SG11201701272UA - Protective coating-forming sheet and method for manufacturing semiconductor chip provided with protective coating - Google Patents

Protective coating-forming sheet and method for manufacturing semiconductor chip provided with protective coating

Info

Publication number
SG11201701272UA
SG11201701272UA SG11201701272UA SG11201701272UA SG11201701272UA SG 11201701272U A SG11201701272U A SG 11201701272UA SG 11201701272U A SG11201701272U A SG 11201701272UA SG 11201701272U A SG11201701272U A SG 11201701272UA SG 11201701272U A SG11201701272U A SG 11201701272UA
Authority
SG
Singapore
Prior art keywords
protective coating
semiconductor chip
manufacturing semiconductor
forming sheet
chip provided
Prior art date
Application number
SG11201701272UA
Other languages
English (en)
Inventor
Daisuke Yamamoto
Naoya Saiki
Hiroyuki Yoneyama
Original Assignee
Lintec Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lintec Corp filed Critical Lintec Corp
Publication of SG11201701272UA publication Critical patent/SG11201701272UA/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836Wafer tapes, e.g. grinding or dicing support tapes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/50Working by transmitting the laser beam through or within the workpiece
    • B23K26/53Working by transmitting the laser beam through or within the workpiece for modifying or reforming the material inside the workpiece, e.g. for producing break initiation cracks
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04Interconnection of layers
    • B32B7/12Interconnection of layers using interposed adhesives or interposed materials with bonding properties
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/8319Arrangement of the layer connectors prior to mounting
    • H01L2224/83192Arrangement of the layer connectors prior to mounting wherein the layer connectors are disposed only on another item or body to be connected to the semiconductor or solid-state body

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Dicing (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Adhesive Tapes (AREA)
  • Laser Beam Processing (AREA)
  • Laminated Bodies (AREA)
  • Paints Or Removers (AREA)
  • Formation Of Insulating Films (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
SG11201701272UA 2014-08-22 2015-08-21 Protective coating-forming sheet and method for manufacturing semiconductor chip provided with protective coating SG11201701272UA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2014169266 2014-08-22
JP2014169267 2014-08-22
PCT/JP2015/073503 WO2016027883A1 (fr) 2014-08-22 2015-08-21 Feuille pour formation de membrane protectrice, et procédé de fabrication de puce semi-conductrice avec membrane protectrice

Publications (1)

Publication Number Publication Date
SG11201701272UA true SG11201701272UA (en) 2017-04-27

Family

ID=55350823

Family Applications (2)

Application Number Title Priority Date Filing Date
SG11201701270QA SG11201701270QA (en) 2014-08-22 2015-08-21 Protective coating-forming sheet and method for manufacturing semiconductor chip provided with protective coating
SG11201701272UA SG11201701272UA (en) 2014-08-22 2015-08-21 Protective coating-forming sheet and method for manufacturing semiconductor chip provided with protective coating

Family Applications Before (1)

Application Number Title Priority Date Filing Date
SG11201701270QA SG11201701270QA (en) 2014-08-22 2015-08-21 Protective coating-forming sheet and method for manufacturing semiconductor chip provided with protective coating

Country Status (8)

Country Link
JP (2) JPWO2016027888A1 (fr)
KR (2) KR102368140B1 (fr)
CN (2) CN106660333B (fr)
MY (2) MY186759A (fr)
PH (2) PH12017500284A1 (fr)
SG (2) SG11201701270QA (fr)
TW (4) TWI712670B (fr)
WO (2) WO2016027888A1 (fr)

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SG11201803325QA (en) * 2015-10-29 2018-05-30 Lintec Corp Film for protective film formation and composite sheet for protective film formation
WO2017149890A1 (fr) * 2016-03-04 2017-09-08 リンテック株式会社 Feuille composite pour formation de membrane protectrice
WO2017149926A1 (fr) * 2016-03-04 2017-09-08 リンテック株式会社 Feuille de traitement de semi-conducteur
KR20180122316A (ko) * 2016-03-04 2018-11-12 린텍 가부시키가이샤 반도체 가공용 시트
JP6573841B2 (ja) * 2016-03-04 2019-09-11 リンテック株式会社 半導体加工用シート
KR102516392B1 (ko) * 2016-03-04 2023-03-30 린텍 가부시키가이샤 보호막 형성용 복합 시트
JP6617056B2 (ja) * 2016-03-04 2019-12-04 リンテック株式会社 半導体加工用シート、その巻取体および当該巻取体の製造方法
TWI721158B (zh) * 2016-04-28 2021-03-11 日商琳得科股份有限公司 保護膜形成用膜及保護膜形成用複合片
TWI778960B (zh) * 2016-04-28 2022-10-01 日商琳得科股份有限公司 保護膜形成用膜、保護膜形成用複合片、以及附有保護膜的半導體晶片之製造方法
TWI796297B (zh) * 2016-04-28 2023-03-21 日商琳得科股份有限公司 保護膜形成用複合片
KR102407322B1 (ko) * 2016-04-28 2022-06-10 린텍 가부시키가이샤 보호막 형성용 필름 및 보호막 형성용 복합 시트
TWI731964B (zh) * 2016-04-28 2021-07-01 日商琳得科股份有限公司 保護膜形成用複合片
WO2017195711A1 (fr) * 2016-05-12 2017-11-16 住友ベークライト株式会社 Ruban adhésif permettant de traiter des substrats semi-conducteurs
JP6776081B2 (ja) * 2016-09-28 2020-10-28 リンテック株式会社 保護膜付き半導体チップの製造方法及び半導体装置の製造方法
JP6438181B1 (ja) * 2017-05-17 2018-12-12 リンテック株式会社 半導体装置及びその製造方法
CN111051455B (zh) * 2017-08-28 2022-05-03 琳得科株式会社 膜状透明粘合剂及红外线传感器模块
WO2019146607A1 (fr) * 2018-01-24 2019-08-01 リンテック株式会社 Longue feuille stratifiée et son corps d'enroulement
KR102487552B1 (ko) 2018-02-05 2023-01-11 삼성전자주식회사 보호막 조성물 및 이를 이용한 반도체 패키지 제조 방법
JP7282076B2 (ja) * 2018-03-23 2023-05-26 リンテック株式会社 フィルム状接着剤及び半導体加工用シート
WO2019187010A1 (fr) * 2018-03-30 2019-10-03 リンテック株式会社 Feuille composite de formation de film de protection et son procédé de production
WO2019187014A1 (fr) * 2018-03-30 2019-10-03 リンテック株式会社 Feuille de support et feuille composite pour formation de film de protection
WO2020218519A1 (fr) * 2019-04-26 2020-10-29 リンテック株式会社 Procédé de production d'un corps à trois couches, procédé de production d'un corps à quatre couches, procédé de production d'un dispositif à semi-conducteurs équipé d'un film de protection de surface arrière, et corps à trois couches
JP7453879B2 (ja) 2020-08-12 2024-03-21 リンテック株式会社 保護膜形成用シートロールおよび保護膜形成用シートロールの製造方法
JP7484557B2 (ja) 2020-08-18 2024-05-16 三菱ケミカル株式会社 粘接着剤組成物、粘接着シート及び積層体
JP7084972B2 (ja) * 2020-10-06 2022-06-15 リンテック株式会社 保護膜形成用複合シート

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EP3664131A3 (fr) 2002-03-12 2020-08-19 Hamamatsu Photonics K. K. Procédé de division de substrat
JP3857953B2 (ja) * 2002-05-16 2006-12-13 株式会社巴川製紙所 半導体装置製造用接着シート
US20030190466A1 (en) * 2002-04-03 2003-10-09 Katsuji Nakaba Adhesive sheet for producing semiconductor devices
JP4364508B2 (ja) * 2002-12-27 2009-11-18 リンテック株式会社 チップ裏面用保護膜形成用シートおよび保護膜付きチップの製造方法
US20060128065A1 (en) * 2003-06-06 2006-06-15 Teiichi Inada Adhesive sheet, dicing tape intergrated type adhesive sheet, and semiconductor device producing method
WO2005004216A1 (fr) * 2003-07-08 2005-01-13 Lintec Corporation Feuille auto-adhesive durcissable pour decoupage en puces/fixation de puces, et procede de fabrication de dispositif a semiconducteur
JP4846406B2 (ja) * 2006-03-28 2011-12-28 リンテック株式会社 チップ用保護膜形成用シート
CN102216075A (zh) * 2008-11-27 2011-10-12 三井-杜邦聚合化学株式会社 电子部件用保护膜、其制造方法及用途
JP5335483B2 (ja) * 2009-02-27 2013-11-06 リンテック株式会社 粘着剤層付き偏光板の製造方法
JP5603757B2 (ja) * 2009-12-04 2014-10-08 リンテック株式会社 レーザーダイシング用粘着シート及び半導体装置の製造方法
JP2011151362A (ja) 2009-12-24 2011-08-04 Nitto Denko Corp ダイシングテープ一体型半導体裏面用フィルム
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JP5865045B2 (ja) * 2011-12-07 2016-02-17 リンテック株式会社 保護膜形成層付ダイシングシートおよびチップの製造方法
JP6001273B2 (ja) * 2012-02-13 2016-10-05 信越化学工業株式会社 半導体ウエハ用保護フィルム及び半導体チップの製造方法
WO2013172328A1 (fr) * 2012-05-14 2013-11-21 リンテック株式会社 Feuille ayant une couche de résine adhésive attachée à celle-ci, et procédé de fabrication d'un dispositif à semi-conducteur
KR102140470B1 (ko) * 2012-11-30 2020-08-03 린텍 가부시키가이샤 칩용 수지막 형성용 시트 및 반도체 장치의 제조 방법
US10106700B2 (en) * 2014-03-24 2018-10-23 Lintec Corporation Protection membrane forming film, protection membrane forming utilization sheet, production method and inspection method for workpiece or processed product, workpiece determined as adequate product, and processed product determined as adequate product
JP5980438B2 (ja) * 2014-03-24 2016-08-31 リンテック株式会社 加工物の製造方法

Also Published As

Publication number Publication date
JPWO2016027888A1 (ja) 2017-06-01
TW201614024A (en) 2016-04-16
KR20170044108A (ko) 2017-04-24
TW201940622A (zh) 2019-10-16
PH12017500285A1 (en) 2017-06-28
TW201938728A (zh) 2019-10-01
SG11201701270QA (en) 2017-03-30
KR102376017B1 (ko) 2022-03-17
MY186759A (en) 2021-08-18
KR20170044652A (ko) 2017-04-25
TWI706023B (zh) 2020-10-01
WO2016027883A1 (fr) 2016-02-25
PH12017500284B1 (en) 2017-07-03
PH12017500285B1 (en) 2017-06-28
CN106660333B (zh) 2018-11-06
CN106660332B (zh) 2020-08-07
MY182846A (en) 2021-02-05
TW201614023A (en) 2016-04-16
CN106660333A (zh) 2017-05-10
WO2016027888A1 (fr) 2016-02-25
TWI668290B (zh) 2019-08-11
TWI712670B (zh) 2020-12-11
JPWO2016027883A1 (ja) 2017-06-01
TWI672354B (zh) 2019-09-21
KR102368140B1 (ko) 2022-02-25
PH12017500284A1 (en) 2017-07-03
JP6589209B2 (ja) 2019-10-16
CN106660332A (zh) 2017-05-10

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