SG136894A1 - Moving beam with respect to diffractive optics in order to reduce interference patterns - Google Patents

Moving beam with respect to diffractive optics in order to reduce interference patterns

Info

Publication number
SG136894A1
SG136894A1 SG200702667-7A SG2007026677A SG136894A1 SG 136894 A1 SG136894 A1 SG 136894A1 SG 2007026677 A SG2007026677 A SG 2007026677A SG 136894 A1 SG136894 A1 SG 136894A1
Authority
SG
Singapore
Prior art keywords
respect
order
reduce interference
interference patterns
moving beam
Prior art date
Application number
SG200702667-7A
Other languages
English (en)
Inventor
Huibert Visser
Johannes Jacobus Mat Baselmans
Jager Pieter Willem Herman De
Henri Johannes Petrus Vink
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG136894A1 publication Critical patent/SG136894A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • H01L21/0275—Photolithographic processes using lasers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G03F7/2006—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light using coherent light; using polarised light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200702667-7A 2006-04-13 2007-04-11 Moving beam with respect to diffractive optics in order to reduce interference patterns SG136894A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/403,194 US7948606B2 (en) 2006-04-13 2006-04-13 Moving beam with respect to diffractive optics in order to reduce interference patterns

Publications (1)

Publication Number Publication Date
SG136894A1 true SG136894A1 (en) 2007-11-29

Family

ID=38180321

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200702667-7A SG136894A1 (en) 2006-04-13 2007-04-11 Moving beam with respect to diffractive optics in order to reduce interference patterns

Country Status (7)

Country Link
US (1) US7948606B2 (zh)
EP (1) EP1845418A2 (zh)
JP (1) JP2007305979A (zh)
KR (1) KR100841424B1 (zh)
CN (1) CN101055429B (zh)
SG (1) SG136894A1 (zh)
TW (1) TWI491997B (zh)

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JP7195411B2 (ja) 2018-09-21 2022-12-23 エーエスエムエル ネザーランズ ビー．ブイ． 放射システム
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Also Published As

Publication number Publication date
EP1845418A2 (en) 2007-10-17
TWI491997B (zh) 2015-07-11
KR20070101813A (ko) 2007-10-17
KR100841424B1 (ko) 2008-06-25
CN101055429B (zh) 2011-06-22
JP2007305979A (ja) 2007-11-22
CN101055429A (zh) 2007-10-17
US20070242253A1 (en) 2007-10-18
TW200801839A (en) 2008-01-01
US7948606B2 (en) 2011-05-24

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