RU2005132825A - Термический способ снижения концентрации дифтордиазина и тетрафторгидразина в трифториде азота - Google Patents

Термический способ снижения концентрации дифтордиазина и тетрафторгидразина в трифториде азота Download PDF

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Publication number
RU2005132825A
RU2005132825A RU2005132825/15A RU2005132825A RU2005132825A RU 2005132825 A RU2005132825 A RU 2005132825A RU 2005132825/15 A RU2005132825/15 A RU 2005132825/15A RU 2005132825 A RU2005132825 A RU 2005132825A RU 2005132825 A RU2005132825 A RU 2005132825A
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Russia
Prior art keywords
reactor
nitrogen trifluoride
wall
heating
impurity
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RU2005132825/15A
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English (en)
Russian (ru)
Inventor
Барри Ашер МАХЛЕР (US)
Барри Ашер МАХЛЕР
Марио Дж. НАППА (US)
Марио Дж. НАППА
Original Assignee
Е.И.Дюпон де Немур энд Компани (US)
Е.И.Дюпон Де Немур Энд Компани
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Application filed by Е.И.Дюпон де Немур энд Компани (US), Е.И.Дюпон Де Немур Энд Компани filed Critical Е.И.Дюпон де Немур энд Компани (US)
Publication of RU2005132825A publication Critical patent/RU2005132825A/ru

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    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00Nitrogen; Compounds thereof
    • C01B21/082Compounds containing nitrogen and non-metals and optionally metals
    • C01B21/083Compounds containing nitrogen and non-metals and optionally metals containing one or more halogen atoms
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/02Apparatus characterised by being constructed of material selected for its chemically-resistant properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/0006Controlling or regulating processes
    • B01J19/002Avoiding undesirable reactions or side-effects, e.g. avoiding explosions, or improving the yield by suppressing side-reactions
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/24Stationary reactors without moving elements inside
    • B01J19/2415Tubular reactors
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00Nitrogen; Compounds thereof
    • C01B21/082Compounds containing nitrogen and non-metals and optionally metals
    • C01B21/083Compounds containing nitrogen and non-metals and optionally metals containing one or more halogen atoms
    • C01B21/0832Binary compounds of nitrogen with halogens
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00Nitrogen; Compounds thereof
    • C01B21/082Compounds containing nitrogen and non-metals and optionally metals
    • C01B21/083Compounds containing nitrogen and non-metals and optionally metals containing one or more halogen atoms
    • C01B21/0832Binary compounds of nitrogen with halogens
    • C01B21/0835Nitrogen trifluoride
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049Controlling or regulating processes
    • B01J2219/00051Controlling the temperature
    • B01J2219/00074Controlling the temperature by indirect heating or cooling employing heat exchange fluids
    • B01J2219/00087Controlling the temperature by indirect heating or cooling employing heat exchange fluids with heat exchange elements outside the reactor
    • B01J2219/00094Jackets
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049Controlling or regulating processes
    • B01J2219/00051Controlling the temperature
    • B01J2219/00074Controlling the temperature by indirect heating or cooling employing heat exchange fluids
    • B01J2219/00087Controlling the temperature by indirect heating or cooling employing heat exchange fluids with heat exchange elements outside the reactor
    • B01J2219/00099Controlling the temperature by indirect heating or cooling employing heat exchange fluids with heat exchange elements outside the reactor the reactor being immersed in the heat exchange medium
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049Controlling or regulating processes
    • B01J2219/00051Controlling the temperature
    • B01J2219/00132Controlling the temperature using electric heating or cooling elements
    • B01J2219/00135Electric resistance heaters
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049Controlling or regulating processes
    • B01J2219/00051Controlling the temperature
    • B01J2219/00157Controlling the temperature by means of a burner
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049Controlling or regulating processes
    • B01J2219/00245Avoiding undesirable reactions or side-effects
    • B01J2219/00247Fouling of the reactor or the process equipment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049Controlling or regulating processes
    • B01J2219/00245Avoiding undesirable reactions or side-effects
    • B01J2219/00252Formation of deposits other than coke
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/02Apparatus characterised by their chemically-resistant properties
    • B01J2219/0204Apparatus characterised by their chemically-resistant properties comprising coatings on the surfaces in direct contact with the reactive components
    • B01J2219/0218Apparatus characterised by their chemically-resistant properties comprising coatings on the surfaces in direct contact with the reactive components of ceramic
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00Etching of wafers, substrates or parts of devices
    • H10P50/20Dry etching; Plasma etching; Reactive-ion etching
    • H10P50/24Dry etching; Plasma etching; Reactive-ion etching of semiconductor materials
    • H10P50/242Dry etching; Plasma etching; Reactive-ion etching of semiconductor materials of Group IV materials

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)
RU2005132825/15A 2003-03-25 2004-03-25 Термический способ снижения концентрации дифтордиазина и тетрафторгидразина в трифториде азота RU2005132825A (ru)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/396,926 2003-03-25
US10/396,926 US20040191155A1 (en) 2003-03-25 2003-03-25 Thermal process for reducing the concentration of dinitrogen difluoride and dinitrogen tetrafluoride in nitrogen trifluoride

Publications (1)

Publication Number Publication Date
RU2005132825A true RU2005132825A (ru) 2006-01-27

Family

ID=32988892

Family Applications (1)

Application Number Title Priority Date Filing Date
RU2005132825/15A RU2005132825A (ru) 2003-03-25 2004-03-25 Термический способ снижения концентрации дифтордиазина и тетрафторгидразина в трифториде азота

Country Status (10)

Country Link
US (1) US20040191155A1 (https=)
EP (1) EP1606217A2 (https=)
JP (1) JP2006521279A (https=)
KR (1) KR20050114686A (https=)
CN (1) CN1761615A (https=)
CA (1) CA2514345A1 (https=)
RU (1) RU2005132825A (https=)
TW (1) TW200502161A (https=)
WO (1) WO2004087569A2 (https=)
ZA (1) ZA200505304B (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AR055831A1 (es) 2004-12-30 2007-09-12 Janssen Pharmaceutica Nv Pepirazinilureas y piperidinilureas como moduladores de hidrolasa de amida de acidos grasos
CN1328160C (zh) * 2005-07-27 2007-07-25 中国船舶重工集团公司第七一八研究所 三氟化氮气体的纯化方法
US8201619B2 (en) 2005-12-21 2012-06-19 Exxonmobil Research & Engineering Company Corrosion resistant material for reduced fouling, a heat transfer component having reduced fouling and a method for reducing fouling in a refinery
CA2634252A1 (en) * 2005-12-21 2007-07-05 Exxonmobil Research And Engineering Company Corrosion resistant material for reduced fouling, heat transfer component with improved corrosion and fouling resistance, and method for reducing fouling
UA108233C2 (uk) 2010-05-03 2015-04-10 Модулятори активності гідролази амідів жирних кислот
CN104548927B (zh) * 2015-01-07 2017-01-25 黎明化工研究设计院有限责任公司 一种四氟化碳中微量三氟化氮的去除工艺
US11754541B2 (en) 2017-09-25 2023-09-12 Cymer, Llc Fluorine detection in a gas discharge light source

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3032400A (en) * 1960-01-14 1962-05-01 Du Pont Method of producing nitrogen fluorides
DE1186857B (de) * 1962-09-22 1965-02-11 Huels Chemische Werke Ag Verwendung von elektropoliertem, nichtrostendem Stahl als Apparatematerial bei der Oxydation organischer Verbindungen
US4193976A (en) * 1978-04-06 1980-03-18 Air Products & Chemicals, Inc. Removal of dinitrogen difluoride from nitrogen trifluoride
US4156598A (en) * 1978-06-08 1979-05-29 Air Products And Chemicals, Inc. Purification of nitrogen trifluoride atmospheres
EP0337294B1 (en) * 1988-04-11 1993-06-30 MITSUI TOATSU CHEMICALS, Inc. Process for purifying nitrogen trifluoride gas
JPH01261208A (ja) * 1988-04-11 1989-10-18 Mitsui Toatsu Chem Inc 三弗化窒素ガスの精製方法
JPH01261209A (ja) * 1988-04-13 1989-10-18 Mitsui Toatsu Chem Inc 三弗化窒素ガスの精製方法
JPH0218309A (ja) * 1988-07-05 1990-01-22 Mitsui Toatsu Chem Inc 三弗化窒素ガスの精製方法
US5009963A (en) * 1988-07-20 1991-04-23 Tadahiro Ohmi Metal material with film passivated by fluorination and apparatus composed of the metal material
JP2867376B2 (ja) * 1988-12-09 1999-03-08 ステラケミファ株式会社 フッ化不動態膜が形成された金属材料、その金属材料を用いたガス装置、並びに該フッ化不動態膜の形成方法
EP0366078B1 (en) * 1988-10-25 1996-06-26 MITSUI TOATSU CHEMICALS, Inc. Method for Purifying nitrogen trifluoride gas
JPH0446672A (ja) * 1990-06-14 1992-02-17 Fuaiaaransu Kogyo Kk 継手付ランスパイプの製造方法及び継手付ランスパイプ
JP3782151B2 (ja) * 1996-03-06 2006-06-07 キヤノン株式会社 エキシマレーザー発振装置のガス供給装置
JP3532345B2 (ja) * 1996-05-14 2004-05-31 日本エア・リキード株式会社 超高純度三弗化窒素製造方法及びその装置
JPH11326160A (ja) * 1998-05-13 1999-11-26 L'air Liquide 反応性フッ素系ガスのサンプリング装置及び方法

Also Published As

Publication number Publication date
EP1606217A2 (en) 2005-12-21
TW200502161A (en) 2005-01-16
KR20050114686A (ko) 2005-12-06
US20040191155A1 (en) 2004-09-30
JP2006521279A (ja) 2006-09-21
CA2514345A1 (en) 2004-10-14
CN1761615A (zh) 2006-04-19
WO2004087569A3 (en) 2004-12-09
WO2004087569A2 (en) 2004-10-14
ZA200505304B (en) 2006-09-27

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Effective date: 20091015