SE510443C2 - Induktorer för integrerade kretsar - Google Patents

Induktorer för integrerade kretsar

Info

Publication number
SE510443C2
SE510443C2 SE9602191A SE9602191A SE510443C2 SE 510443 C2 SE510443 C2 SE 510443C2 SE 9602191 A SE9602191 A SE 9602191A SE 9602191 A SE9602191 A SE 9602191A SE 510443 C2 SE510443 C2 SE 510443C2
Authority
SE
Sweden
Prior art keywords
substrate
inductor
trenches
conductor
plates
Prior art date
Application number
SE9602191A
Other languages
English (en)
Swedish (sv)
Other versions
SE9602191D0 (sv
SE9602191L (sv
Inventor
Ted Johansson
Hans Erik Norstroem
Original Assignee
Ericsson Telefon Ab L M
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ericsson Telefon Ab L M filed Critical Ericsson Telefon Ab L M
Priority to SE9602191A priority Critical patent/SE510443C2/sv
Publication of SE9602191D0 publication Critical patent/SE9602191D0/xx
Priority to EP97926345A priority patent/EP0902974A1/de
Priority to CN97195081A priority patent/CN1220778A/zh
Priority to PCT/SE1997/000954 priority patent/WO1997045873A1/en
Priority to AU31130/97A priority patent/AU3113097A/en
Priority to KR1019980708627A priority patent/KR100298480B1/ko
Priority to JP09542247A priority patent/JP2000511350A/ja
Priority to CA002256763A priority patent/CA2256763A1/en
Publication of SE9602191L publication Critical patent/SE9602191L/xx
Publication of SE510443C2 publication Critical patent/SE510443C2/sv

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00—Resistors, capacitors or inductors
    • H10D1/20—Inductors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/60—Electrodes characterised by their materials
    • H10D64/66—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • H10W20/497—Inductive arrangements or effects of, or between, wiring layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W44/00—Electrical arrangements for controlling or matching impedance
    • H10W44/501—Inductive arrangements

Landscapes

  • Semiconductor Integrated Circuits (AREA)
  • Coils Or Transformers For Communication (AREA)
SE9602191A 1996-05-31 1996-05-31 Induktorer för integrerade kretsar SE510443C2 (sv)

Priority Applications (8)

Application Number Priority Date Filing Date Title
SE9602191A SE510443C2 (sv) 1996-05-31 1996-05-31 Induktorer för integrerade kretsar
EP97926345A EP0902974A1 (de) 1996-05-31 1997-05-30 Leiter für ic's
CN97195081A CN1220778A (zh) 1996-05-31 1997-05-30 集成电路的导体
PCT/SE1997/000954 WO1997045873A1 (en) 1996-05-31 1997-05-30 Conductors for integrated circuits
AU31130/97A AU3113097A (en) 1996-05-31 1997-05-30 Conductors for integrated circuits
KR1019980708627A KR100298480B1 (ko) 1996-05-31 1997-05-30 집적회로의인덕터및그제조방법
JP09542247A JP2000511350A (ja) 1996-05-31 1997-05-30 集積回路のための導電体
CA002256763A CA2256763A1 (en) 1996-05-31 1997-05-30 Conductors for integrated circuits

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE9602191A SE510443C2 (sv) 1996-05-31 1996-05-31 Induktorer för integrerade kretsar

Publications (3)

Publication Number Publication Date
SE9602191D0 SE9602191D0 (sv) 1996-05-31
SE9602191L SE9602191L (sv) 1997-12-01
SE510443C2 true SE510443C2 (sv) 1999-05-25

Family

ID=20402861

Family Applications (1)

Application Number Title Priority Date Filing Date
SE9602191A SE510443C2 (sv) 1996-05-31 1996-05-31 Induktorer för integrerade kretsar

Country Status (8)

Country Link
EP (1) EP0902974A1 (de)
JP (1) JP2000511350A (de)
KR (1) KR100298480B1 (de)
CN (1) CN1220778A (de)
AU (1) AU3113097A (de)
CA (1) CA2256763A1 (de)
SE (1) SE510443C2 (de)
WO (1) WO1997045873A1 (de)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002509649A (ja) 1997-07-11 2002-03-26 テレフオンアクチーボラゲツト エル エム エリクソン 高周波で使用されるｉｃ部品を製造するためのプロセス
KR19990055422A (ko) * 1997-12-27 1999-07-15 정선종 실리콘 기판에서의 인덕터 장치 및 그 제조 방법
JP3942264B2 (ja) * 1998-03-11 2007-07-11 富士通株式会社 半導体基板上に形成されるインダクタンス素子
DE19810825A1 (de) * 1998-03-12 1999-09-16 Siemens Ag Integrierte elektronische Schaltungsanordnung und Verfahren zu ihrer Herstellung
EP0966040A1 (de) * 1998-06-19 1999-12-22 International Business Machines Corporation Passive Komponente über Isolationsgräben
KR20000011585A (ko) 1998-07-28 2000-02-25 윤덕용 반도체소자및그제조방법
US6278186B1 (en) 1998-08-26 2001-08-21 Intersil Corporation Parasitic current barriers
DE19910983A1 (de) * 1999-03-12 2000-09-21 Bosch Gmbh Robert Vorrichtung und Verfahren zur Bestimmung der lateralen Unterätzung einer strukturierten Oberflächenschicht
AU5711000A (en) * 1999-07-08 2001-01-30 Korea Advanced Institute Of Science And Technology Method for manufacturing a semiconductor device having a metal layer floating over a substrate
DE19944306B4 (de) * 1999-09-15 2005-05-19 Infineon Technologies Ag Integrierte Halbleiterschaltung mit integrierter Spule und Verfahren zu deren Herstellung
SG98398A1 (en) * 2000-05-25 2003-09-19 Inst Of Microelectronics Integrated circuit inductor
FR2810451A1 (fr) * 2000-06-20 2001-12-21 Koninkl Philips Electronics Nv Circuit integre incluant un element inductif de facteur de qualite eleve et presentant une grande compacite
KR20020014225A (ko) * 2000-08-17 2002-02-25 박종섭 미세 인덕터와 중첩되는 트렌치 내에 절연막을 구비하는집적 소자 및 그 제조 방법
DE10041084A1 (de) 2000-08-22 2002-03-14 Infineon Technologies Ag Verfahren zur Bildung eines dielektrischen Gebiets in einem Halbleitersubstrat
DE10041691A1 (de) 2000-08-24 2002-03-14 Infineon Technologies Ag Halbleiteranordnung
EP1213762A1 (de) * 2000-12-05 2002-06-12 Koninklijke Philips Electronics N.V. Isolationsvorrichtung für elektrisches Bauelement
DE10163460B4 (de) * 2001-12-21 2010-05-27 Austriamicrosystems Ag Siliziumsubstrat mit einer Isolierschicht und Anordnung mit einem Siliziumsubstrat mit einer Isolierschicht
WO2003054955A2 (de) 2001-12-13 2003-07-03 Austriamicrosystems Ag Siliziumsubstrat mit einer isolierschicht mit teilgebieten und entsprechende anordnung
DE102004022139B4 (de) * 2004-05-05 2007-10-18 Atmel Germany Gmbh Verfahren zur Herstellung einer Spiralinduktivität auf einem Substrat und nach einem derartigen Verfahren hergestelltes Bauelement
JP3927565B2 (ja) * 2004-06-25 2007-06-13 インターナショナル・ビジネス・マシーンズ・コーポレーション 磁気コアを有するオンチップ・インダクタ
CN101149761B (zh) * 2006-09-20 2012-02-08 爱斯泰克（上海）高频通讯技术有限公司 硅基螺旋电感器件等效电路双π非对称模型参数的提取方法
CN100527415C (zh) * 2006-09-22 2009-08-12 联华电子股份有限公司 形成于半导体基底上的电感器及其形成方法
CN102208405B (zh) * 2010-08-24 2015-11-25 华东师范大学 平面螺旋电感
CN102456612A (zh) * 2010-10-27 2012-05-16 上海华虹Nec电子有限公司 半导体集成电感的制作方法及结构
JP5699905B2 (ja) * 2011-10-28 2015-04-15 株式会社デンソー 半導体装置
CN114823638A (zh) * 2022-04-27 2022-07-29 电子科技大学 一种低寄生电容集成电感结构

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0377360A (ja) * 1989-08-18 1991-04-02 Mitsubishi Electric Corp 半導体装置
US5336921A (en) * 1992-01-27 1994-08-09 Motorola, Inc. Vertical trench inductor
WO1994017558A1 (en) * 1993-01-29 1994-08-04 The Regents Of The University Of California Monolithic passive component
WO1996002070A2 (en) * 1994-07-12 1996-01-25 National Semiconductor Corporation Integrated circuit comprising a trench isolation structure and an oxygen barrier layer and method for forming the integrated circuit
US5446311A (en) * 1994-09-16 1995-08-29 International Business Machines Corporation High-Q inductors in silicon technology without expensive metalization

Also Published As

Publication number Publication date
KR100298480B1 (ko) 2001-08-07
KR20000010660A (ko) 2000-02-25
CA2256763A1 (en) 1997-12-04
WO1997045873A1 (en) 1997-12-04
SE9602191D0 (sv) 1996-05-31
SE9602191L (sv) 1997-12-01
JP2000511350A (ja) 2000-08-29
AU3113097A (en) 1998-01-05
CN1220778A (zh) 1999-06-23
EP0902974A1 (de) 1999-03-24

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