JP5688410B2 - 反射要素のアレイの回転マウンティングおよびそれを組み入れたリソグラフィ装置 - Google Patents
反射要素のアレイの回転マウンティングおよびそれを組み入れたリソグラフィ装置 Download PDFInfo
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
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- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0825—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a flexible sheet or membrane, e.g. for varying the focus
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- A47G—HOUSEHOLD OR TABLE EQUIPMENT
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- A47G1/14—Photograph stands
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- A47G—HOUSEHOLD OR TABLE EQUIPMENT
- A47G1/00—Mirrors; Picture frames or the like, e.g. provided with heating, lighting or ventilating means
- A47G1/16—Devices for hanging or supporting pictures, mirrors, or the like
- A47G1/24—Appliances for adjusting pictures, mirrors, or the like, into a desired position, especially inclined
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- G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
- G01D15/00—Component parts of recorders for measuring arrangements not specially adapted for a specific variable
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- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- G—PHYSICS
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- G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Microscoopes, Condenser (AREA)
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Description
本出願は、2009年6月30日に出願された米国仮出願(61/213659)の優先権の利益を享受する。その仮出願は参照によりその全体が本明細書に組み入れられる。
−放射ビームB(例えばDUV放射やEUV放射)を調整する照明システムILと、
−パターニングデバイス(例えばマスク)MAを支持し、パターニングデバイスをアイテムPLに対して正確に位置決めする第1位置決め装置PMに接続されているサポート構造(例えば、マスクテーブル)MTと、
−基板(例えば、レジストでコーティングされたウエハ)Wを保持し、基板をアイテムPLに対して正確に位置決めする第2位置決め装置PWに接続されている基板テーブル(例えば、ウエハテーブル)WTと、
−パターニングデバイスMAによって放射ビームBに付与されたパターンを基板Wの(例えば1つまたは複数のダイを含む)ターゲット部分Cに結像させる投影システム(例えば反射投影レンズ)PLと、
を備える。
その結果、各主反射要素22a−dは、二次反射要素24a−d、a’−d’に、有限の断面寸法(例えば3−5mmの直径)を有する仮想ソースの像を形成するであろう。二次反射要素24a−d、a’−d’は、像の断面寸法よりも大きな断面寸法(例えば、直径)を有してもよい(放射が二次反射要素間に落ちて失われないようにするためである)。図では説明を簡単とするために、フォーカス18およびフォーカスの像は点として描かれている。
ここで、jはミラーの回転角であり、Lはミラーの長さであり、Rは回転軸とミラーの中心との距離であり、θは法線に対する入射放射の角度であり(yの負の向きから来る放射)、Dはミラー間の離間距離である。
式1と式2とを組み合わせることにより、影の面積Asを決めることができる。
最大の影領域は、R=L/2およびD=0のとき得られる。これは、式3の右側の式を生む。
上記の式は、ミラー間の距離Dが小さいとき、回転軸をミラーの中心から端へと動かすことにより、影領域のサイズが係数4で増大することを示す。
Claims (13)
- 反射要素のアレイであって、反射要素の少なくともひとつはマウンティングに取り付けられており、そのマウンティングは少なくとも部分的にスリーブ内に位置するロッドとロッドを直接押すように構成されたアクチュエータとを含み、
ロッドの第1端はスリーブの第1端に固定され、ロッドの第2端は可動とされ、
スリーブは、ロッドの第2端の動きが生じることを許すために曲がるよう構成された第1弾性柔軟部を含み、
反射要素は、スリーブが曲がることで反射要素が回転するようにスリーブの第1端に取り付けられ、
アクチュエータがロッドを直接押すことにより、ロッドの第2端が移動し、その結果、ロッドの第1端に固定されたスリープが曲がることでスリーブの第1端に取り付けられた反射要素が回転するように構成された、アレイ。 - スリーブは、ロッドの動きが生じることを許すために曲がるよう構成された第2弾性柔軟部を含む、請求項1に記載のアレイ。
