SG11201900555XA - NON-MAGNETIC MATERIAL-DISPERSED Fe-Pt SPUTTERING TARGET - Google Patents
NON-MAGNETIC MATERIAL-DISPERSED Fe-Pt SPUTTERING TARGETInfo
- Publication number
- SG11201900555XA SG11201900555XA SG11201900555XA SG11201900555XA SG11201900555XA SG 11201900555X A SG11201900555X A SG 11201900555XA SG 11201900555X A SG11201900555X A SG 11201900555XA SG 11201900555X A SG11201900555X A SG 11201900555XA SG 11201900555X A SG11201900555X A SG 11201900555XA
- Authority
- SG
- Singapore
- Prior art keywords
- sputtering target
- ratio
- sge30mass
- sge
- sputtering
- Prior art date
Links
- 238000000717 platinum sputter deposition Methods 0.000 title 1
- 238000005477 sputtering target Methods 0.000 abstract 6
- 239000000203 mixture Substances 0.000 abstract 2
- 238000004544 sputter deposition Methods 0.000 abstract 2
- 229910000905 alloy phase Inorganic materials 0.000 abstract 1
- 238000004453 electron probe microanalysis Methods 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 238000013507 mapping Methods 0.000 abstract 1
- 239000002245 particle Substances 0.000 abstract 1
- 238000005498 polishing Methods 0.000 abstract 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C5/00—Alloys based on noble metals
- C22C5/04—Alloys based on a platinum group metal
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F5/00—Manufacture of workpieces or articles from metallic powder characterised by the special shape of the product
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/04—Making non-ferrous alloys by powder metallurgy
- C22C1/0466—Alloys based on noble metals
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C28/00—Alloys based on a metal not provided for in groups C22C5/00 - C22C27/00
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C33/00—Making ferrous alloys
- C22C33/02—Making ferrous alloys by powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/002—Ferrous alloys, e.g. steel alloys containing In, Mg, or other elements not provided for in one single group C22C38/001 - C22C38/60
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/851—Coating a support with a magnetic layer by sputtering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
- H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
- H01F41/183—Sputtering targets therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
- H01J37/3426—Material
- H01J37/3429—Plural materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3488—Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus
- H01J37/3491—Manufacturing of targets
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/05—Metallic powder characterised by the size or surface area of the particles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/12—Metallic powder containing non-metallic particles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2304/00—Physical aspects of the powder
- B22F2304/10—Micron size particles, i.e. above 1 micrometer up to 500 micrometer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
- B22F2998/10—Processes characterised by the sequence of their steps
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2999/00—Aspects linked to processes or compositions used in powder metallurgy
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
- B22F3/12—Both compacting and sintering
- B22F3/14—Both compacting and sintering simultaneously
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
- B22F3/12—Both compacting and sintering
- B22F3/14—Both compacting and sintering simultaneously
- B22F3/15—Hot isostatic pressing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/02—Making metallic powder or suspensions thereof using physical processes
- B22F9/04—Making metallic powder or suspensions thereof using physical processes starting from solid material, e.g. by crushing, grinding or milling
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Powder Metallurgy (AREA)
- Magnetic Record Carriers (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016172291A JP6692724B2 (ja) | 2016-09-02 | 2016-09-02 | 非磁性材料分散型Fe−Pt系スパッタリングターゲット |
PCT/JP2017/031469 WO2018043680A1 (ja) | 2016-09-02 | 2017-08-31 | 非磁性材料分散型Fe-Pt系スパッタリングターゲット |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201900555XA true SG11201900555XA (en) | 2019-02-27 |
Family
ID=61301097
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201900555XA SG11201900555XA (en) | 2016-09-02 | 2017-08-31 | NON-MAGNETIC MATERIAL-DISPERSED Fe-Pt SPUTTERING TARGET |
Country Status (7)
Country | Link |
---|---|
US (2) | US20190185987A1 (ja) |
JP (1) | JP6692724B2 (ja) |
CN (1) | CN108138313B (ja) |
MY (1) | MY187837A (ja) |
SG (1) | SG11201900555XA (ja) |
TW (1) | TWI633198B (ja) |
WO (1) | WO2018043680A1 (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2019187243A1 (ja) * | 2018-03-27 | 2019-10-03 | Jx金属株式会社 | スパッタリングターゲット及びその製造方法、並びに磁気記録媒体の製造方法 |
TWI702294B (zh) * | 2018-07-31 | 2020-08-21 | 日商田中貴金屬工業股份有限公司 | 磁氣記錄媒體用濺鍍靶 |
JP7104001B2 (ja) * | 2019-06-28 | 2022-07-20 | 田中貴金属工業株式会社 | Fe-Pt-BN系スパッタリングターゲット及びその製造方法 |
US20220383901A1 (en) * | 2019-11-01 | 2022-12-01 | Tanaka Kikinzoku Kogyo K.K. | Sputtering target for heat-assisted magnetic recording medium |
JP2022042874A (ja) * | 2020-09-03 | 2022-03-15 | Jx金属株式会社 | スパッタリングターゲット、その製造方法、及び磁気記録媒体の製造方法 |
WO2023038016A1 (ja) * | 2021-09-08 | 2023-03-16 | 田中貴金属工業株式会社 | 熱アシスト磁気記録媒体を製造するためのスパッタリングターゲット |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5337331B2 (ja) * | 2010-03-30 | 2013-11-06 | 山陽特殊製鋼株式会社 | スパッタリングターゲット材の製造方法 |
MY168523A (en) * | 2012-10-25 | 2018-11-12 | Jx Nippon Mining & Metals Corp | Fe-pt-based sputtering target having non-magnetic substance dispersed therein |
TW201425620A (zh) * | 2012-11-05 | 2014-07-01 | Mitsubishi Materials Corp | 濺鍍靶及其之製造方法 |
CN104718574B (zh) * | 2012-12-06 | 2018-03-30 | 富士电机株式会社 | 垂直磁记录介质 |
JP5969120B2 (ja) * | 2013-05-13 | 2016-08-17 | Jx金属株式会社 | 磁性薄膜形成用スパッタリングターゲット |
SG11201506142YA (en) * | 2013-05-20 | 2015-09-29 | Jx Nippon Mining & Metals Corp | Sputtering target for magnetic recording medium |
JP5946922B2 (ja) * | 2013-06-06 | 2016-07-06 | Jx金属株式会社 | 磁性記録媒体用スパッタリングターゲット |
JP6422096B2 (ja) * | 2014-03-14 | 2018-11-14 | Jx金属株式会社 | C粒子が分散したFe−Pt系スパッタリングターゲット |
JP6437427B2 (ja) * | 2015-03-04 | 2018-12-12 | Jx金属株式会社 | 磁気記録媒体用スパッタリングターゲット |
-
2016
- 2016-09-02 JP JP2016172291A patent/JP6692724B2/ja active Active
-
2017
- 2017-08-31 TW TW106129826A patent/TWI633198B/zh active
- 2017-08-31 WO PCT/JP2017/031469 patent/WO2018043680A1/ja active Application Filing
- 2017-08-31 US US16/322,984 patent/US20190185987A1/en active Pending
- 2017-08-31 CN CN201780003433.4A patent/CN108138313B/zh active Active
- 2017-08-31 SG SG11201900555XA patent/SG11201900555XA/en unknown
- 2017-08-31 MY MYPI2019001025A patent/MY187837A/en unknown
-
2022
- 2022-12-22 US US18/145,400 patent/US20230125486A1/en active Pending
Also Published As
Publication number | Publication date |
---|---|
CN108138313B (zh) | 2019-10-11 |
TW201812062A (zh) | 2018-04-01 |
WO2018043680A1 (ja) | 2018-03-08 |
JP2018035434A (ja) | 2018-03-08 |
TWI633198B (zh) | 2018-08-21 |
MY187837A (en) | 2021-10-26 |
JP6692724B2 (ja) | 2020-05-13 |
CN108138313A (zh) | 2018-06-08 |
US20230125486A1 (en) | 2023-04-27 |
US20190185987A1 (en) | 2019-06-20 |
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