PH12014502509B1 - Surface-treated copper foil and laminate using same, copper foil, printed wiring board, electronic device, and process for producing printed wiring board - Google Patents

Surface-treated copper foil and laminate using same, copper foil, printed wiring board, electronic device, and process for producing printed wiring board

Info

Publication number
PH12014502509B1
PH12014502509B1 PH12014502509A PH12014502509A PH12014502509B1 PH 12014502509 B1 PH12014502509 B1 PH 12014502509B1 PH 12014502509 A PH12014502509 A PH 12014502509A PH 12014502509 A PH12014502509 A PH 12014502509A PH 12014502509 B1 PH12014502509 B1 PH 12014502509B1
Authority
PH
Philippines
Prior art keywords
copper foil
wiring board
printed wiring
laminate
same
Prior art date
Application number
PH12014502509A
Other languages
English (en)
Other versions
PH12014502509A1 (en
Inventor
Hideta Arai
Atsushi Miki
Original Assignee
Jx Nippon Mining & Metals Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jx Nippon Mining & Metals Corp filed Critical Jx Nippon Mining & Metals Corp
Publication of PH12014502509B1 publication Critical patent/PH12014502509B1/en
Publication of PH12014502509A1 publication Critical patent/PH12014502509A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/06—Wires; Strips; Foils
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/12—Electroforming by electrophoresis
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00—Layered products comprising a layer of metal
    • B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/06—Wires; Strips; Foils
    • C25D7/0614—Strips or foils
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/06—Wires; Strips; Foils
    • C25D7/0614—Strips or foils
    • C25D7/0692—Regulating the thickness of the coating
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/09—Use of materials for the conductive, e.g. metallic pattern
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/382—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/04—Wires; Strips; Foils
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/10—Moulds; Masks; Masterforms
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/12—Electroforming by electrophoresis
    • C25D1/14—Electroforming by electrophoresis of inorganic material
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/58—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of copper
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/022—Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Molecular Biology (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Laminated Bodies (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Metal Rolling (AREA)
PH12014502509A 2012-05-11 2014-11-10 Surface-treated copper foil and laminate using same, copper foil, printed wiring board, electronic device, and process for producing printed wiring board PH12014502509A1 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2012122448 2012-05-11
JP2013003867 2013-01-11
JP2013008519A JP5475897B1 (ja) 2012-05-11 2013-01-21 表面処理銅箔及びそれを用いた積層板、銅箔、プリント配線板、電子機器、並びに、プリント配線板の製造方法
PCT/JP2013/062658 WO2013168646A1 (ja) 2012-05-11 2013-04-30 表面処理銅箔及びそれを用いた積層板、銅箔、プリント配線板、電子機器、並びに、プリント配線板の製造方法

Publications (2)

Publication Number Publication Date
PH12014502509B1 true PH12014502509B1 (en) 2014-12-22
PH12014502509A1 PH12014502509A1 (en) 2014-12-22

Family

ID=49550688

Family Applications (1)

Application Number Title Priority Date Filing Date
PH12014502509A PH12014502509A1 (en) 2012-05-11 2014-11-10 Surface-treated copper foil and laminate using same, copper foil, printed wiring board, electronic device, and process for producing printed wiring board

Country Status (7)

Country Link
JP (1) JP5475897B1 (ko)
KR (2) KR101704892B1 (ko)
CN (2) CN104271813B (ko)
MY (2) MY171074A (ko)
PH (1) PH12014502509A1 (ko)
TW (1) TWI479036B (ko)
WO (1) WO2013168646A1 (ko)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5822669B2 (ja) 2011-02-18 2015-11-24 Jx日鉱日石金属株式会社 グラフェン製造用銅箔及びそれを用いたグラフェンの製造方法
JP5850720B2 (ja) 2011-06-02 2016-02-03 Jx日鉱日石金属株式会社 グラフェン製造用銅箔、及びグラフェンの製造方法
JP5959510B2 (ja) 2011-06-02 2016-08-02 Ｊｘ金属株式会社 グラフェン製造用銅箔、及びグラフェンの製造方法
JP5721609B2 (ja) 2011-11-15 2015-05-20 Jx日鉱日石金属株式会社 グラフェン製造用銅箔、及びグラフェンの製造方法
JP5885790B2 (ja) * 2013-08-20 2016-03-15 Ｊｘ金属株式会社 表面処理銅箔及びそれを用いた積層板、キャリア付銅箔、プリント配線板、電子機器、電子機器の製造方法、並びに、プリント配線板の製造方法
JP5710737B1 (ja) * 2013-11-29 2015-04-30 Jx日鉱日石金属株式会社 表面処理銅箔、積層板、プリント配線板、プリント回路板及び電子機器
JP5756547B1 (ja) * 2014-04-28 2015-07-29 株式会社Ｓｈカッパープロダクツ 表面処理銅箔及び積層板
JP6078024B2 (ja) 2014-06-13 2017-02-08 Ｊｘ金属株式会社 ２次元六角形格子化合物製造用圧延銅箔、及び２次元六角形格子化合物の製造方法
TWI676405B (zh) * 2016-07-26 2019-11-01 日商Ｊｘ金屬股份有限公司 印刷配線板、電子機器、導管及金屬材料
WO2018047933A1 (ja) * 2016-09-12 2018-03-15 古河電気工業株式会社 銅箔およびこれを有する銅張積層板
CN108697006B (zh) * 2017-03-31 2021-07-16 Ｊｘ金属株式会社 表面处理铜箔、附载体铜箔、积层体、印刷配线板的制造方法及电子机器的制造方法
KR102349377B1 (ko) * 2019-12-19 2022-01-12 일진머티리얼즈 주식회사 표면처리 동박, 이의 제조방법, 이를 포함한 동박적층판, 및 이를 포함한 프린트 배선판
CN112566373B (zh) * 2020-11-13 2022-11-04 广东工业大学 一种基于锡模板的粗化方法