- 第1弾性柔軟部は第1向きに曲がるよう構成され、第2弾性柔軟部は第2向きに曲がるよう構成され、第1および第2向きは実質的に交差する、請求項2に記載のアレイ。
- 第1弾性柔軟部は少なくとも2つの剛体部を含み、少なくとも2つの剛体部は両端で弾性接続部によってスリーブの他の部分と接続される、請求項1から3のいずれかに記載のアレイ。
- 第1弾性柔軟部は少なくとも4つの剛体部を含み、少なくとも4つの剛体部は両端で弾性接続部によってスリーブの他の部分と接続される、請求項4に記載のアレイ。
- 少なくともひとつの弾性接続部は、曲げが生じることを許すのに十分なほど薄いスリーブの直線的延在部を含む、請求項4または5に記載のアレイ。
- 剛体部の少なくともひとつは、スリーブの中心軸に対してある角度をなすよう方向付けられている、請求項4から6のいずれかに記載のアレイ。
- スリーブは略円筒形である、請求項1から7のいずれかに記載のアレイ。
- マウンティングは調整可能なエンドストップを備え、エンドストップはロッドの移動方向の調整を可能とするよう構成される、請求項1から8のいずれかに記載のアレイ。
- エンドストップは、ロッドの動きを制限することによって、反射要素の第1向きおよび第2向きを規定する、請求項9に記載のアレイ。
- マウンティングの幅は、マウンティングに取り付けられている反射要素の幅よりも大きい、請求項1から10のいずれかに記載のアレイ。
- 各反射要素はひとつのマウンティングに取り付けられ、
第1マウンティングは第1反射要素が第1軸の周りに回転することができるよう構成され、
第2マウンティングは第2反射要素が第2軸の周りに回転することができるよう構成され、
向きについて、第1軸は第2軸よりも反射要素を横切るように走る軸に近く、
第1マウンティングから第1反射要素の中心までの距離は、第2マウンティングから第2反射要素の中心までの距離よりも大きい、請求項1から11のいずれかに記載のアレイ。 - 請求項1から12のいずれかに記載のアレイを備えるリソグラフィ装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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US21365909P | 2009-06-30 | 2009-06-30 | |
US61/213,659 | 2009-06-30 | ||
PCT/EP2010/058021 WO2011000671A1 (en) | 2009-06-30 | 2010-06-08 | Mountings for rotation of array of reflective elements and lithographic apparatus incorporating same |
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JP2012531759A JP2012531759A (ja) | 2012-12-10 |
JP5688410B2 true JP5688410B2 (ja) | 2015-03-25 |
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JP2012518059A Active JP5688410B2 (ja) | 2009-06-30 | 2010-06-08 | 反射要素のアレイの回転マウンティングおよびそれを組み入れたリソグラフィ装置 |
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US (1) | US8757823B2 (ja) |
EP (1) | EP2449418A1 (ja) |
JP (1) | JP5688410B2 (ja) |
KR (1) | KR101658494B1 (ja) |
CN (1) | CN102472891B (ja) |
NL (1) | NL2004852A (ja) |
TW (1) | TWI487954B (ja) |
WO (1) | WO2011000671A1 (ja) |
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CN102341754B (zh) * | 2009-03-04 | 2014-10-01 | Asml荷兰有限公司 | 照射系统、光刻设备以及形成照射模式的方法 |
JP5960806B2 (ja) | 2011-06-21 | 2016-08-02 | カール・ツァイス・エスエムティー・ゲーエムベーハー | ファセットミラーデバイス |
DE102011080819A1 (de) * | 2011-08-11 | 2012-09-20 | Carl Zeiss Smt Gmbh | Facettenspiegel aus Facettenmodulen mit mehreren Facetten |
US9494878B2 (en) | 2012-10-15 | 2016-11-15 | Asml Netherlands B.V. | Actuation mechanism, optical apparatus, lithography apparatus and method of manufacturing devices |
KR102056273B1 (ko) | 2012-10-15 | 2019-12-16 | 에이에스엠엘 네델란즈 비.브이. | 작동 메카니즘, 광학 장치, 리소그래피 장치 및 디바이스들을 제조하는 방법 |
WO2015104099A1 (en) | 2014-01-13 | 2015-07-16 | Asml Netherlands B.V. | Actuation mechanism, optical apparatus and lithography apparatus |
WO2015144370A1 (en) * | 2014-03-18 | 2015-10-01 | Asml Netherlands B.V. | Housing for an array of densely spaced components and associated manufacturing method |
