ATE177214T1 - Wässrige emulsionsphotoresiste mit nichtionischen fluorkohlenwasserstoffenthaltenden oberflächenaktiven substanzen - Google Patents

Wässrige emulsionsphotoresiste mit nichtionischen fluorkohlenwasserstoffenthaltenden oberflächenaktiven substanzen

Info

Publication number
ATE177214T1
ATE177214T1 AT94307901T AT94307901T ATE177214T1 AT E177214 T1 ATE177214 T1 AT E177214T1 AT 94307901 T AT94307901 T AT 94307901T AT 94307901 T AT94307901 T AT 94307901T AT E177214 T1 ATE177214 T1 AT E177214T1
Authority
AT
Austria
Prior art keywords
photoresists
active substances
aqueous emulsion
ionic surface
substances containing
Prior art date
Application number
AT94307901T
Other languages
English (en)
Inventor
Robert K Barr
Original Assignee
Morton Int Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US08/199,037 external-priority patent/US5364737A/en
Application filed by Morton Int Inc filed Critical Morton Int Inc
Application granted granted Critical
Publication of ATE177214T1 publication Critical patent/ATE177214T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Materials For Photolithography (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Chemical And Physical Treatments For Wood And The Like (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Emulsifying, Dispersing, Foam-Producing Or Wetting Agents (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Paints Or Removers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
AT94307901T 1994-01-25 1994-10-27 Wässrige emulsionsphotoresiste mit nichtionischen fluorkohlenwasserstoffenthaltenden oberflächenaktiven substanzen ATE177214T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US18687594A 1994-01-25 1994-01-25
US08/199,037 US5364737A (en) 1994-01-25 1994-02-18 Waterbone photoresists having associate thickeners
US08/223,615 US5389495A (en) 1994-01-25 1994-04-06 Waterborne photoresists having non-ionic fluorocarbon surfactants

Publications (1)

Publication Number Publication Date
ATE177214T1 true ATE177214T1 (de) 1999-03-15

Family

ID=27392161

Family Applications (1)

Application Number Title Priority Date Filing Date
AT94307901T ATE177214T1 (de) 1994-01-25 1994-10-27 Wässrige emulsionsphotoresiste mit nichtionischen fluorkohlenwasserstoffenthaltenden oberflächenaktiven substanzen

Country Status (12)

Country Link
EP (1) EP0664486B1 (de)
JP (1) JP2703732B2 (de)
CN (1) CN1071910C (de)
AT (1) ATE177214T1 (de)
AU (1) AU660882B1 (de)
BR (1) BR9500256A (de)
CA (1) CA2133147C (de)
DE (1) DE69416814T2 (de)
ES (1) ES2130366T3 (de)
HK (1) HK1005151A1 (de)
IL (1) IL112005A (de)
SG (1) SG50509A1 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002077714A1 (fr) * 2001-03-26 2002-10-03 Nippon Paint Co., Ltd. Matiere de reserve isolante ignifuge autonome et materiau isolant
US8703385B2 (en) * 2012-02-10 2014-04-22 3M Innovative Properties Company Photoresist composition
JP2014079960A (ja) * 2012-10-17 2014-05-08 Eastman Kodak Co 平版印刷版用組成物及び平版印刷版原版
US10761425B2 (en) * 2015-11-23 2020-09-01 Yissum Research Development Company Of The Hebrew University Of Jerusalem Ltd. Particulate photoinitiators and uses thereof
CN112898185B (zh) * 2021-01-26 2022-06-03 宁波南大光电材料有限公司 用于浸没式光刻胶的含氟化合物及其制备方法、光刻胶

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2443785A1 (de) * 1974-09-13 1976-04-01 Basf Ag Fluessige, photovernetzbare formmasse zur herstellung von reliefdruckplatten
US4079028A (en) 1975-10-03 1978-03-14 Rohm And Haas Company Polyurethane thickeners in latex compositions
JPS57178242A (en) * 1981-04-27 1982-11-02 Konishiroku Photo Ind Co Ltd Photosensitive lithographic plate
US4767826A (en) * 1985-07-18 1988-08-30 Polytechnic Institute Of New York Radiation-sensitive polymers
US4743698A (en) 1985-10-01 1988-05-10 Alco Chemical Corp. Acrylic emulsion copolymers for thickening aqueous systems and copolymerizable surfactant monomers for use therein
US4762747A (en) * 1986-07-29 1988-08-09 Industrial Technology Research Institute Single component aqueous acrylic adhesive compositions for flexible printed circuits and laminates made therefrom
JPH0830140B2 (ja) * 1987-08-17 1996-03-27 コニカ株式会社 感光性平版印刷版
JPH0246460A (ja) * 1988-08-08 1990-02-15 Toyobo Co Ltd 感光性樹脂組成物
US5045435A (en) * 1988-11-25 1991-09-03 Armstrong World Industries, Inc. Water-borne, alkali-developable, photoresist coating compositions and their preparation
JP2739382B2 (ja) * 1990-12-06 1998-04-15 富士写真フイルム株式会社 平版印刷版の製造方法
JP3040202B2 (ja) * 1991-07-12 2000-05-15 ダブリュー・アール・グレース・アンド・カンパニー−コーン 水系感光性樹脂組成物及びそれを用いたプリント回路板の製造方法
JP3240769B2 (ja) * 1992-10-02 2001-12-25 ジェイエスアール株式会社 感光性樹脂組成物
JPH06258832A (ja) * 1992-11-17 1994-09-16 W R Grace & Co 感光性樹脂組成物
JPH06230573A (ja) * 1993-01-29 1994-08-19 Japan Synthetic Rubber Co Ltd レジスト組成物
DE69502741T2 (de) * 1994-01-10 1998-10-01 Du Pont Lichtempfindliche wässrige Emulsion, lichtempfindlicher Film und Verfahren zur Herstellung

Also Published As

Publication number Publication date
ES2130366T3 (es) 1999-07-01
JP2703732B2 (ja) 1998-01-26
EP0664486A1 (de) 1995-07-26
EP0664486B1 (de) 1999-03-03
AU660882B1 (en) 1995-07-06
IL112005A0 (en) 1995-03-15
CA2133147C (en) 1999-05-11
CN1071910C (zh) 2001-09-26
CA2133147A1 (en) 1995-07-26
IL112005A (en) 1999-01-26
CN1107585A (zh) 1995-08-30
BR9500256A (pt) 1995-10-17
DE69416814D1 (de) 1999-04-08
SG50509A1 (en) 1999-11-16
HK1005151A1 (en) 1998-12-24
DE69416814T2 (de) 1999-07-08
JPH07219222A (ja) 1995-08-18

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Legal Events

Date Code Title Description
UEP Publication of translation of european patent specification
REN Ceased due to non-payment of the annual fee