DE69408970D1 - Wässrige Emulsionsphotoresiste mit assoziativen Verdickungsmitteln - Google Patents

Wässrige Emulsionsphotoresiste mit assoziativen Verdickungsmitteln

Info

Publication number
DE69408970D1
DE69408970D1 DE69408970T DE69408970T DE69408970D1 DE 69408970 D1 DE69408970 D1 DE 69408970D1 DE 69408970 T DE69408970 T DE 69408970T DE 69408970 T DE69408970 T DE 69408970T DE 69408970 D1 DE69408970 D1 DE 69408970D1
Authority
DE
Germany
Prior art keywords
photoresist
aqueous emulsion
neutralised
compsn
base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69408970T
Other languages
English (en)
Other versions
DE69408970T2 (de
Inventor
Robert K Barr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm and Haas Chemicals LLC
Original Assignee
Morton International LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Morton International LLC filed Critical Morton International LLC
Publication of DE69408970D1 publication Critical patent/DE69408970D1/de
Application granted granted Critical
Publication of DE69408970T2 publication Critical patent/DE69408970T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/107—Polyamide or polyurethane
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Paper (AREA)
  • Paints Or Removers (AREA)
  • Diaphragms For Electromechanical Transducers (AREA)
  • Telephone Function (AREA)
  • Colloid Chemistry (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
DE69408970T 1994-01-25 1994-10-27 Wässrige Emulsionsphotoresiste mit assoziativen Verdickungsmitteln Expired - Fee Related DE69408970T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US18687594A 1994-01-25 1994-01-25
US08/199,037 US5364737A (en) 1994-01-25 1994-02-18 Waterbone photoresists having associate thickeners

Publications (2)

Publication Number Publication Date
DE69408970D1 true DE69408970D1 (de) 1998-04-16
DE69408970T2 DE69408970T2 (de) 1998-08-13

Family

ID=26882508

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69408970T Expired - Fee Related DE69408970T2 (de) 1994-01-25 1994-10-27 Wässrige Emulsionsphotoresiste mit assoziativen Verdickungsmitteln

Country Status (15)

Country Link
US (5) US5364737A (de)
EP (1) EP0664490B1 (de)
JP (1) JP2705907B2 (de)
KR (5) KR0142022B1 (de)
CN (1) CN1078357C (de)
AT (1) ATE164013T1 (de)
AU (1) AU660392B1 (de)
BR (1) BR9404738A (de)
CA (1) CA2131044C (de)
DE (1) DE69408970T2 (de)
ES (1) ES2115165T3 (de)
HK (1) HK1005070A1 (de)
IL (1) IL112006A (de)
SG (1) SG43077A1 (de)
TW (4) TW269018B (de)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5741621A (en) * 1994-01-10 1998-04-21 E. I. Du Pont De Nemours And Company Process for using photoimageable films prepared for aqueous photoimageable liquid emulsions
TW353158B (en) * 1994-03-09 1999-02-21 Nat Starch Chem Invest Aqueous photoresist composition, method for preparing the same and circuit board comprising thereof
JPH08328251A (ja) * 1995-03-31 1996-12-13 W R Grace & Co 水性感光性樹脂組成物
JPH08328252A (ja) * 1995-03-31 1996-12-13 W R Grace & Co 水性感光性樹脂組成物
US5565302A (en) * 1995-04-21 1996-10-15 W. R. Grace & Co.-Conn. Process for preparing photosensitive resin composition
US5512607A (en) * 1995-06-06 1996-04-30 W. R. Grace & Co.-Conn. Unsaturated epoxy ester with quaternary ammonium and phosphate groups
AU709577B2 (en) * 1995-06-07 1999-09-02 E.I. Du Pont De Nemours And Company Process for using photoimageable films prepared from aqueous photoimageable liquid emulsions
WO1996041240A1 (en) * 1995-06-07 1996-12-19 W.R. Grace & Co.-Conn. Water photoresist emulsions and methods of preparation thereof
US5925499A (en) * 1995-08-01 1999-07-20 Morton International, Inc. Epoxy-containing waterborne photoimageable composition
US5846699A (en) * 1996-09-11 1998-12-08 Eastman Kodak Company Coating composition including polyurethane for imaging elements
US6063550A (en) * 1998-04-29 2000-05-16 Morton International, Inc. Aqueous developing solutions for reduced developer residue
US5922522A (en) * 1998-04-29 1999-07-13 Morton International, Inc. Aqueous developing solutions for reduced developer residue
US6248506B1 (en) 1998-12-04 2001-06-19 Nichigo-Morton Aqueous developing solutions for reduced developer residue
JP2000267270A (ja) * 1999-03-19 2000-09-29 Clariant (Japan) Kk ロールコート用感光性樹脂組成物およびロールコート方法
NL1013300C2 (nl) * 1999-10-15 2001-04-18 Stahl Int Bv Werkwijze voor de bereiding van een dispersie van een anionische polymeer in water waarin geen vluchtige tertiaire-amines voorkomen, de verkregen dispersies en coatings welke met de genoemde dispersies verkregen worden.
TW461988B (en) 1999-12-17 2001-11-01 Ind Tech Res Inst Water soluble polymer and photoresist composition containing the same
US6436540B1 (en) * 2000-02-18 2002-08-20 Omnova Solutions Inc. Co-mingled polyurethane-polyvinyl ester polymer compositions and laminates
US6306557B1 (en) * 2000-04-20 2001-10-23 Industrial Technology Research Foundation Process for preparing water dispersible negative-type photosensitive compositions
US6797146B2 (en) 2000-11-02 2004-09-28 Shipley Company, L.L.C. Seed layer repair
US7063895B2 (en) * 2001-08-01 2006-06-20 National Starch And Chemical Investment Holding Corporation Hydrophobically modified solution polymers and their use in surface protecting formulations
AU2003210425A1 (en) * 2002-03-06 2003-09-16 Akzo Nobel Coatings International B.V. Water borne coating composition for film transfer and casting process
US20040058276A1 (en) * 2002-09-23 2004-03-25 Dueber Thomas E. Halo resistent, photoimagable coverlay compositions, having, advantageous application and removal properties, and methods relating thereto
US7226959B2 (en) * 2003-11-06 2007-06-05 Sun Chemical Corporation Water soluble energy curable stereo-crosslinkable ionomer compositions
JP5955526B2 (ja) * 2011-10-08 2016-07-20 株式会社日本触媒 塗料用水性樹脂組成物
US8703385B2 (en) * 2012-02-10 2014-04-22 3M Innovative Properties Company Photoresist composition
CN103700432A (zh) * 2013-12-20 2014-04-02 南昌大学 一种含流平剂涂层的漆包线
IL267443B2 (en) * 2016-12-22 2023-10-01 Illumina Inc stamping device

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3929743A (en) * 1972-10-10 1975-12-30 Johnson & Son Inc S C Polyampholytes
US3912516A (en) * 1973-07-27 1975-10-14 Upjohn Co Photopolyer composition containing a polyurethane binding agent
DE2443785A1 (de) * 1974-09-13 1976-04-01 Basf Ag Fluessige, photovernetzbare formmasse zur herstellung von reliefdruckplatten
US4079028A (en) * 1975-10-03 1978-03-14 Rohm And Haas Company Polyurethane thickeners in latex compositions
US4248958A (en) * 1979-05-23 1981-02-03 Hoechst Aktiengesellschaft Photopolymerizable mixture containing polyurethanes
US4426485A (en) * 1982-06-14 1984-01-17 Union Carbide Corporation Polymers with hydrophobe bunches
US4952481A (en) * 1985-02-12 1990-08-28 Napp Systems (Usa), Inc. Photosensitive resin composition
US4767826A (en) * 1985-07-18 1988-08-30 Polytechnic Institute Of New York Radiation-sensitive polymers
US4743698A (en) * 1985-10-01 1988-05-10 Alco Chemical Corp. Acrylic emulsion copolymers for thickening aqueous systems and copolymerizable surfactant monomers for use therein
US4762747A (en) * 1986-07-29 1988-08-09 Industrial Technology Research Institute Single component aqueous acrylic adhesive compositions for flexible printed circuits and laminates made therefrom
JPH0246460A (ja) * 1988-08-08 1990-02-15 Toyobo Co Ltd 感光性樹脂組成物
US4904772A (en) * 1988-10-03 1990-02-27 Aqualon Company Mixed hydrophobe polymers
US5045435A (en) * 1988-11-25 1991-09-03 Armstrong World Industries, Inc. Water-borne, alkali-developable, photoresist coating compositions and their preparation
US5268256A (en) * 1990-08-02 1993-12-07 Ppg Industries, Inc. Photoimageable electrodepositable photoresist composition for producing non-tacky films
JP3040202B2 (ja) * 1991-07-12 2000-05-15 ダブリュー・アール・グレース・アンド・カンパニー−コーン 水系感光性樹脂組成物及びそれを用いたプリント回路板の製造方法
CA2084369A1 (en) * 1991-12-11 1993-06-12 Brent T. Speelman Water-borne photoimageable compositions
JP3240769B2 (ja) * 1992-10-02 2001-12-25 ジェイエスアール株式会社 感光性樹脂組成物
JPH06258832A (ja) * 1992-11-17 1994-09-16 W R Grace & Co 感光性樹脂組成物
JPH06230573A (ja) * 1993-01-29 1994-08-19 Japan Synthetic Rubber Co Ltd レジスト組成物
DE69502741T2 (de) * 1994-01-10 1998-10-01 Du Pont Lichtempfindliche wässrige Emulsion, lichtempfindlicher Film und Verfahren zur Herstellung

Also Published As

Publication number Publication date
HK1005070A1 (en) 1998-12-18
EP0664490A1 (de) 1995-07-26
AU660392B1 (en) 1995-06-22
SG43077A1 (en) 1997-10-17
KR0142022B1 (ko) 1998-06-15
ES2115165T3 (es) 1998-06-16
TW300289B (de) 1997-03-11
US5387494A (en) 1995-02-07
CA2131044A1 (en) 1995-07-26
US5411837A (en) 1995-05-02
JP2705907B2 (ja) 1998-01-28
CA2131044C (en) 1999-05-11
TW269018B (de) 1996-01-21
KR950024019A (ko) 1995-08-21
JPH07271033A (ja) 1995-10-20
TW263569B (de) 1995-11-21
KR950024022A (ko) 1995-08-21
KR950024018A (ko) 1995-08-21
DE69408970T2 (de) 1998-08-13
EP0664490B1 (de) 1998-03-11
ATE164013T1 (de) 1998-03-15
US5393643A (en) 1995-02-28
BR9404738A (pt) 1995-10-17
KR0144639B1 (ko) 1998-07-01
IL112006A (en) 1999-11-30
KR0149903B1 (ko) 1999-03-30
US5389495A (en) 1995-02-14
IL112006A0 (en) 1995-03-15
KR950024020A (ko) 1995-08-21
KR950024021A (ko) 1995-08-21
CN1118886A (zh) 1996-03-20
TW301720B (de) 1997-04-01
KR0149902B1 (ko) 1999-03-30
CN1078357C (zh) 2002-01-23
US5364737A (en) 1994-11-15

Similar Documents

Publication Publication Date Title
DE69408970T2 (de) Wässrige Emulsionsphotoresiste mit assoziativen Verdickungsmitteln
DE3587269D1 (de) Pfropfcopolymerisate aus vernetzten polymeren und polyoxyethylen, verfahren zu ihrer herstellung und ihre verwendung.
DE69326466D1 (de) Wässerige dispersionen aus lineraen polyestern und vinylharzen
DE60121955D1 (de) Filmpolymer
DE9301444U1 (de) Bei Raumtemperatur vernetzbares wäßriges Bindemittel
ATE66681T1 (de) Mischpolymerisat einer alpha-beta-ungesaettigten carbonsaeure und verfahren zu seiner herstellung.
ES2117216T3 (es) Fotoprotectores de base acuosa que contienen polisiloxanos.
ES2067288T3 (es) Pinturas para fachadas y revoques con alta resistencia al agua temprana.
EP0458481A3 (de) Polymerfilm
JPS57190061A (en) Water-resistant adhesive
DE3686360D1 (de) Verfahren zur herstellung einer strahlungsempfindlichen schicht auf einem schichttraeger.
JPS5281344A (en) Water-based coating composition
JPS5491585A (en) Water thinnable latex photosensitive resin composition
JPS57141471A (en) Photosensitive self-adhesive or adhesive composition
Dichter et al. Corrosion Protection of Steel Pipes
JPS5776045A (en) Thermosetting resin composition
JPS5784777A (en) Inprovement of weather resistance and durability of paint film on wooden article
DE68902571D1 (de) Dispersion eines (meth)acrylat-additionspolymers in einer organischen fluessigkeit.
KR880008714A (ko) 가요성 배선기판
JPS5710603A (en) Preparation of aqueous polymer emulsion
JPS6456593A (en) Thermal stencil paper

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Representative=s name: MUELLER-BORE & PARTNER, PATENTANWAELTE, EUROPEAN PAT

8327 Change in the person/name/address of the patent owner

Owner name: ROHM AND HAAS CHEMICALS LLC, PHILADELPHIA, PA., US

8339 Ceased/non-payment of the annual fee