SG146599A1 - Lithographic apparatus and method - Google Patents

Lithographic apparatus and method

Info

Publication number
SG146599A1
SG146599A1 SG200802531-4A SG2008025314A SG146599A1 SG 146599 A1 SG146599 A1 SG 146599A1 SG 2008025314 A SG2008025314 A SG 2008025314A SG 146599 A1 SG146599 A1 SG 146599A1
Authority
SG
Singapore
Prior art keywords
radiation
radiation beam
illumination mode
patterned
individually controllable
Prior art date
Application number
SG200802531-4A
Other languages
English (en)
Inventor
Heine Melle Mulder
Johannes Jacobus Matheus Baselmans
Adrianus Franciscus Petrus Engelen
Markus Franciscus Antonius Eurlings
Greevenbroek Hendrikus Robertus Marie Van
Patricius Aloysius Jacobus Tinnemans
Van Der Veen Paul
Wilfred Edward Endendijk
Original Assignee
Asml Netherlands B V 22 30 74
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands B V 22 30 74 filed Critical Asml Netherlands B V 22 30 74
Publication of SG146599A1 publication Critical patent/SG146599A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70516—Calibration of components of the microlithographic apparatus, e.g. light sources, addressable masks or detectors

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optics & Photonics (AREA)
  • Microscoopes, Condenser (AREA)
SG200802531-4A 2007-03-30 2008-03-31 Lithographic apparatus and method SG146599A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/729,960 US8937706B2 (en) 2007-03-30 2007-03-30 Lithographic apparatus and method

Publications (1)

Publication Number Publication Date
SG146599A1 true SG146599A1 (en) 2008-10-30

Family

ID=39545019

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200802531-4A SG146599A1 (en) 2007-03-30 2008-03-31 Lithographic apparatus and method

Country Status (7)

Country Link
US (1) US8937706B2 (ko)
EP (2) EP2328028B1 (ko)
JP (2) JP4712062B2 (ko)
KR (1) KR100940583B1 (ko)
CN (2) CN102122117B (ko)
SG (1) SG146599A1 (ko)
TW (1) TWI470363B (ko)

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JP5688410B2 (ja) * 2009-06-30 2015-03-25 エーエスエムエル ネザーランズ ビー．ブイ． 反射要素のアレイの回転マウンティングおよびそれを組み入れたリソグラフィ装置
CN102483581B (zh) * 2009-08-25 2015-04-01 Asml荷兰有限公司 光学设备和定向反射元件的方法
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Also Published As

Publication number Publication date
CN102122117A (zh) 2011-07-13
EP1975724A1 (en) 2008-10-01
CN101276154A (zh) 2008-10-01
JP2011109128A (ja) 2011-06-02
EP1975724B1 (en) 2017-01-11
US20080239268A1 (en) 2008-10-02
EP2328028A1 (en) 2011-06-01
TWI470363B (zh) 2015-01-21
EP2328028B1 (en) 2016-02-10
JP4712062B2 (ja) 2011-06-29
US8937706B2 (en) 2015-01-20
KR100940583B1 (ko) 2010-02-04
CN102122117B (zh) 2013-08-28
KR20080089198A (ko) 2008-10-06
CN101276154B (zh) 2011-04-20
JP5537455B2 (ja) 2014-07-02
TW200900874A (en) 2009-01-01
JP2008258605A (ja) 2008-10-23

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