DE102021113780B9 (de) * | 2021-05-27 | 2024-08-01 | Carl Zeiss Smt Gmbh | Verfahren zur Charakterisierung einer Maske für die Mikrolithographie |
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US3815429A (en) * | 1973-04-19 | 1974-06-11 | Us Navy | Precision non-translating mirror/lens mount |
US4721274A (en) * | 1985-08-21 | 1988-01-26 | Erb Robert C | Gimbal assembly |
US5270737A (en) * | 1990-02-27 | 1993-12-14 | Canon Kabushiki Kaisha | Light deflecting apparatus |
DE19739879A1 (de) * | 1996-09-19 | 1998-03-26 | Zeiss Carl Fa | Kippvorrichtung |
FR2773890B1 (fr) * | 1998-01-22 | 2001-11-23 | Aerospatiale | Ensemble integre et compact de montage isostatique et de correction de position d'un organe, tel qu'un miroir, d'un telescope spatial |
US7090362B2 (en) * | 2001-11-09 | 2006-08-15 | Carl Zeiss Smt Ag | Facet mirror having a number of mirror facets |
WO2003067304A1 (de) | 2002-02-09 | 2003-08-14 | Carl Zeiss Smt Ag | Facettenspiegel mit mehreren spiegelfacetten |
JP2006501660A (ja) * | 2002-09-30 | 2006-01-12 | カール・ツァイス・エスエムティー・アーゲー | 照明の同定用のセンサを備える波長≦193nm用の照明システム |
US7196772B2 (en) * | 2003-11-07 | 2007-03-27 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7148951B2 (en) * | 2004-10-25 | 2006-12-12 | Asml Netherlands B.V. | Lithographic apparatus |
US8937706B2 (en) * | 2007-03-30 | 2015-01-20 | Asml Netherlands B.V. | Lithographic apparatus and method |
US8622557B2 (en) * | 2008-05-20 | 2014-01-07 | Stereo Display, Inc. | Micromirror array lens with self-tilted micromirrors |
JP5716091B2 (ja) * | 2010-08-25 | 2015-05-13 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィ投影露光装置のマルチファセットミラー |
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2010
- 2010-06-08 EP EP10725082A patent/EP2449418A1/en not_active Withdrawn
- 2010-06-08 WO PCT/EP2010/058021 patent/WO2011000671A1/en active Application Filing
- 2010-06-08 KR KR1020117031287A patent/KR101658494B1/ko active IP Right Grant
- 2010-06-08 US US13/381,317 patent/US8757823B2/en active Active
- 2010-06-08 CN CN201080029670.6A patent/CN102472891B/zh active Active
- 2010-06-08 JP JP2012518059A patent/JP5688410B2/ja active Active
- 2010-06-08 NL NL2004852A patent/NL2004852A/en not_active Application Discontinuation
- 2010-06-25 TW TW099120937A patent/TWI487954B/zh active
Also Published As
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US8757823B2 (en) | 2014-06-24 |
NL2004852A (en) | 2011-01-04 |
WO2011000671A1 (en) | 2011-01-06 |
KR101658494B1 (ko) | 2016-09-21 |
US20120105989A1 (en) | 2012-05-03 |
JP2012531759A (ja) | 2012-12-10 |
CN102472891B (zh) | 2014-12-10 |
EP2449418A1 (en) | 2012-05-09 |
KR20120105350A (ko) | 2012-09-25 |
TWI487954B (zh) | 2015-06-11 |
TW201107798A (en) | 2011-03-01 |
CN102472891A (zh) | 2012-05-23 |
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