 1995-08-16 |
CN1072812C true CN1072812C (zh) | 2001-10-10 |
Family
ID=27392160
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN94118621A Expired - Fee Related CN1072812C (zh) | 1994-01-25 | 1994-11-21 | 感光成象组合物和涂覆该组合物的干片 |
Country Status (12)
Country | Link |
---|---|
EP (1) | EP0664491B1 (zh) |
JP (1) | JP2703731B2 (zh) |
CN (1) | CN1072812C (zh) |
AT (1) | ATE162894T1 (zh) |
AU (1) | AU661438B1 (zh) |
BR (1) | BR9500255A (zh) |
CA (1) | CA2133149C (zh) |
DE (1) | DE69408295T2 (zh) |
ES (1) | ES2117216T3 (zh) |
HK (1) | HK1002939A1 (zh) |
IL (1) | IL112009A (zh) |
SG (1) | SG43816A1 (zh) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4397601B2 (ja) * | 2003-02-06 | 2010-01-13 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | フェノール−ビフェニレン樹脂を含むネガ型感光性樹脂組成物 |
TWI377440B (en) * | 2004-10-14 | 2012-11-21 | Sumitomo Chemical Co | Radiation sensitive resin composition |
TW200622486A (en) * | 2004-10-14 | 2006-07-01 | Sumitomo Chemical Co | Radiation sensitive resin composition |
CN100426015C (zh) * | 2006-02-15 | 2008-10-15 | 虹创科技股份有限公司 | 彩色滤光片分隔墙及其制造方法,彩色滤光片及其制造方法 |
US8703385B2 (en) * | 2012-02-10 | 2014-04-22 | 3M Innovative Properties Company | Photoresist composition |
WO2014025716A1 (en) * | 2012-08-09 | 2014-02-13 | 3M Innovative Properties Company | Photocurable compositions |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2443785A1 (de) * | 1974-09-13 | 1976-04-01 | Basf Ag | Fluessige, photovernetzbare formmasse zur herstellung von reliefdruckplatten |
US4079028A (en) * | 1975-10-03 | 1978-03-14 | Rohm And Haas Company | Polyurethane thickeners in latex compositions |
DE3022473A1 (de) * | 1980-06-14 | 1981-12-24 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches kopiermaterial und verfahren zu seiner herstellung |
US4767826A (en) * | 1985-07-18 | 1988-08-30 | Polytechnic Institute Of New York | Radiation-sensitive polymers |
US4743698A (en) * | 1985-10-01 | 1988-05-10 | Alco Chemical Corp. | Acrylic emulsion copolymers for thickening aqueous systems and copolymerizable surfactant monomers for use therein |
US4762747A (en) * | 1986-07-29 | 1988-08-09 | Industrial Technology Research Institute | Single component aqueous acrylic adhesive compositions for flexible printed circuits and laminates made therefrom |
JPH0246460A (ja) * | 1988-08-08 | 1990-02-15 | Toyobo Co Ltd | 感光性樹脂組成物 |
US5045435A (en) * | 1988-11-25 | 1991-09-03 | Armstrong World Industries, Inc. | Water-borne, alkali-developable, photoresist coating compositions and their preparation |
US5268256A (en) * | 1990-08-02 | 1993-12-07 | Ppg Industries, Inc. | Photoimageable electrodepositable photoresist composition for producing non-tacky films |
JP3040202B2 (ja) * | 1991-07-12 | 2000-05-15 | ダブリュー・アール・グレース・アンド・カンパニー−コーン | 水系感光性樹脂組成物及びそれを用いたプリント回路板の製造方法 |
JP3240769B2 (ja) * | 1992-10-02 | 2001-12-25 | ジェイエスアール株式会社 | 感光性樹脂組成物 |
JPH06258832A (ja) * | 1992-11-17 | 1994-09-16 | W R Grace & Co | 感光性樹脂組成物 |
JPH06230573A (ja) * | 1993-01-29 | 1994-08-19 | Japan Synthetic Rubber Co Ltd | レジスト組成物 |
EP0666504B1 (en) * | 1994-01-10 | 1998-06-03 | E.I. Du Pont De Nemours And Company | Aqueous photoimageable liquid emulsion, photoimageable film and process of manufacture |
-
1994
- 1994-09-27 AU AU74214/94A patent/AU661438B1/en not_active Ceased
- 1994-09-28 CA CA002133149A patent/CA2133149C/en not_active Expired - Fee Related
- 1994-10-27 EP EP94307902A patent/EP0664491B1/en not_active Expired - Lifetime
- 1994-10-27 ES ES94307902T patent/ES2117216T3/es not_active Expired - Lifetime
- 1994-10-27 AT AT94307902T patent/ATE162894T1/de not_active IP Right Cessation
- 1994-10-27 DE DE69408295T patent/DE69408295T2/de not_active Expired - Fee Related
- 1994-10-27 SG SG1996001194A patent/SG43816A1/en unknown
- 1994-11-21 CN CN94118621A patent/CN1072812C/zh not_active Expired - Fee Related
- 1994-12-16 IL IL11200994A patent/IL112009A/en not_active IP Right Cessation
-
1995
- 1995-01-19 BR BR9500255A patent/BR9500255A/pt not_active IP Right Cessation
- 1995-01-23 JP JP7007978A patent/JP2703731B2/ja not_active Expired - Lifetime
-
1998
- 1998-03-11 HK HK98102010A patent/HK1002939A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
IL112009A0 (en) | 1995-03-15 |
CA2133149C (en) | 1999-05-11 |
SG43816A1 (en) | 1997-11-14 |
CN1106936A (zh) | 1995-08-16 |
BR9500255A (pt) | 1995-11-14 |
JP2703731B2 (ja) | 1998-01-26 |
ATE162894T1 (de) | 1998-02-15 |
ES2117216T3 (es) | 1998-08-01 |
AU661438B1 (en) | 1995-07-20 |
CA2133149A1 (en) | 1995-07-26 |
DE69408295T2 (de) | 1998-05-14 |
JPH07234506A (ja) | 1995-09-05 |
EP0664491A1 (en) | 1995-07-26 |
HK1002939A1 (en) | 1998-09-25 |
EP0664491B1 (en) | 1998-01-28 |
DE69408295D1 (de) | 1998-03-05 |
IL112009A (en) | 1999-03-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C06 | Publication | ||
PB01 | Publication | ||
C53 | Correction of patent of invention or patent application | ||
CP02 | Change in the address of a patent holder |
Address after: Illinois, United States Applicant after: Morton International, Inc. Applicant before: Morton International, Inc. |
|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: ROHM AND HAAS CHEMICALS CO., LTD. Free format text: FORMER OWNER: MERTON INTERNATIONAL CO., LTD. Effective date: 20070112 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20070112 Address after: American Pennsylvania Patentee after: Roman Haas chemical Limited Liability Company Address before: Illinois, United States Patentee before: Morton International, Inc. |
|
C19 | Lapse of patent right due to non-payment of the annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |