CN1071910C - 含有非离子氟代烃表面活性剂的水性光刻胶 - Google Patents
含有非离子氟代烃表面活性剂的水性光刻胶 Download PDFInfo
- Publication number
- CN1071910C CN1071910C CN94113847A CN94113847A CN1071910C CN 1071910 C CN1071910 C CN 1071910C CN 94113847 A CN94113847 A CN 94113847A CN 94113847 A CN94113847 A CN 94113847A CN 1071910 C CN1071910 C CN 1071910C
- Authority
- CN
- China
- Prior art keywords
- composition
- weight
- photographic imaging
- monomer
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
Landscapes
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Materials For Photolithography (AREA)
- Developing Agents For Electrophotography (AREA)
- Photoreceptors In Electrophotography (AREA)
- Chemical And Physical Treatments For Wood And The Like (AREA)
- Emulsifying, Dispersing, Foam-Producing Or Wetting Agents (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Polyurethanes Or Polyureas (AREA)
- Paints Or Removers (AREA)
Abstract
Description
不加入表面活性剂 | 加烃表面活性剂 | 加硅氧烷表面活性剂 | 加FC120阴离子的含氟化合物 | 加FC431非离子含氟化合物 | 加FC170C非离子含氟化合物 | |
涂层缺陷 | >100空穴/呎2 | 50空穴/呎2 | 25空穴/呎2 | 5空穴/呎2 | 10空穴/呎2 | 0空穴/呎2 |
泡沫高度 | 10mm | 7mm | 7mm | 35mm | 10mm | 10mm |
(对泡沫的净影响) | (-) | (-3mm) | (-3mm) | (+25mm) | (-) | 净影响为0 |
不加入表面活性剂 | +0.4%** | 0.8%FC-170C | +1.5%FC-170C | +3.0%FC-170C | +6.0%FC-170C | |
涂层缺陷 | >100空穴/呎2 | 3空穴/呎2 | 1空穴/呎2 | 0空穴/呎2 | 0空穴/呎2 | 1空穴/呎2 |
起泡高度 | 10mm | 10mm | 10mm | 10mm | 10mm | 10mm |
(对泡沫的净影响) | (-) | (-) | (-) | (-) | (-) | (-) |
Claims (3)
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US18687594A | 1994-01-25 | 1994-01-25 | |
US08/186875 | 1994-01-25 | ||
US08/199037 | 1994-02-18 | ||
US08/199,037 US5364737A (en) | 1994-01-25 | 1994-02-18 | Waterbone photoresists having associate thickeners |
US08/223615 | 1994-04-06 | ||
US08/223,615 US5389495A (en) | 1994-01-25 | 1994-04-06 | Waterborne photoresists having non-ionic fluorocarbon surfactants |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1107585A CN1107585A (zh) | 1995-08-30 |
CN1071910C true CN1071910C (zh) | 2001-09-26 |
Family
ID=27392161
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN94113847A Expired - Fee Related CN1071910C (zh) | 1994-01-25 | 1994-11-21 | 含有非离子氟代烃表面活性剂的水性光刻胶 |
Country Status (12)
Country | Link |
---|---|
EP (1) | EP0664486B1 (zh) |
JP (1) | JP2703732B2 (zh) |
CN (1) | CN1071910C (zh) |
AT (1) | ATE177214T1 (zh) |
AU (1) | AU660882B1 (zh) |
BR (1) | BR9500256A (zh) |
CA (1) | CA2133147C (zh) |
DE (1) | DE69416814T2 (zh) |
ES (1) | ES2130366T3 (zh) |
HK (1) | HK1005151A1 (zh) |
IL (1) | IL112005A (zh) |
SG (1) | SG50509A1 (zh) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2002077714A1 (fr) * | 2001-03-26 | 2002-10-03 | Nippon Paint Co., Ltd. | Matiere de reserve isolante ignifuge autonome et materiau isolant |
US8703385B2 (en) * | 2012-02-10 | 2014-04-22 | 3M Innovative Properties Company | Photoresist composition |
JP2014079960A (ja) * | 2012-10-17 | 2014-05-08 | Eastman Kodak Co | 平版印刷版用組成物及び平版印刷版原版 |
CN108475010A (zh) * | 2015-11-23 | 2018-08-31 | 耶路撒冷希伯来大学伊森姆研究发展有限公司 | 颗粒状光引发剂及其用途 |
CN112898185B (zh) * | 2021-01-26 | 2022-06-03 | 宁波南大光电材料有限公司 | 用于浸没式光刻胶的含氟化合物及其制备方法、光刻胶 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2443785A1 (de) * | 1974-09-13 | 1976-04-01 | Basf Ag | Fluessige, photovernetzbare formmasse zur herstellung von reliefdruckplatten |
US4079028A (en) * | 1975-10-03 | 1978-03-14 | Rohm And Haas Company | Polyurethane thickeners in latex compositions |
JPS57178242A (en) * | 1981-04-27 | 1982-11-02 | Konishiroku Photo Ind Co Ltd | Photosensitive lithographic plate |
US4767826A (en) * | 1985-07-18 | 1988-08-30 | Polytechnic Institute Of New York | Radiation-sensitive polymers |
US4743698A (en) * | 1985-10-01 | 1988-05-10 | Alco Chemical Corp. | Acrylic emulsion copolymers for thickening aqueous systems and copolymerizable surfactant monomers for use therein |
US4762747A (en) * | 1986-07-29 | 1988-08-09 | Industrial Technology Research Institute | Single component aqueous acrylic adhesive compositions for flexible printed circuits and laminates made therefrom |
JPH0830140B2 (ja) * | 1987-08-17 | 1996-03-27 | コニカ株式会社 | 感光性平版印刷版 |
JPH0246460A (ja) * | 1988-08-08 | 1990-02-15 | Toyobo Co Ltd | 感光性樹脂組成物 |
US5045435A (en) * | 1988-11-25 | 1991-09-03 | Armstrong World Industries, Inc. | Water-borne, alkali-developable, photoresist coating compositions and their preparation |
JP2739382B2 (ja) * | 1990-12-06 | 1998-04-15 | 富士写真フイルム株式会社 | 平版印刷版の製造方法 |
JP3040202B2 (ja) * | 1991-07-12 | 2000-05-15 | ダブリュー・アール・グレース・アンド・カンパニー−コーン | 水系感光性樹脂組成物及びそれを用いたプリント回路板の製造方法 |
JP3240769B2 (ja) * | 1992-10-02 | 2001-12-25 | ジェイエスアール株式会社 | 感光性樹脂組成物 |
JPH06258832A (ja) * | 1992-11-17 | 1994-09-16 | W R Grace & Co | 感光性樹脂組成物 |
JPH06230573A (ja) * | 1993-01-29 | 1994-08-19 | Japan Synthetic Rubber Co Ltd | レジスト組成物 |
DE69502741T2 (de) * | 1994-01-10 | 1998-10-01 | Du Pont | Lichtempfindliche wässrige Emulsion, lichtempfindlicher Film und Verfahren zur Herstellung |
-
1994
- 1994-09-27 AU AU74216/94A patent/AU660882B1/en not_active Ceased
- 1994-09-28 CA CA002133147A patent/CA2133147C/en not_active Expired - Fee Related
- 1994-10-27 DE DE69416814T patent/DE69416814T2/de not_active Expired - Fee Related
- 1994-10-27 SG SG1996002996A patent/SG50509A1/en unknown
- 1994-10-27 AT AT94307901T patent/ATE177214T1/de not_active IP Right Cessation
- 1994-10-27 EP EP94307901A patent/EP0664486B1/en not_active Expired - Lifetime
- 1994-10-27 ES ES94307901T patent/ES2130366T3/es not_active Expired - Lifetime
- 1994-11-21 CN CN94113847A patent/CN1071910C/zh not_active Expired - Fee Related
- 1994-12-16 IL IL11200594A patent/IL112005A/en not_active IP Right Cessation
-
1995
- 1995-01-19 BR BR9500256A patent/BR9500256A/pt not_active IP Right Cessation
- 1995-01-24 JP JP7008841A patent/JP2703732B2/ja not_active Expired - Fee Related
-
1998
- 1998-05-19 HK HK98104283A patent/HK1005151A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
IL112005A0 (en) | 1995-03-15 |
EP0664486B1 (en) | 1999-03-03 |
DE69416814T2 (de) | 1999-07-08 |
BR9500256A (pt) | 1995-10-17 |
JPH07219222A (ja) | 1995-08-18 |
CN1107585A (zh) | 1995-08-30 |
IL112005A (en) | 1999-01-26 |
ATE177214T1 (de) | 1999-03-15 |
CA2133147C (en) | 1999-05-11 |
HK1005151A1 (en) | 1998-12-24 |
SG50509A1 (en) | 1999-11-16 |
EP0664486A1 (en) | 1995-07-26 |
AU660882B1 (en) | 1995-07-06 |
CA2133147A1 (en) | 1995-07-26 |
JP2703732B2 (ja) | 1998-01-26 |
DE69416814D1 (de) | 1999-04-08 |
ES2130366T3 (es) | 1999-07-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C06 | Publication | ||
PB01 | Publication | ||
C53 | Correction of patent of invention or patent application | ||
CB02 | Change of applicant information |
Address after: Illinois Applicant after: Morton International, Inc. Address before: Illinois Applicant before: Morton International, Inc. |
|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: ROHM AND HAAS CHEMICALS CO., LTD. Free format text: FORMER OWNER: MERTON INTERNATIONAL CO., LTD. Effective date: 20070112 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20070112 Address after: American Pennsylvania Patentee after: Roman Haas chemical Limited Liability Company Address before: Illinois Patentee before: Morton International, Inc. |
|
C19 | Lapse of patent right due to non-payment of the annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |