SG10201801395TA - Processing method for workpiece - Google Patents

Processing method for workpiece

Info

Publication number
SG10201801395TA
SG10201801395TA SG10201801395TA SG10201801395TA SG10201801395TA SG 10201801395T A SG10201801395T A SG 10201801395TA SG 10201801395T A SG10201801395T A SG 10201801395TA SG 10201801395T A SG10201801395T A SG 10201801395TA SG 10201801395T A SG10201801395T A SG 10201801395TA
Authority
SG
Singapore
Prior art keywords
cutting
deep
workpiece
grooves
processing method
Prior art date
Application number
SG10201801395TA
Other languages
English (en)
Inventor
Tanaka Hideaki
Original Assignee
Disco Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Disco Corp filed Critical Disco Corp
Publication of SG10201801395TA publication Critical patent/SG10201801395TA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67092—Apparatus for mechanical treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Dicing (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)
  • Milling, Broaching, Filing, Reaming, And Others (AREA)
  • Milling Processes (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
SG10201801395TA 2017-03-13 2018-02-21 Processing method for workpiece SG10201801395TA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017047317A JP6812079B2 (ja) 2017-03-13 2017-03-13 被加工物の加工方法

Publications (1)

Publication Number Publication Date
SG10201801395TA true SG10201801395TA (en) 2018-10-30

Family

ID=63259331

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201801395TA SG10201801395TA (en) 2017-03-13 2018-02-21 Processing method for workpiece

Country Status (8)

Country Link
US (1) US10535562B2 (de)
JP (1) JP6812079B2 (de)
KR (1) KR102391848B1 (de)
CN (1) CN108573919B (de)
DE (1) DE102018203678B4 (de)
MY (1) MY181615A (de)
SG (1) SG10201801395TA (de)
TW (1) TWI745547B (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7080552B2 (ja) * 2017-12-28 2022-06-06 株式会社ディスコ 切削ブレードのドレッシング方法

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1174228A (ja) * 1997-08-28 1999-03-16 Disco Abrasive Syst Ltd 精密切削装置
JP2002075919A (ja) * 2000-08-30 2002-03-15 Sharp Corp 半導体ウエハのダイシング方法
JP2003173986A (ja) * 2001-12-04 2003-06-20 Disco Abrasive Syst Ltd ２スピンドル切削装置における切削方法
KR20030075681A (ko) * 2002-03-20 2003-09-26 삼성전기주식회사 칩핑 방지를 위한 웨이퍼 다이싱 방법
CN100440444C (zh) * 2004-07-22 2008-12-03 株式会社瑞萨科技 半导体器件的制造方法
JP4975422B2 (ja) * 2006-11-28 2012-07-11 株式会社ディスコ 切削装置
KR20090052468A (ko) * 2007-11-21 2009-05-26 한미반도체 주식회사 자재 하프 컷팅 방법
JP5571331B2 (ja) * 2009-07-07 2014-08-13 株式会社ディスコ 切削装置
JP5764031B2 (ja) * 2011-10-06 2015-08-12 株式会社ディスコ 切削装置
US20130273717A1 (en) * 2012-04-17 2013-10-17 Taiwan Semiconductor Manufacturing Co., Ltd. Apparatus and Method for the Singulation of a Semiconductor Wafer
JP6078272B2 (ja) * 2012-09-10 2017-02-08 株式会社ディスコ ウエーハの加工方法
JP6061776B2 (ja) * 2013-05-16 2017-01-18 株式会社ディスコ 切削溝の検出方法
JP6170769B2 (ja) * 2013-07-11 2017-07-26 株式会社ディスコ ウェーハの加工方法
JP6180876B2 (ja) * 2013-10-02 2017-08-16 株式会社ディスコ 切削装置及びウエーハの切削方法
TW201519360A (zh) * 2013-11-08 2015-05-16 Prov Technology Corp 晶圓切割方法
JP6203011B2 (ja) * 2013-11-19 2017-09-27 株式会社ディスコ 切削方法
JP6251574B2 (ja) * 2014-01-14 2017-12-20 株式会社ディスコ 切削方法
JP6282194B2 (ja) * 2014-07-30 2018-02-21 株式会社ディスコ ウェーハの加工方法
JP6562670B2 (ja) 2015-03-23 2019-08-21 株式会社ディスコ 被加工物の切削方法
JP6521687B2 (ja) * 2015-03-23 2019-05-29 株式会社ディスコ 切削ブレードの検査方法
JP6422388B2 (ja) * 2015-04-09 2018-11-14 株式会社ディスコ 切削溝の形成方法
JP2016219757A (ja) * 2015-05-26 2016-12-22 株式会社ディスコ 被加工物の分割方法
TWI692023B (zh) * 2015-07-08 2020-04-21 美商戴卡科技有限公司 用於移除材料的半導體元件製程方法
JP6607639B2 (ja) * 2015-12-24 2019-11-20 株式会社ディスコ ウェーハの加工方法
JP6906836B2 (ja) * 2017-01-27 2021-07-21 株式会社ディスコ 積層ドレッシングボードの使用方法
JP2018181903A (ja) * 2017-04-04 2018-11-15 株式会社ディスコ 加工方法
JP6847529B2 (ja) * 2017-06-15 2021-03-24 株式会社ディスコ 被加工物の切削方法
JP6979296B2 (ja) * 2017-07-28 2021-12-08 株式会社ディスコ 切削方法
JP6955975B2 (ja) * 2017-11-21 2021-10-27 株式会社ディスコ ウェーハの加工方法
JP2019115962A (ja) * 2017-12-27 2019-07-18 株式会社ディスコ チャックテーブル修正方法及び切削装置

Also Published As

Publication number Publication date
CN108573919B (zh) 2023-08-15
TWI745547B (zh) 2021-11-11
DE102018203678B4 (de) 2024-01-25
US10535562B2 (en) 2020-01-14
KR20180104566A (ko) 2018-09-21
MY181615A (en) 2020-12-29
US20180261505A1 (en) 2018-09-13
KR102391848B1 (ko) 2022-04-27
DE102018203678A1 (de) 2018-09-13
CN108573919A (zh) 2018-09-25
JP6812079B2 (ja) 2021-01-13
TW201835990A (zh) 2018-10-01
JP2018152453A (ja) 2018-09-27

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