SE516914C2 - Metoder och rastrerare för högpresterande mönstergenerering - Google Patents

Metoder och rastrerare för högpresterande mönstergenerering

Info

Publication number
SE516914C2
SE516914C2 SE9903243A SE9903243A SE516914C2 SE 516914 C2 SE516914 C2 SE 516914C2 SE 9903243 A SE9903243 A SE 9903243A SE 9903243 A SE9903243 A SE 9903243A SE 516914 C2 SE516914 C2 SE 516914C2
Authority
SE
Sweden
Prior art keywords
data
fracturing
slm
rasterization
bitmap
Prior art date
Application number
SE9903243A
Other languages
English (en)
Swedish (sv)
Other versions
SE9903243D0 (sv
SE9903243L (sv
Inventor
Torbjoern Sandstroem
Anders Thuren
Hubert Lakner
Peter Duerr
Original Assignee
Micronic Laser Systems Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Micronic Laser Systems Ab filed Critical Micronic Laser Systems Ab
Priority to SE9903243A priority Critical patent/SE516914C2/sv
Publication of SE9903243D0 publication Critical patent/SE9903243D0/xx
Priority to CNB008125694A priority patent/CN1203376C/zh
Priority to AU75664/00A priority patent/AU7566400A/en
Priority to PCT/SE2000/001749 priority patent/WO2001018606A1/en
Priority to KR1020027003117A priority patent/KR100748767B1/ko
Priority to JP2001522140A priority patent/JP2003508825A/ja
Priority to DE10085017T priority patent/DE10085017B4/de
Priority to US10/049,286 priority patent/US6717097B1/en
Publication of SE9903243L publication Critical patent/SE9903243L/xx
Publication of SE516914C2 publication Critical patent/SE516914C2/sv
Priority to US10/782,863 priority patent/US7590966B2/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70508—Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70158—Diffractive optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S707/00—Data processing: database and file management or data structures
    • Y10S707/99931—Database or file accessing
    • Y10S707/99937—Sorting
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S707/00—Data processing: database and file management or data structures
    • Y10S707/99941—Database schema or data structure
    • Y10S707/99942—Manipulating data structure, e.g. compression, compaction, compilation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
  • Image Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SE9903243A 1999-09-09 1999-09-09 Metoder och rastrerare för högpresterande mönstergenerering SE516914C2 (sv)

Priority Applications (9)

Application Number Priority Date Filing Date Title
SE9903243A SE516914C2 (sv) 1999-09-09 1999-09-09 Metoder och rastrerare för högpresterande mönstergenerering
US10/049,286 US6717097B1 (en) 1999-09-09 2000-09-08 Data path for high performance pattern generator
KR1020027003117A KR100748767B1 (ko) 1999-09-09 2000-09-08 고성능 패턴 발생기를 위한 데이터 경로
AU75664/00A AU7566400A (en) 1999-09-09 2000-09-08 Data path for high performance pattern generator
PCT/SE2000/001749 WO2001018606A1 (en) 1999-09-09 2000-09-08 Data path for high performance pattern generator
CNB008125694A CN1203376C (zh) 1999-09-09 2000-09-08 一种图形数据转换方法及装置
JP2001522140A JP2003508825A (ja) 1999-09-09 2000-09-08 高性能パターン発生器のためのデータパス
DE10085017T DE10085017B4 (de) 1999-09-09 2000-09-08 Datenpfad für Hochleistungs-Mustergenerator
US10/782,863 US7590966B2 (en) 1999-09-09 2004-02-23 Data path for high performance pattern generator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE9903243A SE516914C2 (sv) 1999-09-09 1999-09-09 Metoder och rastrerare för högpresterande mönstergenerering

Publications (3)

Publication Number Publication Date
SE9903243D0 SE9903243D0 (sv) 1999-09-09
SE9903243L SE9903243L (sv) 2001-03-10
SE516914C2 true SE516914C2 (sv) 2002-03-19

Family

ID=20416954

Family Applications (1)

Application Number Title Priority Date Filing Date
SE9903243A SE516914C2 (sv) 1999-09-09 1999-09-09 Metoder och rastrerare för högpresterande mönstergenerering

Country Status (8)

Country Link
US (2) US6717097B1 (ko)
JP (1) JP2003508825A (ko)
KR (1) KR100748767B1 (ko)
CN (1) CN1203376C (ko)
AU (1) AU7566400A (ko)
DE (1) DE10085017B4 (ko)
SE (1) SE516914C2 (ko)
WO (1) WO2001018606A1 (ko)

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Also Published As

Publication number Publication date
KR20020072530A (ko) 2002-09-16
US20040159636A1 (en) 2004-08-19
CN1203376C (zh) 2005-05-25
US6717097B1 (en) 2004-04-06
WO2001018606A1 (en) 2001-03-15
DE10085017T1 (de) 2002-10-24
KR100748767B1 (ko) 2007-08-13
DE10085017B4 (de) 2011-08-11
CN1373862A (zh) 2002-10-09
SE9903243D0 (sv) 1999-09-09
SE9903243L (sv) 2001-03-10
JP2003508825A (ja) 2003-03-04
US7590966B2 (en) 2009-09-15
AU7566400A (en) 2001-04-10

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