SG141452A1 - Lithographic apparatus and device manufacturing method - Google Patents

Lithographic apparatus and device manufacturing method

Info

Publication number
SG141452A1
SG141452A1 SG200802267-5A SG2008022675A SG141452A1 SG 141452 A1 SG141452 A1 SG 141452A1 SG 2008022675 A SG2008022675 A SG 2008022675A SG 141452 A1 SG141452 A1 SG 141452A1
Authority
SG
Singapore
Prior art keywords
lithographic apparatus
device manufacturing
liquid
immersion
drained
Prior art date
Application number
SG200802267-5A
Other languages
English (en)
Inventor
Christiaan Alexander Hoogendam
Johannes Henricus Wilhe Jacobs
Kate Nicolaas Ten
Der Meulen Frits Van
Original Assignee
Asml Netherlands B V Nl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands B V Nl filed Critical Asml Netherlands B V Nl
Publication of SG141452A1 publication Critical patent/SG141452A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
SG200802267-5A 2004-09-20 2005-09-14 Lithographic apparatus and device manufacturing method SG141452A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/944,415 US7133114B2 (en) 2004-09-20 2004-09-20 Lithographic apparatus and device manufacturing method

Publications (1)

Publication Number Publication Date
SG141452A1 true SG141452A1 (en) 2008-04-28

Family

ID=35169653

Family Applications (2)

Application Number Title Priority Date Filing Date
SG200802267-5A SG141452A1 (en) 2004-09-20 2005-09-14 Lithographic apparatus and device manufacturing method
SG200505921A SG121142A1 (en) 2004-09-20 2005-09-14 Lithographic apparatus and device manufacturing method

Family Applications After (1)

Application Number Title Priority Date Filing Date
SG200505921A SG121142A1 (en) 2004-09-20 2005-09-14 Lithographic apparatus and device manufacturing method

Country Status (8)

Country Link
US (1) US7133114B2 (zh)
EP (2) EP1850181A1 (zh)
JP (2) JP4347282B2 (zh)
KR (1) KR100767089B1 (zh)
CN (1) CN100524035C (zh)
DE (1) DE602005003082T2 (zh)
SG (2) SG141452A1 (zh)
TW (1) TWI277839B (zh)

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CN103268059B (zh) * 2013-05-29 2014-12-10 浙江大学 用于浸没式光刻机的多级负压回收密封和气密封装置
CN103969964B (zh) * 2014-04-25 2015-11-25 浙江大学 用于浸没式光刻机的气密封和微孔密封装置
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Also Published As

Publication number Publication date
JP4728382B2 (ja) 2011-07-20
KR100767089B1 (ko) 2007-10-15
JP4347282B2 (ja) 2009-10-21
DE602005003082T2 (de) 2008-08-14
JP2006093703A (ja) 2006-04-06
EP1850181A1 (en) 2007-10-31
JP2009094532A (ja) 2009-04-30
US7133114B2 (en) 2006-11-07
DE602005003082D1 (de) 2007-12-13
SG121142A1 (en) 2006-04-26
EP1637931A1 (en) 2006-03-22
TWI277839B (en) 2007-04-01
KR20060051387A (ko) 2006-05-19
CN1752851A (zh) 2006-03-29
CN100524035C (zh) 2009-08-05
US20060061739A1 (en) 2006-03-23
EP1637931B1 (en) 2007-10-31
TW200622507A (en) 2006-07-01

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