JP2006521279A5 - - Google Patents

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Publication number
JP2006521279A5
JP2006521279A5 JP2006509297A JP2006509297A JP2006521279A5 JP 2006521279 A5 JP2006521279 A5 JP 2006521279A5 JP 2006509297 A JP2006509297 A JP 2006509297A JP 2006509297 A JP2006509297 A JP 2006509297A JP 2006521279 A5 JP2006521279 A5 JP 2006521279A5
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JP
Japan
Prior art keywords
nitrogen trifluoride
container
impurity
wall
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006509297A
Other languages
English (en)
Japanese (ja)
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JP2006521279A (ja
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Publication date
Priority claimed from US10/396,926 external-priority patent/US20040191155A1/en
Application filed filed Critical
Publication of JP2006521279A publication Critical patent/JP2006521279A/ja
Publication of JP2006521279A5 publication Critical patent/JP2006521279A5/ja
Pending legal-status Critical Current

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JP2006509297A 2003-03-25 2004-03-25 三フッ化窒素中の二フッ化二窒素および四フッ化二窒素濃度を低減する熱的方法 Pending JP2006521279A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/396,926 US20040191155A1 (en) 2003-03-25 2003-03-25 Thermal process for reducing the concentration of dinitrogen difluoride and dinitrogen tetrafluoride in nitrogen trifluoride
PCT/US2004/009183 WO2004087569A2 (en) 2003-03-25 2004-03-25 Thermal process for reducing the concentration of dinitrogen difluoride and dinitrogen tetrafluoride in nitrogen trifluoride

Publications (2)

Publication Number Publication Date
JP2006521279A JP2006521279A (ja) 2006-09-21
JP2006521279A5 true JP2006521279A5 (https=) 2007-06-07

Family

ID=32988892

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006509297A Pending JP2006521279A (ja) 2003-03-25 2004-03-25 三フッ化窒素中の二フッ化二窒素および四フッ化二窒素濃度を低減する熱的方法

Country Status (10)

Country Link
US (1) US20040191155A1 (https=)
EP (1) EP1606217A2 (https=)
JP (1) JP2006521279A (https=)
KR (1) KR20050114686A (https=)
CN (1) CN1761615A (https=)
CA (1) CA2514345A1 (https=)
RU (1) RU2005132825A (https=)
TW (1) TW200502161A (https=)
WO (1) WO2004087569A2 (https=)
ZA (1) ZA200505304B (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AR055831A1 (es) 2004-12-30 2007-09-12 Janssen Pharmaceutica Nv Pepirazinilureas y piperidinilureas como moduladores de hidrolasa de amida de acidos grasos
CN1328160C (zh) * 2005-07-27 2007-07-25 中国船舶重工集团公司第七一八研究所 三氟化氮气体的纯化方法
US8201619B2 (en) 2005-12-21 2012-06-19 Exxonmobil Research & Engineering Company Corrosion resistant material for reduced fouling, a heat transfer component having reduced fouling and a method for reducing fouling in a refinery
CA2634252A1 (en) * 2005-12-21 2007-07-05 Exxonmobil Research And Engineering Company Corrosion resistant material for reduced fouling, heat transfer component with improved corrosion and fouling resistance, and method for reducing fouling
UA108233C2 (uk) 2010-05-03 2015-04-10 Модулятори активності гідролази амідів жирних кислот
CN104548927B (zh) * 2015-01-07 2017-01-25 黎明化工研究设计院有限责任公司 一种四氟化碳中微量三氟化氮的去除工艺
US11754541B2 (en) 2017-09-25 2023-09-12 Cymer, Llc Fluorine detection in a gas discharge light source

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3032400A (en) * 1960-01-14 1962-05-01 Du Pont Method of producing nitrogen fluorides
DE1186857B (de) * 1962-09-22 1965-02-11 Huels Chemische Werke Ag Verwendung von elektropoliertem, nichtrostendem Stahl als Apparatematerial bei der Oxydation organischer Verbindungen
US4193976A (en) * 1978-04-06 1980-03-18 Air Products & Chemicals, Inc. Removal of dinitrogen difluoride from nitrogen trifluoride
US4156598A (en) * 1978-06-08 1979-05-29 Air Products And Chemicals, Inc. Purification of nitrogen trifluoride atmospheres
EP0337294B1 (en) * 1988-04-11 1993-06-30 MITSUI TOATSU CHEMICALS, Inc. Process for purifying nitrogen trifluoride gas
JPH01261208A (ja) * 1988-04-11 1989-10-18 Mitsui Toatsu Chem Inc 三弗化窒素ガスの精製方法
JPH01261209A (ja) * 1988-04-13 1989-10-18 Mitsui Toatsu Chem Inc 三弗化窒素ガスの精製方法
JPH0218309A (ja) * 1988-07-05 1990-01-22 Mitsui Toatsu Chem Inc 三弗化窒素ガスの精製方法
US5009963A (en) * 1988-07-20 1991-04-23 Tadahiro Ohmi Metal material with film passivated by fluorination and apparatus composed of the metal material
JP2867376B2 (ja) * 1988-12-09 1999-03-08 ステラケミファ株式会社 フッ化不動態膜が形成された金属材料、その金属材料を用いたガス装置、並びに該フッ化不動態膜の形成方法
EP0366078B1 (en) * 1988-10-25 1996-06-26 MITSUI TOATSU CHEMICALS, Inc. Method for Purifying nitrogen trifluoride gas
JPH0446672A (ja) * 1990-06-14 1992-02-17 Fuaiaaransu Kogyo Kk 継手付ランスパイプの製造方法及び継手付ランスパイプ
JP3782151B2 (ja) * 1996-03-06 2006-06-07 キヤノン株式会社 エキシマレーザー発振装置のガス供給装置
JP3532345B2 (ja) * 1996-05-14 2004-05-31 日本エア・リキード株式会社 超高純度三弗化窒素製造方法及びその装置
JPH11326160A (ja) * 1998-05-13 1999-11-26 L'air Liquide 反応性フッ素系ガスのサンプリング装置及び方法

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