KR950024019A - 아미노 아크릴레이트로 중화된 결합제를 지닌 수-부유성 감광성 내식막 - Google Patents

아미노 아크릴레이트로 중화된 결합제를 지닌 수-부유성 감광성 내식막 Download PDF

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Publication number
KR950024019A
KR950024019A KR1019940030566A KR19940030566A KR950024019A KR 950024019 A KR950024019 A KR 950024019A KR 1019940030566 A KR1019940030566 A KR 1019940030566A KR 19940030566 A KR19940030566 A KR 19940030566A KR 950024019 A KR950024019 A KR 950024019A
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South Korea
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weight
composition
binder polymer
weight percent
latex binder
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KR1019940030566A
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KR0144639B1 (ko
Inventor
이. 런디 대니얼
케이. 바 로버트
엔. 트란 댄
Original Assignee
제랄드 케이. 화이트
모르톤 인터내쇼날, 인코오포레이티드
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Publication of KR950024019A publication Critical patent/KR950024019A/ko
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Publication of KR0144639B1 publication Critical patent/KR0144639B1/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/107—Polyamide or polyurethane
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials For Photolithography (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Paints Or Removers (AREA)
  • Paper (AREA)
  • Telephone Function (AREA)
  • Diaphragms For Electromechanical Transducers (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Colloid Chemistry (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)

Abstract

본 발명은 알칼리성 수용액에서 현상가능하게 하는 산작용성을 갖는 라텍스 결합제 중합체(이 때, 산작용성은 아미노아크릴레이트를 사용하여 약 1몰% 이상 중화시킴), 광중합성 단량체 단편, 및 광개시제 화학 시스템을 포함하는 수-부유성 광결상성 조성물 또는 감광성 내식막에 관한 것이다.

Description

아미노 아크릴레이트로 중화된 결합제를 지닌 수-부유성 감광성 내식막
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (4)

  1. A) 산가 약 40 내지 약 250을 갖는 라텍스 결합제 중합체 약 30 내지 약 80중량%;B) 아미노아크릴레이트를 제외한, 알파, 베타-에틸렌계 불포화 단량체(들) 약 15 내지 약 50중량%;C) 유리 라디칼을 발생하는 광개시제 또는 광개시제 화학 시스템 약 0.1 내지 약 25중량%;D) 라텍스 결합제 중합체의 산작용성 약 1 내지 약 40몰%를 중화시키기 위한 아미노아크릴레이트(들) 약 0.1 내지 약 20중량%;및 E) 수성 유탁액으로 광결상성(photoimageable)(光結像性) 조성물을 안정화시키기에 충분한 양으로 상기 아미노아크릴레이트(들)와 결합되는 부가중화 염기 및/또는 폴리에테르 폴리우레탄 결합된 중점제 약 40중량% 이하를 포함하며(이 때, 중량%는 성분 A 내지 E의 총 중량을 기준한 것임), 수성매질내의 유탁액으로 부유 가능한 광결상성 조성물.
  2. 제1항에 있어서, 수성 매질내에 유탁액으로 존재하는 광결상성 조성물.
  3. 제1항에 있어서, 지지체 시트위에 층으로 존재하며, 상기 층 및 상기 지지체 시트가 건조필름을 포함하는 광결상성 조성물.
  4. 제1항에 있어서, 단계 E)의 폴리에테르 폴리우레탄 결합된 증점제를 성분 A 내지 E의 총중량을 기준으로 약1 내지 약40중량% 포함하는 광결상성 조성물.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019940030566A 1994-01-25 1994-11-21 아미노 아크릴레이트로 중화된 결합제를 지닌 수-부유성 감광성 내식막 KR0144639B1 (ko)

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
US18687594A 1994-01-25 1994-01-25
US08/186,875 1994-01-25
US8/186,875 1994-01-25
US8/199,037 1994-02-18
US08/199,037 US5364737A (en) 1994-01-25 1994-02-18 Waterbone photoresists having associate thickeners
US08/238,133 US5393643A (en) 1994-01-25 1994-05-04 Waterborne photoresists having binders neutralized with amino acrylates
US8/238,133 1994-05-04
US08/238,133 1994-05-04

Publications (2)

Publication Number Publication Date
KR950024019A true KR950024019A (ko) 1995-08-21
KR0144639B1 KR0144639B1 (ko) 1998-07-01

Family

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Family Applications (5)

Application Number Title Priority Date Filing Date
KR1019940025629A KR0142022B1 (ko) 1994-01-25 1994-10-07 연합된 증점제를 갖는 수-부유성 감광성 내식막
KR1019940030569A KR0149903B1 (ko) 1994-01-25 1994-11-21 폴리실록산을 갖는 수-부유성 감광성 내식막
KR1019940030568A KR950024021A (ko) 1994-01-25 1994-11-21 설폰산 작용가를 갖는 결합제를 포함하는 수인성 감광성 내식막
KR1019940030566A KR0144639B1 (ko) 1994-01-25 1994-11-21 아미노 아크릴레이트로 중화된 결합제를 지닌 수-부유성 감광성 내식막
KR1019940030567A KR0149902B1 (ko) 1994-01-25 1994-11-21 비이온성 탄화 플루오르 계면 활성제를 갖는 수부유성 감광성 내식막

Family Applications Before (3)

Application Number Title Priority Date Filing Date
KR1019940025629A KR0142022B1 (ko) 1994-01-25 1994-10-07 연합된 증점제를 갖는 수-부유성 감광성 내식막
KR1019940030569A KR0149903B1 (ko) 1994-01-25 1994-11-21 폴리실록산을 갖는 수-부유성 감광성 내식막
KR1019940030568A KR950024021A (ko) 1994-01-25 1994-11-21 설폰산 작용가를 갖는 결합제를 포함하는 수인성 감광성 내식막

Family Applications After (1)

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KR1019940030567A KR0149902B1 (ko) 1994-01-25 1994-11-21 비이온성 탄화 플루오르 계면 활성제를 갖는 수부유성 감광성 내식막

Country Status (15)

Country Link
US (5) US5364737A (ko)
EP (1) EP0664490B1 (ko)
JP (1) JP2705907B2 (ko)
KR (5) KR0142022B1 (ko)
CN (1) CN1078357C (ko)
AT (1) ATE164013T1 (ko)
AU (1) AU660392B1 (ko)
BR (1) BR9404738A (ko)
CA (1) CA2131044C (ko)
DE (1) DE69408970T2 (ko)
ES (1) ES2115165T3 (ko)
HK (1) HK1005070A1 (ko)
IL (1) IL112006A (ko)
SG (1) SG43077A1 (ko)
TW (4) TW269018B (ko)

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Also Published As

Publication number Publication date
HK1005070A1 (en) 1998-12-18
US5387494A (en) 1995-02-07
EP0664490A1 (en) 1995-07-26
KR0142022B1 (ko) 1998-06-15
CA2131044C (en) 1999-05-11
KR950024020A (ko) 1995-08-21
US5389495A (en) 1995-02-14
KR950024021A (ko) 1995-08-21
TW301720B (ko) 1997-04-01
KR0144639B1 (ko) 1998-07-01
JP2705907B2 (ja) 1998-01-28
CA2131044A1 (en) 1995-07-26
US5393643A (en) 1995-02-28
AU660392B1 (en) 1995-06-22
SG43077A1 (en) 1997-10-17
KR0149902B1 (ko) 1999-03-30
JPH07271033A (ja) 1995-10-20
EP0664490B1 (en) 1998-03-11
CN1078357C (zh) 2002-01-23
TW269018B (ko) 1996-01-21
KR950024022A (ko) 1995-08-21
DE69408970D1 (de) 1998-04-16
ES2115165T3 (es) 1998-06-16
IL112006A (en) 1999-11-30
KR950024018A (ko) 1995-08-21
TW300289B (ko) 1997-03-11
IL112006A0 (en) 1995-03-15
US5411837A (en) 1995-05-02
KR0149903B1 (ko) 1999-03-30
BR9404738A (pt) 1995-10-17
TW263569B (ko) 1995-11-21
DE69408970T2 (de) 1998-08-13
US5364737A (en) 1994-11-15
ATE164013T1 (de) 1998-03-15
CN1118886A (zh) 1996-03-20

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