AU2340400A - Laser writer - Google Patents

Laser writer

Info

Publication number
AU2340400A
AU2340400A AU23404/00A AU2340400A AU2340400A AU 2340400 A AU2340400 A AU 2340400A AU 23404/00 A AU23404/00 A AU 23404/00A AU 2340400 A AU2340400 A AU 2340400A AU 2340400 A AU2340400 A AU 2340400A
Authority
AU
Australia
Prior art keywords
laser writer
writer
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU23404/00A
Other languages
English (en)
Inventor
Stefan Gullstrand
Leif Odselius
Torbjorn Sandstrom
Anders Thuren
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Micronic Laser Systems AB
Original Assignee
Micronic Laser Systems AB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Micronic Laser Systems AB filed Critical Micronic Laser Systems AB
Publication of AU2340400A publication Critical patent/AU2340400A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
AU23404/00A 1999-01-21 2000-01-21 Laser writer Abandoned AU2340400A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
SE9900170 1999-01-21
SE9900170A SE514835C2 (sv) 1999-01-21 1999-01-21 System och metod för mikrolitografiskt skrivande
PCT/SE2000/000136 WO2000043838A1 (en) 1999-01-21 2000-01-21 Laser writer

Publications (1)

Publication Number Publication Date
AU2340400A true AU2340400A (en) 2000-08-07

Family

ID=20414167

Family Applications (1)

Application Number Title Priority Date Filing Date
AU23404/00A Abandoned AU2340400A (en) 1999-01-21 2000-01-21 Laser writer

Country Status (5)

Country Link
US (1) US6624878B1 (enExample)
JP (1) JP2002535719A (enExample)
AU (1) AU2340400A (enExample)
SE (1) SE514835C2 (enExample)
WO (1) WO2000043838A1 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10138313A1 (de) * 2001-01-23 2002-07-25 Zeiss Carl Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm
US20050002090A1 (en) * 1998-05-05 2005-01-06 Carl Zeiss Smt Ag EUV illumination system having a folding geometry
SE518170C2 (sv) * 2000-06-27 2002-09-03 Micronic Laser Systems Ab Flerstrålemönstergenerator och metod för skannande
SE0200547D0 (sv) * 2002-02-25 2002-02-25 Micronic Laser Systems Ab An image forming method and apparatus
JP2007052080A (ja) * 2005-08-15 2007-03-01 Fujifilm Holdings Corp 描画装置、露光装置、および描画方法
US20090199152A1 (en) * 2008-02-06 2009-08-06 Micronic Laser Systems Ab Methods and apparatuses for reducing mura effects in generated patterns
JP6000695B2 (ja) * 2011-07-08 2016-10-05 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画装置及び荷電粒子ビーム描画方法
KR102721673B1 (ko) 2015-08-31 2024-10-25 리톱텍 엘엘씨 막 또는 표면 수정을 위하여 주사 광 빔을 이용하기 위한 장치 및 방법
WO2021167587A1 (en) * 2020-02-18 2021-08-26 Applied Materials, Inc. Data inspection for digital lithography for hvm using offline and inline approach

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2030468A5 (enExample) * 1969-01-29 1970-11-13 Thomson Brandt Csf
US4313188A (en) * 1976-03-19 1982-01-26 Rca Corporation Method of recording an ablative optical recording medium
US4218142A (en) 1978-03-08 1980-08-19 Aerodyne Research, Inc. Mask analysis
JPS5862630A (ja) * 1981-10-08 1983-04-14 Sony Corp 光変調装置
US4464030A (en) * 1982-03-26 1984-08-07 Rca Corporation Dynamic accuracy X-Y positioning table for use in a high precision light-spot writing system
JPS5928337A (ja) 1982-08-09 1984-02-15 Hitachi Ltd プロジエクシヨンアライナ
JP2797503B2 (ja) * 1989-08-28 1998-09-17 日本電気株式会社 プッシュプル昇圧コンバータのパルス幅変調回路
DE4022732A1 (de) 1990-07-17 1992-02-20 Micronic Laser Systems Ab Auf einem lichtempfindlich beschichteten substrat durch fokussierte laserstrahlung hergestellte struktur sowie verfahren und vorrichtung zu ihrer herstellung
DE69226511T2 (de) * 1992-03-05 1999-01-28 Micronic Laser Systems Ab, Taeby Verfahren und Vorrichtung zur Belichtung von Substraten
US5315111A (en) * 1992-10-15 1994-05-24 Lasa Industries, Inc. Method and apparatus for laser beam drift compensation
US5477304A (en) 1992-10-22 1995-12-19 Nikon Corporation Projection exposure apparatus
JPH0725061A (ja) * 1993-07-09 1995-01-27 Matsushita Electric Ind Co Ltd 印字装置
JP3647121B2 (ja) 1996-01-04 2005-05-11 キヤノン株式会社 走査露光装置および方法、ならびにデバイス製造方法

Also Published As

Publication number Publication date
JP2002535719A (ja) 2002-10-22
WO2000043838A1 (en) 2000-07-27
SE9900170D0 (sv) 1999-01-21
US6624878B1 (en) 2003-09-23
SE514835C2 (sv) 2001-04-30
SE9900170L (sv) 2000-07-22

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase
TH Corrigenda

Free format text: IN VOL 14, NO 44, PAGE(S) 7916-7918 UNDER THE HEADING APPLICATIONS LAPSED, REFUSED OR WITHDRAWN PLEASE DELETE ALL REFERENCE TO APPLICATION NO 23404/00

MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase