SG126921A1 - Lithographic apparatus and device manufacturing method - Google Patents

Lithographic apparatus and device manufacturing method

Info

Publication number
SG126921A1
SG126921A1 SG200602940A SG200602940A SG126921A1 SG 126921 A1 SG126921 A1 SG 126921A1 SG 200602940 A SG200602940 A SG 200602940A SG 200602940 A SG200602940 A SG 200602940A SG 126921 A1 SG126921 A1 SG 126921A1
Authority
SG
Singapore
Prior art keywords
device manufacturing
lithographic apparatus
lithographic
manufacturing
Prior art date
Application number
SG200602940A
Other languages
English (en)
Inventor
Alexander Straaijer
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG126921A1 publication Critical patent/SG126921A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200602940A 2005-05-03 2006-05-02 Lithographic apparatus and device manufacturing method SG126921A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/120,198 US7317507B2 (en) 2005-05-03 2005-05-03 Lithographic apparatus and device manufacturing method

Publications (1)

Publication Number Publication Date
SG126921A1 true SG126921A1 (en) 2006-11-29

Family

ID=36685649

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200602940A SG126921A1 (en) 2005-05-03 2006-05-02 Lithographic apparatus and device manufacturing method

Country Status (7)

Country Link
US (1) US7317507B2 (ja)
EP (1) EP1720073B1 (ja)
JP (1) JP4543003B2 (ja)
KR (1) KR100706921B1 (ja)
CN (1) CN1858655B (ja)
SG (1) SG126921A1 (ja)
TW (1) TWI331705B (ja)

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Also Published As

Publication number Publication date
KR100706921B1 (ko) 2007-04-13
KR20060115613A (ko) 2006-11-09
US20060250591A1 (en) 2006-11-09
CN1858655B (zh) 2010-09-01
JP4543003B2 (ja) 2010-09-15
EP1720073B1 (en) 2012-01-18
JP2006313905A (ja) 2006-11-16
US7317507B2 (en) 2008-01-08
CN1858655A (zh) 2006-11-08
EP1720073A1 (en) 2006-11-08
TW200643650A (en) 2006-12-16
TWI331705B (en) 2010-10-11

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