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JP2849059B2 (ja) 1995-09-28 1999-01-20 日鉱グールド・フォイル株式会社 印刷回路用銅箔の処理方法
KR100632861B1 (ko) * 2002-05-13 2006-10-13 미쓰이 긴조꾸 고교 가부시키가이샤 칩온 필름용 플렉시블 프린트배선판
JP2004098659A (ja) 2002-07-19 2004-04-02 Ube Ind Ltd 銅張積層板及びその製造方法
US7341796B2 (en) * 2004-02-17 2008-03-11 Nippon Mining & Metals Co., Ltd Copper foil having blackened surface or layer
JP2005344174A (ja) * 2004-06-03 2005-12-15 Mitsui Mining & Smelting Co Ltd 表面処理銅箔及びその表面処理銅箔を用いて製造したフレキシブル銅張積層板並びにフィルムキャリアテープ
WO2006106956A1 (ja) * 2005-03-31 2006-10-12 Mitsui Mining & Smelting Co., Ltd 電解銅箔及び電解銅箔の製造方法、その電解銅箔を用いて得られた表面処理電解銅箔、その表面処理電解銅箔を用いた銅張積層板及びプリント配線板
KR20070044774A (ko) * 2005-10-25 2007-04-30 미쓰이 긴조꾸 고교 가부시키가이샤 2층 플렉시블 프린트 배선판 및 그 2층 플렉시블 프린트배선판의 제조 방법
TW200728515A (en) * 2005-10-31 2007-08-01 Mitsui Mining & Smelting Co Method for manufacture of electrolytic copper foil, electrolytic copper foil manufactured by the method, surface-treated copper foil manufactured using the electrolytic copper foil, and copper-clad laminate manufactured using the electrolytic copper
TW200738913A (en) * 2006-03-10 2007-10-16 Mitsui Mining & Smelting Co Surface treated elctrolytic copper foil and process for producing the same
JP2007332458A (ja) 2006-05-18 2007-12-27 Sony Corp 蒸着装置および蒸着源ならびに表示装置の製造方法
JP2007332418A (ja) * 2006-06-15 2007-12-27 Fukuda Metal Foil & Powder Co Ltd 表面処理銅箔
JP4240506B2 (ja) * 2006-09-05 2009-03-18 三井金属鉱業株式会社 電子部品実装用フィルムキャリアテープの製造方法
JP5129642B2 (ja) * 2007-04-19 2013-01-30 三井金属鉱業株式会社 表面処理銅箔及びその表面処理銅箔を用いて得られる銅張積層板並びにその銅張積層板を用いて得られるプリント配線板
US8524378B2 (en) * 2008-11-25 2013-09-03 Jx Nippon Mining & Metals Corporation Copper foil for printed circuit
EP2361762B1 (en) * 2009-12-22 2013-11-06 JX Nippon Mining & Metals Corporation Method for producing laminate
JP5242710B2 (ja) * 2010-01-22 2013-07-24 古河電気工業株式会社 粗化処理銅箔、銅張積層板及びプリント配線板
JP5411192B2 (ja) * 2011-03-25 2014-02-12 Ｊｘ日鉱日石金属株式会社 圧延銅箔及びその製造方法
JP5261595B1 (ja) * 2012-06-29 2013-08-14 Ｊｘ日鉱日石金属株式会社 圧延銅箔及びその製造方法、並びに、積層板

Also Published As

Publication number Publication date
MY194478A (en) 2022-11-30
CN107022774A (zh) 2017-08-08
KR20160128467A (ko) 2016-11-07
CN104271813B (zh) 2018-08-28
KR20150008482A (ko) 2015-01-22
PH12014502509A1 (en) 2014-12-22
TW201402840A (zh) 2014-01-16
MY171074A (en) 2019-09-24
KR101704892B1 (ko) 2017-02-08
TWI479036B (zh) 2015-04-01
WO2013168646A1 (ja) 2013-11-14
KR101822325B1 (ko) 2018-01-25
JP5475897B1 (ja) 2014-04-16
JP2014148691A (ja) 2014-08-21
CN104271813A (zh) 2015-01-07

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