ATA147195A - Alkoxyphenyl-substituierte bisbenzoylphosphinoxide - Google Patents

Alkoxyphenyl-substituierte bisbenzoylphosphinoxide

Info

Publication number
ATA147195A
ATA147195A AT0147195A AT147195A ATA147195A AT A147195 A ATA147195 A AT A147195A AT 0147195 A AT0147195 A AT 0147195A AT 147195 A AT147195 A AT 147195A AT A147195 A ATA147195 A AT A147195A
Authority
AT
Austria
Prior art keywords
bisbenzoylphosphinoxide
alkoxyphenyl
substituted
substituted bisbenzoylphosphinoxide
Prior art date
Application number
AT0147195A
Other languages
English (en)
Other versions
AT402298B (de
Original Assignee
Ciba Geigy Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy Ag filed Critical Ciba Geigy Ag
Publication of ATA147195A publication Critical patent/ATA147195A/de
Application granted granted Critical
Publication of AT402298B publication Critical patent/AT402298B/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/30—Phosphinic acids [R2P(=O)(OH)]; Thiophosphinic acids ; [R2P(=X1)(X2H) (X1, X2 are each independently O, S or Se)]
    • C07F9/32—Esters thereof
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/50—Organo-phosphines
    • C07F9/53—Organo-phosphine oxides; Organo-phosphine thioxides
    • C07F9/5337—Phosphine oxides or thioxides containing the structure -C(=X)-P(=X) or NC-P(=X) (X = O, S, Se)
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/124—Carbonyl compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Inorganic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Paper (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
  • Materials For Photolithography (AREA)
  • Detergent Compositions (AREA)
AT0147195A 1994-09-02 1995-09-04 Alkoxyphenyl-substituierte bisbenzoylphosphinoxide AT402298B (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH269194 1994-09-02

Publications (2)

Publication Number Publication Date
ATA147195A true ATA147195A (de) 1996-08-15
AT402298B AT402298B (de) 1997-03-25

Family

ID=4239412

Family Applications (1)

Application Number Title Priority Date Filing Date
AT0147195A AT402298B (de) 1994-09-02 1995-09-04 Alkoxyphenyl-substituierte bisbenzoylphosphinoxide

Country Status (19)

Country Link
US (2) US5965776A (de)
JP (1) JP3834738B2 (de)
KR (1) KR100363978B1 (de)
CN (1) CN1130632A (de)
AT (1) AT402298B (de)
AU (1) AU700479B2 (de)
BE (1) BE1010179A4 (de)
BR (1) BR9503915A (de)
CA (1) CA2157342A1 (de)
CZ (1) CZ223695A3 (de)
DE (1) DE19532358A1 (de)
FR (1) FR2724172B1 (de)
GB (2) GB9517257D0 (de)
IT (1) IT1281126B1 (de)
NL (1) NL1001124C2 (de)
SE (1) SE510489C2 (de)
SK (1) SK284316B6 (de)
TW (1) TW381106B (de)
ZA (1) ZA957404B (de)

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EP0825201B2 (de) † 1996-08-23 2006-11-29 Showa Denko Kabushiki Kaisha Photohärtbare Zusammensetzung und Härtungsverfahren
SG53043A1 (en) * 1996-08-28 1998-09-28 Ciba Geigy Ag Molecular complex compounds as photoinitiators
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DE19650562A1 (de) * 1996-12-05 1998-06-10 Basf Ag Photoinitiatorgemische, enthaltend Acylphosphinoxide und Benzophenonderivate
US5922473A (en) * 1996-12-26 1999-07-13 Morton International, Inc. Dual thermal and ultraviolet curable powder coatings
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US6130980A (en) * 1997-05-06 2000-10-10 Dsm N.V. Ribbon assemblies and ink coating compositions for use in forming the ribbon assemblies
CN1144767C (zh) * 1997-05-06 2004-04-07 Dsm有限公司 可辐射固化的油墨组合物
US6359025B1 (en) 1997-05-16 2002-03-19 Dsm N.V. Radiation-curable liquid resin composition for coating optical fibers
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DE19812859A1 (de) * 1998-03-24 1999-09-30 Basf Ag Photoinitiatorgemische
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CN1211388C (zh) * 1998-11-30 2005-07-20 西巴特殊化学品控股有限公司 酰基膦和其衍生物的制备方法
SE9904080D0 (sv) 1998-12-03 1999-11-11 Ciba Sc Holding Ag Fotoinitiatorberedning
US6520926B2 (en) * 1999-02-24 2003-02-18 Lohmann Rauscher, Inc. Compression support sleeve
SE9900935D0 (sv) 1999-03-16 1999-03-16 Pharmacia & Upjohn Bv Macromolecular compounds
DE60008778T2 (de) 1999-11-05 2005-02-10 Z Corp., Burlington Verfahren für dreidimensionales drucken
ES2208250T3 (es) * 1999-12-08 2004-06-16 Ciba Specialty Chemicals Holding Inc. Nuevos sistemas de fotoiniciadores de oxido de fosfina y composiciones reticulables de color bajo.
DE19961355A1 (de) 1999-12-17 2001-06-21 S & C Polymer Silicon & Compos Photoinitiatorsystem mit Titanocen-Initiatoren
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US20010050031A1 (en) 2000-04-14 2001-12-13 Z Corporation Compositions for three-dimensional printing of solid objects
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CA2422156A1 (en) * 2000-09-14 2002-03-21 Ciba Specialty Chemicals Holding Inc. Acylphosphine oxide photoinitiators in methacrylate casting resins
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US6737216B2 (en) 2000-12-08 2004-05-18 E.I. Du Pont De Nemours And Company Laser engravable flexographic printing element and a method for forming a printing plate from the element
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EP1749513B1 (de) 2005-08-01 2009-03-04 Ivoclar Vivadent AG Photopolymerisierbare Dentalmaterialien mit Bisacylphosphinoxiden als Initiator
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DE102006050153A1 (de) 2006-10-25 2008-05-08 Ivoclar Vivadent Ag Mikroverkapselte Photoinitiatoren und deren Verwendung für Dentalmaterialien
CN101568422B (zh) 2006-12-08 2013-02-13 3D系统公司 使用过氧化物固化的三维印刷材料体系和方法
JP5129267B2 (ja) 2007-01-10 2013-01-30 スリーディー システムズ インコーポレーテッド 改良された色、物品性能及び使用の容易さ、を持つ３次元印刷材料システム
US7968626B2 (en) 2007-02-22 2011-06-28 Z Corporation Three dimensional printing material system and method using plasticizer-assisted sintering
JP5066376B2 (ja) * 2007-02-27 2012-11-07 株式会社タムラ製作所 プリント配線板用のソルダーレジスト組成物およびプリント配線板
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CN109661409B (zh) * 2016-09-07 2021-09-07 富士胶片株式会社 光聚合引发剂、聚合性组合物、喷墨记录方法、以及酰基氧化膦化合物
JP7180068B2 (ja) * 2017-11-09 2022-11-30 株式会社リコー 硬化型液体組成物、硬化物、硬化物の製造方法及び硬化物の製造装置
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ZA941879B (en) * 1993-03-18 1994-09-19 Ciba Geigy Curing compositions containing bisacylphosphine oxide photoinitiators

Also Published As

Publication number Publication date
KR960010669A (ko) 1996-04-20
FR2724172A1 (fr) 1996-03-08
FR2724172B1 (fr) 1998-01-23
ITMI951851A0 (it) 1995-09-01
CZ223695A3 (en) 1996-03-13
JP3834738B2 (ja) 2006-10-18
ITMI951851A1 (it) 1997-03-01
SE9503022L (sv) 1996-03-03
US5965776A (en) 1999-10-12
GB2292740B (en) 1998-12-30
GB9517849D0 (en) 1995-11-01
ZA957404B (en) 1996-04-17
BE1010179A4 (fr) 1998-02-03
AU3028695A (en) 1996-05-09
JPH0881481A (ja) 1996-03-26
AT402298B (de) 1997-03-25
IT1281126B1 (it) 1998-02-13
CN1130632A (zh) 1996-09-11
SE510489C2 (sv) 1999-05-31
DE19532358A1 (de) 1996-03-07
KR100363978B1 (ko) 2003-02-17
CA2157342A1 (en) 1996-03-03
SK107395A3 (en) 1998-11-04
SK284316B6 (sk) 2005-01-03
NL1001124C2 (nl) 1997-05-13
GB2292740A (en) 1996-03-06
AU700479B2 (en) 1999-01-07
NL1001124A1 (nl) 1996-03-04
TW381106B (en) 2000-02-01
GB9517257D0 (en) 1995-10-25
SE9503022D0 (sv) 1995-09-01
US5767169A (en) 1998-06-16
BR9503915A (pt) 1996-09-17

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