ES2130366T3 - Composiciones fotoresistentes en emulsion acuosa que contienen agentes tensioactivos fluorocarbonados no ionicos. - Google Patents

Composiciones fotoresistentes en emulsion acuosa que contienen agentes tensioactivos fluorocarbonados no ionicos.

Info

Publication number
ES2130366T3
ES2130366T3 ES94307901T ES94307901T ES2130366T3 ES 2130366 T3 ES2130366 T3 ES 2130366T3 ES 94307901 T ES94307901 T ES 94307901T ES 94307901 T ES94307901 T ES 94307901T ES 2130366 T3 ES2130366 T3 ES 2130366T3
Authority
ES
Spain
Prior art keywords
photoresistent
compositions
aqueous emulsion
emulsion containing
containing non
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES94307901T
Other languages
English (en)
Inventor
Robert K Barr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Morton International LLC
Original Assignee
Morton International LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US08/199,037 external-priority patent/US5364737A/en
Application filed by Morton International LLC filed Critical Morton International LLC
Application granted granted Critical
Publication of ES2130366T3 publication Critical patent/ES2130366T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Materials For Photolithography (AREA)
  • Chemical And Physical Treatments For Wood And The Like (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Emulsifying, Dispersing, Foam-Producing Or Wetting Agents (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Paints Or Removers (AREA)

Abstract

UNA COMPOSICION FLOTANTE CON LA QUE SE PUEDEN FORMAR IMAGENES POR VIA FOTOMECANICA O SUSTANCIA PROTECTORA FOTOSENSIBLE QUE CONTIENE UN POLIMERO AGLUTINANTE DE LATEX QUE POSEE UNA FUNCIONALIDAD DEL ACIDO CARBOXILICO SUFICIENTE COMO PARA HACER QUE SE PUEDA REVELAR EN UNA SOLUCION ACUOSA ALCALINA, UNA FRACCION MONOMERICA FOTOPOLIMERIZABLE, UN SISTEMA QUIMICO FOTOINICIADOR Y UN SURFACTANTE QUE ES UN ADUCTO DE OXIETILENO FLUORALIFATICO.
ES94307901T 1994-01-25 1994-10-27 Composiciones fotoresistentes en emulsion acuosa que contienen agentes tensioactivos fluorocarbonados no ionicos. Expired - Lifetime ES2130366T3 (es)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US18687594A 1994-01-25 1994-01-25
US08/199,037 US5364737A (en) 1994-01-25 1994-02-18 Waterbone photoresists having associate thickeners
US08/223,615 US5389495A (en) 1994-01-25 1994-04-06 Waterborne photoresists having non-ionic fluorocarbon surfactants

Publications (1)

Publication Number Publication Date
ES2130366T3 true ES2130366T3 (es) 1999-07-01

Family

ID=27392161

Family Applications (1)

Application Number Title Priority Date Filing Date
ES94307901T Expired - Lifetime ES2130366T3 (es) 1994-01-25 1994-10-27 Composiciones fotoresistentes en emulsion acuosa que contienen agentes tensioactivos fluorocarbonados no ionicos.

Country Status (11)

Country Link
EP (1) EP0664486B1 (es)
JP (1) JP2703732B2 (es)
CN (1) CN1071910C (es)
AT (1) ATE177214T1 (es)
AU (1) AU660882B1 (es)
BR (1) BR9500256A (es)
CA (1) CA2133147C (es)
DE (1) DE69416814T2 (es)
ES (1) ES2130366T3 (es)
IL (1) IL112005A (es)
SG (1) SG50509A1 (es)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002077714A1 (fr) * 2001-03-26 2002-10-03 Nippon Paint Co., Ltd. Matiere de reserve isolante ignifuge autonome et materiau isolant
US8703385B2 (en) * 2012-02-10 2014-04-22 3M Innovative Properties Company Photoresist composition
JP2014079960A (ja) * 2012-10-17 2014-05-08 Eastman Kodak Co 平版印刷版用組成物及び平版印刷版原版
WO2017090038A2 (en) * 2015-11-23 2017-06-01 Yissum Research Development Company Of The Hebrew University Of Jerusalem Ltd Particulate photoinitiators and uses thereof
CN112898185B (zh) * 2021-01-26 2022-06-03 宁波南大光电材料有限公司 用于浸没式光刻胶的含氟化合物及其制备方法、光刻胶

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2443785A1 (de) * 1974-09-13 1976-04-01 Basf Ag Fluessige, photovernetzbare formmasse zur herstellung von reliefdruckplatten
US4079028A (en) 1975-10-03 1978-03-14 Rohm And Haas Company Polyurethane thickeners in latex compositions
JPS57178242A (en) * 1981-04-27 1982-11-02 Konishiroku Photo Ind Co Ltd Photosensitive lithographic plate
US4767826A (en) * 1985-07-18 1988-08-30 Polytechnic Institute Of New York Radiation-sensitive polymers
US4743698A (en) 1985-10-01 1988-05-10 Alco Chemical Corp. Acrylic emulsion copolymers for thickening aqueous systems and copolymerizable surfactant monomers for use therein
US4762747A (en) * 1986-07-29 1988-08-09 Industrial Technology Research Institute Single component aqueous acrylic adhesive compositions for flexible printed circuits and laminates made therefrom
JPH0830140B2 (ja) * 1987-08-17 1996-03-27 コニカ株式会社 感光性平版印刷版
JPH0246460A (ja) * 1988-08-08 1990-02-15 Toyobo Co Ltd 感光性樹脂組成物
US5045435A (en) * 1988-11-25 1991-09-03 Armstrong World Industries, Inc. Water-borne, alkali-developable, photoresist coating compositions and their preparation
JP2739382B2 (ja) * 1990-12-06 1998-04-15 富士写真フイルム株式会社 平版印刷版の製造方法
JP3040202B2 (ja) * 1991-07-12 2000-05-15 ダブリュー・アール・グレース・アンド・カンパニー−コーン 水系感光性樹脂組成物及びそれを用いたプリント回路板の製造方法
JP3240769B2 (ja) * 1992-10-02 2001-12-25 ジェイエスアール株式会社 感光性樹脂組成物
JPH06258832A (ja) * 1992-11-17 1994-09-16 W R Grace & Co 感光性樹脂組成物
JPH06230573A (ja) * 1993-01-29 1994-08-19 Japan Synthetic Rubber Co Ltd レジスト組成物
EP0666504B1 (en) * 1994-01-10 1998-06-03 E.I. Du Pont De Nemours And Company Aqueous photoimageable liquid emulsion, photoimageable film and process of manufacture

Also Published As

Publication number Publication date
JPH07219222A (ja) 1995-08-18
DE69416814D1 (de) 1999-04-08
EP0664486A1 (en) 1995-07-26
CN1071910C (zh) 2001-09-26
JP2703732B2 (ja) 1998-01-26
CA2133147C (en) 1999-05-11
SG50509A1 (en) 1999-11-16
AU660882B1 (en) 1995-07-06
IL112005A (en) 1999-01-26
ATE177214T1 (de) 1999-03-15
CN1107585A (zh) 1995-08-30
DE69416814T2 (de) 1999-07-08
EP0664486B1 (en) 1999-03-03
BR9500256A (pt) 1995-10-17
CA2133147A1 (en) 1995-07-26
IL112005A0 (en) 1995-03-15
HK1005151A1 (en) 1998-12-24

Similar Documents

Publication Publication Date Title
KR950024020A (ko) 비이온성 탄화 플루오르 계면 활성제를 갖는 수인성 감광성 내식막
DE69112637D1 (de) Aerosolzusammensetzungen.
ATE132556T1 (de) Sanftes tissuepapier
CA2226246A1 (en) Water resistant gypsum compositions and emulsions
CA2004310A1 (en) Hard surface cleaning composition containing polyacrylate copolymers as performance boosters
SG33687G (en) Photopolymerisable composition and copying material made therefrom
ES2130366T3 (es) Composiciones fotoresistentes en emulsion acuosa que contienen agentes tensioactivos fluorocarbonados no ionicos.
TR199801182T2 (xx) Erozyona hassas topraklar�n y�zey stabilizasyonunu yo�unla�t�rmak i�in i�lem.
WO2001077240A3 (en) Radiation-curable release compositions, use thereof and release coated substrates
KR960011556A (ko) 수용성 막형성 조성물
JPS6040182A (ja) 高引火点を有する撥水撥油剤
DE3262314D1 (en) Cleaner-polish for fiberglass and ceramic surfaces
JPH0330825A (ja) 低起泡性フッ素系界面活性剤
ES2144744T3 (es) Composicion anti-espuma.
KR920018289A (ko) 휴지 재생용 탈묵제
FI830987L (fi) Kopolymerlatex, foerfarande foer framstaellning daerav och anvaendning daerav saerskilt foer belaegpapper
US4116715A (en) Method for removing photopolymers from metal substrates
JPS5573764A (en) Aqueous emulsion composition for surface protection
ATE162894T1 (de) Wässrige emulsionsphotoresiste mit polysiloxanen
GB1600925A (en) Photopolymerizable compositions for the production of printing plates and relief plates
JPS5578068A (en) Surface coating for moldings of thermosetting resin
JPS646066A (en) Method for forming moisture-permeable film
JPS5579438A (en) Photosensitive polyamide resin composition
JP3077507B2 (ja) 発泡壁紙
JPS5765761A (en) Antistatic, acting ray-curable coat composition

Legal Events

Date Code Title Description
FG2A Definitive protection

Ref document number: 664486

Country of ref document: ES