SE510489C2 - Alkoxifenylsubstituerade bisacylfosfinoxider - Google Patents

Alkoxifenylsubstituerade bisacylfosfinoxider

Info

Publication number
SE510489C2
SE510489C2 SE9503022A SE9503022A SE510489C2 SE 510489 C2 SE510489 C2 SE 510489C2 SE 9503022 A SE9503022 A SE 9503022A SE 9503022 A SE9503022 A SE 9503022A SE 510489 C2 SE510489 C2 SE 510489C2
Authority
SE
Sweden
Prior art keywords
alkyl
formula
hydrogen
compounds
phenyl
Prior art date
Application number
SE9503022A
Other languages
English (en)
Swedish (sv)
Other versions
SE9503022D0 (sv
SE9503022L (sv
Inventor
David G Leppard
Manfred Koehler
Original Assignee
Ciba Geigy Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy Ag filed Critical Ciba Geigy Ag
Publication of SE9503022D0 publication Critical patent/SE9503022D0/xx
Publication of SE9503022L publication Critical patent/SE9503022L/xx
Publication of SE510489C2 publication Critical patent/SE510489C2/sv

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • C07F9/30Phosphinic acids [R2P(=O)(OH)]; Thiophosphinic acids ; [R2P(=X1)(X2H) (X1, X2 are each independently O, S or Se)]
    • C07F9/32Esters thereof
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • C07F9/50Organo-phosphines
    • C07F9/53Organo-phosphine oxides; Organo-phosphine thioxides
    • C07F9/5337Phosphine oxides or thioxides containing the structure -C(=X)-P(=X) or NC-P(=X) (X = O, S, Se)
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/117Free radical
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/124Carbonyl compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Molecular Biology (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Paper (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
  • Detergent Compositions (AREA)
  • Materials For Photolithography (AREA)
SE9503022A 1994-09-02 1995-09-01 Alkoxifenylsubstituerade bisacylfosfinoxider SE510489C2 (sv)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH269194 1994-09-02

Publications (3)

Publication Number Publication Date
SE9503022D0 SE9503022D0 (sv) 1995-09-01
SE9503022L SE9503022L (sv) 1996-03-03
SE510489C2 true SE510489C2 (sv) 1999-05-31

Family

ID=4239412

Family Applications (1)

Application Number Title Priority Date Filing Date
SE9503022A SE510489C2 (sv) 1994-09-02 1995-09-01 Alkoxifenylsubstituerade bisacylfosfinoxider

Country Status (19)

Country Link
US (2) US5965776A (de)
JP (1) JP3834738B2 (de)
KR (1) KR100363978B1 (de)
CN (1) CN1130632A (de)
AT (1) AT402298B (de)
AU (1) AU700479B2 (de)
BE (1) BE1010179A4 (de)
BR (1) BR9503915A (de)
CA (1) CA2157342A1 (de)
CZ (1) CZ223695A3 (de)
DE (1) DE19532358A1 (de)
FR (1) FR2724172B1 (de)
GB (2) GB9517257D0 (de)
IT (1) IT1281126B1 (de)
NL (1) NL1001124C2 (de)
SE (1) SE510489C2 (de)
SK (1) SK284316B6 (de)
TW (1) TW381106B (de)
ZA (1) ZA957404B (de)

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US5922473A (en) * 1996-12-26 1999-07-13 Morton International, Inc. Dual thermal and ultraviolet curable powder coatings
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US6130980A (en) * 1997-05-06 2000-10-10 Dsm N.V. Ribbon assemblies and ink coating compositions for use in forming the ribbon assemblies
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DE19812859A1 (de) * 1998-03-24 1999-09-30 Basf Ag Photoinitiatorgemische
US5925402A (en) * 1998-07-15 1999-07-20 Morton International, Inc. Method of forming a hidden identification using powder coating
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KR100653117B1 (ko) 1998-11-30 2006-12-21 시바 스페셜티 케미칼스 홀딩 인크. 아실포스핀 및 유도체의 제조방법
SE9904080D0 (sv) 1998-12-03 1999-11-11 Ciba Sc Holding Ag Fotoinitiatorberedning
US6520926B2 (en) * 1999-02-24 2003-02-18 Lohmann Rauscher, Inc. Compression support sleeve
SE9900935D0 (sv) 1999-03-16 1999-03-16 Pharmacia & Upjohn Bv Macromolecular compounds
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ES2208250T3 (es) * 1999-12-08 2004-06-16 Ciba Specialty Chemicals Holding Inc. Nuevos sistemas de fotoiniciadores de oxido de fosfina y composiciones reticulables de color bajo.
DE19961355A1 (de) * 1999-12-17 2001-06-21 S & C Polymer Silicon & Compos Photoinitiatorsystem mit Titanocen-Initiatoren
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DE102006050153A1 (de) 2006-10-25 2008-05-08 Ivoclar Vivadent Ag Mikroverkapselte Photoinitiatoren und deren Verwendung für Dentalmaterialien
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Also Published As

Publication number Publication date
DE19532358A1 (de) 1996-03-07
GB2292740A (en) 1996-03-06
CN1130632A (zh) 1996-09-11
GB9517849D0 (en) 1995-11-01
ITMI951851A0 (it) 1995-09-01
US5767169A (en) 1998-06-16
AU3028695A (en) 1996-05-09
NL1001124C2 (nl) 1997-05-13
FR2724172A1 (fr) 1996-03-08
JPH0881481A (ja) 1996-03-26
KR100363978B1 (ko) 2003-02-17
SE9503022D0 (sv) 1995-09-01
GB9517257D0 (en) 1995-10-25
SE9503022L (sv) 1996-03-03
GB2292740B (en) 1998-12-30
JP3834738B2 (ja) 2006-10-18
CZ223695A3 (en) 1996-03-13
SK107395A3 (en) 1998-11-04
SK284316B6 (sk) 2005-01-03
BR9503915A (pt) 1996-09-17
FR2724172B1 (fr) 1998-01-23
ATA147195A (de) 1996-08-15
AT402298B (de) 1997-03-25
KR960010669A (ko) 1996-04-20
ZA957404B (en) 1996-04-17
BE1010179A4 (fr) 1998-02-03
IT1281126B1 (it) 1998-02-13
US5965776A (en) 1999-10-12
NL1001124A1 (nl) 1996-03-04
TW381106B (en) 2000-02-01
ITMI951851A1 (it) 1997-03-01
AU700479B2 (en) 1999-01-07
CA2157342A1 (en) 1996-03-03

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