SE514835C2 - System och metod för mikrolitografiskt skrivande - Google Patents

System och metod för mikrolitografiskt skrivande

Info

Publication number
SE514835C2
SE514835C2 SE9900170A SE9900170A SE514835C2 SE 514835 C2 SE514835 C2 SE 514835C2 SE 9900170 A SE9900170 A SE 9900170A SE 9900170 A SE9900170 A SE 9900170A SE 514835 C2 SE514835 C2 SE 514835C2
Authority
SE
Sweden
Prior art keywords
writing
detector
substrate
laser
typing
Prior art date
Application number
SE9900170A
Other languages
English (en)
Swedish (sv)
Other versions
SE9900170L (sv
SE9900170D0 (sv
Inventor
Torbjoern Sandstroem
Leif Odselius
Anders Thuren
Stefan Gullstrand
Original Assignee
Micronic Laser Systems Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Micronic Laser Systems Ab filed Critical Micronic Laser Systems Ab
Priority to SE9900170A priority Critical patent/SE514835C2/sv
Publication of SE9900170D0 publication Critical patent/SE9900170D0/xx
Priority to PCT/SE2000/000136 priority patent/WO2000043838A1/en
Priority to US09/869,922 priority patent/US6624878B1/en
Priority to AU23404/00A priority patent/AU2340400A/en
Priority to JP2000595202A priority patent/JP2002535719A/ja
Publication of SE9900170L publication Critical patent/SE9900170L/
Publication of SE514835C2 publication Critical patent/SE514835C2/sv

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SE9900170A 1999-01-21 1999-01-21 System och metod för mikrolitografiskt skrivande SE514835C2 (sv)

Priority Applications (5)

Application Number Priority Date Filing Date Title
SE9900170A SE514835C2 (sv) 1999-01-21 1999-01-21 System och metod för mikrolitografiskt skrivande
PCT/SE2000/000136 WO2000043838A1 (en) 1999-01-21 2000-01-21 Laser writer
US09/869,922 US6624878B1 (en) 1999-01-21 2000-01-21 Laser writer
AU23404/00A AU2340400A (en) 1999-01-21 2000-01-21 Laser writer
JP2000595202A JP2002535719A (ja) 1999-01-21 2000-01-21 レーザー記録方法およびシステム

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE9900170A SE514835C2 (sv) 1999-01-21 1999-01-21 System och metod för mikrolitografiskt skrivande

Publications (3)

Publication Number Publication Date
SE9900170D0 SE9900170D0 (sv) 1999-01-21
SE9900170L SE9900170L (sv) 2000-07-22
SE514835C2 true SE514835C2 (sv) 2001-04-30

Family

ID=20414167

Family Applications (1)

Application Number Title Priority Date Filing Date
SE9900170A SE514835C2 (sv) 1999-01-21 1999-01-21 System och metod för mikrolitografiskt skrivande

Country Status (5)

Country Link
US (1) US6624878B1 (enExample)
JP (1) JP2002535719A (enExample)
AU (1) AU2340400A (enExample)
SE (1) SE514835C2 (enExample)
WO (1) WO2000043838A1 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10138313A1 (de) * 2001-01-23 2002-07-25 Zeiss Carl Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm
US20050002090A1 (en) * 1998-05-05 2005-01-06 Carl Zeiss Smt Ag EUV illumination system having a folding geometry
SE518170C2 (sv) * 2000-06-27 2002-09-03 Micronic Laser Systems Ab Flerstrålemönstergenerator och metod för skannande
SE0200547D0 (sv) * 2002-02-25 2002-02-25 Micronic Laser Systems Ab An image forming method and apparatus
JP2007052080A (ja) * 2005-08-15 2007-03-01 Fujifilm Holdings Corp 描画装置、露光装置、および描画方法
US20090199152A1 (en) * 2008-02-06 2009-08-06 Micronic Laser Systems Ab Methods and apparatuses for reducing mura effects in generated patterns
JP6000695B2 (ja) * 2011-07-08 2016-10-05 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画装置及び荷電粒子ビーム描画方法
WO2017040639A1 (en) 2015-08-31 2017-03-09 Lithoptek LLC Apparatus and method for using scanning light beam for film or surface modification
WO2021167587A1 (en) * 2020-02-18 2021-08-26 Applied Materials, Inc. Data inspection for digital lithography for hvm using offline and inline approach

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2030468A5 (enExample) * 1969-01-29 1970-11-13 Thomson Brandt Csf
US4313188A (en) * 1976-03-19 1982-01-26 Rca Corporation Method of recording an ablative optical recording medium
US4218142A (en) 1978-03-08 1980-08-19 Aerodyne Research, Inc. Mask analysis
JPS5862630A (ja) * 1981-10-08 1983-04-14 Sony Corp 光変調装置
US4464030A (en) * 1982-03-26 1984-08-07 Rca Corporation Dynamic accuracy X-Y positioning table for use in a high precision light-spot writing system
JPS5928337A (ja) * 1982-08-09 1984-02-15 Hitachi Ltd プロジエクシヨンアライナ
JP2797503B2 (ja) * 1989-08-28 1998-09-17 日本電気株式会社 プッシュプル昇圧コンバータのパルス幅変調回路
DE4022732A1 (de) * 1990-07-17 1992-02-20 Micronic Laser Systems Ab Auf einem lichtempfindlich beschichteten substrat durch fokussierte laserstrahlung hergestellte struktur sowie verfahren und vorrichtung zu ihrer herstellung
EP0558781B1 (en) * 1992-03-05 1998-08-05 Micronic Laser Systems Ab Method and apparatus for exposure of substrates
US5315111A (en) * 1992-10-15 1994-05-24 Lasa Industries, Inc. Method and apparatus for laser beam drift compensation
US5477304A (en) * 1992-10-22 1995-12-19 Nikon Corporation Projection exposure apparatus
JPH0725061A (ja) * 1993-07-09 1995-01-27 Matsushita Electric Ind Co Ltd 印字装置
JP3647121B2 (ja) * 1996-01-04 2005-05-11 キヤノン株式会社 走査露光装置および方法、ならびにデバイス製造方法

Also Published As

Publication number Publication date
US6624878B1 (en) 2003-09-23
SE9900170L (sv) 2000-07-22
AU2340400A (en) 2000-08-07
WO2000043838A1 (en) 2000-07-27
JP2002535719A (ja) 2002-10-22
SE9900170D0 (sv) 1999-01-21

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