JP2002535719A - レーザー記録方法およびシステム - Google Patents

レーザー記録方法およびシステム

Info

Publication number
JP2002535719A
JP2002535719A JP2000595202A JP2000595202A JP2002535719A JP 2002535719 A JP2002535719 A JP 2002535719A JP 2000595202 A JP2000595202 A JP 2000595202A JP 2000595202 A JP2000595202 A JP 2000595202A JP 2002535719 A JP2002535719 A JP 2002535719A
Authority
JP
Japan
Prior art keywords
writing
error condition
detector
error
interrupted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000595202A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002535719A5 (enExample
Inventor
サンドストロム、トルブヨルン
オドセリウス、レイフ
ツレン、アンデルス
グルストランド、ステファン
Original Assignee
マイクロニック レーザー システムズ アクチボラゲット
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by マイクロニック レーザー システムズ アクチボラゲット filed Critical マイクロニック レーザー システムズ アクチボラゲット
Publication of JP2002535719A publication Critical patent/JP2002535719A/ja
Publication of JP2002535719A5 publication Critical patent/JP2002535719A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2000595202A 1999-01-21 2000-01-21 レーザー記録方法およびシステム Pending JP2002535719A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
SE9900170A SE514835C2 (sv) 1999-01-21 1999-01-21 System och metod för mikrolitografiskt skrivande
SE9900170-3 1999-01-21
PCT/SE2000/000136 WO2000043838A1 (en) 1999-01-21 2000-01-21 Laser writer

Publications (2)

Publication Number Publication Date
JP2002535719A true JP2002535719A (ja) 2002-10-22
JP2002535719A5 JP2002535719A5 (enExample) 2007-01-11

Family

ID=20414167

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000595202A Pending JP2002535719A (ja) 1999-01-21 2000-01-21 レーザー記録方法およびシステム

Country Status (5)

Country Link
US (1) US6624878B1 (enExample)
JP (1) JP2002535719A (enExample)
AU (1) AU2340400A (enExample)
SE (1) SE514835C2 (enExample)
WO (1) WO2000043838A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013038397A (ja) * 2011-07-08 2013-02-21 Nuflare Technology Inc 荷電粒子ビーム描画装置及び荷電粒子ビーム描画方法

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10138313A1 (de) * 2001-01-23 2002-07-25 Zeiss Carl Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm
US20050002090A1 (en) * 1998-05-05 2005-01-06 Carl Zeiss Smt Ag EUV illumination system having a folding geometry
SE518170C2 (sv) * 2000-06-27 2002-09-03 Micronic Laser Systems Ab Flerstrålemönstergenerator och metod för skannande
SE0200547D0 (sv) * 2002-02-25 2002-02-25 Micronic Laser Systems Ab An image forming method and apparatus
JP2007052080A (ja) * 2005-08-15 2007-03-01 Fujifilm Holdings Corp 描画装置、露光装置、および描画方法
US20090199152A1 (en) * 2008-02-06 2009-08-06 Micronic Laser Systems Ab Methods and apparatuses for reducing mura effects in generated patterns
WO2017040639A1 (en) 2015-08-31 2017-03-09 Lithoptek LLC Apparatus and method for using scanning light beam for film or surface modification
WO2021167587A1 (en) * 2020-02-18 2021-08-26 Applied Materials, Inc. Data inspection for digital lithography for hvm using offline and inline approach

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2030468A5 (enExample) * 1969-01-29 1970-11-13 Thomson Brandt Csf
US4313188A (en) * 1976-03-19 1982-01-26 Rca Corporation Method of recording an ablative optical recording medium
US4218142A (en) 1978-03-08 1980-08-19 Aerodyne Research, Inc. Mask analysis
JPS5862630A (ja) * 1981-10-08 1983-04-14 Sony Corp 光変調装置
US4464030A (en) * 1982-03-26 1984-08-07 Rca Corporation Dynamic accuracy X-Y positioning table for use in a high precision light-spot writing system
JPS5928337A (ja) * 1982-08-09 1984-02-15 Hitachi Ltd プロジエクシヨンアライナ
JP2797503B2 (ja) * 1989-08-28 1998-09-17 日本電気株式会社 プッシュプル昇圧コンバータのパルス幅変調回路
DE4022732A1 (de) * 1990-07-17 1992-02-20 Micronic Laser Systems Ab Auf einem lichtempfindlich beschichteten substrat durch fokussierte laserstrahlung hergestellte struktur sowie verfahren und vorrichtung zu ihrer herstellung
EP0558781B1 (en) * 1992-03-05 1998-08-05 Micronic Laser Systems Ab Method and apparatus for exposure of substrates
US5315111A (en) * 1992-10-15 1994-05-24 Lasa Industries, Inc. Method and apparatus for laser beam drift compensation
US5477304A (en) * 1992-10-22 1995-12-19 Nikon Corporation Projection exposure apparatus
JPH0725061A (ja) * 1993-07-09 1995-01-27 Matsushita Electric Ind Co Ltd 印字装置
JP3647121B2 (ja) * 1996-01-04 2005-05-11 キヤノン株式会社 走査露光装置および方法、ならびにデバイス製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013038397A (ja) * 2011-07-08 2013-02-21 Nuflare Technology Inc 荷電粒子ビーム描画装置及び荷電粒子ビーム描画方法

Also Published As

Publication number Publication date
US6624878B1 (en) 2003-09-23
SE9900170L (sv) 2000-07-22
AU2340400A (en) 2000-08-07
WO2000043838A1 (en) 2000-07-27
SE514835C2 (sv) 2001-04-30
SE9900170D0 (sv) 1999-01-21

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